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1. 发明申请

US20100080961A1 METHOD OF PROCESSING GLASS SUBSTRATE SURFACE 审中-公开
标题翻译：玻璃基板表面处理方法
公开(公告)号：US20100080961A1
公开(公告)日：2010-04-01
申请号：US12631304
申请日：2009-12-04
申请人： Kenji OKAMURA , Masabumi Ito
发明人： Kenji OKAMURA , Masabumi Ito
IPC分类号： B32B3/02 , B44C1/22 , B29D11/00
CPC分类号： C03C15/02 , C03C17/3665 , C03C23/0025 , C03C23/006 , C03C2204/08 , C03C2218/31 , Y10T428/24777
摘要： The present invention is to provide a method for processing the whole of a glass substrate surface so as to give a surface excellent in flatness and surface roughness. The present invention provides a method of processing a glass substrate surface using a processing technique selected from the group consisting of ion-beam etching, gas cluster ion-beam etching, plasma etching, and nano-ablation, wherein a frame element satisfying the following (1) and (2) is arranged along the periphery of the glass substrate before the glass substrate surface is processed: (1) the difference between the height of the frame element and the height of the glass substrate surface is 1 mm or smaller; and (2) the frame element has a width which is not smaller than one-half the beam diameter or laser light diameter to be used in the processing technique.
摘要翻译：本发明提供一种加工整个玻璃基板表面以提供平坦度和表面粗糙度优异的表面的方法。本发明提供一种使用选自离子束蚀刻，气体簇离子束蚀刻，等离子体蚀刻和纳米烧蚀的处理技术来处理玻璃基板表面的方法，其中满足以下（（1）和（2）在玻璃基板表面被处理之前沿着玻璃基板的周边布置：（1）框架元件的高度与玻璃基板表面的高度之间的差为1mm或更小; 和（2）框架元件具有不小于处理技术中使用的光束直径或激光光径的一半的宽度。

2. 发明申请

US20110244171A1 LOW EXPANSION GLASS SUBSTRATE FOR REFLECTION TYPE MASK AND METHOD FOR PROCESSING SAME 有权
标题翻译：用于反射型掩模的低膨胀玻璃基板及其加工方法
公开(公告)号：US20110244171A1
公开(公告)日：2011-10-06
申请号：US13163338
申请日：2011-06-17
申请人： Kenji OKAMURA , Masabumi Ito , Hiroshi Kojima
发明人： Kenji OKAMURA , Masabumi Ito , Hiroshi Kojima
IPC分类号： B32B3/02 , B32B17/00 , B24B1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , Y10T428/24
摘要： The present invention relates to a low expansion glass substrate which serves as a substrate of a reflective mask used in a lithography step of semiconductor production steps, wherein two side surfaces positioned to face each other among side surfaces formed along a periphery of the low expansion glass substrate, each have a flatness of 25 μm or less.
摘要翻译：本发明涉及用作半导体制造步骤的光刻步骤中使用的反射掩模的基板的低膨胀玻璃基板，其中两个侧表面沿着低膨胀玻璃的周边形成的侧表面彼此相对定位基板各自具有25μm以下的平坦度。

3. 发明申请

US20110281069A1 METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE 失效
标题翻译：初步抛光玻璃基材表面处理方法
公开(公告)号：US20110281069A1
公开(公告)日：2011-11-17
申请号：US13177910
申请日：2011-07-07
申请人： Koji OTSUKA , Kenji OKAMURA
发明人： Koji OTSUKA , Kenji OKAMURA
IPC分类号： B32B33/00 , B32B17/00
CPC分类号： G01B9/02065 , C03C15/02 , C03C19/00 , C03C23/006 , C03C2204/08 , G01B9/02057 , G01B9/0209 , G01B11/30 , G03F1/60 , H01J2237/0812 , Y10T428/24355
摘要： A glass substrate obtained by a method including measuring flatness of a glass substrate surface and measuring concentration distribution of dopant in the substrate. Processing conditions of the surface are set up for each site of the substrate based on results from the measuring the flatness and the measuring the distribution, and the finishing is carried out while keeping an angle formed by normal line of the substrate and incident beam onto the surface at from 30 to 89°. The surface is subjected to second finishing for improving an RMS in a high spatial frequency region. The surface after the second finishing satisfies the requirements: an RMS slope in the region that 5 μm
摘要翻译：一种玻璃基板，其通过包括测量玻璃基板表面的平坦度和测量基板中掺杂剂的浓度分布的方法获得。基于测量平面度和测量分布的结果，为基板的每个部位设置表面的加工条件，并且在将基板和入射光束的法线形成的角度保持在表面为30〜89°。对表面进行第二次精加工以改善高空间频率区域中的均方根。第二次完成后的表面满足以下要求：在5μm（λ）（空间波长）<1mm的区域内的RMS斜率不大于0.5mRad，并且在250nm <λ（空间波长）的区域中的RMS斜率， <5μm不大于0.6mRad。

4. 发明申请

US20100304282A1 METHOD FOR FINISHING SURFACE OF PRELIMINARY POLISHED GLASS SUBSTRATE 有权
标题翻译：初步抛光玻璃基材表面处理方法
公开(公告)号：US20100304282A1
公开(公告)日：2010-12-02
申请号：US12815091
申请日：2010-06-14
申请人： Koji OTSUKA , Kenji OKAMURA
发明人： Koji OTSUKA , Kenji OKAMURA
IPC分类号： G03F1/00
CPC分类号： G01B9/02065 , C03C15/02 , C03C19/00 , C03C23/006 , C03C2204/08 , G01B9/02057 , G01B9/0209 , G01B11/30 , G03F1/60 , H01J2237/0812 , Y10T428/24355
摘要： A glass substrate obtained by a method including measuring flatness of a glass substrate surface and measuring concentration distribution of dopant in the substrate. Processing conditions of the surface are set up for each site of the substrate based on results from the measuring the flatness and the measuring the distribution, and the finishing is carried out while keeping an angle formed by normal line of the substrate and incident beam onto the surface at from 30 to 89°. The surface is subjected to second finishing for improving an RMS in a high spatial frequency region. The surface after the second finishing satisfies the requirements: an RMS slope in the region that 5 μm
摘要翻译：一种玻璃基板，其通过包括测量玻璃基板表面的平坦度和测量基板中掺杂剂的浓度分布的方法获得。基于测量平面度和测量分布的结果，为基板的每个部位设置表面的加工条件，并且在将基板和入射光束的法线形成的角度保持在表面为30〜89°。对表面进行第二次精加工以改善高空间频率区域中的均方根。第二次修整后的表面满足以下要求：在5μm（λ）（空间波长）<1mm的区域内的RMS斜率不大于0.5mRad，并且在250nm <λ（空间波长）的区域中的RMS斜率， <5μm不大于0.6mRad。

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