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1. 发明授权

US06331890B1 Thickness measuring apparatus, substrate processing method, and substrate processing apparatus 失效
标题翻译：厚度测量装置，基板处理方法和基板处理装置
公开(公告)号：US06331890B1
公开(公告)日：2001-12-18
申请号：US09474126
申请日：1999-12-29
申请人： Yoshinori Marumo , Teruyuki Hayashi
发明人： Yoshinori Marumo , Teruyuki Hayashi
IPC分类号： G01J400
CPC分类号： G01B11/0683
摘要： A film thickness measuring apparatus is provided with a housing which is made up of a base plate and outer cases, and which substantially shuts off the internal region thereof from the outside air, an introduction stage on which a cassette C is mounted, the cassette containing a plurality of substrates which have thin films formed thereon, a measurement stage which is arranged inside the housing and on which the substrate is placed for measuring the film thickness of the thin film, and a conveyance mechanism, arranged inside the housing, for moving the substrates between the inside of the cassette and the measurement stage. A film thickness measuring mechanism is arranged inside the housing. The film thickness measuring mechanism comprises a light emitting mechanism and a detector. The light emitting mechanism includes a laser light source for emitting a laser beam to the thin film on a wafer placed on the measurement stage. The detector detects light reflected from the thin film. On the basis of the information detected by the detector, the film thickness measuring mechanism measures the thickness of the thin film in a non-contact manner. A filter unit is arranged in the housing and located above the measurement stage. Through this filter unit, pure air free of gaseous organic matter is supplied and guided to the region above the measurement stage.
摘要翻译：薄膜厚度测量装置设置有由基板和外壳组成的壳体，其基本上从外部空气中切断其内部区域，安装盒C的导入台，所述盒体包含在其上形成有薄膜的多个基板，布置在壳体内部并且放置基板以测量薄膜的膜厚度的测量台，以及布置在壳体内部的用于移动盒子内部和测量台之间的衬底。膜厚测量机构设置在壳体内。膜厚测量机构包括发光机构和检测器。发光机构包括用于在放置在测量台上的晶片上向激光束发射激光的激光光源。检测器检测从薄膜反射的光。基于由检测器检测到的信息，膜厚测量机构以非接触的方式测量薄膜的厚度。过滤器单元布置在壳体中并位于测量台的上方。通过该过滤器单元，将不含气态有机物的纯空气供给并引导到测量台上方的区域。

2. 发明授权

US08950999B2 Substrate processing apparatus and particle adhesion preventing method 有权
标题翻译：基板处理装置和颗粒附着防止方法
公开(公告)号：US08950999B2
公开(公告)日：2015-02-10
申请号：US12525314
申请日：2008-01-31
申请人： Akitake Tamura , Teruyuki Hayashi
发明人： Akitake Tamura , Teruyuki Hayashi
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01J37/34 , H01J37/32522 , H01J37/3476 , H01J2237/332 , H01J2237/334 , H01L21/67248 , H01L21/67766 , H01L21/67772 , H01L21/67778
摘要： Any particle adhesion onto the surface of a substrate to be processed is prevented. There is provided a substrate processing apparatus characterized by including a transfer chamber for, via a gate to which a substrate accommodating container for accommodation of the substrate is set, performing transfer of the substrate between the same and the substrate accommodating container, a processing chamber for applying a specific process to the substrate, a load-lock chamber for linking the processing chamber with the transfer chamber, and a temperature control unit for at the stage of transferring the substrate into at least one of the transfer chamber and the load-lock chamber, so as for the temperature of the substrate just before the transfer thereof to be higher than the temperature of the interior of the chamber, into which the substrate will be transferred, controlling at least one of the temperature of the substrate and the temperature of the interior of the chamber.
摘要翻译：防止任何颗粒附着在待处理基材的表面上。提供了一种基板处理装置，其特征在于包括：传送室，用于经由设置用于容纳基板的基板容纳容器的栅极，在其之间进行基板与基板容纳容器的传送;处理室，对基板施加特定的处理，用于将处理室与传送室连接的加载锁定室以及用于在将基板转移到传送室和装载锁定室中的至少一个的阶段的温度控制单元，因为刚好在其转移之前的衬底的温度高于将被转移到其中的衬底内部的温度，控制衬底的温度和温度的至少一个室内

