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1. 发明授权

US07528220B2 Cyanate ester compound, flame-retardant resin composition, and cured product thereof 有权
标题翻译：氰酸酯化合物，阻燃性树脂组合物及其固化物
公开(公告)号：US07528220B2
公开(公告)日：2009-05-05
申请号：US11270661
申请日：2005-11-10
申请人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Masanobu Sogame , Hironao Fukuoka , Masayoshi Ueno
发明人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Masanobu Sogame , Hironao Fukuoka , Masayoshi Ueno
IPC分类号： C08G73/10 , C08G73/16 , C07C265/12 , C08K5/205 , C08K5/29 , C09D5/18
CPC分类号： C08G73/0655 , C07C261/02 , C08K5/29 , C09D5/18 , C09K21/14 , G02F1/1339 , H05K1/0346 , H05K3/386 , Y10T428/31699
摘要： A cyanate ester compound represented by the formula (1), wherein Ar2 represents a phenylene group, a naphthylene group or a biphenylene group, Ar1 represents a naphthylene group or a biphenylene group when Ar2 is a phenylene group, or Ar1 represents a phenylene group, a naphthylene group or a biphenylene group when Ar2 is a naphthylene group or a biphenylene group, Rx represents all substituents of Ar1, each Rx is the same or different and represents hydrogen, an alkyl group or an aryl group, Ry represents all substituents of Ar2, each Ry is the same or different and represents hydrogen, an alkyl group or an aryl group, and n is an integer of 1 to 50.
摘要翻译：由式（1）表示的氰酸酯化合物，其中Ar2表示亚苯基，亚萘基或亚联苯基，当Ar2为亚苯基时，Ar1表示亚萘基或亚联苯基，或Ar1表示亚苯基，亚萘基或亚联苯基时，R 2表示Ar 1的全部取代基，各Rx相同或不同，表示氢，烷基或芳基，Ry表示Ar 2的全部取代基各Ry相同或不同，表示氢，烷基或芳基，n为1〜50的整数。

2. 发明申请

US20060084787A1 Novel cyanate ester compound, flame-retardant resin composition, and cured product thereof 有权
标题翻译：新型氰酸酯化合物，阻燃性树脂组合物及其固化物
公开(公告)号：US20060084787A1
公开(公告)日：2006-04-20
申请号：US11270661
申请日：2005-11-10
申请人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Masanobu Sogame , Hironao Fukuoka , Masayoshi Ueno
发明人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Masanobu Sogame , Hironao Fukuoka , Masayoshi Ueno
IPC分类号： C07C265/12
CPC分类号： C08G73/0655 , C07C261/02 , C08K5/29 , C09D5/18 , C09K21/14 , G02F1/1339 , H05K1/0346 , H05K3/386 , Y10T428/31699
摘要： A cyanate ester compound represented by the formula (1), wherein Ar2 represents a phenylene group, a naphthylene group or a biphenylene group, Ar1 represents a naphthylene group or a biphenylene group when Ar2 is a phenylene group, or Ar1 represents a phenylene group, a naphthylene group or a biphenylene group when Ar2 is a naphthylene group or a biphenylene group, Rx represents all substituents of Ar1, each Rx is the same or different and represents hydrogen, an alkyl group or an aryl group, Ry represents all substituents of Ar2, each Ry is the same or different and represents hydrogen, an alkyl group or an aryl group, and n is an integer of 1 to 50.
摘要翻译：由式（1）表示的氰酸酯化合物，其中Ar 2表示亚苯基，亚萘基或亚联苯基，Ar 1表示亚萘基或当Ar 2 2是亚苯基时，亚联苯基或当Ar 2为Ar 2时，Ar 1代表亚苯基，亚萘基或亚联苯基亚萘基或亚联苯基，R x表示Ar 1的全部取代基，每个R x相同或不同，表示氢，烷基或芳基，R y表示Ar 2的全部取代基，每个R y相同或不同，表示氢，烷基或芳基， n为1〜50的整数。

