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    • 5. 发明授权
    • Charged particle beam device, defect observation device, and management server
    • 带电粒子束装置,缺陷观察装置和管理服务器
    • US08779360B2
    • 2014-07-15
    • US13809923
    • 2011-06-22
    • Kozo MiyakeJunko KonishiTakehiro HiraiKenji Obara
    • Kozo MiyakeJunko KonishiTakehiro HiraiKenji Obara
    • H01J37/153
    • H01J37/153G01N23/00H01J37/28H01J2237/24592H01J2237/2817
    • Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
    • 提供了一种带电粒子束装置,其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化(例如,忽视缺陷)引起的加工故障的增加 样品的处理顺序并实时提供反馈。 在带电粒子束装置的每个处理步骤中,监视表示装置的运行状态(电子束的控制状态,晶片定位时的偏移量,缺陷坐标误差偏移量等)的监视项目 在样品的处理顺序期间并存储为历史信息。 在处理顺序的中间,根据预先设定的判断基准,进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。 当过去历史信息的波动宽度偏离参考范围时,发出警报。
    • 6. 发明申请
    • CHARGED PARTICLE BEAM DEVICE, DEFECT OBSERVATION DEVICE, AND MANAGEMENT SERVER
    • 充电颗粒光束装置,缺陷观察装置和管理服务器
    • US20130112893A1
    • 2013-05-09
    • US13809923
    • 2011-06-22
    • Kozo MiyakeJunko KonishiTakehiro HiraiKenji Obara
    • Kozo MiyakeJunko KonishiTakehiro HiraiKenji Obara
    • G01N23/00
    • H01J37/153G01N23/00H01J37/28H01J2237/24592H01J2237/2817
    • Provided is a charged particle beam device that prevents the increase in processing trouble caused by deterioration in the reviewing performance (e.g., overlooking of defects) by detecting an operation abnormality affecting the performance of the device or a possibility of such an abnormality in the middle of a processing sequence of a sample and giving a feedback in real time. In each processing step of the charged particle beam device, monitoring items representing the operating status of the device (control status of the electron beam, an offset amount at the time of wafer positioning, a defect coordinate error offset amount, etc.) are monitored during the processing sequence of a sample and stored as history information. In the middle of the processing sequence, a comparative judgment between the value of each monitoring item and the past history information corresponding to the monitoring item is made according to preset judgment criteria. When the width of fluctuation from the past history information deviates from a reference range, an alert is issued.
    • 提供了一种带电粒子束装置,其通过检测影响装置的性能的操作异常或在中间的这种异常的可能性来防止由于检查性能的劣化(例如,忽视缺陷)引起的加工故障的增加 样品的处理顺序并实时提供反馈。 在带电粒子束装置的每个处理步骤中,监视表示装置的运行状态(电子束的控制状态,晶片定位时的偏移量,缺陷坐标误差偏移量等)的监视项目 在样品的处理顺序期间并存储为历史信息。 在处理顺序的中间,根据预先设定的判断基准,进行各监视项目的值与对应于监视项目的过去历史信息的比较判断。 当过去历史信息的波动宽度偏离参考范围时,发出警报。