3. 发明申请

US20120031339A1 DEPOSITION HEAD AND FILM FORMING APPARATUS 审中-公开
标题翻译：沉积头和成膜装置
公开(公告)号：US20120031339A1
公开(公告)日：2012-02-09
申请号：US13262335
申请日：2010-04-02
申请人： Yuji Ono , Tomohiko Edura , Teruyuki Hayashi , Akitake Tamura , Misako Saito
发明人： Yuji Ono , Tomohiko Edura , Teruyuki Hayashi , Akitake Tamura , Misako Saito
IPC分类号： C23C16/455
CPC分类号： C23C14/12 , C23C14/24 , H01L51/001 , H01L51/50
摘要： There is provided a deposition head capable of discharging a material gas having a uniform flow rate and equi-thermal property from each component in a large-sized substrate as well as a conventional small-sized one for forming a uniform thin film. A deposition apparatus including the deposition head is also provided. The deposition head is provided within a deposition apparatus for forming a thin film on a substrate and configured to discharge a material gas toward the substrate. The deposition head includes an outer casing, and an inner casing provided within the outer casing and into which the material gas is introduced. In the inner casing, an opening configured to discharge the material gas toward the substrate is formed, and a heater configured to heat the material gas is provided at an outer surface of the outer casing or in a space between the outer casing and the inner casing.
摘要翻译：提供一种沉积头，其能够在大尺寸基板中排出具有均匀流速和等热特性的材料气体，以及用于形成均匀薄膜的常规小尺寸基板。还提供了包括沉积头的沉积设备。沉积头设置在用于在衬底上形成薄膜并用于将材料气体朝向衬底排出的沉积设备中。沉积头包括外壳和设置在外壳内并且材料气体被引入的内壳。在内壳体中，形成有将材料气体朝向基板排出的开口，在外壳的外表面或外壳与内壳之间的空间内设置加热材料气体的加热器。

4. 发明申请

US20100111648A1 SUBSTRATE PROCESSING APPARATUS AND PARTICLE ADHESION PREVENTING METHOD 有权
标题翻译：基板加工装置和颗粒粘合防止方法
公开(公告)号：US20100111648A1
公开(公告)日：2010-05-06
申请号：US12525314
申请日：2008-01-31
申请人： Akitake Tamura , Teruyuki Hayashi
发明人： Akitake Tamura , Teruyuki Hayashi
IPC分类号： H01L21/677 , H01L21/673 , H01L21/67 , F28F27/00 , G05D23/00
CPC分类号： H01J37/34 , H01J37/32522 , H01J37/3476 , H01J2237/332 , H01J2237/334 , H01L21/67248 , H01L21/67766 , H01L21/67772 , H01L21/67778
摘要： Any particle adhesion onto the surface of a substrate to be processed is prevented. There is provided a substrate processing apparatus characterized by including a transfer chamber for, via a gate to which a substrate accommodating container for accommodation of the substrate is set, performing transfer of the substrate between the same and the substrate accommodating container, a processing chamber for applying a specific process to the substrate, a load-lock chamber for linking the processing chamber with the transfer chamber, and a temperature control unit for at the stage of transferring the substrate into at least one of the transfer chamber and the load-lock chamber, so as for the temperature of the substrate just before the transfer thereof to be higher than the temperature of the interior of the chamber, into which the substrate will be transferred, controlling at least one of the temperature of the substrate and the temperature of the interior of the chamber.
摘要翻译：防止任何颗粒附着在待处理基材的表面上。提供了一种基板处理装置，其特征在于包括：传送室，用于经由设置用于容纳基板的基板容纳容器的栅极，在其之间进行基板与基板容纳容器的传送;处理室，对基板施加特定的处理，用于将处理室与传送室连接的加载锁定室以及用于在将基板转移到传送室和装载锁定室中的至少一个的阶段的温度控制单元，因为刚好在其转移之前的衬底的温度高于将被转移到其中的衬底内部的温度，控制衬底的温度和温度的至少一个室内

