专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5283155A Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative 失效
标题翻译：包含碱溶性树脂和羟基黄烷衍生物的醌二叠氮磺酸酯的正型抗蚀剂组合物
公开(公告)号：US5283155A
公开(公告)日：1994-02-01
申请号：US688514
申请日：1991-06-11
申请人： Yasunori Uetani , Hirotoshi Nakanishi , Yasunori Doi
发明人： Yasunori Uetani , Hirotoshi Nakanishi , Yasunori Doi
IPC分类号： G03F7/022 , G03F7/023 , G03F7/32
CPC分类号： G03F7/022
摘要： A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR1## wherein Y.sub.1, Y.sub.2, Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are independently a hydrogen atom, a hydroxyl group, a C.sub.1 -C.sub.4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group, and at least two of Z.sub.1 to Z.sub.7 are hydroxyl groups, and R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently a hydrogen atom, a C.sub.1 -C.sub.10 alkyl group, a C.sub.1 -C.sub.4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high .gamma.-value.
摘要翻译： PCT No.PCT / JP91 / 00013 Sec。 371日期1991年6月11日 102（e）1991年6月11日PCT 1991年1月11日PCT PCT。公开号WO92 / 12205 日本1992年7月23日。一种正型抗蚀剂组合物，其包含碱溶性树脂和作为敏化剂的下式的酚化合物的醌二叠氮磺酸酯：（* CHEMICAL STRUCTURE *）（I）其中Y1， Y2，Z1，Z2，Z3，Z4，Z5，Z6和Z7独立地为氢原子，羟基，可被卤素原子取代的C1-C4烷基，条件是Y 1和Y 2中的至少一个为羟基，Z1至Z7中的至少两个为羟基，R1，R2，R3，R4，R5和R6独立地为氢原子，C1-C10烷基，C1-C4烯基，环烷基基团或芳基，该组成具有高（γ）值。

2. 发明授权

US5283324A Process for preparing radiation sensitive compound and positive resist composition 失效
标题翻译：制备辐射敏感化合物和正型抗蚀剂组合物的方法
公开(公告)号：US5283324A
公开(公告)日：1994-02-01
申请号：US869968
申请日：1992-04-17
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C08G61/00 , C07C303/28 , C07C309/76 , C07D311/60 , G03F7/022 , H01L21/027
CPC分类号： G03F7/022 , C07C303/28 , C07D311/60
摘要： A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
摘要翻译：通过使酚化合物与醌二叠氮磺酰卤在相对介电常数不大于10的溶剂和相对介电常数为至少15的溶剂的混合物中反应制备的辐射敏感化合物，该化合物较少着色并得到具有良好分辨率的正性抗蚀剂组合物。

3. 发明申请

US20100089439A1 CBP COMPOUND 审中-公开
标题翻译： CBP化合物
公开(公告)号：US20100089439A1
公开(公告)日：2010-04-15
申请号：US12527564
申请日：2007-02-26
申请人： Yasunori Uetani , Jun Fujiwara , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Jun Fujiwara , Hirotoshi Nakanishi
IPC分类号： H01L31/00 , C07D209/86 , C07D209/88 , G03G5/04 , H01L51/30 , H01L51/54 , H01L51/46
CPC分类号： C07D209/86 , C09K11/06 , C09K2211/1425 , C09K2211/1466 , H01L51/0072 , H01L51/5048 , Y02E10/549
摘要： Disclosed is a compound which is an organic semiconductor material having excellent charge transport property. Specifically, disclosed is a compound represented by the following formula (1). (In the formula (1), R1-R4 independently represent a hydrogen atom, or a group selected from the group consisting of alkyl groups having 1-18 carbon atoms and groups represented by the following formula (2): R7O—R8a (2) (2) (wherein R7 represents an alkyl group having 1-18 carbon atoms; R8 represents an alkylene group having 1-20 carbon atoms; a represents an integer of 1-5, and when a is 2 or more, R8's may be the same as or different from each other), and at least one of R1-R4 represents a group represented by the formula (2); R5 and R6 independently represent an alkyl group having 1-18 carbon atoms; and m and n independently represent an integer of 0-4.)
摘要翻译：公开了作为具有优异的电荷输送性的有机半导体材料的化合物。具体地，公开了由下式（1）表示的化合物。（式（1）中，R 1〜R 4分别独立地表示氢原子或选自具有1-18个碳原子的烷基和由下式（2）表示的基团的基团：R7〜 a（2）（2）（其中，R7表示碳原子数为1〜18的烷基，R8表示碳原子数1〜20的亚烷基，a表示1〜5的整数，a为2以上时） R 8可以相同也可以不同），R 1〜R 4中的至少一个表示式（2）表示的基团; R 5和R 6独立地表示碳原子数1〜18的烷基，m 且n独立地表示0-4的整数。）