3. 发明申请

US20140308530A1 NOVEL CYANATE ESTER COMPOUND AND METHOD FOR PRODUCING THE SAME, AND CURABLE RESIN COMPOSITION COMPRISING THE COMPOUND, AND CURED PRODUCT THEREOF COMPOSITION 审中-公开
标题翻译：新型氰基酯化合物及其制造方法以及包含该化合物的可固化树脂组合物及其固化产物
公开(公告)号：US20140308530A1
公开(公告)日：2014-10-16
申请号：US14237426
申请日：2012-07-31
申请人： Yuuichi Sugano , Masayuki Katagiri , Seiji Kita , Daisuke Ohno , Masanobu Sogame
发明人： Yuuichi Sugano , Masayuki Katagiri , Seiji Kita , Daisuke Ohno , Masanobu Sogame
IPC分类号： C08G10/04 , C08L63/00 , B32B15/098 , C09K3/10 , C09J161/18 , C08L61/18 , C08L71/00
CPC分类号： C08G10/04 , B32B5/022 , B32B5/024 , B32B7/12 , B32B15/098 , B32B15/14 , B32B2250/40 , B32B2260/023 , B32B2260/046 , B32B2262/0261 , B32B2262/0269 , B32B2262/0276 , B32B2262/101 , B32B2307/3065 , C08G14/12 , C08G73/0655 , C08J5/24 , C08J2361/34 , C08L61/18 , C08L61/34 , C08L63/00 , C08L71/00 , C08L79/04 , C09J161/18 , C09J161/34 , C09J179/04 , C09K3/1006 , H01L23/29 , H01L2924/0002 , Y10T428/31688 , H01L2924/00
摘要： To provide a novel cyanate ester compound that can realize a cured product having low dielectric constant and dielectric loss tangent, and excellent flame retardancy and heat resistance, and moreover has relatively low viscosity, excellent solvent solubility, and also excellent handling properties, and a method for producing the cyanate ester compound, and a curable resin composition and the like using the cyanate ester compound. A phenol-modified xylene formaldehyde resin is cyanated.
摘要翻译：为了提供能够实现低介电常数和介电损耗角正切，优异的阻燃性和耐热性的固化物的新型氰酸酯化合物，另外具有较低的粘度，优异的溶剂溶解性和优异的操作性，以及使用氰酸酯化合物的固化性树脂组合物等。苯酚改性的二甲苯甲醛树脂被氰化。

4. 发明授权

US10155835B2 Cyanate ester compound and method for producing the same, and curable resin composition comprising the compound, and cured product thereof composition 有权
公开(公告)号：US10155835B2
公开(公告)日：2018-12-18
申请号：US14237426
申请日：2012-07-31
申请人： Yuuichi Sugano , Masayuki Katagiri , Seiji Kita , Daisuke Ohno , Masanobu Sogame
发明人： Yuuichi Sugano , Masayuki Katagiri , Seiji Kita , Daisuke Ohno , Masanobu Sogame
IPC分类号： B32B5/02 , B32B7/12 , C08J5/24 , C09K3/10 , B32B15/14 , C08G10/04 , C08G14/12 , C08G73/06 , C08L61/18 , C08L61/34 , C08L63/00 , C08L71/00 , C08L79/04 , B32B15/098 , C09J161/18 , C09J161/34 , C09J179/04 , H01L23/29
摘要： To provide a novel cyanate ester compound that can realize a cured product having low dielectric constant and dielectric loss tangent, and excellent flame retardancy and heat resistance, and moreover has relatively low viscosity, excellent solvent solubility, and also excellent handling properties, and a method for producing the cyanate ester compound, and a curable resin composition and the like using the cyanate ester compound. A phenol-modified xylene formaldehyde resin is cyanated.

5. 发明申请

US20050182203A1 Novel cyanate ester compound, flame-retardant resin composition, and cured product thereof 审中-公开
标题翻译：新型氰酸酯化合物，阻燃性树脂组合物及其固化物
公开(公告)号：US20050182203A1
公开(公告)日：2005-08-18
申请号：US11057182
申请日：2005-02-15
申请人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Yoshikazu Shima
发明人： Yuuichi Sugano , Masayuki Katagiri , Daisuke Ohno , Seiji Kita , Yoshikazu Shima
IPC分类号： C07C261/02 , C08G73/06 , C08K5/205 , C08K5/29 , C09D5/18 , C09K21/14 , G02F1/1339 , H05K1/03 , H05K3/38 , C08L63/00
CPC分类号： C08G73/0655 , C07C261/02 , C08K5/29 , C09D5/18 , C09K21/14 , G02F1/1339 , H05K1/0346 , H05K3/386 , Y10T428/31699
摘要： A cyanate ester compound represented by the formula (1), wherein Ar2 represents a phenylene group, a naphthylene group or a biphenylene group, Ar1 represents a naphthylene group or a biphenylene group when Ar2 is a phenylene group, or Ar1 represents a phenylene group, a naphthylene group or a biphenylene group when Ar2 is a naphthylene group or a biphenylene group, Rx represents all substituents of Ar1 each Rx is the same or different and represents hydrogen, an alkyl group or an aryl group, Ry represents all substituents of Ar2, each Ry is the same or different and represents hydrogen, an alkyl group or an aryl group, and n is an integer of 1 to 50.
摘要翻译：由式（1）表示的氰酸酯化合物，其中Ar 2表示亚苯基，亚萘基或亚联苯基，Ar 1表示亚萘基或当Ar 2 2是亚苯基时，亚联苯基或当Ar 2为Ar 2时，Ar 1代表亚苯基，亚萘基或亚联苯基亚萘基或亚联苯基，R x表示Ar 1的全部取代基，每个R x x相同或不同，表示氢，烷基或芳基，R y表示Ar 2的全部取代基，每个R y相同或不同，表示氢，烷基或芳基，n为1〜50的整数。

