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1. 发明申请

US20070114399A1 Pattern measuring method 有权
公开(公告)号：US20070114399A1
公开(公告)日：2007-05-24
申请号：US11651498
申请日：2007-01-10
申请人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
发明人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.

2. 发明申请

US20050211897A1 Pattern measuring method 有权
标题翻译：图案测量方法
公开(公告)号：US20050211897A1
公开(公告)日：2005-09-29
申请号：US11066219
申请日：2005-02-28
申请人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
发明人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
IPC分类号： G01B15/00 , G01N23/00 , G01N23/225 , G21K7/00 , H01J37/28
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
摘要翻译：图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。

3. 发明授权

US07288764B2 Pattern measuring method 有权
标题翻译：图案测量方法
公开(公告)号：US07288764B2
公开(公告)日：2007-10-30
申请号：US11651498
申请日：2007-01-10
申请人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
发明人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
IPC分类号： H01J37/49
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
摘要翻译：图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。

4. 发明申请

US20120305764A1 METHOD OF DETERMINING THE CONCAVITY AND CONVEXITY ON SAMPLE SURFACE, AND CHARGED PARTICLE BEAM APPARATUS 审中-公开
标题翻译：确定样品表面的浓度和渗透率的方法和带电粒子束装置
公开(公告)号：US20120305764A1
公开(公告)日：2012-12-06
申请号：US13570931
申请日：2012-08-09
申请人： Yoshihiro Kimura , Osamu Komuro , Fumihiro Sasajima
发明人： Yoshihiro Kimura , Osamu Komuro , Fumihiro Sasajima
IPC分类号： G01N23/225
CPC分类号： G01B15/08 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： A method and apparatus suitable for determining the concavity and convexity of line and space patterns formed on a sample. A profile is formed based on a charged-particle beam scan, the profile having a peak. When one foot portion of the peak converges more gradually than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a convex portion. Alternatively, when one foot portion of the peak converges more steeply than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a concave portion.
摘要翻译：适用于确定在样品上形成的线和空间图案的凹凸的方法和装置。基于带电粒子束扫描形成轮廓，轮廓具有峰值。当峰的一个脚部比另一个脚部更加逐渐收敛时，与一个脚部相对应的部分样本被确定为凸部。或者，当峰的一个脚部比另一个脚部收敛得更陡峭时，与一个脚部对应的样本的一部分被确定为凹部。

5. 发明授权

US07180062B2 Pattern measuring method 有权
公开(公告)号：US07180062B2
公开(公告)日：2007-02-20
申请号：US11066219
申请日：2005-02-28
申请人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
发明人： Fumihiro Sasajima , Yoshihiro Kimura , Osamu Komuro
IPC分类号： H01J37/49
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.

6. 发明授权

US08953855B2 Edge detection technique and charged particle radiation equipment 有权
标题翻译：边缘检测技术和带电粒子辐射设备
公开(公告)号：US08953855B2
公开(公告)日：2015-02-10
申请号：US12393321
申请日：2009-02-26
申请人： Hitoshi Namai , Osamu Komuro , Satoru Yamaguchi , Fumihiro Sasajima
发明人： Hitoshi Namai , Osamu Komuro , Satoru Yamaguchi , Fumihiro Sasajima
IPC分类号： G06K9/00 , G06K9/46 , G06T7/00
CPC分类号： G06K9/4609 , G06T7/13
摘要： An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).
摘要翻译：本发明的目的是提供一种能够通过抑制噪声的影响来稳定地检测边缘的边缘检测技术和设备，即使在通过诸如扫描电子显微镜的带电粒子辐射设备获得图像的情况下并具有较低的S / N比。更具体地，本发明是提出一种被配置为基于以下两个边缘提取技术来确定峰值位置（边缘）的技术和设备。也就是说，本发明提出一种技术和设备，其中通过使用作为边缘检测技术的至少两个峰形成例如具有相对较高灵敏度的一个峰值检测技术和相对较少的另一个峰值检测技术容易受到噪声的影响而不是一个峰值检测技术，并且其中峰值彼此重合的位置被确定为真正的峰值位置（边缘位置）。

