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    • 3. 发明申请
    • PRIORITY-BASED TEMPLATE MATCHING INTRA PREDICTION VIDEO AND IMAGE CODING
    • 基于优先级的模式匹配预测视频和图像编码
    • US20090003443A1
    • 2009-01-01
    • US12146338
    • 2008-06-25
    • Yi GuoYe-Kui WangHouqiang Li
    • Yi GuoYe-Kui WangHouqiang Li
    • H04N7/12H04N11/02H04N7/26
    • H04N19/11H04N19/14H04N19/147H04N19/176H04N19/19H04N19/593H04N19/61H04N19/70
    • Template matching intra prediction based on a given priority is provided. Priority values of all, or a subset of the pixels on a border between a current block and a reconstructed area are calculated. A border pixel with the highest priority is used as the center of a template block. A search for the best matched candidate template is performed in the reconstructed area. Distortion metrics between known pixels in the to-match template and corresponding pixels in candidate templates are calculated and compared. The candidate template with the smallest distortion metric value is chosen as the best match. Corresponding pixels of the best-matched candidate template in the searching area are used as predictors of the unknown pixels in the template centered at the pixel with the highest priority, and the predicted pixels are marked as known. The process is repeated until all pixels in the current block are marked as known.
    • 提供了基于给定优先级的模板匹配帧内预测。 计算所有的优先级值,或当前块和重建区域之间的边界上的像素的子集。 具有最高优先级的边框像素用作模板块的中心。 在重建区域中执行最佳匹配候选模板的搜索。 计算和比较匹配模板中的已知像素与候选模板中的相应像素之间的失真度量。 选择具有最小失真度量值的候选模板作为最佳匹配。 将搜索区域中最佳匹配的候选模板的相应像素用作以具有最高优先级的像素为中心的模板中的未知像素的预测器,并将预测像素标记为已知的。 重复该过程,直到当前块中的所有像素被标记为已知。
    • 8. 发明授权
    • Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride
    • 抛光包括多晶硅和至少一种氧化硅和氮化硅的衬底的方法
    • US08492277B2
    • 2013-07-23
    • US12724721
    • 2010-03-16
    • Yi GuoZhendong LiuKancharla-Arun Kumar ReddyGuangyun Zhang
    • Yi GuoZhendong LiuKancharla-Arun Kumar ReddyGuangyun Zhang
    • C03C15/00C03C25/68H01L21/302H01L21/461
    • H01L21/31053C09G1/02
    • A method for chemical mechanical polishing of a substrate is provided, comprising: providing a substrate, wherein the substrate comprises polysilicon and at least one of silicon oxide and silicon nitride; providing a chemical mechanical polishing composition, comprising, as initial components: water; an abrasive; and an acyclic organosulfonic acid compound, wherein the acyclic organosulfonic acid compound has an acyclic hydrophobic portion having 6 to 30 carbon atoms and a nonionic acyclic hydrophilic portion having 10 to 300 carbon atoms; providing a chemical mechanical polishing pad with a polishing surface; moving the polishing surface relative to the substrate; dispensing the chemical mechanical polishing composition onto the polishing surface; and, abrading at least a portion of the substrate to polish the substrate; wherein at least some of the polysilicon is removed from the substrate; and, wherein at least some of the at least one of silicon oxide and silicon nitride is removed from the substrate.
    • 提供了一种用于基板的化学机械抛光的方法,包括:提供基板,其中所述基板包括多晶硅和氧化硅和氮化硅中的至少一种; 提供化学机械抛光组合物,其包含作为初始组分的水; 研磨剂 和无环有机磺酸化合物,其中所述无环有机磺酸化合物具有6至30个碳原子的无环疏水部分和具有10至300个碳原子的非离子非环状亲水部分; 提供具有抛光表面的化学机械抛光垫; 相对于衬底移动抛光表面; 将化学机械抛光组合物分配到抛光表面上; 并且研磨所述衬底的至少一部分以抛光所述衬底; 其中所述多晶硅中的至少一些从所述衬底移除; 并且其中所述至少一种氧化硅和氮化硅中的至少一种从所述衬底去除。