5. 发明授权

US07508518B2 Particle measuring method and particle measuring apparatus 失效
标题翻译：粒子测量方法和粒子测量仪器
公开(公告)号：US07508518B2
公开(公告)日：2009-03-24
申请号：US12078172
申请日：2008-03-27
申请人： Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
发明人： Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
IPC分类号： G01N21/00 , G01N21/55
CPC分类号： G01N15/06 , G01N1/42 , G01N2015/0693
摘要： The present invention relates to a particle measuring method for irradiating light to a surface of a substrate to scatter the light so as to measure a condition of particles on the substrate based on the scattered light. The particle measuring method according to the present invention comprises the steps of: heating a certain liquid to obtain a steam; supplying the steam onto a substrate so that a content of the steam is absorbed by each particle, while a temperature of the substrate is maintained in such a manner that the steam does not condense on the substrate; cooling the substrate before the particle dries so that the content absorbed by the particle is solidified, while preventing generation of solidified substance on regions of the surface of the substrate to which no particle adheres; and irradiating light to the substrate to scatter the light and detecting the scattered light, under a condition in which the content absorbed by the particle has been solidified.
摘要翻译：本发明涉及一种用于将光照射到基板的表面以散射光以便基于散射光测量基板上的颗粒的状态的颗粒测量方法。根据本发明的颗粒测量方法包括以下步骤：加热某些液体以获得蒸汽; 将蒸汽供给到基板上，使得蒸汽的含量被每个颗粒吸收，同时保持基板的温度使得蒸汽不会在基板上冷凝; 在颗粒干燥之前冷却基板，使得由颗粒吸收的内容物固化，同时防止在没有颗粒粘附的基材表面的区域上产生固化物质; 并且在颗粒吸收的内容物固化的条件下，向基板照射光以散射光并检测散射光。

6. 发明申请

US20080239283A1 Particle measuring method and particle measuring apparatus 失效
标题翻译：粒子测量方法和粒子测量仪器
公开(公告)号：US20080239283A1
公开(公告)日：2008-10-02
申请号：US12078172
申请日：2008-03-27
申请人： Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
发明人： Akitake Tamura , Kaoru Fujihara , Teruyuki Hayashi
IPC分类号： G01N1/00
CPC分类号： G01N15/06 , G01N1/42 , G01N2015/0693
摘要： The present invention relates to a particle measuring method for irradiating light to a surface of a substrate to scatter the light so as to measure a condition of particles on the substrate based on the scattered light. The particle measuring method according to the present invention comprises the steps of: heating a certain liquid to obtain a steam; supplying the steam onto a substrate so that a content of the steam is absorbed by each particle, while a temperature of the substrate is maintained in such a manner that the steam does not condense on the substrate; cooling the substrate before the particle dries so that the content absorbed by the particle is solidified, while preventing generation of solidified substance on regions of the surface of the substrate to which no particle adheres; and irradiating light to the substrate to scatter the light and detecting the scattered light, under a condition in which the content absorbed by the particle has been solidified.
摘要翻译：本发明涉及一种用于将光照射到基板的表面以散射光以便基于散射光测量基板上的颗粒的状态的颗粒测量方法。根据本发明的颗粒测量方法包括以下步骤：加热某些液体以获得蒸汽; 将蒸汽供给到基板上，使得蒸汽的含量被每个颗粒吸收，同时保持基板的温度使得蒸汽不会在基板上冷凝; 在颗粒干燥之前冷却基板，使得由颗粒吸收的内容物固化，同时防止在没有颗粒粘附的基材表面的区域上产生固化物质; 并且在颗粒吸收的内容物固化的条件下，向基板照射光以散射光并检测散射光。

