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1. 发明授权

US06970807B2 Diagnostic system and method for electric leak detecting device 失效
标题翻译：漏电检测装置诊断系统及方法
公开(公告)号：US06970807B2
公开(公告)日：2005-11-29
申请号：US10855508
申请日：2004-05-28
申请人： Yuji Kito , Hiroshi Fujita , Kazuyuki Kato , Toshiharu Asai
发明人： Yuji Kito , Hiroshi Fujita , Kazuyuki Kato , Toshiharu Asai
IPC分类号： G01R31/02 , B60L1/00 , B60L3/00 , B60R16/02 , G01M17/00 , G01R31/00 , H02H3/05 , H02H3/16 , H02H7/00 , G06F19/00
CPC分类号： B60K6/48 , B60L3/0023 , B60L3/0069 , G01R31/025 , Y02T10/6221
摘要： A power supply unit includes a battery, a motor which is driven by the battery, an electric power converting device which is provided between the battery and the motor, a simulated electric leak generating device which generates an electric leak state between the battery and a vehicle body, and an electric leak detecting device which detects a simulated electric leak. A diagnostic system which performs a diagnosis of operating performance of the electric leak detecting device includes an opening/closing device which connects/disconnects the electric power converting device to/from the battery, and an opening/closing detecting device which detects opening/closing of the opening/closing device and which outputs a result of detection to the simulated electric leak generating device and the electric leak detecting device. When opening/closing of the opening/closing device is detected by the opening/closing detecting device, both generation of a simulated electric leak and detection of an electric leak are retried.
摘要翻译：电源单元包括电池，由电池驱动的电动机，设置在电池和电动机之间的电力转换装置，在电池和车辆之间产生电气泄漏状态的模拟泄漏产生装置身体和检测模拟电泄漏的漏电检测装置。执行泄漏检测装置的操作性能的诊断的诊断系统包括将电力转换装置与电池连接/断开的开闭装置，以及检测开关的开闭检测装置所述开闭装置将检测结果输出到所述模拟泄漏检测装置和所述漏电检测装置。当打开/关闭检测装置检测到打开/关闭装置的打开/关闭时，重新产生模拟泄漏和检测电气泄漏。

2. 发明授权

US08800484B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08800484B2
公开(公告)日：2014-08-12
申请号：US13003102
申请日：2009-06-16
申请人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Kazuto Takai
发明人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Kazuto Takai
IPC分类号： C23C16/511 , H01L21/67 , H01J37/32 , H01L21/687 , C23F1/00
CPC分类号： H01L21/6719 , H01J37/32192 , H01J37/32238 , H01J37/3244 , H01J37/32449 , H01L21/67126 , H01L21/68785
摘要： A plasma processing apparatus includes a processing container in which a plasma processing is performed on a substrate to be processed, a holding stage which is disposed in the processing container and holds thereon the substrate to be processed, a dielectric plate which is provided at a location facing the holding stage and transmits a microwave into the processing container, and a reactive gas supply unit which supplies a reactive gas for plasma processing toward the central region of the substrate to be processed held by the holding stage. Here, the reactive gas supply unit includes an injector base, which is disposed at a location more recessed inside the dielectric plate than a wall surface of the dielectric plate facing the holding stage. A supply hole, which supplies a reactive gas for plasma processing into the processing container, is formed in the injector base.
摘要翻译：等离子体处理装置包括处理容器，其中对待处理的基板进行等离子体处理，保持台设置在处理容器中并保持在其上待处理的基板，电介质板，其设置在位置面向保持阶段并将微波传输到处理容器中，以及反应气体供应单元，其向保持阶段保持的待处理基板的中心区域提供用于等离子体处理的反应气体。这里，反应气体供给单元包括喷射器基座，该喷射器基座设置在比介质板的面向保持台的壁面更靠内侧的位置。在喷射器基座中形成供应孔，其将用于等离子体处理的反应气体供应到处理容器中。

