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    • 8. 发明授权
    • Semiconductor integrated circuit device having a first MISFET of an
output buffer circuit and a second MISFET of an internal circuit
    • 具有输出缓冲电路的第一MISFET和内部电路的第二MISFET的半导体集成电路器件
    • US5436483A
    • 1995-07-25
    • US142965
    • 1993-10-29
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • H01L21/8238H01L21/8242H01L27/02H01L27/092H01L29/78H01L29/06
    • H01L21/823864H01L27/0251H01L27/0266H01L27/0922H01L27/10873H01L29/78
    • Disclosed is a semiconductor device having an internal circuit protected by an electrostatic protective circuit, the internal circuit and electrostatic protective circuit being formed on the same semiconductor substrate. The internal circuit includes MIS elements and has a double-diffused drain structure, while the protective circuit has a single-diffused drain structure. The internal circuit can be, e.g., a DRAM, and the protective circuit can have diffused resistors and clamping MIS elements. The single-diffused drain structure can be formed in the protective circuit on the semiconductor substrate, while providing double-diffused drain structure in the internal circuit on the same substrate, by: (1) scanning the ion implanting apparatus to avoid ion implantation of the first ions into the region of the protective circuit, and/or (2) forming a photoresist film over the region of the protective circuit to prevent ion implanation of the first ions into the protective circuit region. As a further embodiment of the present invention, a semiconductor integrated circuit device is provided wherein the source and drain regions of an MOSFET in the internal circuit have lightly doped drain (LDD) structure in order to suppress the appearance of hot carriers, and the source and drain regions of an MOSFET in the input/output circuit have structure doped with phosphorus at a high impurity concentration, in order to enhance an electrostatic breakdown voltage.
    • 公开了具有被静电保护电路保护的内部电路的半导体器件,内部电路和静电保护电路形成在同一半导体衬底上。 内部电路包括MIS元件,并具有双扩散漏极结构,而保护电路具有单扩散漏极结构。 内部电路可以是例如DRAM,并且保护电路可以具有扩散电阻器和钳位MIS元件。 单扩散漏极结构可以形成在半导体衬底上的保护电路中,同时通过以下步骤在同一衬底上的内部电路中提供双扩散漏极结构:(1)扫描离子注入装置以避免离子注入 第一离子进入保护电路的区域,和/或(2)在保护电路的区域上形成光致抗蚀剂膜,以防止第一离子离子注入保护电路区域。 作为本发明的另一实施例,提供了一种半导体集成电路器件,其中内部电路中的MOSFET的源极和漏极区域具有轻掺杂漏极(LDD)结构,以便抑制热载流子的出现,源极 并且输入/输出电路中的MOSFET的漏极区域掺杂有高杂质浓度的磷的结构,以增强静电击穿电压。
    • 9. 发明授权
    • Semiconductor integrated circuit device having input protective elements
and internal circuits
    • 具有输入保护元件和内部电路的半导体集成电路器件
    • US5436484A
    • 1995-07-25
    • US143151
    • 1993-10-29
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • H01L21/8238H01L21/8242H01L27/02H01L27/092H01L29/78H01L29/06
    • H01L21/823864H01L27/0251H01L27/0266H01L27/0922H01L27/10873H01L29/78
    • Disclosed is a semiconductor device having an internal circuit protected by an electrostatic protective circuit, the internal circuit and electrostatic protective circuit being formed on the same semiconductor substrate. The internal circuit includes MIS elements and has a double-diffused drain structure, while the protective circuit has a single-diffused drain structure. The internal circuit can be, e.g., a DRAM, and the protective circuit can have diffused resistors and clamping MIS elements. The single-diffused drain structure can be formed in the protective circuit on the semiconductor substrate, while providing double-diffused drain structure in the internal circuit on the same substrate, by: (1) scanning the ion implanting apparatus to avoid ion implantation of the first ions into the region of the protective circuit, and/or (2) forming a photoresist film over the region of the protective circuit to prevent ion implanation of the first ions into the protective circuit region. As a further embodiment of the present invention, a semiconductor integrated circuit device is provided wherein the source and drain regions of an MOSFET in the internal circuit have lightly doped drain (LDD) structure in order to suppress the appearance of hot carriers, and the source and drain regions of an MOSFET in the input/output circuit have structure doped with phosphorus at a high impurity concentration, in order to enhance an electrostatic breakdown voltage.