7. 发明授权

US07420118B2 Electric wire and cable with coating/covering of polyvinyl chloride family resin composition 失效
标题翻译：电线电缆与涂料/覆盖层的聚氯乙烯树脂组成
公开(公告)号：US07420118B2
公开(公告)日：2008-09-02
申请号：US11113065
申请日：2005-04-25
申请人： Kiyoshi Watanabe , Hiroyuki Ito , Misako Saito , Teruyuki Hayashi , Naoya Hirayama , Sadao Kobayashi , Yoshihide Wakayama
发明人： Kiyoshi Watanabe , Hiroyuki Ito , Misako Saito , Teruyuki Hayashi , Naoya Hirayama , Sadao Kobayashi , Yoshihide Wakayama
IPC分类号： H01B11/06
CPC分类号： H01B3/443 , C08K5/098 , C08L27/06
摘要： An electric wire with coating of polyvinyl chloride family resin composition is disclosed which has a coating layer containing a polyvinyl chloride family resin composition comprising polyvinyl chloride family resin and one or more compounds selected from calcium soap, zinc soap and hydrotalcite. The polyvinyl chloride composition does not comprise either or both of a lead compound and a β-diketone compound having a melting point less than 100° C. A plasticizer can be further added to the composition so as to obtain a heat-stable vinyl chloride composition. A cable covered with the polyvinyl chloride family resin composition is also disclosed, including a cable having electric wires coated with the polyvinyl chloride family resin composition.
摘要翻译：公开了一种具有聚氯乙烯家族树脂组合物涂层的电线，其具有包含聚氯乙烯家族树脂组合物的涂层，其包含聚氯乙烯家族树脂和一种或多种选自钙皂，锌皂和水滑石的化合物。聚氯乙烯组合物不包含铅化合物和熔点低于100℃的β-二酮化合物中的任一种或两者。还可以向组合物中加入增塑剂以获得热稳定性氯乙烯组合物。还公开了用聚氯乙烯族树脂组合物覆盖的电缆，包括具有涂覆有聚氯乙烯树脂组合物的电线的电缆。

8. 发明授权

US07208428B2 Method and apparatus for treating article to be treated 失效
标题翻译：用于治疗待治疗物品的方法和装置
公开(公告)号：US07208428B2
公开(公告)日：2007-04-24
申请号：US10433423
申请日：2001-12-04
申请人： Shingo Hishiya , Yoshikazu Furusawa , Teruyuki Hayashi , Misako Saito , Kota Umezawa , Syoichi Sato
发明人： Shingo Hishiya , Yoshikazu Furusawa , Teruyuki Hayashi , Misako Saito , Kota Umezawa , Syoichi Sato
IPC分类号： H01L21/324 , H01L21/477
CPC分类号： H01L21/02046 , C30B33/00 , H01L21/02238 , H01L21/02255 , H01L21/02301 , H01L21/02312 , H01L21/31138 , H01L21/31662 , H01L21/67109
摘要： A thermal treatment apparatus 1 includes a reaction tube 2 for containing wafers 10 contaminated with organic substances having a heater 12 capable of heating the reaction tube; a first gas supply pipe 13 for carrying oxygen gas into the reaction tube 2; and a second gas supply pipe 14 for carrying hydrogen gas into the reaction tube 2. Oxygen gas and hydrogen gas are supplied through the first gas supply pipe 13 and the second gas supply pipe 14, respectively, into the reaction tube 2, and the heater 12 heats the reaction tube 2 at a temperature capable of activating oxygen gas and hydrogen gas. A combustion reaction occurs in the reaction tube 2 and thereby the organic substances adhering to the wafers 10 are oxidized, decomposed and removed.
摘要翻译：热处理装置1包括反应管2，用于容纳被有机物质污染的晶片10，该有机物质具有加热反应管的加热器12; 用于将氧气输送到反应管2中的第一气体供给管13; 以及用于将氢气输送到反应管2中的第二气体供给管14。氧气和氢气分别通过第一气体供给管13和第二气体供给管14供给到反应管2中，加热器12在能够活化氧气和氢气的温度下加热反应管2 。在反应管2中发生燃烧反应，因此附着在晶片10上的有机物被氧化，分解除去。

