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    • 3. 发明申请
    • SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
    • 基板清洗方法和基板清洗装置
    • US20090250079A1
    • 2009-10-08
    • US12400419
    • 2009-03-09
    • Kousuke YOSHIHARAYuichi YOSHIDATaro YAMAMOTO
    • Kousuke YOSHIHARAYuichi YOSHIDATaro YAMAMOTO
    • B08B7/04
    • G03F7/168B08B3/024G03F7/3021H01L21/67051
    • The present invention relates to a substrate cleaning method for cleaning a substrate whose static contact angle with respect to water is 85 degrees or more. The substrate cleaning method includes a step in which the substrate is held horizontally by a substrate holder in such a manner that a central part of the substrate and a central part in rotation correspond to each other; a step in which, while the substrate holder is being rotated about a vertical axis, a cleaning liquid is discharged from a cleaning-liquid nozzle to the central part of the substrate and is spread over all the surface of the substrate by a centrifugal force; a step in which, while the substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a distance between an interface on a side of a to-be-discharged position of the gas in the to-be-discharged position of the cleaning liquid and an interface on a side of the to-be-discharged position of the cleaning liquid in the to-be-discharged position of the gas is set between 9 mm and 15 mm; and a step in which, while the substrate holder is being continuously rotated, the to-be-discharged position of the cleaning liquid is moved toward a periphery of the substrate at a speed lower than a speed at which the dried area is spread outward.
    • 本发明涉及一种清洗相对于水的静态接触角为85度以上的基板的基板清洗方法。 基板清洗方法包括以下步骤:基板由基板保持器水平地保持,使得基板的中心部分和旋转中心部分彼此对应; 在衬底保持器围绕垂直轴线旋转的同时,清洗液从清洗液喷嘴排出到基板的中心部分,并通过离心力分散在基板的所有表面上; 在基板保持器持续旋转的同时,将基板上的清洗液的排出位置变更为离开基板的中心部的偏心位置,从而从 气体喷嘴到基板的中心部分,以便在待处理气体的待排出位置的一侧的界面之间的距离处于这样的条件下形成清洁液体的干燥区域, 清洁液体的排出位置和待排出位置的清洗液体的待排出位置一侧的界面设定在9mm〜15mm之间; 以及在衬底保持器持续旋转的同时,清洗液的排出位置以比干燥区域向外扩展的速度朝向衬底的周边移动的步骤。
    • 4. 发明申请
    • SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND STORAGE MEDIUM FOR SUBSTRATE CLEANING
    • 基板清洗方法,基板清洗装置和基板清洗存储介质
    • US20120111373A1
    • 2012-05-10
    • US13288255
    • 2011-11-03
    • Hiroshi ARIMAYuichi YOSHIDAKousuke YOSHIHARA
    • Hiroshi ARIMAYuichi YOSHIDAKousuke YOSHIHARA
    • B08B7/00B08B5/00B08B3/04
    • G03F7/422H01L21/67051
    • A method for cleaning a surface of a substrate having a circuit pattern formed thereon, includes: forming a liquid film on the surface by feeding a cleaning solution onto the center of the surface while rotating the substrate with the substrate kept horizontal; forming a dry region by discharging gas to the center while moving a position of feed of the cleaning solution on the surface by a distance from the center toward the periphery of the substrate with the substrate being rotated; moving the position of feed of the cleaning solution on the surface toward the periphery at a speed equal to a speed at which the dry region is expanded toward the periphery while rotating the substrate; and controlling temperature of the cleaning solution to form the liquid film such that the temperature becomes higher than process atmosphere temperature on the surface during feed of the cleaning solution.
    • 一种用于清洗其上形成有电路图案的基板的表面的方法,包括:通过在将基板保持水平的同时旋转基板的同时将清洁溶液馈送到表面的中心而在表面上形成液膜; 通过在基板旋转的同时将清洁溶液的进料位置从基板的中心向外周移动到表面上的方式将气体排出到中心而形成干燥区域; 在旋转基板的同时,以与干燥区域朝向周边膨胀的速度相等的速度将清洁溶液的表面朝向周边移动的位置; 以及控制清洁溶液的温度以形成液膜,使得在清洁溶液的进料期间温度变得高于表面上的处理气氛温度。
    • 5. 发明申请
    • FEATURE CONVERSION DEVICE, SIMILAR INFORMATION SEARCH APPARATUS PROVIDED THEREWITH, CODING PARAMETER GENERATION METHOD, AND COMPUTER PROGRAM
    • 特征转换装置,提供的类似信息搜索装置,编码参数生成方法和计算机程序
    • US20120219212A1
    • 2012-08-30
    • US13405716
    • 2012-02-27
    • Mitsuru ANBAIYuichi YOSHIDA
    • Mitsuru ANBAIYuichi YOSHIDA
    • G06K9/62
    • G06F17/30619
    • A bit code converter transforms a learning feature vector using a transformation matrix updated by a transformation matrix update unit, and converts the transformed learning feature vector into a bit code. When the transformation matrix update unit substitutes a substitution candidate for an element of the transformation matrix, a cost function calculator fixes the substitution candidate that minimizes a cost function as the element. The transformation matrix update unit selects the element while sequentially changing the elements, and the cost function calculator fixes the selected element every time the transformation matrix update unit selects the element, thereby finally fixing the optimum transformation matrix. A substitution candidate specifying unit specifies the substitution candidate such that a speed of transformation processing that the bit code converter performs using the transformation matrix using the transformation matrix is enhanced based on a constraint condition stored in a constraint condition storage unit.
    • 位代码转换器使用由变换矩阵更新单元更新的变换矩阵来变换学习特征向量,并将变换后的学习特征向量转换为位代码。 当变换矩阵更新单元将替代候选替换为变换矩阵的元素时,成本函数计算器将成本函数最小化的替代候选者固定为元素。 变换矩阵更新单元在顺序地改变元素的同时选择元素,并且每当变换矩阵更新单元选择元素时,成本函数计算器固定所选择的元素,从而最终确定最佳变换矩阵。 替代候选指定单元指定替换候选,使得基于存储在约束条件存储单元中的约束条件来增强使用变换矩阵的比特码转换器使用变换矩阵执行的变换处理的速度。
    • 8. 发明申请
    • SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE TREATMENT APPARATUS
    • 基板处理方法,计算机存储介质和基板处理设备
    • US20120115090A1
    • 2012-05-10
    • US13280409
    • 2011-10-25
    • Hirofumi TAKEGUCHIYuichi YOSHIDA
    • Hirofumi TAKEGUCHIYuichi YOSHIDA
    • G03F7/30B05B1/00
    • H01L21/67051G03F7/3021G03F7/38H01L21/6715
    • The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the surface treatment liquid from a nozzle to one location of a peripheral portion of the substrate; and a liquid puddle moving step of then moving the liquid puddle formed at the peripheral portion of the substrate to a central portion of the substrate by moving the nozzle from a position above the peripheral portion of the substrate to a position above the central portion of the substrate while continuing the supply of the surface treatment liquid.
    • 本公开是一种将表面处理液体供给到具有形成在其上形成有高斥水性的膜的基板的表面上的基板处理方法,该方法包括:液体水坑形成步骤,通过以下方式形成表面处理液体的液体熔池: 将所述表面处理液体从喷嘴供给到所述基板的周边部分的一个位置; 以及液体搅拌移动步骤,然后通过将所述喷嘴从所述基板的周边部分上方的位置移动到所述基板的中心部分上方的位置,将形成在所述基板的周边部分处的所述液体熔池移动到所述基板的中心部分 同时继续供应表面处理液体。