会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Methods for fabricating a magnetic recording device
    • 制造磁记录装置的方法
    • US07785666B1
    • 2010-08-31
    • US11955266
    • 2007-12-12
    • Hai SunLiubo HongHongping YuanYizhong WangWinnie YuXianzhong Zeng
    • Hai SunLiubo HongHongping YuanYizhong WangWinnie YuXianzhong Zeng
    • B05D1/32
    • G11B5/855B82Y10/00B82Y40/00G03F7/0002
    • A method and system for fabricating a magnetic recording device are described. The method and system include providing a mask layer on the magnetic recording device and imprinting a pattern in the mask layer to form a mask. The method and system also include transferring the pattern from the mask to the magnetic recording device. In another aspect, the method and system include providing a malleable mask layer on the magnetic recording device. In this aspect, the method and system also include depressing an imprint mask into the mask layer and curing the mask layer while the imprint mask is depressed into the mask layer to provide a mask having a pattern. The pattern may correspond to a read sensor and/or a perpendicular magnetic recording pole. The method and system also include transferring the pattern from the mask to the magnetic recording device.
    • 描述了用于制造磁记录装置的方法和系统。 所述方法和系统包括在磁记录装置上设置掩模层并在掩模层中印刷图案以形成掩模。 该方法和系统还包括将图案从掩模转移到磁记录装置。 在另一方面,该方法和系统包括在磁记录装置上提供可延展的掩模层。 在这方面,该方法和系统还包括将印模掩模压入掩模层中并固化掩模层,同时将印模掩模压入掩模层中以提供具有图案的掩模。 图案可以对应于读取传感器和/或垂直磁记录极。 该方法和系统还包括将图案从掩模转移到磁记录装置。
    • 6. 发明授权
    • Method for providing a perpendicular magnetic recording head
    • 提供垂直磁记录头的方法
    • US08793866B1
    • 2014-08-05
    • US11960596
    • 2007-12-19
    • Jinqiu ZhangLiubo HongYong ShenYizhong WangHai SunLi He
    • Jinqiu ZhangLiubo HongYong ShenYizhong WangHai SunLi He
    • G11B5/187C23C14/22
    • G11B5/3163G11B5/1278G11B5/3116
    • A method provides a PMR transducer. In one aspect, the method includes forming a trench in an intermediate layer using reactive ion etch(es). The trench top is wider than its bottom. In this aspect, the method also includes providing a seed layer using atomic layer deposition and providing a PMR pole on the seed layer. Portion(s) of the seed layer and PMR pole reside in the trench. In another aspect, the method includes providing a mask including a trench having a top wider than its bottom. In this aspect, the method includes providing mask material in the trench, providing an intermediate layer on the mask material and removing the mask material to provide another trench in the intermediate layer. In this aspect, the method also includes providing a PMR pole in the additional trench.
    • 一种方法提供PMR换能器。 一方面,该方法包括使用反应离子蚀刻在中间层中形成沟槽。 沟槽顶部比底部宽。 在这方面,该方法还包括使用原子层沉积提供种子层并在种子层上提供PMR极点。 种子层和PMR极的部分位于沟槽中。 在另一方面,该方法包括提供一种掩模,该掩模包括具有比其底部更宽的顶部的沟槽。 在这方面,该方法包括在沟槽中提供掩模材料,在掩模材料上提供中间层并去除掩模材料以在中间层中提供另一个沟槽。 在这方面,该方法还包括在附加沟槽中提供PMR极点。