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    • 4. 发明申请
    • Latch circuit and flip-flop
    • 锁存电路和触发器
    • US20070132495A1
    • 2007-06-14
    • US11520165
    • 2006-09-13
    • Yil YangJong KimTae RohDae Lee
    • Yil YangJong KimTae RohDae Lee
    • H03K3/00
    • H03K19/0013H03K3/356156H03K3/356182
    • A high-reliability, multi-threshold complementary metal oxide semiconductor (CMOS) latch circuit having low sub-threshold leakage current is provided. More particularly, a latch circuit and flip-flop that can be applied in the deep sub-micron era and that are entirely configured of only CMOS using a combination of a high threshold device and a low threshold device and a low-threshold-voltage stack structure, without using a power gating technique such as multi-threshold CMOS (MTCMOS) and a back bias voltage control technique such as variable threshold CMOS (VTCMOS), are provided. The multi-threshold latch circuit includes: a forward clock inverter including a low threshold transistor only and inverting an input-terminal logic state and applying the inverted logic state to an output-terminal logic state when a clock is in a first logic state; and a backward clock inverter including a high threshold transistor, forming a circular latch structure together with the forward clock inverter, and inverting an input-terminal logic state and applying the inverted logic state to an output logic state when the clock is in a second logic state.
    • 提供了具有低亚阈值泄漏电流的高可靠性,多阈值互补金属氧化物半导体(CMOS)锁存电路。 更具体地,可以应用于深亚微米时代的锁存电路和触发器,并且仅使用高阈值器件和低阈值器件和低阈值电压堆叠的组合的CMOS构成 结构,而不使用诸如多阈值CMOS(MTCMOS)的功率门控技术和诸如可变阈值CMOS(VTCMOS)的背偏压控制技术。 多阈值锁存电路包括:正时时钟反相器,其仅在低阈值晶体管和反相输入端逻辑状态下进行反相,并且当时钟处于第一逻辑状态时将反相逻辑状态应用于输出端逻辑状态; 以及包括高阈值晶体管的反向时钟反相器,与正向时钟反相器一起形成圆形锁存结构,并且当时钟处于第二逻辑时反相输入端逻辑状态并将反相逻辑状态应用于输出逻辑状态 州。
    • 6. 发明申请
    • Multiple-gate MOS transistor and a method of manufacturing the same
    • 多门MOS晶体管及其制造方法
    • US20050263821A1
    • 2005-12-01
    • US10989006
    • 2004-11-16
    • Young ChoSung KwonTae RohDae LeeJong Kim
    • Young ChoSung KwonTae RohDae LeeJong Kim
    • H01L21/336H01L27/12H01L29/786
    • H01L29/785H01L29/66818
    • Provided is a multiple-gate metal oxide semiconductor (MOS) transistor and a method for manufacturing the same, in which a channel is implemented in a streamline shape, an expansion region is implemented in a gradually increased form, and source and drain regions is implemented in an elevated structure by using a difference of a thermal oxidation rate depending on a crystal orientation of silicon and a geographical shape of the single-crystal silicon pattern. As the channel is formed in a streamline shape, it is possible to prevent the degradation of reliability due to concentration of an electric field and current driving capability by the gate voltage is improved because the upper portion and both sides of the channel are surrounded by the gate electrodes. In addition, a current crowding effect is prevented due to the expansion region increased in size and source and drain series resistance is reduced by elevated source and drain structures, thereby increasing the current driving capability.
    • 提供一种多栅极金属氧化物半导体(MOS)晶体管及其制造方法,其中以流线形状实现沟道,扩展区域以逐渐增加的形式实现,并且实现源极和漏极区域 通过使用取决于硅的晶体取向的热氧化速率的差异和单晶硅图案的地理形状,在升高的结构中。 由于通道形成为流线形状,所以可以防止由于电场集中引起的可靠性的劣化,由于栅极电压的电流驱动能力得到改善,因为通道的上部和两侧被 栅电极。 此外,由于扩大区域的尺寸增加,阻止了电流拥挤效应,并且通过升高的源极和漏极结构降低了源极和漏极串联电阻,从而增加了电流驱动能力。
    • 7. 发明申请
    • Multiple-gate MOS transistor and a method of manufacturing the same
    • 多门MOS晶体管及其制造方法
    • US20070190709A1
    • 2007-08-16
    • US11727268
    • 2007-03-26
    • Young ChoSung KwonTae RohDae LeeJong Kim
    • Young ChoSung KwonTae RohDae LeeJong Kim
    • H01L21/84
    • H01L29/785H01L29/66818
    • Provided is a multiple-gate metal oxide semiconductor (MOS) transistor and a method for manufacturing the same, in which a channel is implemented in a streamline shape, an expansion region is implemented in a gradually increased form, and source and drain regions is implemented in an elevated structure by using a difference of a thermal oxidation rate depending on a crystal orientation of silicon and a geographical shape of the single-crystal silicon pattern. As the channel is formed in a streamline shape, it is possible to prevent the degradation of reliability due to concentration of an electric field and current driving capability by the gate voltage is improved because the upper portion and both sides of the channel are surrounded by the gate electrodes. In addition, a current crowding effect is prevented due to the expansion region increased in size and source and drain series resistance is reduced by elevated source and drain structures, thereby increasing the current driving capability.
    • 提供一种多栅极金属氧化物半导体(MOS)晶体管及其制造方法,其中以流线形状实现沟道,扩展区域以逐渐增加的形式实现,并且实现源极和漏极区域 通过使用取决于硅的晶体取向的热氧化速率的差异和单晶硅图案的地理形状,在升高的结构中。 由于通道形成为流线形状,所以可以防止由于电场集中引起的可靠性的劣化,由于栅极电压的电流驱动能力得到改善,因为通道的上部和两侧被 栅电极。 此外,由于扩大区域的尺寸增加,阻止了电流拥挤效应,并且通过升高的源极和漏极结构降低了源极和漏极串联电阻,从而增加了电流驱动能力。