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1. 发明授权

US5283324A Process for preparing radiation sensitive compound and positive resist composition 失效
标题翻译：制备辐射敏感化合物和正型抗蚀剂组合物的方法
公开(公告)号：US5283324A
公开(公告)日：1994-02-01
申请号：US869968
申请日：1992-04-17
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Hiroshi Takagaki , Yasunori Doi , Yasunori Uetani , Ryotaro Hanawa
IPC分类号： C08G61/00 , C07C303/28 , C07C309/76 , C07D311/60 , G03F7/022 , H01L21/027
CPC分类号： G03F7/022 , C07C303/28 , C07D311/60
摘要： A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.
摘要翻译：通过使酚化合物与醌二叠氮磺酰卤在相对介电常数不大于10的溶剂和相对介电常数为至少15的溶剂的混合物中反应制备的辐射敏感化合物，该化合物较少着色并得到具有良好分辨率的正性抗蚀剂组合物。

2. 发明授权

US5714620A Polyhydric phenol compound and positive resist composition comprising the same 失效
公开(公告)号：US5714620A
公开(公告)日：1998-02-03
申请号：US703436
申请日：1996-08-27
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , C07D311/60
CPC分类号： C07D311/64 , G03F7/0226
摘要： A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.

3. 发明授权

US5587492A Polyhydric phenol compound and positive resist composition comprising the same 失效
标题翻译：多元酚化合物和含有它的正型抗蚀剂组合物
公开(公告)号：US5587492A
公开(公告)日：1996-12-24
申请号：US423760
申请日：1995-04-18
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , C07D311/60
CPC分类号： C07D311/64 , G03F7/0226
摘要： A polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a positive resist composition having improved sensitivity and a good depth of focus.
摘要翻译：下式的多元酚化合物：其中R 1至R 5独立地为氢原子，烷基，烯基，环烷基或芳基，其中R 1和R 2中的至少一个为烷基，烯基，环烷基或芳基，以及其醌二叠氮化物磺酸盐，其赋予具有改进的灵敏度和良好的聚焦深度的正性抗蚀剂组合物。

4. 发明授权

US5436107A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5436107A
公开(公告)日：1995-07-25
申请号：US853547
申请日：1992-03-18
申请人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
发明人： Jun Tomioka , Yasunori Uetani , Hirotoshi Nakanishi , Ryotaro Hanawa , Ayako Ida
IPC分类号： C07D311/64 , G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： C07D311/64 , G03F7/0226
摘要： A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; anda quinone diazide sulfonate of a phenol compound of the formula ##STR2## wherein R.sub.6 to R.sub.10 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.6 and R.sub.7 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group.
摘要翻译：一种正性抗蚀剂组合物，其包含碱溶性树脂; 至少一种下式的多元酚化合物的醌二叠氮化物磺酸盐：其中R 1至R 5独立地为氢原子，烷基，烯基，环烷基或芳基，条件是在 R1和R2中的至少一个是烷基，烯基，环烷基或芳基; 和式（II）的酚化合物的醌二叠氮基磺酸盐，其中R 6至R 10独立地为氢原子，烷基，烯基，环烷基或芳基，条件是至少一个 R6和R7是烷基，烯基，环烷基或芳基。

