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1. 发明申请

US20100101601A1 CLEANING EQUIPMENT AND CLEANING METHOD OF DEPOSITION MASK 失效
标题翻译：清洗设备和清洁方法沉积掩模
公开(公告)号：US20100101601A1
公开(公告)日：2010-04-29
申请号：US12551821
申请日：2009-09-01
申请人： Yoichi TAKAHARA , Fumio Kataoka , Kenji Yumiba , Kenji Katagiri , Ryo Izaki
发明人： Yoichi TAKAHARA , Fumio Kataoka , Kenji Yumiba , Kenji Katagiri , Ryo Izaki
IPC分类号： B08B3/00 , B08B7/04
CPC分类号： H01L21/67028
摘要： Equipment is realized which is capable of increasing the frequency of use of a deposition mask of an organic EL element and the recycle of an adhesive agent by efficiently cleaning the deposition mask with little damage and efficiently collecting the adhesive agent. A pulse laser is irradiated to a deposition mask to separate the deposition agent from the deposition mask. The separated deposition agent is sucked by a suction nozzle, and the deposition agent is separated from air by a cyclone and deposited on a bottom of the cyclone. Thereafter, a first valve is opened to collect the deposition agent in a deposition agent collection section. Then a second valve is opened to move the deposition agent to a deposition agent refining section to be refined. A third valve is opened to store the refined deposition agent in a deposition agent storage section. The deposition mask may be cleaned without being damaged to collect the deposition agent with high efficiency.
摘要翻译：实现了能够通过有效地清洁沉积掩模并且有效地收集粘合剂来增加有机EL元件的沉积掩模的使用频率和粘合剂的再循环的设备。将脉冲激光照射到沉积掩模以将沉积剂与沉积掩模分离。分离的沉积剂通过吸嘴吸入，并且沉积剂通过旋风分离器与空气分离并沉积在旋风分离器的底部。此后，打开第一阀门以将沉积剂收集在沉积剂收集部分中。然后打开第二个阀，以将沉积剂移动到要精炼的沉积剂精炼部分。第三阀被打开以将精制的沉积剂存储在沉积剂储存部分中。可以清洁沉积掩模而不损坏以高效率收集沉积剂。

2. 发明授权

US08182610B2 Cleaning equipment and cleaning method of deposition mask 失效
标题翻译：清洗设备和沉积掩模的清洗方法
公开(公告)号：US08182610B2
公开(公告)日：2012-05-22
申请号：US12551821
申请日：2009-09-01
申请人： Yoichi Takahara , Fumio Kataoka , Kenji Yumiba , Kenji Katagiri , Ryo Izaki
发明人： Yoichi Takahara , Fumio Kataoka , Kenji Yumiba , Kenji Katagiri , Ryo Izaki
IPC分类号： B08B5/04
CPC分类号： H01L21/67028
摘要： Equipment is realized which is capable of increasing the frequency of use of a deposition mask of an organic EL element and the recycle of an adhesive agent by efficiently cleaning the deposition mask with little damage and efficiently collecting the adhesive agent. A pulse laser is irradiated to a deposition mask to separate the deposition agent from the deposition mask. The separated deposition agent is sucked by a suction nozzle, and the deposition agent is separated from air by a cyclone and deposited on a bottom of the cyclone. Thereafter, a first valve is opened to collect the deposition agent in a deposition agent collection section. Then a second valve is opened to move the deposition agent to a deposition agent refining section to be refined. A third valve is opened to store the refined deposition agent in a deposition agent storage section. The deposition mask may be cleaned without being damaged to collect the deposition agent with high efficiency.
摘要翻译：实现了能够通过有效地清洁沉积掩模并且有效地收集粘合剂来增加有机EL元件的沉积掩模的使用频率和粘合剂的再循环的设备。将脉冲激光照射到沉积掩模以将沉积剂与沉积掩模分离。分离的沉积剂通过吸嘴吸入，并且沉积剂通过旋风分离器与空气分离并沉积在旋风分离器的底部。此后，打开第一阀门以将沉积剂收集在沉积剂收集部分中。然后打开第二个阀，以将沉积剂移动到要精炼的沉积剂精炼部分。第三阀被打开以将精制的沉积剂存储在沉积剂储存部分中。可以清洁沉积掩模而不损坏以高效率收集沉积剂。