    • 公开了具有被静电保护电路保护的内部电路的半导体器件,内部电路和静电保护电路形成在同一半导体衬底上。 内部电路包括MIS元件,并具有双扩散漏极结构,而保护电路具有单扩散漏极结构。 内部电路可以是例如DRAM,并且保护电路可以具有扩散电阻器和钳位MIS元件。 单扩散漏极结构可以形成在半导体衬底上的保护电路中,同时通过以下步骤在同一衬底上的内部电路中提供双扩散漏极结构:(1)扫描离子注入装置以避免离子注入 第一离子进入保护电路的区域,和/或(2)在保护电路的区域上形成光致抗蚀剂膜,以防止第一离子离子注入保护电路区域。 作为本发明的另一实施例,提供了一种半导体集成电路器件,其中内部电路中的MOSFET的源极和漏极区域具有轻掺杂漏极(LDD)结构,以便抑制热载流子的出现,源极 并且输入/输出电路中的MOSFET的漏极区域掺杂有高杂质浓度的磷的结构,以增强静电击穿电压。
    • 10. 发明授权
    • Semiconductor integrated circuit device having protective/output
elements and internal circuits
    • 具有保护/输出元件和内部电路的半导体集成电路器件
    • US5276346A
    • 1994-01-04
    • US815863
    • 1992-01-02
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • Hidetoshi IwaiKazumichi MitsusadaMasamichi IshiharaTetsuro MatsumotoKazuyuki MiyazawaHisao KattoKousuke Okuyama
    • H01L21/8238H01L21/8242H01L27/02H01L27/092H01L29/78H01L29/06
    • H01L21/823864H01L27/0251H01L27/0266H01L27/0922H01L27/10873H01L29/78
    • Disclosed is a semiconductor device having an internal circuit protected by an electrostatoc protective circuit, the internal circuit and electrostatic protective circuit being formed on the same semiconductor substrate. The internal circuit includes MIS elements and has a double-diffused drain structure, while the protective circuit has a single-diffused drain structure. The internal circuit can be, e.g., a DRAM, and the protective circuit can have diffused resistors and clamping MIS elements. The single-diffused drain structure can be formed in the protective circuit on the semiconductor substrate, while providing double-diffused drain structure in the internal circuit on the same substrate, by: (1) scanning the ion implanting apparatus to avoid ion implantation of the first ions into the region of the protective circuit, and/or (2) forming a photoresist film over the region of the protective circuit to prevent ion implanation of the first ions into the protective circuit region. As a further embodiment of the present invention, a semiconductor integrated circuit device is provided wherein the source and drain regions of an MOSFET in the internal circuit have lightly doped drain (LDD) structure in order to suppress the appearance of hot carriers, and the source and drain regions of an MOSFET in the input/output circuit have structure doped with phosphorus at a high impurity concentration, in order to enhance an electrostatic breakdown voltage.
    • 本发明公开了一种半导体器件,其具有由静电场保护电路保护的内部电路,内部电路和静电保护电路形成在同一半导体衬底上。 内部电路包括MIS元件,并具有双扩散漏极结构,而保护电路具有单扩散漏极结构。 内部电路可以是例如DRAM,并且保护电路可以具有扩散电阻器和钳位MIS元件。 单扩散漏极结构可以形成在半导体衬底上的保护电路中,同时通过以下步骤在同一衬底上的内部电路中提供双扩散漏极结构:(1)扫描离子注入装置以避免离子注入 第一离子进入保护电路的区域,和/或(2)在保护电路的区域上形成光致抗蚀剂膜,以防止第一离子离子注入保护电路区域。 作为本发明的另一个实施例,提供一种半导体集成电路器件,其中内部电路中的MOSFET的源极和漏极区域具有轻掺杂漏极(LDD)结构,以便抑制热载流子的出现,源极 并且输入/输出电路中的MOSFET的漏极区域掺杂有高杂质浓度的磷的结构,以增强静电击穿电压。