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1. 发明授权

US09035370B2 Semiconductor device 有权
标题翻译：半导体器件
公开(公告)号：US09035370B2
公开(公告)日：2015-05-19
申请号：US13415010
申请日：2012-03-08
申请人： Yoshiko Kato , Hiroyuki Kutsukake
发明人： Yoshiko Kato , Hiroyuki Kutsukake
IPC分类号： H01L29/788 , H01L27/115
CPC分类号： H01L27/11558 , H01L27/11531
摘要： A semiconductor device, includes: a semiconductor substrate; a first conductivity type well and a second conductivity type well; a first active area; a second active area; a first well contact layer; a plurality of first source/drain layers; a first gate insulating film; a first gate electrode; a second well contact layer; a plurality of second source/drain layers; a second gate insulating film; and a second gate electrode. The first well contact layer is formed in the first active area at one end part in the one direction. The one end parts in each of the first active areas and in each of the second active areas are mutually on the same side.
摘要翻译：一种半导体器件，包括：半导体衬底; 第一导电类型井和第二导电类型井; 第一个活跃区域; 第二个活跃区域; 第一阱接触层; 多个第一源极/漏极层; 第一栅极绝缘膜; 第一栅电极; 第二阱接触层; 多个第二源极/漏极层; 第二栅绝缘膜; 和第二栅电极。第一阱接触层在一个方向上的一个端部的第一有源区域中形成。第一有效区域和第二有源区域中的每一个中的一端部分彼此相同。

2. 发明授权

US08698204B2 Semiconductor memory device 有权
标题翻译：半导体存储器件
公开(公告)号：US08698204B2
公开(公告)日：2014-04-15
申请号：US13226763
申请日：2011-09-07
申请人： Hiroyuki Kutsukake , Yoshiko Kato
发明人： Hiroyuki Kutsukake , Yoshiko Kato
IPC分类号： H01L27/118 , H01L27/108 , H01L29/76 , H01L23/52 , H01L23/48 , H01L23/40
CPC分类号： H01L27/11524 , H01L27/11519 , H01L2924/0002 , H01L2924/00
摘要： In one embodiment, a semiconductor memory device includes a substrate, and device regions in the substrate to extend in a first direction. The device further includes select gates on the substrate to extend in a second direction, and a contact region provided between the select gates and including contact plugs on the respective device regions. The contact region includes partial regions, in each of which N contact plugs are disposed on N successive device regions to be arranged on a straight line being non-parallel to the first and second directions, where N is an integer of 2 or more. The contact region includes the partial regions of at least two types whose values of N are different. Further, each of the contact plugs has a planar shape of an ellipse, and is arranged so that a major axis of the ellipse is tilted with respect to the first direction.
摘要翻译：在一个实施例中，半导体存储器件包括衬底以及衬底中沿第一方向延伸的器件区域。该装置还包括在基板上沿第二方向延伸的选择栅极以及设置在选择栅极之间并包括各个器件区域上的接触插塞的接触区域。接触区域包括部分区域，其中每个N个接触插塞设置在N个连续的器件区域上，以布置在不平行于第一和第二方向的直线上，其中N是2或更大的整数。接触区域包括N值不同的至少两种类型的部分区域。此外，每个接触插塞具有椭圆形的平面形状，并且被布置成使得椭圆的长轴相对于第一方向倾斜。

3. 发明授权

US08232608B2 Semiconductor device and method for manufacturing semiconductor device 有权
标题翻译：半导体装置及半导体装置的制造方法
公开(公告)号：US08232608B2
公开(公告)日：2012-07-31
申请号：US12501726
申请日：2009-07-13
申请人： Yoshiko Kato , Hiroyuki Kutsukake
发明人： Yoshiko Kato , Hiroyuki Kutsukake
IPC分类号： H01L27/088
CPC分类号： H01L21/823481 , H01L21/823462 , H01L27/088
摘要： A semiconductor device with a high-voltage transistor and a low-voltage transistor includes an isolation insulating film between a first element region of the high-voltage transistor and a second element region of the low-voltage transistor, a first gate insulating film on a semiconductor substrate in the first element region, a first gate electrode on the first gate insulating film, a second gate insulating film on the semiconductor substrate in the second element region, and a second gate electrode on the second gate insulating film. The isolation insulating film includes a first isolation region adjacent to a surrounding area of the first element region and a second isolation region adjacent to a surrounding area of the second element region. A bottom of the second isolation region is lower than a bottom of the first isolation region. The first gate insulating film is thicker than the second gate insulating film.
摘要翻译：具有高压晶体管和低压晶体管的半导体器件包括在高压晶体管的第一元件区域和低压晶体管的第二元件区域之间的隔离绝缘膜，第一栅极绝缘膜第一元件区域中的半导体衬底，第一栅极绝缘膜上的第一栅极电极，第二元件区域中的半导体衬底上的第二栅极绝缘膜，以及第二栅极绝缘膜上的第二栅极电极。隔离绝缘膜包括与第一元件区域的周围区域相邻的第一隔离区域和与第二元件区域的周围区域相邻的第二隔离区域。第二隔离区域的底部低于第一隔离区域的底部。第一栅极绝缘膜比第二栅极绝缘膜厚。