3. 发明授权

US4554237A Photosensitive resin composition and method for forming fine patterns with said composition 失效
标题翻译：光敏树脂组合物和用所述组合物形成精细图案的方法
公开(公告)号：US4554237A
公开(公告)日：1985-11-19
申请号：US452198
申请日：1982-12-22
申请人： Fumio Kataoka , Fusaji Shoji , Hitoshi Yokono , Daisuke Makino , Shigeru Koibuchi , Asao Isobe
发明人： Fumio Kataoka , Fusaji Shoji , Hitoshi Yokono , Daisuke Makino , Shigeru Koibuchi , Asao Isobe
IPC分类号： G03C1/72 , G03F7/008 , G03C1/52 , G03C1/60 , G03C5/16
CPC分类号： G03F7/008 , Y10S430/128
摘要： Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after development and a method for forming fine patterns with said composition.Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): ##STR1## [wherein X is --N.sub.3 or --SO.sub.2 N.sub.3, Y is ##STR2## R.sup.1 is a lower alkylene such as --CH.sub.2 CH.sub.2 --, --CH.sub.2 CH.sub.2 CH.sub.2 --, or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 CH.sub.2 --, a hydroxyalkylene or an aminoalkylene such as ##STR3## (wherein R.sup.4 and R.sup.5 are lower alkyl or hydrogen, R.sup.6 -R.sup.8 are lower alkyl groups, R.sup.3 is hydrogen, a lower alkyl group or --CH.sub.2 CH.sub.2 O).sub.n R.sup.9 wherein n is an integer of 3 or less and R.sup.9 is hydrogen or a lower alkyl group)].
摘要翻译：公开了用于在半导体器件上形成精细图案的光敏树脂组合物，具有高度敏感性和显影性优异的并且没有问题，例如显影后的叠氮化合物和剩余的叠氮化物颗粒的沉淀，以及方法用于用所述组合物形成精细图案。所述光敏树脂组合物包含（a）至少一种选自酚醛清漆树脂和聚羟基苯乙烯树脂的聚合物化合物和（b）由通式（1）表示的叠氮化合物：其中 X是-N3或-SO2N3，Y是低级亚烷基，例如-CH2CH2-，-CH2CH2CH2-或-CH2CH2OCH2CH2CH2-，羟基亚烷基或氨基亚烷基，例如

4. 发明授权

US4513132A Heat-resistant silicone block polymer 失效
标题翻译：耐热硅胶聚合物
公开(公告)号：US4513132A
公开(公告)日：1985-04-23
申请号：US480789
申请日：1983-03-31
申请人： Fusaji Shoji , Issei Takemoto , Fumio Kataoka , Hitoshi Yokono , Tokio Isogai
发明人： Fusaji Shoji , Issei Takemoto , Fumio Kataoka , Hitoshi Yokono , Tokio Isogai
IPC分类号： C08G77/00 , C08G77/42 , C08G77/44 , C08G77/52 , C08G77/06
CPC分类号： C08G77/52 , C08G77/44
摘要： Heat-resistant silicone block polymer with a good flexibility obtained by reaction of an organosilsesquioxane with a silicone compound or organosiloxane in the presence of a basic catalyst in an organic solvent.
摘要翻译：通过有机倍半硅氧烷与有机硅化合物或有机硅氧烷在碱性催化剂存在下在有机溶剂中反应而获得的具有良好柔软性的耐热硅氧烷嵌段聚合物。

5. 发明授权

US06319656B1 Photosensitive polyimide precursor and its use for pattern formation 失效
标题翻译：光敏聚酰亚胺前体及其用于图案形成
公开(公告)号：US06319656B1
公开(公告)日：2001-11-20
申请号：US09455929
申请日：1999-12-07
申请人： Haruhiko Kikkawa , Fumio Kataoka , Issei Takemoto , Jun Tanaka , Keiko Isoda , Shunichiro Uchimura , Makoto Kaji , Minoru Sugiura
发明人： Haruhiko Kikkawa , Fumio Kataoka , Issei Takemoto , Jun Tanaka , Keiko Isoda , Shunichiro Uchimura , Makoto Kaji , Minoru Sugiura
IPC分类号： G03F730
CPC分类号： C08G73/1025 , C08G73/10 , G03F7/0387
摘要： A polyimide precursor having repeating units of the formula: wherein R1 is a tetravalent organic group having 4 or more carbon atoms; R2 is a trivalent or tetravalent organic group having one or more aromatic rings; R3 is a monovalent organic group; A is a monovalent group showing acidity; and n is an integer of 1 or 2, is effective for preparing a highly sensitive negative-working photosensitive material developable with an alkaline aqueous solution in a short time with high resolution.
摘要翻译：一种具有下式重复单元的聚酰亚胺前体：其中R1是具有4个或更多个碳原子的四价有机基团; R2是具有一个或多个芳环的三价或四价有机基团; R3是一价有机基团; A是显示酸度的一价基团; n为1或2的整数，能够以高分辨率在短时间内制备用碱性水溶液显影的高敏感性负性感光性物质。