4. 发明申请

US20090039765A1 LIGHT EMITTING POLYMER COMPOSITION AND POLYMER LIGHT EMITTING DEVICE 审中-公开
标题翻译：发光聚合物组合物和聚合物发光装置
公开(公告)号：US20090039765A1
公开(公告)日：2009-02-12
申请号：US11574029
申请日：2005-08-23
申请人： Yasunori Uetani , Nobuhiko Shirasawa , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Nobuhiko Shirasawa , Hirotoshi Nakanishi
IPC分类号： H01J1/62 , C09K11/06 , C07D209/82
CPC分类号： H01L51/0061 , C07D209/86 , C08K5/0091 , C08K5/3417 , C08L65/00 , C09K11/06 , C09K2211/1425 , C09K2211/1433 , C09K2211/145 , C09K2211/1458 , C09K2211/1466 , C09K2211/1491 , C09K2211/182 , C09K2211/185 , H01L51/0035 , H01L51/0037 , H01L51/0052 , H01L51/0059 , H01L51/0071 , H01L51/0072 , H01L51/0085 , H01L51/5012 , H01L2251/308 , H05B33/14
摘要： A light emitting polymer composition comprising a light emitting polymer and a compound selected from the following formulae (1a) to (1d): (wherein, X represents an atom or atomic group forming a 5-membered or 6-membered ring together with four carbon atoms on two benzene rings in the formula, Q and T represent each independently a hydrogen atom, halogen atom, alkyl group, alkyloxy group, alkylthio group, aryl group, aryloxy group, arylthio group, arylalkyl group, arylalkyloxy group, arylalkylthio group, alkenyl group, alkynyl group, arylalkenyl group, arylalkynyl group, substituted silyloxy group, substituted silylthio group, substituted silylamino group, substituted amino group, amide group, acid imide group, acyloxy group, mono-valent heterocyclic group, heteroaryloxy group, heteroarylthio group, cyano group or nitro group).
摘要翻译：一种发光聚合物组合物，其包含发光聚合物和选自下式（1a）至（1d）的化合物：（其中X表示与四个碳一起形成5元或6元环的原子或原子团式中的两个苯环上的原子，Q和T各自独立地表示氢原子，卤素原子，烷基，烷氧基，烷硫基，芳基，芳氧基，芳硫基，芳基烷基，芳基烷氧基，芳基烷硫基，烯基基团，炔基，芳基烯基，芳基炔基，取代的甲硅烷氧基，取代的甲硅烷硫基，取代的甲硅烷基氨基，取代的氨基，酰胺基，酰亚胺基，酰氧基，1价杂环基，杂芳氧基，杂芳硫基，氰基基团或硝基）。

5. 发明授权

US5290657A Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound 失效
标题翻译：正选择多羟基添加剂化合物的正性醌醌二氮化物和碱溶性树脂抗蚀剂组合物
公开(公告)号：US5290657A
公开(公告)日：1994-03-01
申请号：US743299
申请日：1991-08-15
申请人： Yasunori Uetani , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Hirotoshi Nakanishi
IPC分类号： G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027 , G03C1/61
CPC分类号： G03F7/039 , G03F7/0226
摘要： A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.
摘要翻译： PCT No.PCT / JP90 / 01659 Sec。 371日期1991年8月15日 102（e）日期1991年8月15日PCT 1990年12月20日PCT PCT。公开号WO91 / 09346 日本1991年6月27日。包含碱溶性树脂，醌二叠氮化合物和特定含羟基化合物的正型抗蚀剂组合物可以提高灵敏度，而不会降低耐热性和膜厚保持性。