6. 发明申请

US20100316950A1 COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN 有权
标题翻译：用于形成基片的组合物和形成多层耐蚀图案的方法
公开(公告)号：US20100316950A1
公开(公告)日：2010-12-16
申请号：US12746421
申请日：2008-12-01
申请人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
发明人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
IPC分类号： G03F7/004 , C08G10/02 , C08K5/05 , C08K5/29 , G03F7/20
CPC分类号： C08G10/02 , G03F7/094
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
摘要翻译：一种用于形成用于光刻的下层膜的组合物，用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性，由该组合物形成且具有高折射率（n）和低消光系数（k）的下层膜，具有高耐腐蚀性，含有极少量的可升华成分的透明性，以及使用该下层膜形成图案的方法。用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。

7. 发明授权

US08524952B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
标题翻译：改性萘甲醛树脂，含三环癸烷骨架的萘酚化合物和酯化合物
公开(公告)号：US08524952B2
公开(公告)日：2013-09-03
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C49/317 , C07C49/323 , C07C49/345
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
摘要翻译：通过将分子中具有下述通式[1]表示的构成单元的多官能二甲基萘甲醛树脂与选自下述通式[1]所示的苯酚中的至少一种进行改性而得到的改性二甲基萘甲醛树脂， 2]，由以下通式[3]表示的萘酚和由以下通式[4]表示的萘酚，条件是至少任何由通式[3]表示的萘酚或由通式 [4]必须包括在内。

8. 发明申请

US20070238850A1 Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin 有权
标题翻译：生产低粘度苯酚改性芳香烃甲醛树脂的方法
公开(公告)号：US20070238850A1
公开(公告)日：2007-10-11
申请号：US11697315
申请日：2007-04-06
申请人： Masashi Ogiwara , Seiji Kita
发明人： Masashi Ogiwara , Seiji Kita
IPC分类号： C08G14/02
CPC分类号： C08G8/28 , C08G8/30
摘要： Provided is a method of producing a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin (C), including subjecting an aromatic hydrocarbon formaldehyde resin (A) and a phenol (B) to condensation reaction under the presence of an acid catalyst. The method includes: terminating, when a reaction mixture has a viscosity at 25° C. of 200 to 1,500 mPa·S, the condensation reaction by adding an inorganic basic compound and/or a tertiary amine compound having a boiling point of 300° C. or more; and distilling and removing the phenol (B) unreacted and a low boiling component after termination of the condensation reaction, whereby there can be produced a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin which is kept in a liquid state and contains small amounts of unreacted phenols, and in which increase in viscosity is small even after removal of low boiling components.
摘要翻译：本发明提供一种低粘度苯酚改性芳香族甲醛树脂（C）的制造方法，其特征在于，在酸催化剂的存在下，使芳香族甲醛树脂（A）和苯酚（B）进行缩合反应。该方法包括：当反应混合物在25℃下的粘度为200至1,500mPa.S时，终止通过加入沸点为300℃的无机碱性化合物和/或叔胺化合物的缩合反应。或者更多; 并在缩合反应结束后蒸馏除去未反应的苯酚（B）和低沸点成分，由此可以制备保持液态的低粘度苯酚改性芳香族甲醛树脂，并含有少量未反应的即使在除去低沸点组分之后，粘度的增加也很小。

9. 发明授权

US08519177B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
公开(公告)号：US08519177B2
公开(公告)日：2013-08-27
申请号：US13423996
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C69/753 , C07C67/14
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

10. 发明授权

US07584464B2 Software processing method and software processing system 有权
标题翻译：软件处理方法和软件处理系统
公开(公告)号：US07584464B2
公开(公告)日：2009-09-01
申请号：US10727055
申请日：2003-12-04
申请人： Kei Yoneda , Isao Kawamoto , Seiji Kita , Takaaki Matsubayashi
发明人： Kei Yoneda , Isao Kawamoto , Seiji Kita , Takaaki Matsubayashi
IPC分类号： G06F9/44 , G06F9/45
CPC分类号： G06F9/52 , G06F2209/508
摘要： In a multi-processor system constituted by a processor such as a CPU and a DSP, in which the processor and the DSP have an external memory and a bus as shared resources and the DSP carries out a process in response to a processing request from the processor, a monitoring step for status of use includes a step of monitoring the status of use of the DSP, and when contention information obtained in the monitoring step for the status of use indicates frequent uses, an altering step for software process appropriately alters a software processing method to be executed, and switches the corresponding process to an equivalent process so that it becomes possible to avoid bus contention, and consequently to prevent a reduction in the processing speed.
摘要翻译：在由诸如CPU和DSP的处理器构成的多处理器系统中，其中处理器和DSP具有外部存储器和总线作为共享资源，并且DSP响应于来自所述处理器的处理请求执行处理处理器，用于使用状态的监视步骤包括监视DSP的使用状态的步骤，并且当在用于使用状态的监视步骤中获得的争用信息指示频繁使用时，软件处理的改变步骤适当地改变软件处理方法，并将相应的处理切换到等效处理，使得可以避免总线争用，从而防止处理速度的降低。

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