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1. 发明授权

US6071372A RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls 失效
标题翻译： RF等离子体蚀刻反应器，具有内部感应线圈天线和导电室壁
公开(公告)号：US6071372A
公开(公告)日：2000-06-06
申请号：US869798
申请日：1997-06-05
申请人： Yan Ye , Donald Olgado , Avi Tepman , Diana Ma , Gerald Yin , Peter Loewenhardt , Jeng H. Hwang , Steve Mak
发明人： Yan Ye , Donald Olgado , Avi Tepman , Diana Ma , Gerald Yin , Peter Loewenhardt , Jeng H. Hwang , Steve Mak
IPC分类号： H05H1/46 , H01J37/32 , H01L21/302 , C23F1/02 , C23C16/00
CPC分类号： H01J37/32477 , H01J37/321
摘要： An RF plasma etch reactor having an etch chamber with electrically conductive walls and a protective layer forming the portion of the walls facing the interior of the chamber. The protective layer prevents sputtering of material from the chamber walls by a plasma formed within the chamber. The etch reactor also has an inductive coil antenna disposed within the etch chamber which is used to generate the plasma by inductive coupling. Like the chamber walls, the inductive coil antenna is constructed to prevent sputtering of the material making up the antenna by the plasma. The coil antenna can take on any configuration (e.g. location, shape, orientation) that is necessary to achieve a desired power deposition pattern within the chamber. Examples of potential coil antenna configurations for achieving the desired power deposition pattern include constructing the coil antenna with a unitary or a segmented structure. The segmented structure involves the use of at least two coil segments wherein each segment is electrically isolated from the other segments and connected to a separate RF power signal. The unitary coil antenna or each of the coil segments can have a planar shape, a cylindrical shape, a truncated conical shape, a dome shape, or any combination thereof. The conductive walls are electrically grounded to serve as an electrical ground (i.e. anode) for a workpiece-supporting pedestal which is connected to a source of RF power to create a bias voltage at the surface of the workpiece.
摘要翻译： RF等离子体蚀刻反应器具有具有导电壁的蚀刻室和形成面向腔室内部的部分壁的保护层。保护层防止在室内形成的等离子体从室壁溅射材料。蚀刻反应器还具有设置在蚀刻室内的感应线圈天线，其用于通过感应耦合产生等离子体。类似于室壁，感应线圈天线被构造成防止由等离子体溅射构成天线的材料。线圈天线可以承受在室内实现期望的功率沉积图案所必需的任何配置（例如位置，形状，取向）。用于实现期望的功率沉积模式的电位线圈天线配置的示例包括以整体或分段结构构造线圈天线。分段结构涉及使用至少两个线圈段，其中每个段与其它段电隔离并连接到单独的RF功率信号。单线圈天线或每个线圈段可以具有平面形状，圆柱形，截顶圆锥形，圆顶形或其任何组合。导电壁电接地以用作工件支撑基座的电接地（即阳极），工件支撑基座连接到RF功率源，以在工件的表面产生偏置电压。

2. 发明授权

US08175757B2 Self-cleaning chassis 失效
标题翻译：自清洁底盘
公开(公告)号：US08175757B2
公开(公告)日：2012-05-08
申请号：US12557340
申请日：2009-09-10
申请人： Trevor J. Aggus , Helane F. Daniels , Linda Derechailo , Richard Jaccard , Roman Kelbert , Steve Mak , Charles Truax , Niv Zilberman
发明人： Trevor J. Aggus , Helane F. Daniels , Linda Derechailo , Richard Jaccard , Roman Kelbert , Steve Mak , Charles Truax , Niv Zilberman
IPC分类号： G05D23/00
CPC分类号： H05K7/20836 , G06F1/20 , G06F1/206
摘要： A temperature control system and methods that remove dust or debris from inside an electrical equipment chassis are provided. One or more fans are placed in or near the exterior of the chassis. The fans are operated either in reverse, forward, pulsing, or reverse pulsing modes to create turbulent air flow through the chassis. The change in air flow pattern helps dislodge dust and particles. Once airborne, the fans can exhaust the dust and particles. Further, some embodiments provide vanes or other elements to further direct air flow. The temperature control system can be used in any electrical equipment that is ventilated with fans. The temperature control system provides the advantage of a low cost and efficient method for ensuring that dust does not accumulate on components within an enclosure.
摘要翻译：提供了从电气设备底盘内部除去灰尘或碎屑的温度控制系统和方法。一个或多个风扇放置在机箱外部或附近。风扇以反向，前进，脉冲或反向脉冲模式运行，以产生通过底盘的湍流空气流。气流模式的变化有助于消除灰尘和颗粒物。一旦机载，风扇可以排出灰尘和颗粒物。此外，一些实施例提供叶片或其它元件以进一步引导空气流动。温度控制系统可用于任何通风风扇的电气设备。温度控制系统提供了低成本和有效方法的优点，以确保灰尘不会积聚在外壳内的部件上。

