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1. 发明授权

US08519177B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
公开(公告)号：US08519177B2
公开(公告)日：2013-08-27
申请号：US13423996
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C69/753 , C07C67/14
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

2. 发明申请

US20100316950A1 COMPOSITION FOR FORMING BASE FILM FOR LITHOGRAPHY AND METHOD FOR FORMING MULTILAYER RESIST PATTERN 有权
标题翻译：用于形成基片的组合物和形成多层耐蚀图案的方法
公开(公告)号：US20100316950A1
公开(公告)日：2010-12-16
申请号：US12746421
申请日：2008-12-01
申请人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
发明人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
IPC分类号： G03F7/004 , C08G10/02 , C08K5/05 , C08K5/29 , G03F7/20
CPC分类号： C08G10/02 , G03F7/094
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
摘要翻译：一种用于形成用于光刻的下层膜的组合物，用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性，由该组合物形成且具有高折射率（n）和低消光系数（k）的下层膜，具有高耐腐蚀性，含有极少量的可升华成分的透明性，以及使用该下层膜形成图案的方法。用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。

3. 发明授权

US08524952B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
标题翻译：改性萘甲醛树脂，含三环癸烷骨架的萘酚化合物和酯化合物
公开(公告)号：US08524952B2
公开(公告)日：2013-09-03
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C49/317 , C07C49/323 , C07C49/345
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
摘要翻译：通过将分子中具有下述通式[1]表示的构成单元的多官能二甲基萘甲醛树脂与选自下述通式[1]所示的苯酚中的至少一种进行改性而得到的改性二甲基萘甲醛树脂， 2]，由以下通式[3]表示的萘酚和由以下通式[4]表示的萘酚，条件是至少任何由通式[3]表示的萘酚或由通式 [4]必须包括在内。

4. 发明申请

US20070238850A1 Method of Producing Low Viscosity Phenol-Modified Aromatic Hydrocarbon Formaldehyde Resin 有权
标题翻译：生产低粘度苯酚改性芳香烃甲醛树脂的方法
公开(公告)号：US20070238850A1
公开(公告)日：2007-10-11
申请号：US11697315
申请日：2007-04-06
申请人： Masashi Ogiwara , Seiji Kita
发明人： Masashi Ogiwara , Seiji Kita
IPC分类号： C08G14/02
CPC分类号： C08G8/28 , C08G8/30
摘要： Provided is a method of producing a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin (C), including subjecting an aromatic hydrocarbon formaldehyde resin (A) and a phenol (B) to condensation reaction under the presence of an acid catalyst. The method includes: terminating, when a reaction mixture has a viscosity at 25° C. of 200 to 1,500 mPa·S, the condensation reaction by adding an inorganic basic compound and/or a tertiary amine compound having a boiling point of 300° C. or more; and distilling and removing the phenol (B) unreacted and a low boiling component after termination of the condensation reaction, whereby there can be produced a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin which is kept in a liquid state and contains small amounts of unreacted phenols, and in which increase in viscosity is small even after removal of low boiling components.
摘要翻译：本发明提供一种低粘度苯酚改性芳香族甲醛树脂（C）的制造方法，其特征在于，在酸催化剂的存在下，使芳香族甲醛树脂（A）和苯酚（B）进行缩合反应。该方法包括：当反应混合物在25℃下的粘度为200至1,500mPa.S时，终止通过加入沸点为300℃的无机碱性化合物和/或叔胺化合物的缩合反应。或者更多; 并在缩合反应结束后蒸馏除去未反应的苯酚（B）和低沸点成分，由此可以制备保持液态的低粘度苯酚改性芳香族甲醛树脂，并含有少量未反应的即使在除去低沸点组分之后，粘度的增加也很小。