4. 发明申请

US20120007192A1 SEMICONDUCTOR MEMORY DEVICE 有权
标题翻译：半导体存储器件
公开(公告)号：US20120007192A1
公开(公告)日：2012-01-12
申请号：US12952637
申请日：2010-11-23
申请人： Yoshiko Kato , Hiroyuki Kutsukake , Masayuki Ichige
发明人： Yoshiko Kato , Hiroyuki Kutsukake , Masayuki Ichige
IPC分类号： H01L27/105
CPC分类号： H01L27/11521 , H01L27/11519
摘要： According to one embodiment, a semiconductor memory device includes a plurality of memory cell blocks, a plurality of first wirings, a plurality of second wirings, and a contact. Each of the memory cell blocks includes a plurality of memory cell units. Each of the plurality of memory cell units includes a plurality of memory cells and is provided in a first direction at a prescribed spacing. The plurality of memory cell blocks is arranged in a second direction intersecting with the first direction. The plurality of first wirings extends in the second direction and is provided in the first direction at a prescribed spacing. The plurality of second wirings is provided at least one of above and below the first wiring. The contact is provided at both end portions of the second wiring in the second direction and connects the first wiring to the second wiring. A width dimension of the second wiring along the first direction is larger than a width dimension of the first wiring along the first direction.
摘要翻译：根据一个实施例，半导体存储器件包括多个存储器单元块，多个第一布线，多个第二布线和一个触点。每个存储单元块包括多个存储单元单元。多个存储单元单元中的每一个包括多个存储单元，并且以规定间隔沿第一方向设置。多个存储单元块被布置在与第一方向交叉的第二方向上。多个第一配线在第二方向上延伸并且以规定间隔沿第一方向设置。多个第二布线被设置在第一布线的上方和下方中的至少一个。在第二方向的第二配线的两端设置接点，将第一配线连接到第二配线。沿着第一方向的第二布线的宽度尺寸大于沿着第一方向的第一布线的宽度尺寸。

5. 发明授权

US08525246B2 Semiconductor storage device and method of manufacturing the same 有权
标题翻译：半导体存储装置及其制造方法
公开(公告)号：US08525246B2
公开(公告)日：2013-09-03
申请号：US12724802
申请日：2010-03-16
申请人： Yoshiko Kato , Hiroyuki Kutsukake , Kikuko Sugimae , Yasuhiko Matsunaga
发明人： Yoshiko Kato , Hiroyuki Kutsukake , Kikuko Sugimae , Yasuhiko Matsunaga
IPC分类号： H01L29/76
CPC分类号： H01L27/11521
摘要： A non-volatile semiconductor storage device includes: a semiconductor substrate; a semiconductor layer formed on the semiconductor substrate; a first device isolation/insulation film formed in a trench, the trench formed in the semiconductor layer, with a first direction taken as a longitudinal direction; a device formation region formed by separating the semiconductor layer by the first device isolation/insulation film with the first direction taken as a longitudinal direction; and a memory transistor disposed on the device formation region. The first device isolation/insulation film and the device formation region have an impurity of a first conductivity type. An impurity concentration of the impurity of the first conductivity type in the first device isolation/insulation film is higher than that in the device formation region.
摘要翻译：非易失性半导体存储器件包括：半导体衬底; 形成在半导体衬底上的半导体层; 形成在沟槽中的第一器件隔离/绝缘膜，形成在半导体层中的沟槽，第一方向作为纵向方向; 通过第一装置隔离/绝缘膜将第一方向作为纵向方向分离半导体层而形成的器件形成区域; 以及设置在器件形成区域上的存储晶体管。第一器件隔离/绝缘膜和器件形成区具有第一导电类型的杂质。第一器件隔离/绝缘膜中的第一导电类型的杂质的杂质浓度高于器件形成区域中的杂质浓度。

