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    • 1. 发明授权
    • Field controlled thyristor with dual resistivity field layer
    • 具有双电阻率场层的场控晶闸管
    • US4223328A
    • 1980-09-16
    • US911311
    • 1978-06-01
    • Yoshio TerasawaKenji MiyataMasayoshi NaitoTakuzo OgawaMasahiro Okamura
    • Yoshio TerasawaKenji MiyataMasayoshi NaitoTakuzo OgawaMasahiro Okamura
    • H01L29/80H01L29/08H01L29/10H01L29/167H01L29/74H01L29/744
    • H01L29/744H01L29/0834H01L29/1066H01L29/167
    • A field controlled thyristor is disclosed which comprises a first emitter region exposed to one main surface of a semiconductor substrate and having a first conductivity type, a second emitter region exposed to the other main surface of the substrate and having a second conductivity type, a base region connecting the first and the second emitter region, and a gate region provided in the base region. The gate region consists of a slab-like first portion disposed parallel to both the emitter and a second portion connecting the first slab-like portion with one of the main surfaces of the semiconductor substrate. The impurity concentration of the base region is higher in the portion of the base region nearer to the emitter region having the same conductivity type as that of the base region than in the portion of the base region nearer to the emitter region having the opposite conductivity type to that of the base region. The field controlled thyristor has a high forward blocking voltage gain (anode-cathode voltage/gate bias voltage), a large current rating, and a high switching power capability and its switching time is very short.
    • 公开了一种场控晶闸管,其包括暴露于半导体衬底的一个主表面并具有第一导电类型的第一发射极区域,暴露于衬底的另一个主表面并具有第二导电类型的第二发射极区域, 连接第一和第二发射极区域的区域,以及设置在基极区域中的栅极区域。 栅极区域由平行于发射极的板状第一部分和将第一板状部分与半导体衬底的主表面中的一个连接的第二部分组成。 基极区域的杂质浓度比基极区域具有与基极区域相同的导电类型的发射极区域的部分比在具有相反导电类型的发射极区域更靠近的部分的基极区域更高 到基地区。 场控晶闸管具有高正向阻断电压增益(阳极 - 阴极电压/栅极偏置电压),大额定电流和高开关功率能力,其开关时间非常短。
    • 10. 发明授权
    • Process for preparation of semiconductor devices utilizing a two-step
polycrystalline deposition technique to form a diffusion source
    • 使用两步多晶沉积技术制备半导体器件以形成扩散源的方法
    • US4164436A
    • 1979-08-14
    • US925792
    • 1978-07-18
    • Mitsuru UraKenji MiyataTakaya SuzukiTakuzo Ogawa
    • Mitsuru UraKenji MiyataTakaya SuzukiTakuzo Ogawa
    • H01L21/22H01L21/205H01L21/225H01L29/04H01L29/08H01L29/866
    • H01L29/866H01L21/02381H01L21/0245H01L21/02532H01L21/02576H01L21/02579H01L21/0262H01L21/2257H01L29/04H01L29/0834Y10S148/122Y10S438/983
    • A semiconductor substrate having a single crystal semiconductor layer of one conductivity type exposed to the surface thereof is maintained at a temperature lower than the temperature at which the semiconductors is precipitated from the gas phase. In this state, a gas of a starting material of a semiconductor, a gas containing impurities capable of forming a semiconductor of the other conductivity type and a carrier gas therefore are fed onto the semiconductor substrate. Then, the semiconductor substrate is heated to form an amorphous or polycrystalline semiconductor layer of the other conductivity type on the semiconductor substrate. Simultaneously, the impurities of the other conductivity type are diffused from the amorphous or polycrystal semiconductor layer into the substrate which has a single crystal semiconductor layer of one conductivity type, to form a single crystal semiconductor layer having a p-n junction just below the amorphous or polycrystal semiconductor layer between the amorphous or polycrystalline semiconductor layer and the single crystal semiconductor layer of one conductivity type.In a p-n junction to be formed according to this process, the distribution of the concentration of impurities can be controlled precisely, and the step-like distribution of the concentration of impurities can be attained very well.
    • 具有暴露于其表面的一种导电类型的单晶半导体层的半导体衬底保持在比从气相中半导体析出的温度低的温度。 在这种状态下,半导体衬底上的半导体原料气体,含能够形成其它导电类型的半导体的气体和载气的气体被馈送到半导体衬底上。 然后,半导体衬底被加热以在半导体衬底上形成另一导电类型的非晶或多晶半导体层。 同时,其他导电类型的杂质从非晶或多晶半导体层扩散到具有一种导电类型的单晶半导体层的衬底中,以形成具有刚好在无定形或多晶的下面的pn结的单晶半导体层 非晶或多晶半导体层与一种导电类型的单晶半导体层之间的半导体层。