5. 发明授权

US08648152B2 Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof 有权
标题翻译：多官能二甲基萘甲醛树脂及其制造方法
公开(公告)号：US08648152B2
公开(公告)日：2014-02-11
申请号：US12743157
申请日：2008-11-11
申请人： Seiji Kita , Masashi Ogiwara
发明人： Seiji Kita , Masashi Ogiwara
IPC分类号： C08F283/00 , C08G10/02
CPC分类号： C08G10/02 , C08G14/06
摘要： The present invention provides a polyfunctional dimethylnaphthalene formaldehyde resin which is polyfunctional, rich in reactivity and useful as a variety of raw materials to be modified, specifically a dimethylnaphthalene formaldehyde resin obtained by allowing (1) one kind or two or more kinds of a dimethylnaphthalene having one methyl group on each of two benzene rings in a naphthalene ring thereof and selected from the group consisting of 1,5-dimethylnaphthalene, 1,6-dimethylnaphthalene, 2,6-dimethylnaphthalene, 1,7-dimethylnaphthalene, 1,8-dimethylnaphthalene and 2,7-dimethylnaphthalene; and (2) formaldehyde to react with each other in the presence of water and an acid catalyst, the polyfunctional dimethylnaphthalene formaldehyde resin having a mean value of the number of hydrogen atoms substituted by the reaction among the six hydrogen atoms directly bonded on the naphthalene ring in the dimethylnaphthalene of from 1.8 to 3.5.
摘要翻译：本发明提供多官能的二甲基萘甲醛树脂，其具有多官能性，反应性丰富，可用作各种待改性原料，特别是二甲基萘甲醛树脂，其通过以下方法获得：（1）一种或两种以上的二甲基萘具有选自萘环中的两个苯环中的一个甲基，并且选自1,5-二甲基萘，1,6-二甲基萘，2,6-二甲基萘，1,7-二甲基萘，1,8-二甲基萘和2,7-二甲基萘; 和（2）甲醛在水和酸催化剂的存在下相互反应，多官能二甲基萘甲醛树脂具有直接键合在萘环上的六个氢原子之间的反应取代的氢原子数的平均值在二甲基萘中为1.8〜3.5。

6. 发明授权

US08592134B2 Composition for forming base film for lithography and method for forming multilayer resist pattern 有权
标题翻译：用于形成用于光刻的基底膜的组合物和用于形成多层抗蚀剂图案的方法
公开(公告)号：US08592134B2
公开(公告)日：2013-11-26
申请号：US12746421
申请日：2008-12-01
申请人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
发明人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
IPC分类号： G03F7/00 , G03F7/11 , G03F7/32 , C08F283/00
CPC分类号： C08G10/02 , G03F7/094
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
摘要翻译：一种用于形成用于光刻的下层膜的组合物，用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性，由该组合物形成且具有高折射率（n）和低消光系数（k）的下层膜，具有高耐腐蚀性，含有极少量的可升华成分的透明性，以及使用该下层膜形成图案的方法。用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。

7. 发明申请

US20120238781A1 MODIFIED NAPHTHALENE FORMALDEHYDE RESIN, TRICYCLODECANE SKELETON-CONTAINING NAPHTHOL COMPOUND AND ESTER COMPOUND 有权
公开(公告)号：US20120238781A1
公开(公告)日：2012-09-20
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C49/83 , C07C45/42
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.

8. 发明授权

US07772331B2 Method of producing low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin 有权
标题翻译：生产低粘度苯酚改性芳烃甲醛树脂的方法
公开(公告)号：US07772331B2
公开(公告)日：2010-08-10
申请号：US11697315
申请日：2007-04-06
申请人： Masashi Ogiwara , Seiji Kita
发明人： Masashi Ogiwara , Seiji Kita
IPC分类号： C08G4/00 , C08G10/04 , C08G14/02 , C08G16/04 , C08G8/04 , C08L61/20
CPC分类号： C08G8/28 , C08G8/30
摘要： Provided is a method of producing a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin (C), including subjecting an aromatic hydrocarbon formaldehyde resin (A) and a phenol (B) to condensation reaction under the presence of an acid catalyst. The method includes: terminating, when a reaction mixture has a viscosity at 25° C. of 200 to 1,500 mPa·S, the condensation reaction by adding an inorganic basic compound and/or a tertiary amine compound having a boiling point of 300° C. or more; and distilling and removing the phenol (B) unreacted and a low boiling component after termination of the condensation reaction, whereby there can be produced a low viscosity phenol-modified aromatic hydrocarbon formaldehyde resin which is kept in a liquid state and contains small amounts of unreacted phenols, and in which increase in viscosity is small even after removal of low boiling components.
摘要翻译：本发明提供一种低粘度苯酚改性芳香族甲醛树脂（C）的制造方法，其特征在于，在酸催化剂的存在下，使芳香族甲醛树脂（A）和苯酚（B）进行缩合反应。该方法包括：当反应混合物在25℃下的粘度为200〜1500mPa·S时，终止通过加入沸点为300℃的无机碱性化合物和/或叔胺化合物的缩合反应。或者更多; 并在缩合反应结束后蒸馏除去未反应的苯酚（B）和低沸点成分，由此可以制备保持液态的低粘度苯酚改性芳香族甲醛树脂，并含有少量未反应的即使在除去低沸点组分之后，粘度的增加也很小。