5. 发明授权

US5413895A Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound. 失效
标题翻译：包含醌二叠层磺酸酯，酚醛清漆树脂和多酚化合物的正型抗蚀剂组合物。
公开(公告)号：US5413895A
公开(公告)日：1995-05-09
申请号：US931316
申请日：1992-08-18
申请人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Yasunori Uetani , Ayako Ida
发明人： Jun Tomioka , Koji Kuwana , Hirotoshi Nakanishi , Yasunori Uetani , Ayako Ida
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0226
摘要： A positive resist composition comprising an alkali-soluble resin containing a novolak resin which is obtained by a condensation reaction of a phenol compound and a carbonyl compound and has an area in a GPC pattern of a range in that a molecular weight as converted to polystyrene is not larger than 900 not exceeding 20% of a whole pattern area excluding the unreacted phenol compound, a quinonediazide compound and a polyphenol compound of the formula: ##STR1## in which R.sub.1 and R.sub.2 are independently a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group or a group: --OCOR.sub.3 in which R.sub.3 is an alkyl group or a phenyl group, x and y are independently an integer of 1 to 3, and m is an integer of 0 to 4, wherein a weight ratio of said polyphenol compound (I) to said alkali-soluble resin is from 3:10 to 5:10, which is excellent in heat resistance, sensitivity, resolution and a depth of focus and leaves no scum after development.
摘要翻译：含有通过酚化合物与羰基化合物的缩合反应得到的酚醛清漆树脂的碱溶性树脂的正型抗蚀剂组合物，其GPC图案的面积为转化为聚苯乙烯的分子量的范围为不大于900不超过除了未反应的酚化合物之外的整个图案区域的20％，醌二叠氮化合物和下式的多酚化合物：其中R 1和R 2独立地为氢原子，卤素原子，烷基，烷氧基或基团：其中R 3为烷基或苯基的-OCOR 3，x和y独立地为1〜3的整数，m为0〜4的整数，其中，所述多酚化合物（I）与所述碱溶性树脂的重量比为3:10〜5:10，耐热性，灵敏度，分辨率和焦深均优异，显影后无浮渣。

6. 发明授权

US5080997A Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture 失效
标题翻译：通过混合二氢化亚油酸酯和酚醛树脂溶液的凝聚产物，不会从凝乳混合物分离凝结产物来制备阳性组合物的方法
公开(公告)号：US5080997A
公开(公告)日：1992-01-14
申请号：US446153
申请日：1989-12-05
申请人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
发明人： Takeshi Hioki , Koji Kuwana , Jun Tomioka , Hirotoshi Nakanishi , Yasunori Uetani , Yukio Hanamoto , Fumio Oi
IPC分类号： C08L61/04 , C08L61/06 , G03F7/022 , G03F7/023
CPC分类号： G03F7/023
摘要： A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

7. 发明授权

US5290656A Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound 失效
标题翻译：抗酚组合物，新型苯酚化合物和醌二叠氮磺酸酯新型酚类化合物
公开(公告)号：US5290656A
公开(公告)日：1994-03-01
申请号：US5429
申请日：1993-01-19
申请人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi , Jun Tomioka
发明人： Yasunori Uetani , Makoto Hanabata , Hirotoshi Nakanishi , Koji Kuwana , Yukio Hanamoto , Fumio Oi , Jun Tomioka
IPC分类号： G03F7/022 , G03C1/52 , C07C309/76
CPC分类号： G03F7/022
摘要： A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydroxyl group, provided that at least one of Y.sub.1, Y.sub.2, Y.sub.3 and Y.sub.4 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5 and Z.sub.6 is a hydroxyl group; X is ##STR2## in which R.sub.1 and R.sub.2 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo-alkyl group, an alkoxy group or an aryl group, provided that when at least one of R.sub.1 and R.sub.2 is a hydrogen atom, an alkyl or aryl group is present at the ortho position to a hydroxyl group which is present at the ortho position to X provides a positive resist composition which has a high .gamma.-value.
摘要翻译：通式（I）的酚化合物的醌二叠氮磺酸酯：其中Y 1，Y 2，Y 3和Y 4相同或不同，各自为氢原子，烷基，卤素原子或羟基，条件是Y 1，Y 2，Y 3和Y 4中的至少一个为羟基; Z 1，Z 2，Z 3，Z 4，Z 5和Z 6相同或不同，各自为氢原子，烷基，芳基，卤素原子或羟基，条件是Z1，Z2，Z3，Z4中的至少一个 Z5和Z6是羟基; X为，其中R 1和R 2相同或不同，并且各自为氢原子，烷基，烯基，环烷基，烷氧基或芳基，条件是当至少一个 R1和R2是氢原子，烷基或芳基存在于与X的邻位存在的羟基的邻位，提供具有高γ值的正性抗蚀剂组合物。