6. 发明授权

US5753372A Wiring structures and method of manufacturing the same 失效
标题翻译：接线结构及其制造方法
公开(公告)号：US5753372A
公开(公告)日：1998-05-19
申请号：US500157
申请日：1995-07-10
申请人： Hideo Sotokawa , Miharu Otani , Fumio Kataoka , Fusaji Shoji , Haruhiko Matsuyama , Eiji Matsuzaki , Shogi Ikeda , Hidetaka Shigi , Tetsuya Yamazaki , Naoki Matsushima , Shirou Akamatsu
发明人： Hideo Sotokawa , Miharu Otani , Fumio Kataoka , Fusaji Shoji , Haruhiko Matsuyama , Eiji Matsuzaki , Shogi Ikeda , Hidetaka Shigi , Tetsuya Yamazaki , Naoki Matsushima , Shirou Akamatsu
IPC分类号： H01L21/312 , H01L21/3205 , H01L21/768 , H01L23/532 , H05K1/00 , H05K1/03 , H05K3/46 , B32B9/04
CPC分类号： H01L21/76801 , H01L21/312 , H01L21/32056 , H01L21/76838 , H01L23/5329 , H01L2924/0002 , H05K1/0346 , H05K3/4647 , H05K3/4676 , Y10T428/24802 , Y10T428/31504 , Y10T428/31678 , Y10T428/31721
摘要： The present invention provides the wiring structure having a wiring layer and insulation layer and the method of manufacturing the same, wherein at least a part of the wiring of said wiring layer comprises copper, and said insulation layer comprises the polyimide obtained by heating the polyimide precursor composition containing the polyimide precursor having the repeating unit which can be represented by the following general formula (Chemical formula 15). ##STR1## (In this formula, R.sup.1 is at least one type of quadrivalent organic group selected from among the Chemical formulae 16, while R.sup.2 is a bivalent organic group containing aromatic ring).
摘要翻译：本发明提供具有布线层和绝缘层的布线结构及其制造方法，其中所述布线层的布线的至少一部分包括铜，并且所述绝缘层包括通过加热聚酰亚胺前体获得的聚酰亚胺含有具有可以由以下通式表示的重复单元的聚酰亚胺前体的组合物（化学式15）。（化学式15）（化学式16）选自化学式16中的四价有机基团的类型，而R2是含有芳香环的二价有机基团）。

7. 发明授权

US5851681A Wiring structure with metal wiring layers and polyimide layers, and fabrication process of multilayer wiring board 失效
标题翻译：带有金属布线层和聚酰亚胺层的布线结构，以及多层布线板的制造工艺
公开(公告)号：US5851681A
公开(公告)日：1998-12-22
申请号：US212766
申请日：1994-03-15
申请人： Haruhiko Matsuyama , Eiji Matsuzaki , Shozi Ikeda , Fumio Kataoka , Fusaji Shoji
发明人： Haruhiko Matsuyama , Eiji Matsuzaki , Shozi Ikeda , Fumio Kataoka , Fusaji Shoji
IPC分类号： C08G73/10 , G11B5/17 , G11B5/31 , H01L23/498 , H05K1/00 , G11B5/40 , C08G69/26
CPC分类号： H01L23/49894 , C08G73/10 , G11B5/313 , H05K3/4676 , G11B5/17 , G11B5/3109 , H01L2924/0002 , H05K2201/0154 , Y10T428/1193 , Y10T428/24917 , Y10T428/31681 , Y10T428/31721
摘要： This invention relates to a wiring structure having metal wiring layers and polyimide layers. An object of this invention is to overcome problems caused by oxidation of a metal surface, such as an increase in the resistance of wiring and a reduction in insulation, by preventing a reaction between a metal of the wiring layers, such as copper, and carboxyl groups of polyamic acid which make up the polyimide layers. In the wiring structure according to the present invention, the polyimide layers have been formed by heating and curing a resin composition which comprises a polyimide precursor, an amine compound and an organic solvent.
摘要翻译：本发明涉及具有金属布线层和聚酰亚胺层的布线结构。本发明的目的是通过防止诸如铜的布线层的金属和羧基之间的反应来克服金属表面的氧化引起的问题，例如布线电阻的增加和绝缘的减少组成聚酰亚胺层的聚酰胺酸组。在根据本发明的布线结构中，通过加热和固化包含聚酰亚胺前体，胺化合物和有机溶剂的树脂组合物，形成聚酰亚胺层。