3. 发明申请

US20080308527A1 ADVANCED MASK PATTERNING WITH PATTERNING LAYER 有权
标题翻译：高级掩模与花纹层
公开(公告)号：US20080308527A1
公开(公告)日：2008-12-18
申请号：US12194689
申请日：2008-08-20
申请人： JIAN MA , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
发明人： JIAN MA , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
IPC分类号： B44C1/22 , B32B7/02
CPC分类号： B44C1/22 , B32B7/02 , G03F1/80 , H01L21/461 , Y10T428/24942
摘要： An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.
摘要翻译：可以使用成像层上的图案化层来制造诸如掩模或掩模版的成像结构。图案化层可以具有与成像层基本上不同的蚀刻性质。相对于抗蚀剂层，第一蚀刻工艺可以是图案化层的选择性。相对于图案化层，第二蚀刻工艺可以是成像层的选择性。

4. 发明申请

US20060215135A1 Advanced mask patterning with patterning layer 有权
标题翻译：高级掩模图案化图案层
公开(公告)号：US20060215135A1
公开(公告)日：2006-09-28
申请号：US11092993
申请日：2005-03-28
申请人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
发明人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
IPC分类号： G03F7/20
CPC分类号： B44C1/22 , B32B7/02 , G03F1/80 , H01L21/461 , Y10T428/24942
摘要： An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.
摘要翻译：可以使用成像层上的图案化层来制造诸如掩模或掩模版的成像结构。图案化层可以具有与成像层基本上不同的蚀刻性质。相对于抗蚀剂层，第一蚀刻工艺可以是图案化层的选择性。相对于图案化层，第二蚀刻工艺可以是成像层的选择性。

5. 发明授权

US08734660B2 Advanced mask patterning with patterning layer 有权
标题翻译：高级掩模图案化图案层
公开(公告)号：US08734660B2
公开(公告)日：2014-05-27
申请号：US12194689
申请日：2008-08-20
申请人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
发明人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
IPC分类号： B44C1/22 , B32B7/02 , H01L21/461
CPC分类号： B44C1/22 , B32B7/02 , G03F1/80 , H01L21/461 , Y10T428/24942
摘要： An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.
摘要翻译：可以使用成像层上的图案化层来制造诸如掩模或掩模版的成像结构。图案化层可以具有与成像层基本上不同的蚀刻性质。相对于抗蚀剂层，第一蚀刻工艺可以是图案化层的选择性。第二蚀刻工艺可以相对于图案化层选择成像层。

6. 发明申请

US20120116983A1 SYSTEM AND METHOD FOR REAL ESTATE INVENTORY MANAGEMENT 审中-公开
标题翻译：房地产库存管理系统与方法
公开(公告)号：US20120116983A1
公开(公告)日：2012-05-10
申请号：US12940723
申请日：2010-11-05
申请人： Steve Mak , Michael Buenaventura , Winston Mak , Matthys Van Vuuren
发明人： Steve Mak , Michael Buenaventura , Winston Mak , Matthys Van Vuuren
IPC分类号： G06Q50/00
CPC分类号： G06Q50/163 , G06Q10/087
摘要： A system and method of real estate inventory management includes providing, to a client system, data identifying one or more units of real estate that are available for sale; receiving a reservation request identifying a unit that is available for sale; receiving, at the server system, purchasing data for a reservation fee for the identified unit of real estate; processing a deposit in the amount of the reservation fee for the identified of real estate using the purchasing data; verifying that the deposit for the identified unit record processed; and updating the reservation status of the identified unit of real estate to indicate that the unit of real estate is not available for sale.
摘要翻译：房地产库存管理的系统和方法包括向客户系统提供识别可供出售的一个或多个房地产单元的数据; 接收确定可出售单元的预约请求; 在服务器系统处接收用于所识别的房地产单位的预订费用的数据; 使用采购数据处理确定的房地产的预订费用的金额; 验证所识别的单位记录的存款处理; 更新所识别的房地产单位的预约状态，以表明房地产单位不可出售。

