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1. 发明授权

US5209813A Lithographic apparatus and method 失效
标题翻译：平版印刷设备和方法
公开(公告)号：US5209813A
公开(公告)日：1993-05-11
申请号：US781879
申请日：1991-10-24
申请人： Yoshitada Oshida , Genya Matsuoka , Teruo Iwasaki , Toshio Kaneko , Hiroyuki Takahashi , Hiroyoshi Ando , Hidenori Yamaguchi , Katsuhiro Kawasaki
发明人： Yoshitada Oshida , Genya Matsuoka , Teruo Iwasaki , Toshio Kaneko , Hiroyuki Takahashi , Hiroyoshi Ando , Hidenori Yamaguchi , Katsuhiro Kawasaki
IPC分类号： H01J37/304 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/304 , H01J37/3174 , H01J2237/30433 , H01J2237/30455 , H01J2237/31796
摘要： A lithographic method and a lithographic apparatus ar disclosed in which the height of a silicon wafer making up an object of lithography is accurately measured. A lithographic apparatus such as an electron beam apparatus having a height-measuring instrument built therein is effectively used for forming a pattern on the order of submicrons.
摘要翻译：公开了一种光刻方法和光刻设备，其中精确地测量了构成光刻对象的硅晶片的高度。诸如其中内置有高度测量仪的电子束装置的光刻设备有效地用于形成亚微米级的图案。

2. 发明申请

US20060211353A1 Abrasive disc 有权
标题翻译：研磨盘
公开(公告)号：US20060211353A1
公开(公告)日：2006-09-21
申请号：US11080981
申请日：2005-03-16
申请人： Noriomi Kodani , Akihiko Nagaya , Katsuhiro Kawasaki
发明人： Noriomi Kodani , Akihiko Nagaya , Katsuhiro Kawasaki
IPC分类号： B23F21/03 , B24B33/00
CPC分类号： B24D7/06
摘要： An abrasive disc which has plural abrasive chips having an abrasive layer on a metal piece and being arranged in a peripheral portion of a disc substrate with a predetermined space comprises a suspension plate placed between the disc substrate and abrasive chips and an elastic sheet placed between the disc substrate and the suspension plate, wherein the disc substrate consists of a plastic resin including fiber, the abrasive chips have stakes therein and the suspension plate has through-holes to which the stakes are deformed therein. Each of the abrasive chips has abrasive surfaces including a top abrasive surface and peripheral surfaces and the outer peripheral portion and the inner peripheral portion are declined to the top surface. The abrasive discs have a combination of different abrasive chips fabricated by different bonding metals for the fabrication of the abrasive chips.
摘要翻译：具有在金属片上具有研磨层并且具有预定间隔设置在盘基片的周边部分中的多个研磨片的研磨盘包括放置在盘基片和研磨片之间的悬挂板，盘基片和悬挂板，其中盘基片由包括纤维的塑料树脂组成，研磨片在其中具有桩，悬挂板具有通孔，桩中的桩在其中变形。每个研磨片具有包括顶部研磨表面和外周表面的研磨表面，并且外周部分和内周部分向下倾斜到顶表面。研磨盘具有由用于制造磨料碎片的不同结合金属制成的不同研磨片的组合。

3. 发明授权

US5326979A Electron beam lithography system 失效
标题翻译：电子束光刻系统
公开(公告)号：US5326979A
公开(公告)日：1994-07-05
申请号：US950689
申请日：1992-09-25
申请人： Katsuhiro Kawasaki , Takashi Matsuzaka , Hiroya Ohta , Toshihiko Kohno
发明人： Katsuhiro Kawasaki , Takashi Matsuzaka , Hiroya Ohta , Toshihiko Kohno
IPC分类号： H01L21/027 , H01J37/302 , H01L21/30 , H01J37/256
CPC分类号： H01J37/3026
摘要： An electron beam lithography system which generates phase shift pattern data relating to main patterns, and exposes the phase shift pattern on a mask plate by using an electron beam in accordance with instruction from a computer. An electron beam lithography system is provided which can remarkably decrease a time needed for preparing phase shift pattern data. The apparatus is furnished with a parameter table for storing equations to generate phase shift pattern data, and generates the phase shift pattern data by assigning original pattern data into equations in accordance with a corresponding instruction for applying a phase shift method, and automatically exposes the phase shift pattern.
摘要翻译：一种电子束光刻系统，其产生与主图案相关的相移图案数据，并且根据来自计算机的指令通过使用电子束在掩模板上曝光相移图案。提供了一种电子束光刻系统，其可以显着地减少准备相移图案数据所需的时间。该装置具有用于存储方程式以产生相移模式数据的参数表，并且通过根据用于施加相移方法的相应指令将原始模式数据分配到等式中并生成相移模式数据，并且自动地将相位移位模式