9. 发明授权

US08586289B2 Aromatic hydrocarbon resin and composition for forming underlayer film for lithography 有权
标题翻译：芳族烃树脂和用于形成用于光刻的下层膜的组合物
公开(公告)号：US08586289B2
公开(公告)日：2013-11-19
申请号：US13395947
申请日：2010-09-14
申请人： Ryuji Ideno , Seiji Kita , Masashi Ogiwara , Gou Higashihara
发明人： Ryuji Ideno , Seiji Kita , Masashi Ogiwara , Gou Higashihara
IPC分类号： G03F7/11 , G03F7/40
CPC分类号： C08G10/02 , C08G61/02 , C08G2261/148 , C08G2261/342 , C08G2261/42 , C08L65/00 , C09D161/18 , G03F7/11
摘要： The aromatic hydrocarbon resin can be used as a coating material and a resist resin for a semiconductor, and has a high carbon concentration and a low oxygen concentration. A composition for forming an underlayer film for lithography that has excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed with the same, and a pattern forming method using the same are disclosed. An aromatic hydrocarbon is reacted with an aromatic aldehyde in the presence of an acidic catalyst, thereby providing an aromatic hydrocarbon resin that has a high carbon concentration of from 90 to 99.9% by mass and a low oxygen concentration of from 0 to 5% by mass. A composition for forming an underlayer film for lithography contains the resin and an organic solvent, an underlayer film is formed with the same, and a pattern forming method uses the same.
摘要翻译：芳族烃树脂可以用作半导体的涂料和抗蚀剂树脂，并且具有高的碳浓度和低的氧浓度。公开了一种用于形成用于光刻的下层膜的组合物，其具有优异的耐蚀刻性，作为用于多层抗蚀剂工艺的下层膜，使用其形成的下层膜以及使用其的图案形成方法。芳族烃与芳族醛在酸性催化剂存在下反应，从而提供具有90至99.9质量％的高碳浓度和0至5质量％的低氧浓度的芳族烃树脂。用于形成用于光刻的下层膜的组合物包含树脂和有机溶剂，由此形成下层膜，并且图案形成方法使用它。

10. 发明授权

US08563665B2 Modified naphthalene formaldehyde resin, tricyclodecane skeleton-containing naphthol compound and ester compound 有权
标题翻译：改性萘甲醛树脂，含三环癸烷骨架的萘酚化合物和酯化合物
公开(公告)号：US08563665B2
公开(公告)日：2013-10-22
申请号：US12746611
申请日：2008-12-04
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C08G14/04 , C08G14/12 , C08G10/04
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4], provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included This resin is excellent in heat resistance and useful for thermosetting resins.
摘要翻译：通过将分子中具有下述通式[1]表示的构成单元的多官能二甲基萘甲醛树脂与选自下述通式[1]所示的苯酚中的至少一种进行改性而得到的改性二甲基萘甲醛树脂， 2]表示的萘酚，由以下通式[3]表示的萘酚和由以下通式[4]表示的萘酚，条件是至少任意由通式[3]表示的萘酚或由通式必须包括配方[4]该树脂的耐热性优异，可用于热固性树脂。

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