3. 发明申请

US20140166205A1 PROCESS MONITORING DEVICE FOR USE IN SUBSTRATE PROCESS APPARATUS, PROCESS MONITORING METHOD AND SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：用于基板工艺装置的工艺监测装置，工艺监测方法和基板处理装置
公开(公告)号：US20140166205A1
公开(公告)日：2014-06-19
申请号：US14111030
申请日：2012-04-06
申请人： Caizhong Tian , Toshihisa Nozawa , Kazuki Moyama , Takahiro Senda , Kazuyuki Kato , Munetaka Yamagami
发明人： Caizhong Tian , Toshihisa Nozawa , Kazuki Moyama , Takahiro Senda , Kazuyuki Kato , Munetaka Yamagami
IPC分类号： G01B11/24 , H01J37/32
CPC分类号： G01B11/24 , G01B11/02 , G01B11/06 , G01N21/9501 , H01J37/32009 , H01L21/67253 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A process monitoring device 11 includes a light source unit that outputs light; a light detection unit that detects an intensity of light; a first optical path 21 that guides the light outputted from the light source unit to a wafer W and guides reflection light from the wafer W to the light detection unit; a second optical path that has a light propagation characteristic equivalent to that of the first optical path 21 and guides the light outputted from the light source unit to the light detection unit without allowing the light to pass the wafer W; and a controller 17 that corrects intensity information of the light detected by the light detection unit via the first optical path 21 based on intensity information of the light detected by the light detection unit via the second optical path, and analyzes a structure of the wafer W.
摘要翻译：处理监视装置11包括输出光的光源单元; 光检测单元，其检测光的强度; 第一光路21，其将从光源单元输出的光引导到晶片W，并将来自晶片W的反射光引导到光检测单元; 具有与第一光路21的光传播特性相当的光传播特性的第二光路，并将从光源单元输出的光引导到光检测单元，而不允许光通过晶片W; 以及控制器17，其通过第一光路21基于由光检测单元检测出的光的强度信息经由第二光路校正由光检测单元检测到的光的强度信息，并分析晶片W的结构。

4. 发明申请

US20050035841A1 Current fuse and method of making the current fuse 有权
标题翻译：电流保险丝和制作电流保险丝的方法
公开(公告)号：US20050035841A1
公开(公告)日：2005-02-17
申请号：US10883032
申请日：2004-07-02
申请人： Satoru Kobayashi , Kazuyuki Kato
发明人： Satoru Kobayashi , Kazuyuki Kato
IPC分类号： B23K35/26 , B23K35/28 , C22C9/00 , C22C13/00 , C22C18/00 , H01H69/02 , H01H85/041 , H01H85/143 , H01H85/157 , H01H85/02
CPC分类号： C22C13/00 , B23K35/262 , B23K35/282 , H01H85/0418 , H01H85/157 , H05K3/1216 , H05K3/143 , H05K3/26 , H05K3/3489 , H05K2203/043
摘要： In order to provide a current fuse with high solderability without containing harmful materials, solder chips containing 30 to 60 percent by weight of zinc, 0.1 to 2 percent by weight of copper, 0.1 to 1 percent by weight of nickel, and the remainder percent by weight being tin, or further containing 0.01 to 0.5 percent by weight of aluminum are inserted into the interior of the electrodes before pressing the electrodes into the ends of the substrate of the fuse, the exterior of the electrodes is heated to melt the solder chips, thereby connecting between the electrodes and the fuse wire.
摘要翻译：为了提供具有高可焊性的电流熔断器而不含有害材料，焊料芯片含有30-60重量％的锌，0.1-2重量％的铜，0.1-1重量％的镍，其余百分比由在将电极压入保险丝的基板的端部之前，将锡重量或进一步含有0.01至0.5重量％的铝插入电极的内部，电极的外部被加热以熔化焊料芯片，从而连接电极和熔丝。