9. 发明申请

US20050107599A1 Novel phosphonamides, process for producing the same, and use thereof 失效
标题翻译：新型膦酰胺，其制备方法及其用途
公开(公告)号：US20050107599A1
公开(公告)日：2005-05-19
申请号：US10506424
申请日：2003-03-03
申请人： Yoshikazu Makioka , Teruyuki Hayashi , Masato Tanaka , Li-Biao Han
发明人： Yoshikazu Makioka , Teruyuki Hayashi , Masato Tanaka , Li-Biao Han
IPC分类号： C07F9/44 , C07F9/6584 , C22B3/38 , C22B59/00 , C07F5/00 , C07F9/22
CPC分类号： C22B59/00 , C07F9/4407 , C07F9/4419 , C07F9/65848 , C22B3/0052 , C22B3/0072 , Y02P10/234
摘要： The invention provides a process by which rare earth metal ions can be efficiently extracted by easy operation, and effective extracting reagents for the process. Specifically, phosphonamides represented by the general formula [1]; a process for producing the same; reagents for extracting rare earth metal ions, containing the phosphonamides; and a process for extraction of rare earth metal ions with the phosphonamides: [1] wherein R1 is alkyl, cycloalkyl, alkenyl, cycloalkenyl, alkynyl, aryl, aralkyl, or a heterocyclic group, with the proviso that each group may be substituted; R2 is hydrogen, alkyl, cycloalkyl, alkenyl, cycloalkenyl, aryl, aralkyl, or a heterocyclic group, with the proviso that each group may be substituted; R3 is hydrogen, alkyl, cycloalkyl, alkenyl, cycloalkenyl, aryl, aralkyl, or a heterocyclic group, with the proviso that each group may be substituted, or the two R3s may be united to form alkylene, cycloalkylene, or arylene.
摘要翻译：本发明提供了一种易于操作可有效提取稀土金属离子的方法，并为该方法提供了有效的提取试剂。具体地，由通式[1]表示的膦酰胺; 其制造方法; 含有膦酰胺的稀土金属离子萃取试剂; 以及用膦酰胺萃取稀土金属离子的方法：[1]其中R 1是烷基，环烷基，烯基，环烯基，炔基，芳基，芳烷基或杂环基，条件是每个组可以被替代; R 2是氢，烷基，环烷基，烯基，环烯基，芳基，芳烷基或杂环基，条件是每个基团可以被取代; R 3是氢，烷基，环烷基，烯基，环烯基，芳基，芳烷基或杂环基，条件是每个基团可以被取代，或两个R 3 O 可以结合形成亚烷基，亚环烷基或亚芳基。

10. 发明授权

US4229381A Process for preparation of aldehydes 失效
标题翻译：醛的制备方法
公开(公告)号：US4229381A
公开(公告)日：1980-10-21
申请号：US18879
申请日：1979-03-09
申请人： Ikuei Ogata , Yasuziro Kawabata , Masato Tanaka , Teruyuki Hayashi
发明人： Ikuei Ogata , Yasuziro Kawabata , Masato Tanaka , Teruyuki Hayashi
IPC分类号： C07C67/31 , B01J31/00 , C07C27/00 , C07C27/20 , C07C45/00 , C07C45/49 , C07C45/50 , C07C67/00 , C07C69/12 , C07C69/67 , C07C255/17 , C07C45/08 , C07C45/10
CPC分类号： C07C45/50 , C07C45/49
摘要： An improved hydroformylation process for preparing aldehydes by reacting olefins with synthesis gas (H.sub.2 and CO) under heating and pressure is disclosed. The hydroformylation is carried out in the presence of a platinum catalyst, and assitant composed of a halide of a metal of the group IVb of the Periodic Table and a reaction promotor composed of a specific bidentate ligand of the formula R.sub.2 X--Z--Y--Z--X--R'.sub.2. In this reaction, the platinum catalyst exerts a high activity, and an aldehyde mixture containing a linear isomer at a very high ratio of content is obtained as a product.
摘要翻译：公开了通过在加热和压力下使烯烃与合成气（H 2和CO）反应制备醛的改进的加氢甲酰化方法。加氢甲酰基化是在铂催化剂存在下进行的，由周期表IVb族金属的卤化物和由式R2X-ZYZX-R'2的特定二齿配体组成的反应促进剂组成的助剂。在该反应中，铂催化剂发挥高活性，得到以非常高的含量比例含有线性异构体的醛混合物作为产物。

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