6. 发明授权

US08294238B2 Nonvolatile semiconductor memory device with reduced size of peripheral circuit area 有权
标题翻译：非易失性半导体存储器件，外围电路面积减小
公开(公告)号：US08294238B2
公开(公告)日：2012-10-23
申请号：US12765477
申请日：2010-04-22
申请人： Hiroyuki Kutsukake , Takayuki Toba , Yoshiko Kato , Kenji Gomikawa , Haruhiko Koyama
发明人： Hiroyuki Kutsukake , Takayuki Toba , Yoshiko Kato , Kenji Gomikawa , Haruhiko Koyama
IPC分类号： H01L21/70
CPC分类号： H01L27/11519 , H01L27/11526 , H01L27/11529
摘要： A peripheral circuit area is formed around a memory cell array area. The peripheral circuit area has element regions, an element isolation region isolating the element regions, and field-effect transistor formed in each of the element regions and including a gate electrode extending in a channel width direction, on a semiconductor substrate. An end portion and a corner portion of the gate electrode are on the element isolation region. A radius of curvature of the corner portion of the gate electrode is smaller than a length from the end portion of the element region in the channel width direction to the end portion of the gate electrode in the channel width direction, and is less than 85 nm.
摘要翻译：在存储单元阵列区域周围形成外围电路区域。外围电路区域具有元件区域，隔离元件区域的元件隔离区域和形成在每个元件区域中并包括在沟道宽度方向上延伸的栅电极的场效应晶体管。栅电极的端部和角部位于元件隔离区上。栅电极的角部的曲率半径比从沟道宽度方向的元件区域的端部到沟道宽度方向的栅电极的端部的长度小，并且小于85nm 。

7. 发明申请

US20100314677A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：半导体存储器件及其制造方法
公开(公告)号：US20100314677A1
公开(公告)日：2010-12-16
申请号：US12724802
申请日：2010-03-16
申请人： Yoshiko KATO , Hiroyuki Kutsukake , Kikuko Sugimae , Yasuhiko Matsunaga
发明人： Yoshiko KATO , Hiroyuki Kutsukake , Kikuko Sugimae , Yasuhiko Matsunaga
IPC分类号： H01L27/115 , H01L21/8247
CPC分类号： H01L27/11521
摘要： A non-volatile semiconductor storage device includes: a semiconductor substrate; a semiconductor layer formed on the semiconductor substrate; a first device isolation/insulation film formed in a trench, the trench formed in the semiconductor layer, with a first direction taken as a longitudinal direction; a device formation region formed by separating the semiconductor layer by the first device isolation/insulation film with the first direction taken as a longitudinal direction; and a memory transistor disposed on the device formation region. The first device isolation/insulation film and the device formation region have an impurity of a first conductivity type. An impurity concentration of the impurity of the first conductivity type in the first device isolation/insulation film is higher than that in the device formation region.
摘要翻译：非易失性半导体存储器件包括：半导体衬底; 形成在半导体衬底上的半导体层; 形成在沟槽中的第一器件隔离/绝缘膜，形成在半导体层中的沟槽，第一方向作为纵向方向; 通过第一装置隔离/绝缘膜将第一方向作为纵向方向分离半导体层而形成的器件形成区域; 以及设置在器件形成区域上的存储晶体管。第一器件隔离/绝缘膜和器件形成区具有第一导电类型的杂质。第一器件隔离/绝缘膜中的第一导电类型的杂质的杂质浓度高于器件形成区域中的杂质浓度。

8. 发明申请

US20090294824A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE 失效
标题翻译：非易失性半导体存储器件
公开(公告)号：US20090294824A1
公开(公告)日：2009-12-03
申请号：US12412884
申请日：2009-03-27
申请人： Kenji Gomikawa , Hiroyuki Kutsukake , Yoshiko Kato , Mitsuhiro Noguchi
发明人： Kenji Gomikawa , Hiroyuki Kutsukake , Yoshiko Kato , Mitsuhiro Noguchi
IPC分类号： H01L29/788
CPC分类号： H01L27/11521 , H01L27/11524 , H01L27/11526 , H01L27/11529
摘要： A first select transistor is connected to one end of a plurality of memory cell transistors that are serially connected. A second select transistor is connected to the other end of the serially connected memory cell transistors. A first impurity diffusion region is formed in a semiconductor substrate and constitutes a first main electrode of the first select transistor. A second impurity diffusion region is formed in the semiconductor substrate and constitutes a second main electrode of the second select transistor. A depth of the first impurity diffusion region is greater than a depth of the second impurity diffusion region.
摘要翻译：第一选择晶体管连接到串联连接的多个存储单元晶体管的一端。第二选择晶体管连接到串联存储单元晶体管的另一端。在半导体衬底中形成第一杂质扩散区，构成第一选择晶体管的第一主电极。在半导体衬底中形成第二杂质扩散区，构成第二选择晶体管的第二主电极。第一杂质扩散区域的深度大于第二杂质扩散区域的深度。