5. 发明授权

US4373800A Wet type electrophotographic copying machine 失效
标题翻译：湿式电子照相复印机
公开(公告)号：US4373800A
公开(公告)日：1983-02-15
申请号：US207999
申请日：1980-11-18
申请人： Shin-ichi Kamiyama , Kiyoshi Ohshima , Manabu Mochizuki , Kazuyuki Kato , Takeshi Saito
发明人： Shin-ichi Kamiyama , Kiyoshi Ohshima , Manabu Mochizuki , Kazuyuki Kato , Takeshi Saito
IPC分类号： G03G15/11 , G03G21/00 , G03G15/10
CPC分类号： G03G15/11 , G03G21/0088
摘要： A wet type electrophotographic copying machine of the type capable of performing one copy making process during substantially two revolutions of a photoconductor, which is provided with means for forming a liquid developer deposition portion by charging, exposure and development, on the downstream side of an image formation area on the photoconductor, the liquid developer deposition portion capable of substantially narrowing the gap between the photoconductor and a squeegee roller, whereby the squeezing of excess developer from the surface of the photoconductor can be performed at the squeezing initiation point on the photoconductor, thus attaining a sharp squeezing effect, and the adhesion of the excess liquid developer to an image transfer material can be prevented.
摘要翻译：该类型的湿式电照相复印机能够在大致两圈的感光体中进行一次复印制作工艺，该感光体在图像的下游侧设置有用于通过充电，曝光和显影形成液体显影剂沉积部分的装置光电导体上的形成区域，液体显影剂沉积部分能够基本上使得光电导体和刮板辊之间的间隙变窄，从而可以在光电导体的挤压起始点处从光电导体的表面挤压多余的显影剂，从而达到急剧的挤压效果，并且可以防止多余的液体显影剂对图像转印材料的粘附。

6. 发明申请

US20070013472A1 Current fuse and method of making the current fuse 审中-公开
公开(公告)号：US20070013472A1
公开(公告)日：2007-01-18
申请号：US11525167
申请日：2006-09-22
申请人： Satoru Kobayashi , Kazuyuki Kato
发明人： Satoru Kobayashi , Kazuyuki Kato
IPC分类号： H01H85/04
CPC分类号： C22C13/00 , B23K35/262 , B23K35/282 , H01H85/0418 , H01H85/157 , H05K3/1216 , H05K3/143 , H05K3/26 , H05K3/3489 , H05K2203/043
摘要： In order to provide a current fuse with high solderability without containing harmful materials, solder chips containing 30 to 60 percent by weight of zinc, 0.1 to 2 percent by weight of copper, 0.1 to 1 percent by weight of nickel, and the remainder percent by weight being tin, or further containing 0.01 to 0.5 percent by weight of aluminum are inserted into the interior of the electrodes before pressing the electrodes into the ends of the substrate of the fuse, the exterior of the electrodes is heated to melt the solder chips, thereby connecting between the electrodes and the fuse wire.

7. 发明授权

US5467781A Condom 失效
标题翻译：避孕套
公开(公告)号：US5467781A
公开(公告)日：1995-11-21
申请号：US321996
申请日：1994-10-12
申请人： Kazuyuki Kato
发明人： Kazuyuki Kato
IPC分类号： A61F6/04
CPC分类号： A61F6/04 , A61F2006/048 , Y10S128/918
摘要： A condom disperses local tightening force at the opening end portion and maintains wind-up property. Further, it enables the drug to be automatically applied when it is being used to effectively prevent infection of diseases. The condom has a sperm reservoir at an end portion thereof and extends in a cylindrical form, wherein an open end portion includes elastic annular trapezoidal portions in cross section with notch and an elastic annular end with a hollow end portion. The condom may have sol type active drug in the porous hollow end portion, so that said drug is applied to the outer surface of the cylindrical portion when the condom is used.
摘要翻译：避孕套分散在开口端部分的局部紧固力，并保持卷起性能。此外，它能够在用于有效预防疾病感染时自动应用药物。避孕套在其端部具有精子储存器并以圆柱形形式延伸，其中开口端部包括具有凹口的横截面的弹性环形梯形部分和具有中空端部的弹性环形端。避孕套可以在多孔中空端部具有溶胶型活性药物，使用所述避孕套时，将所述药物施用于圆筒部的外表面。

