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    • 4. 发明申请
    • SUBSTRATE PROCESSING DEVICE
    • 基板处理装置
    • US20160020085A1
    • 2016-01-21
    • US14652471
    • 2014-02-18
    • SCREEN Holdings Co., Ltd.
    • Michinori IWAO
    • H01L21/02B08B3/08B01D53/78
    • H01L21/02041B01D53/1412B01D53/1456B01D53/346B01D53/40B01D53/42B01D53/78B01D2251/50B01D2251/60B01D2258/0216B08B3/08
    • A substrate processing apparatus includes a processing unit supplying at least one of a plurality of types of chemical liquids to a substrate and a scrubber cleaning an exhaust by bringing the exhaust in contact with a scrubbing liquid. The scrubber includes an exhaust passage that guides the exhaust, generated at the processing unit and containing the chemical liquid, toward an exhaust equipment disposed outside the substrate processing apparatus and a discharger that is able to discharge each of a plurality of types of scrubbing liquids that clean the exhaust individually inside the exhaust passage. A controller selects any one of the plurality of types of scrubbing liquids based on the type of chemical liquid contained in the exhaust and makes the selected scrubbing liquid be discharged from the discharger.
    • 基板处理装置包括处理单元,其将多种类型的化学液体中的至少一种提供给基板,以及通过使排气与洗涤液体接触来清洁排气的洗涤器。 洗涤器包括排气通道,该排气通道在处理单元处产生并且容纳化学液体的排气朝向设置在基板处理设备外部的排气设备引导,并且排出器能够排出多种洗涤液体中的每一种, 在排气通道内单独清洁排气。 控制器基于排气中所含的化学液体的类型选择多种类型的洗涤液中的任何一种,并使所选择的洗涤液从排出器排出。