4. 发明授权

US06225011B1 Method for manufacturing semiconductor devices utilizing plurality of exposure systems 失效
标题翻译：利用多个曝光系统制造半导体器件的方法
公开(公告)号：US06225011B1
公开(公告)日：2001-05-01
申请号：US09294428
申请日：1999-04-20
申请人： Yasuko Gotoh , Norio Hasegawa , Naoko Asai , Katsuya Hayano , Takashi Matsuzaka , Katsuhiro Kawasaki
发明人： Yasuko Gotoh , Norio Hasegawa , Naoko Asai , Katsuya Hayano , Takashi Matsuzaka , Katsuhiro Kawasaki
IPC分类号： G03F900
CPC分类号： G03F7/7045 , H01J37/3045 , H01J2237/3175 , Y10S430/143
摘要： A pattern can be written in accordance with a distortion which changes depending upon exposure conditions of the optical exposure system and exposed pattern features, and a pattern can be written with a high alignment accuracy by the optical exposure system and an electron beam lithography system or two optical exposure systems. A pattern which is exposed by optical exposure system divided into very small areas shown by broken lines, and pattern feature amounts (fx), (fy) at each area are calculated. A correction amount is obtained by using the pattern feature amount and the position within an exposure field as parameters based on exposure distortion examined by a standard pattern predeterminedly.
摘要翻译：可以根据根据光学曝光系统的曝光条件和曝光图案特征而变化的失真来写入图案，并且可以通过光学曝光系统和电子束光刻系统或两个方式以高对准精度写入图案光学曝光系统计算出被分为由虚线示出的非常小的区域的光学曝光系统曝光的图案，以及每个区域的图案特征量（fx），（fy）。通过使用图案特征量和曝光区域内的位置作为基于通过标准图案检查的曝光失真的参数来获得校正量。

5. 发明授权

US4524277A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US4524277A
公开(公告)日：1985-06-18
申请号：US455941
申请日：1982-12-16
申请人： Yoshimasa Shimura , Hideyuki Kakiuchi , Yoshihisa Minamikawa , Katsuhiro Kawasaki
发明人： Yoshimasa Shimura , Hideyuki Kakiuchi , Yoshihisa Minamikawa , Katsuhiro Kawasaki
IPC分类号： H01J37/04 , H01J37/15 , H01J37/28 , H01J37/304 , H01J37/305 , H01L21/027 , G01K1/08 , H01J3/00
CPC分类号： H01J37/15 , H01J37/304
摘要： A charged particle beam apparatus in which a beam of charged particles emitted from a beam source is focussed on a target in a predetermined size and shape through a plurality of aperture members. Each of the aperture members is combined with a respective deflecting unit which effects a two-dimensional scan with the charged particle beam in response to a scan signal supplied thereto. The center axis of the aperture formed in the aperture member is arithmetically determined on the basis of time-based variation in the quantity of the charged particles trapped by the aperture member during the scan operation. Further, deviation of the arithmetically determined center axis of the aperture from a reference axis is determined. The aperture member is slided on a plane extending perpendicularly to the center axis of the aperture to cancel out the deviation.
摘要翻译：一种带电粒子束装置，其中从束源发射的带电粒子束通过多个孔径构件以预定尺寸和形状聚焦在靶上。每个孔径构件与相应的偏转单元组合，其响应于提供给其的扫描信号，利用带电粒子束进行二维扫描。基于在扫描操作期间由孔构件捕获的带电粒子的量的时间变化，算术地确定在孔构件中形成的孔的中心轴线。此外，确定孔径的算术确定的中心轴线与参考轴线的偏差。孔径构件在垂直于孔的中心轴延伸的平面上滑动以抵消偏差。