8. 发明授权

US5335549A Semiconductor pressure sensor having double diaphragm structure 失效
标题翻译：具有双膜结构的半导体压力传感器
公开(公告)号：US5335549A
公开(公告)日：1994-08-09
申请号：US982655
申请日：1992-11-27
申请人： Kazuyuki Kato
发明人： Kazuyuki Kato
IPC分类号： G01L9/04 , G01L9/00 , G01L7/00
CPC分类号： G01L19/147 , G01L19/0038 , G01L19/0084 , G01L19/0645 , G01L19/148 , G01L9/0052 , G01L9/0054
摘要： In a semiconductor sensor having double diaphragm structure, in which pressure to be measured is applied to diaphragm portions having distortion gages via a liquid filled in spaces partitioned by sealed diaphragms, as circuit elements of a signal processing circuit for processing an output of a distortion gage bridge are integrated in and on a semiconductor chip having diaphragm portions, the number of component parts used is reduced, and a compact size, a low cost, and high reliability are attained. This arrangement can be applied to any of the pressure sensors for detecting absolute pressure, relative pressure, and differential pressure.
摘要翻译：在具有双光阑结构的半导体传感器中，将被测量的压力通过填充在被密封隔膜分隔的空间中的液体施加到具有变形规的隔膜部分上，作为信号处理电路的电路元件，用于处理变形计的输出桥接器集成在具有隔膜部分的半导体芯片中和之上，所使用的部件的数量减少，并且获得了紧凑的尺寸，低成本和高可靠性。这种布置可以应用于用于检测绝对压力，相对压力和差压的任何压力传感器。

9. 发明授权

US08877004B2 Plasma processing apparatus and plasma processing method 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：US08877004B2
公开(公告)日：2014-11-04
申请号：US12866545
申请日：2009-02-06
申请人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Masaru Sasaki
发明人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Masaru Sasaki
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H01J37/32 , H05H1/46
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32238
摘要： A dielectric plate 20 is provided at a ceiling surface facing a susceptor 3 of a processing chamber 2, and a slot antenna 30 having a multiple number of microwave transmissive slots 33 is provided on a top surface of the dielectric plate 20. A protrusion member 21 configured as a separate member from the dielectric plate 20 is provided on a peripheral portion of a bottom surface of the dielectric plate 20 so as to prevent an abnormal electric discharge. Electric field intensity in the vicinity of the dielectric plate 20 is controlled by adjusting a gap between an outer peripheral surface 22 of a cylindrical part of the protrusion member 21 and an inner peripheral surface 5a of a sidewall of the processing chamber 2 or by adjusting a thickness of the cylindrical part of the protrusion member 21.
摘要翻译：电介质板20设置在面向处理室2的基座3的顶面上，并且具有多个微波透射槽33的缝隙天线30设置在电介质板20的顶表面上。突起构件21 在电介质板20的底面的周边部设置有与电介质板20分离的部件，以防止异常放电。通过调整突起部件21的圆筒部的外周面22与处理室2的侧壁的内周面5a之间的间隙，调整电介质板20附近的电场强度，突出部件21的圆筒部的厚度。

10. 发明申请

US20110114261A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20110114261A1
公开(公告)日：2011-05-19
申请号：US13003102
申请日：2009-06-16
申请人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Kazuto Takai
发明人： Naoki Matsumoto , Kazuyuki Kato , Masafumi Shikata , Kazuto Takai
IPC分类号： C23F1/08
CPC分类号： H01L21/6719 , H01J37/32192 , H01J37/32238 , H01J37/3244 , H01J37/32449 , H01L21/67126 , H01L21/68785
摘要： A plasma processing apparatus includes a processing container in which a plasma processing is performed on a substrate to be processed, a holding stage which is disposed in the processing container and holds thereon the substrate to be processed, a dielectric plate which is provided at a location facing the holding stage and transmits a microwave into the processing container, and a reactive gas supply unit which supplies a reactive gas for plasma processing toward the central region of the substrate to be processed held by the holding stage. Here, the reactive gas supply unit includes an injector base, which is disposed at a location more recessed inside the dielectric plate than a wall surface of the dielectric plate facing the holding stage. A supply hole, which supplies a reactive gas for plasma processing into the processing container, is formed in the injector base.
摘要翻译：等离子体处理装置包括处理容器，其中对待处理的基板进行等离子体处理，保持台设置在处理容器中并保持在其上待处理的基板，电介质板，其设置在位置面向保持阶段并将微波传输到处理容器中，以及反应气体供应单元，其向保持阶段保持的待处理基板的中心区域提供用于等离子体处理的反应气体。这里，反应气体供给单元包括喷射器基座，该喷射器基座设置在比介质板的面向保持台的壁面更靠内侧的位置。在喷射器基座中形成供应孔，其将用于等离子体处理的反应气体供应到处理容器中。

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