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    • 3. 发明授权
    • Inspection device for detecting defects in a periodic pattern on a
semiconductor wafer
    • 用于检测半导体晶片周期性图案中的缺陷的检查装置
    • US5170063A
    • 1992-12-08
    • US661140
    • 1991-02-27
    • Yoko MiyazakiHitoshi TanakaNobuyuki KosakaToshimasa Tomoda
    • Yoko MiyazakiHitoshi TanakaNobuyuki KosakaToshimasa Tomoda
    • G01N21/88G01N21/956G03H1/00G06T1/00
    • G01N21/95623G03H1/00
    • An inspection device for detecting defects in a periodic pattern on a semiconductor wafer includes a laser oscillator. In the exposure process, light emitted from the laser oscillator is divided into a subject beam and a reference beam. The subject beam is guided to a semiconductor wafer having a periodic pattern thereon by mirrors and a beam expander. The light scattered from the specimen is collected by a lens on a photographic plate. The reference beam is guided to the photographic plate via a second beam expander and another mirror. The intensity of the reference beam is adjusted to a level at which the reference beams interferes on the photographic plate with the light scattered from defects in the periodic pattern and collected by the lens. Thus, a hologram of the defects in the pattern is recorded on the photographic plate. After development, the photographic plate is returned to its original position and used to form a holographic image of the defects with a transmitted regeneration light beam.
    • 用于检测半导体晶片周期性图案中的缺陷的检查装置包括激光振荡器。 在曝光过程中,从激光振荡器发射的光被分成目标光束和参考光束。 目标光束通过反射镜和光束扩展器被引导到其上具有周期性图案的半导体晶片。 从样本散射的光由照相板上的透镜收集。 参考光束通过第二光束扩展器和另一个反射镜被引导到照相板。 参考光束的强度被调整到参考光束干涉照相板的水平,其中光从周期性图案中的缺陷散射并由透镜收集。 因此,图案上的缺陷的全息图被记录在照相板上。 在显影之后,照相板返回其原始位置,并用于通过发射的再生光束形成缺陷的全息图像。
    • 4. 发明授权
    • System for detecting minute particles on or above a substrate
    • 用于检测基板上或上方的微小颗粒的系统
    • US5008558A
    • 1991-04-16
    • US373801
    • 1989-06-29
    • Masao KoshinakaMinoru AkiyamaHitoshi TanakaToshimasa Tomoda
    • Masao KoshinakaMinoru AkiyamaHitoshi TanakaToshimasa Tomoda
    • G01N21/88G01N15/02G01N15/14G01N21/89G01N21/94G01N21/95G01N21/956H01L21/66
    • G01N21/94G01N2015/0238G01N2021/8909G01N2021/945G01N21/9501
    • A fine-particle measuring apparatus designed to measure fine particles attached to the surface of a substrate for a semiconductor device set in a processing unit for formation of films, etching, cleaning, etc. and fine particles suspended in the space above the substrate surface by the use of scattering of a laser beam caused by these fine particles. The measuring apparatus comprises a laser beam scanning mechanism for irradiating a measuring space with a laser beam the angular position of which is minutely modulated at a predetermined frequency, a photodetector which receives light scattered by a fine particle and converts the received light into an electrical signal, and a signal processor which extracts from the electrical signal output by the photodetector a signal component whose frequency is the same as or double that of a modulating signal for the minute scanning with the laser beam and which has a constant phase difference in terms of time with respect to the modulating signal. Thus, it is possible to measure fine particles with high sensitivity without substantially disturbing the environment inside the process unit or the process itself.
    • 一种微粒测量装置,被设计用于测量附着在用于形成膜,蚀刻,清洁等的处理单元中的用于半导体器件的基板的表面的细颗粒,以及悬浮在基板表面上方的空间中的细颗粒 使用由这些细颗粒引起的激光束的散射。 该测量装置包括:激光束扫描机构,用于以预定频率微调其角度位置的激光束照射测量空间;光电检测器,其接收由微粒散射的光并将接收的光转换成电信号 以及信号处理器,其从由光电检测器输出的电信号中提取频率与用于用激光束进行微小扫描的调制信号的频率相同或者是两倍的信号分量,并且其在时间上具有恒定的相位差 相对于调制信号。 因此,可以以高灵敏度测量细颗粒,而基本上不会干扰处理单元内的环境或过程本身。
    • 9. 发明授权
    • Varistor and method for manufacturing varistor
    • 压敏电阻及其制造方法
    • US08471673B2
    • 2013-06-25
    • US13545505
    • 2012-07-10
    • Hitoshi TanakaKatsunari MoriaiTakahiro Itami
    • Hitoshi TanakaKatsunari MoriaiTakahiro Itami
    • H01C7/10
    • H01C1/14H01C7/00H01C7/10H01C17/28Y10T29/49082Y10T29/49085
    • A varistor is provided with a varistor element body, a plurality of internal electrodes arranged in the varistor element body so as to sandwich a partial region of the varistor element body between them, and a plurality of external electrodes arranged on the surface of the varistor element body and connected to the corresponding internal electrodes. The external electrode has a sintered electrode layer formed by attaching an electroconductive paste containing an alkali metal to the surface of the varistor element body and sintering it. The varistor element body has a high-resistance region formed by diffusing the alkali metal in the electroconductive paste into the varistor element body from an interface between the surface of the varistor element body and the sintered electrode layer.
    • 变阻器设置有可变电阻元件主体,多个内部电极,布置在可变电阻元件主体中,以将可变电阻元件主体的局部区域夹在它们之间;以及多个外部电极,布置在可变电阻元件的表面上 并连接到相应的内部电极。 外部电极具有烧结电极层,该烧结电极层通过将含有碱金属的导电膏附着到可变电阻元件体的表面并烧结而形成。 可变电阻元件体具有通过将可变电阻元件体的表面与烧结电极层之间的界面将导电浆中的碱金属扩散到可变电阻元件体中而形成的高电阻区域。