6. 发明授权

US5714620A Polyhydric phenol compound and positive resist composition comprising the same 失效
公开(公告)号：US5714620A
公开(公告)日：1998-02-03
申请号：US703436
申请日：1996-08-27
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , C07D311/60
CPC分类号： C07D311/64 , G03F7/0226
摘要： A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.

7. 发明授权

US5587492A Polyhydric phenol compound and positive resist composition comprising the same 失效
标题翻译：多元酚化合物和含有它的正型抗蚀剂组合物
公开(公告)号：US5587492A
公开(公告)日：1996-12-24
申请号：US423760
申请日：1995-04-18
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , C07D311/60
CPC分类号： C07D311/64 , G03F7/0226
摘要： A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.
摘要翻译：下式的多元酚化合物：其中R 1至R 5独立地为氢原子，烷基，烯基，环烷基或芳基，其中R 1和R 2中的至少一个为烷基，烯基，环烷基或芳基，以及其醌二叠氮化物磺酸盐，其赋予具有改进的灵敏度和良好的聚焦深度的正性抗蚀剂组合物。

8. 发明授权

US5374742A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5374742A
公开(公告)日：1994-12-20
申请号：US148346
申请日：1993-11-08
申请人： Yasunori Uetani , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Hirotoshi Nakanishi
IPC分类号： G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027 , C07D311/82
CPC分类号： G03F7/039 , G03F7/0226
摘要： A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.
摘要翻译：包含碱溶性树脂，醌二叠氮化合物和特定含羟基化合物的正型抗蚀剂组合物可以提高灵敏度，而不会降低耐热性和膜厚保持性。

9. 发明授权

US5275910A Positive radiation-sensitive resist composition 失效
标题翻译：正辐射敏感抗蚀剂组合物
公开(公告)号：US5275910A
公开(公告)日：1994-01-04
申请号：US960695
申请日：1992-10-14
申请人： Hiroshi Moriuma , Hirotoshi Nakanishi , Yasunori Uetani
发明人： Hiroshi Moriuma , Hirotoshi Nakanishi , Yasunori Uetani
IPC分类号： G03F7/004 , G03F7/022 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0226 , Y10S430/11
摘要： A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3.
摘要翻译：一种阳离子敏感抗蚀剂组合物，其包含碱溶性树脂，辐射敏感成分和由通式（I）表示的酚化合物：（*化学结构*）（I）其中R1，R2和R3独立地为一另一个表示氢原子，烷基或烷氧基，n表示1,2或3。

10. 发明授权

US5407779A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5407779A
公开(公告)日：1995-04-18
申请号：US71409
申请日：1993-06-04
申请人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022
摘要： A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: ##STR1## wherein R.sub.1 represents hydrogen, halogen, or the like; R.sub.3 represents alkyl or phenyl; x represents 1-3; Q.sub.1 to Q.sub.12 represent hydrogen, alkyl or phenyl; and Z.sub.1 to Z.sub.5 represent the groups of the following formulas: ##STR2## wherein R.sub.2 is hydrogen, halogen or the like; R.sub.3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.
摘要翻译：一种正型抗蚀剂组合物，其包含碱溶性树脂和含有由以下通式表示的至少一种酚化合物的醌二叠氮磺酸酯的光敏醌二叠氮化物材料：（Ia）图像（Ib）＆lt; IMAGE＆gt; （Ⅰc）（Id）其中R1表示氢，卤素等; R3表示烷基或苯基; x表示1-3; Q1至Q12表示氢，烷基或苯基; Z 1〜Z 5分别表示下式的基团：其中，R 2为氢，卤素等; R3如上所定义; y为1-3; 并且p为0或1.该正性抗蚀剂组合物在分辨率，轮廓，焦深等性能之间的平衡方面是优异的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式