8. 发明授权

US5407779A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5407779A
公开(公告)日：1995-04-18
申请号：US71409
申请日：1993-06-04
申请人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
IPC分类号： G03F7/039 , G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022
摘要： A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid ester of at least one phenol compound represented by the following general formulas: ##STR1## wherein R.sub.1 represents hydrogen, halogen, or the like; R.sub.3 represents alkyl or phenyl; x represents 1-3; Q.sub.1 to Q.sub.12 represent hydrogen, alkyl or phenyl; and Z.sub.1 to Z.sub.5 represent the groups of the following formulas: ##STR2## wherein R.sub.2 is hydrogen, halogen or the like; R.sub.3 is as defined above; y is 1-3; and p is 0 or 1. This positive resist composition is excellent in the balance between properties such as resolution, profile, depth of focus, etc.
摘要翻译：一种正型抗蚀剂组合物，其包含碱溶性树脂和含有由以下通式表示的至少一种酚化合物的醌二叠氮磺酸酯的光敏醌二叠氮化物材料：（Ia）图像（Ib）＆lt; IMAGE＆gt; （Ⅰc）（Id）其中R1表示氢，卤素等; R3表示烷基或苯基; x表示1-3; Q1至Q12表示氢，烷基或苯基; Z 1〜Z 5分别表示下式的基团：其中，R 2为氢，卤素等; R3如上所定义; y为1-3; 并且p为0或1.该正性抗蚀剂组合物在分辨率，轮廓，焦深等性能之间的平衡方面是优异的。

9. 发明授权

US5407778A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US5407778A
公开(公告)日：1995-04-18
申请号：US60539
申请日：1993-05-13
申请人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Jun Tomioka , Hirotoshi Nakanishi
IPC分类号： G03F7/022 , H01L21/027 , G03F7/023 , G03F7/30
CPC分类号： G03F7/022
摘要： A positive resist composition comprising an alkali-soluble resin and a light-sensitive quinonediazide material containing a quinonediazidesulfonic acid diester of at least one member selected from the phenol compounds represented by the following general formulas: ##STR1## wherein R.sub.1 and R.sub.2 each represent hydrogen, halogen, --OCOR.sub.3, alkyl or alkoxy in which R.sub.3 represents alkyl or phenyl, x and y each represent 1, 2 or 3, and R, R.sub.o, R' and R.sub.o ' each represent hydrogen atom, alkyl or phenyl group; wherein the content of said diester is 50% or greater based on the total light-sensitive quinonediazide material. This composition is excellent in the balance between properties such as resolution, profile and depth of focus.
摘要翻译：一种正极抗蚀剂组合物，其包含碱溶性树脂和含有选自以下通式表示的酚化合物中的至少一种的醌二叠氮磺酸二酯的光敏醌二叠氮化物材料：（I）＆lt; IMAGE（II））其中R 1和R 2各自表示氢，卤素，-OCOR 3，其中R 3表示烷基或苯基的烷基或烷氧基，x和y各自表示1,2或3，R，Ro，R'和Ro'各自表示氢原子，烷基或苯基; 其中所述二酯的含量基于全部光敏醌二叠氮化物材料为50％以上。该组合物在分辨率，轮廓和焦深等性质之间的平衡方面是优异的。

10. 发明授权

US5218136A Styryl compounds, process for preparing the same and photoresist compositions comprising the same 失效
标题翻译： STYRYL化合物，其制备方法和包含其的光学组合物
公开(公告)号：US5218136A
公开(公告)日：1993-06-08
申请号：US290264
申请日：1988-12-27
申请人： Takanori Yamamoto , Shinji Konishi , Ryotaro Hanawa , Akirhiro Furuta , Takeshi Hioki , Jun Tomioka
发明人： Takanori Yamamoto , Shinji Konishi , Ryotaro Hanawa , Akirhiro Furuta , Takeshi Hioki , Jun Tomioka
IPC分类号： C07C229/44 , C07C255/34 , C07C255/42 , C07C309/14 , C07C311/05 , C07C317/48 , C07F7/18 , G03F7/022 , G03F7/09
CPC分类号： C07C229/44 , C07C255/34 , C07C255/42 , C07C309/14 , C07C311/05 , C07C317/48 , C07F7/1856 , G03F7/0226 , G03F7/091 , Y10S430/127
摘要： A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.

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