9. 发明授权

US08860121B2 Semiconductor device having upper layer portion of semiconductor substrate divided into a plurality of active areas 有权
标题翻译：半导体器件具有分为多个有源区的半导体衬底的上层部分
公开(公告)号：US08860121B2
公开(公告)日：2014-10-14
申请号：US12725848
申请日：2010-03-17
申请人： Yoshiko Kato , Mitsuhiro Noguchi , Hiroyuki Kutsukake
发明人： Yoshiko Kato , Mitsuhiro Noguchi , Hiroyuki Kutsukake
IPC分类号： H01L29/792 , H01L29/78 , H01L27/115 , H01L29/66 , H01L29/10
CPC分类号： H01L27/11529 , H01L27/11521 , H01L27/11526 , H01L27/11551 , H01L29/1083 , H01L29/66825
摘要： A semiconductor memory device includes: a semiconductor substrate; a plurality of element isolation insulators disposed in parts of an upper layer portion of the semiconductor substrate and dividing the upper layer portion into a plurality of active areas extended in one direction; tunnel insulating films provided on the active areas: charge storage members provided on the tunnel insulating films; and control gate electrodes provided on the charge storage members. A width of a middle portion of one of the active areas in the up-to-down direction being smaller than a width of a portion of the active areas upper of the middle portion and a width of a portion of the active areas below the middle portion.
摘要翻译：半导体存储器件包括：半导体衬底; 多个元件隔离绝缘体，设置在所述半导体衬底的上层部分的一部分中，并将所述上层部分分成沿一个方向延伸的多个有效区域; 设置在有源区域上的隧道绝缘膜：设置在隧道绝缘膜上的电荷存储构件; 以及设置在电荷存储部件上的控制栅电极。一个有源区域的上下方向的中间部分的宽度小于中间部分的有效区域的一部分的宽度，以及在中间部分之下的有效区域的一部分的宽度一部分。

10. 发明授权

US08399953B2 Semiconductor device and method for manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US08399953B2
公开(公告)日：2013-03-19
申请号：US12885031
申请日：2010-09-17
申请人： Hiroyuki Kutsukake , Kenji Gomikawa , Yoshiko Kato , Norihisa Arai , Tomoaki Hatano
发明人： Hiroyuki Kutsukake , Kenji Gomikawa , Yoshiko Kato , Norihisa Arai , Tomoaki Hatano
IPC分类号： H01L29/00 , H01L29/167 , H01L21/336
CPC分类号： H01L27/11519 , H01L21/76229 , H01L27/11521 , H01L27/11526 , H01L27/11546
摘要： A semiconductor device includes a semiconductor substrate, an element isolation insulating film dividing an upper portion of the substrate into a plurality of first active regions, a source layer and a drain layer, a gate electrode, a gate insulating film, a first punch-through stopper layer, and a second punch-through stopper layer. The source layer and the drain layer are formed in spaced to each other in an upper portion of each of the first active regions. The first punch-through stopper layer is formed in a region of the first active region directly below the source layer and the second punch-through stopper layer is formed in a region of the first active region directly below the drain layer. The first punch-through stopper layer and the second punch-through stopper layer each has an effective impurity concentration higher than the semiconductor substrate. The first punch-through stopper layer and the source layer are separated in the channel region. The second punch-through stopper layer and the drain layer are separated in the channel region.
摘要翻译：半导体器件包括半导体衬底，将衬底的上部分成多个第一有源区的元件隔离绝缘膜，源极层和漏极层，栅极电极，栅极绝缘膜，第一穿通阻挡层和第二穿通止挡层。源极层和漏极层在每个第一有源区域的上部彼此间隔开地形成。第一穿通阻挡层形成在源层正下方的第一有源区的区域中，并且第二穿通阻挡层形成在漏极层正下方的第一有源区的区域中。第一穿通阻止层和第二穿通阻止层各自具有高于半导体衬底的有效杂质浓度。第一穿通阻止层和源极层在沟道区域中分离。第二穿通阻止层和漏极层在沟道区域中分离。

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