8. 发明授权

US4727185A Process for preparation of 3,3',4,4'-biphenyltetracarboxylic acid salts 失效
标题翻译：制备3,3'，4,4'-联苯四羧酸盐的方法
公开(公告)号：US4727185A
公开(公告)日：1988-02-23
申请号：US820629
申请日：1986-01-21
申请人： Fusaji Shoji , Fumio Kataoka
发明人： Fusaji Shoji , Fumio Kataoka
IPC分类号： C07C63/331 , B01J31/00 , C07B61/00 , C07C51/00 , C07C51/347 , C07C67/00
CPC分类号： C07C51/347
摘要： When a 4-halogenoorthophthalic acid salt is dissolved together with a base in an alkaline aqueous solution and the solution is heated in the presence of a catalyst comprising a noble metal supported on a carrier, a formic acid salt and a small amount of an aliphatic compound containing a hydroxyl group, a 3,3',4,4'-biphenyltetracarboxylic acid salt is obtained in a high yield.
摘要翻译：当将4-卤代邻苯二甲酸盐与碱溶解在碱性水溶液中时，在负载在载体上的贵金属的催化剂，甲酸盐和少量的脂肪族化合物含有羟基，高收率地得到3,3'，4,4'-联苯四羧酸盐。

9. 发明授权

US4667534A Limited slip differential gear mechanism 失效
标题翻译：有限滑差差齿轮机构
公开(公告)号：US4667534A
公开(公告)日：1987-05-26
申请号：US788970
申请日：1985-10-18
申请人： Fumio Kataoka
发明人： Fumio Kataoka
IPC分类号： F16D7/02 , F16D13/64 , F16D13/74 , F16H20060101 , F16H48/22 , F16H
CPC分类号： F16H48/22 , F16H48/08
摘要： A limited slip differential gear mechanism includes a pinion shaft rotating integrally with a differential gear casing, pinion gears attached rotatably to the pinion shaft, side gears engaged with the pinion gears and splined to axles, and a plurality of first and second clutch plates alternately disposed between the side gears and the differential gear casing. A lug portion provided on the inner surface of each first clutch plate engages with the outer surface of the side gear, while a lug portion provided on the outer surface of each second clutch plate engages with the inner surface of the differential gear casing. Concave portions or projections are formed between the first and second plates in contact with each other to define gaps for retaining lubricating oil.
摘要翻译：限滑差速齿轮机构包括与差速齿轮箱整体旋转的小齿轮轴，可旋转地附接到小齿轮轴的小齿轮，与小齿轮啮合并与花键轴相配合的侧齿轮，以及交替布置的多个第一和第二离合器板在侧齿轮和差速齿轮箱之间。设置在每个第一离合器片的内表面上的凸耳部分与侧齿轮的外表面接合，而设置在每个第二离合器片的外表面上的凸耳部分与差速齿轮箱的内表面接合。在第一和第二板之间形成凹陷部分或突起以彼此接触以限定用于保持润滑油的间隙。

10. 发明授权

US4565767A Light-sensitive polymer composition with poly(amic acid), bisazide, and tertiary amine compound 失效
标题翻译：具有聚（酰胺酸），双叠氮化物和叔胺化合物的光敏聚合物组合物
公开(公告)号：US4565767A
公开(公告)日：1986-01-21
申请号：US603451
申请日：1984-04-24
申请人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Issei Takemoto , Hitoshi Yokono , Tokio Isogai , Mitsumasa Kojima
发明人： Fumio Kataoka , Fusaji Shoji , Isao Obara , Issei Takemoto , Hitoshi Yokono , Tokio Isogai , Mitsumasa Kojima
IPC分类号： C08F290/00 , C08F299/00 , C08G73/00 , C08G73/02 , C08G73/10 , C08L79/08 , G03F7/012 , G03F7/038 , G03F7/26 , H01L21/312 , H01L21/47 , G03C1/71
CPC分类号： C08L79/08 , G03F7/0125 , Y10S430/12 , Y10S430/128
摘要： A light-sensitive polymer composition comprising a poly(amic acid), a special bisazide compound and an amine compound can give a film which has high sensitivity and in which portions exposed to light are not easily released by a developing solution at the time of development.
摘要翻译：包含聚（酰胺酸），特殊双叠氮化合物和胺化合物的光敏聚合物组合物可以产生具有高灵敏度的膜，并且其中暴露于光的部分在显影时不容易被显影溶液释放。

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