6. 发明授权

US07744447B2 Abrasive disc 有权
标题翻译：研磨盘
公开(公告)号：US07744447B2
公开(公告)日：2010-06-29
申请号：US11080981
申请日：2005-03-16
申请人： Noriomi Kodani , Akihiko Nagaya , Katsuhiro Kawasaki
发明人： Noriomi Kodani , Akihiko Nagaya , Katsuhiro Kawasaki
IPC分类号： B23F21/03
CPC分类号： B24D7/06
摘要： An abrasive disc comprises a disc substrate having a peripheral portion, plural abrasive chips each having an abrasive layer on a metal piece and being arranged in the peripheral portion of the disc substrate with a predetermined space, a suspension plate placed between the disc substrate and abrasive chips, and an elastic sheet placed between the disc substrate and the suspension plate so as to isolate the disc substrate from the suspension plate in order to absorb mechanical shock generated in operation of the abrasive disc. The abrasive chips are fastened to the suspension plate. Each of the abrasive chips has abrasive surfaces including a top abrasive surface and peripheral surfaces and the outer peripheral portion and the inner peripheral portion are declined to the top surface.
摘要翻译：研磨盘包括具有周边部分的盘基片，多个研磨片各自在金属片上具有研磨层，并且以预定间隔布置在盘基片的周边部分中，悬置板放置在盘基片和磨料之间芯片和放置在盘基片和悬挂板之间的弹性片，以将盘基片与悬挂板隔离，以吸收在研磨盘的操作中产生的机械冲击。研磨片固定在悬挂板上。每个研磨片具有包括顶部研磨表面和外周表面的研磨表面，并且外周部分和内周部分向下倾斜到顶表面。

7. 发明授权

US4707950A Ring grinding tool 失效
标题翻译：环磨工具
公开(公告)号：US4707950A
公开(公告)日：1987-11-24
申请号：US936385
申请日：1986-12-01
申请人： Katsuhiro Kawasaki
发明人： Katsuhiro Kawasaki
IPC分类号： B24D13/12 , B24D11/00
CPC分类号： B24D13/12
摘要： A ring grinding tool suitable for use in grinding or polishing a workpiece, particularly having a curvature, is provided. The tool comprises at least one rubber-made supporting layer reinforced with a metal wire and having a surface adapted for mating and contacting a rotary wheel, at least one porous elastic layer provided on the supporting layer, at least one elastic protective layer made of a rubber sheet provided on the porous elastic layer and a plurality of flat abrasive pieces provided on the elastic protective layer.
摘要翻译：提供了适用于研磨或抛光工件的环形研磨工具，特别是具有曲率。所述工具包括至少一个用金属丝加强的橡胶制成的支撑层，并具有适于配合和接触旋转轮的表面，设置在支撑层上的至少一个多孔弹性层，至少一个弹性保护层，设置在多孔弹性层上的橡胶片和设置在弹性保护层上的多个平坦的磨料片。

8. 发明授权

US5759423A Electron beam writing method and apparatus for carrying out the same 失效
标题翻译：电子束写入方法及其执行装置
公开(公告)号：US5759423A
公开(公告)日：1998-06-02
申请号：US563329
申请日：1995-11-28
申请人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
发明人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , B44C1/22 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.
摘要翻译：电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。

9. 发明授权

US4710640A Electron beam lithography 失效
标题翻译：电子束光刻
公开(公告)号：US4710640A
公开(公告)日：1987-12-01
申请号：US757285
申请日：1985-07-22
申请人： Katsuhiro Kawasaki
发明人： Katsuhiro Kawasaki
IPC分类号： H01L21/027 , G03F7/20 , H01J37/317 , H01J37/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/2059 , H01J37/3174 , H01J2237/043 , H01J2237/31776
摘要： An electron beam lithograhy apparatus capable of uniformly exposing the surface of a sample by an electron beam including a generator for generating the electron beam, members for shaping the electron beam, members for focusing the shaped electron beam on the surface of the sample, devices for permitting the focused electron beam to scan the surface of the sample, and devices for deflecting the electron beam to blank, unblank and blank in turn, wherein when the electrom beam is deflected in one direction, a sequence of blanking, unblanking and blanking is made of the beam.
摘要翻译：一种电子束光刻装置，其能够通过包括用于产生电子束的发生器的电子束均匀地暴露样品的表面，用于使电子束成形的构件，用于将成形电子束聚焦在样品表面上的构件，用于允许聚焦的电子束扫描样品的表面，以及用于依次将电子束偏转到空白，非空白和空白的装置，其中当电磁波束在一个方向上偏转时，进行一系列的消隐，非白化和消隐的梁。

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