7. 发明申请

US20070290697A1 Microstructured pattern inspection method 有权
标题翻译：微结构图案检验方法
公开(公告)号：US20070290697A1
公开(公告)日：2007-12-20
申请号：US11798395
申请日：2007-05-14
申请人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
发明人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
IPC分类号： G01N23/00
CPC分类号： G03F7/70608 , G01N23/225 , G06T7/0004 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2487
摘要： The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
摘要翻译：相对于由步进器暴露的微结构化图案检测掩模版的边缘，并且检测光致抗蚀剂表面和底部处的微结构图案的形状。通过在屏幕上计算和显示代表光刻胶表面和底部上检测到的图案之间的位置关系的位错矢量来评估微结构化图案。此外，同样计算单芯片或单次照射区域或一个晶片上的多个位置处的微结构化图案之间的位错矢量，则将每个这样的位置处的位错矢量的尺寸和分布状态分类为特征量，并且分析相应的趋势。因此，检测到步进器或晶片异常。

8. 发明授权

US06936819B2 Microstructured pattern inspection method 有权
公开(公告)号：US06936819B2
公开(公告)日：2005-08-30
申请号：US10857956
申请日：2004-06-02
申请人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
发明人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
IPC分类号： H01L21/027 , B32B3/00 , G01B11/00 , G01N23/225 , G01Q30/02 , G01Q30/04 , G03F7/20 , H01L21/66 , G01N23/00
CPC分类号： G03F7/70608 , G01N23/225 , G06T7/0004 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2487
摘要： The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.

9. 发明授权

US06573499B1 Microstructured pattern inspection method 有权
标题翻译：微结构图案检验方法
公开(公告)号：US06573499B1
公开(公告)日：2003-06-03
申请号：US09684469
申请日：2000-10-06
申请人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
发明人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
IPC分类号： G01N23225
CPC分类号： G03F7/70608 , G01N23/225 , G06T7/0004 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2487
摘要： The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot. area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
摘要翻译：相对于由步进器暴露的微结构化图案检测掩模版的边缘，并且检测光致抗蚀剂表面和底部处的微结构图案的形状。通过在屏幕上计算和显示代表光刻胶表面和底部上检测到的图案之间的位置关系的位错矢量来评估微结构化图案。此外，在单芯片或单次拍摄的多个位置处的微结构化图案之间的位错矢量。同样计算一个晶片上的面积，然后将每个这样的位置处的位错矢量的尺寸和分布状态分类为特征量，并分析相应的趋势。因此，检测到步进器或晶片异常。

10. 发明申请

US20090226096A1 EDGE DETECTION TECHNIQUE AND CHARGED PARTICLE RADIATION EQUIPMENT 有权
标题翻译：边缘检测技术和充电颗粒辐射设备
公开(公告)号：US20090226096A1
公开(公告)日：2009-09-10
申请号：US12393321
申请日：2009-02-26
申请人： Hitoshi NAMAI , Osamu Komuro , Satoru Yamaguchi , Fumihiro Sasajima
发明人： Hitoshi NAMAI , Osamu Komuro , Satoru Yamaguchi , Fumihiro Sasajima
IPC分类号： G06K9/48
CPC分类号： G06K9/4609 , G06T7/13
摘要： An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).
摘要翻译：本发明的目的是提供一种能够通过抑制噪声的影响来稳定地检测边缘的边缘检测技术和设备，即使在通过诸如扫描电子显微镜的带电粒子辐射设备获得图像的情况下并具有较低的S / N比。更具体地，本发明是提出一种被配置为基于以下两个边缘提取技术来确定峰值位置（边缘）的技术和设备。也就是说，本发明提出一种技术和设备，其中通过使用作为边缘检测技术的至少两个峰形成例如具有相对较高灵敏度的一个峰值检测技术和相对较少的另一个峰值检测技术容易受到噪声的影响而不是一个峰值检测技术，并且其中峰值彼此一致的位置被确定为真正的峰值位置（边缘位置）。

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