7. 发明授权

US07460209B2 Advanced mask patterning with patterning layer 有权
标题翻译：高级掩模图案化图案层
公开(公告)号：US07460209B2
公开(公告)日：2008-12-02
申请号：US11092993
申请日：2005-03-28
申请人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
发明人： Jian Ma , Phil Freiberger , Karmen Yung , Frederick Chen , Chaoyang Li , Steve Mak
IPC分类号： G03B27/42 , G03F1/00
CPC分类号： B44C1/22 , B32B7/02 , G03F1/80 , H01L21/461 , Y10T428/24942
摘要： An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.
摘要翻译：可以使用成像层上的图案化层来制造诸如掩模或掩模版的成像结构。图案化层可以具有与成像层基本上不同的蚀刻性质。相对于抗蚀剂层，第一蚀刻工艺可以是图案化层的选择性。相对于图案化层，第二蚀刻工艺可以是成像层的选择性。

8. 发明申请

US20110060471A1 SELF-CLEANING CHASSIS 失效
标题翻译：自清洁衣物
公开(公告)号：US20110060471A1
公开(公告)日：2011-03-10
申请号：US12557340
申请日：2009-09-10
申请人： Trevor J. Aggus , Helane F. Daniels , Linda Derechailo , Richard Jaccard , Roman Kelbert , Steve Mak , Charles Truax , Niv Zilberman
发明人： Trevor J. Aggus , Helane F. Daniels , Linda Derechailo , Richard Jaccard , Roman Kelbert , Steve Mak , Charles Truax , Niv Zilberman
IPC分类号： G05D7/06 , G05D23/19
CPC分类号： H05K7/20836 , G06F1/20 , G06F1/206
摘要： A temperature control system and methods that remove dust or debris from inside an electrical equipment chassis are provided. One or more fans are placed in or near the exterior of the chassis. The fans are operated either in reverse, forward, pulsing, or reverse pulsing modes to create turbulent air flow through the chassis. The change in air flow pattern helps dislodge dust and particles. Once airborne, the fans can exhaust the dust and particles. Further, some embodiments provide vanes or other elements to further direct air flow. The temperature control system can be used in any electrical equipment that is ventilated with fans. The temperature control system provides the advantage of a low cost and efficient method for ensuring that dust does not accumulate on components within an enclosure.
摘要翻译：提供了从电气设备底盘内部除去灰尘或碎屑的温度控制系统和方法。一个或多个风扇放置在机箱外部或附近。风扇以反向，前进，脉冲或反向脉冲模式运行，以产生通过底盘的湍流空气流。气流模式的变化有助于消除灰尘和颗粒物。一旦机载，风扇可以排出灰尘和颗粒物。此外，一些实施例提供叶片或其它元件以进一步引导空气流动。温度控制系统可用于任何通风风扇的电气设备。温度控制系统提供了低成本和有效方法的优点，以确保灰尘不会积聚在外壳内的部件上。

9. 发明授权

US07792284B1 Washable shell for a handheld electronic device 有权
标题翻译：手持电子设备的可洗外壳
公开(公告)号：US07792284B1
公开(公告)日：2010-09-07
申请号：US12203281
申请日：2008-09-03
申请人： Trevor Aggus , Robert Bopp , Warren Brown , Linda Derechailo , Rich Jaccard , Steve Mak , Robert Randall , Charles Truax , Greg Boothe
发明人： Trevor Aggus , Robert Bopp , Warren Brown , Linda Derechailo , Rich Jaccard , Steve Mak , Robert Randall , Charles Truax , Greg Boothe
IPC分类号： H04M1/00 , H04M9/00
CPC分类号： H04M1/17
摘要： The shell of an electronic handheld device is adapted for easy and repeated—even frequent—assembly with and disassembly from the electronics, and the shell is washable, preferably in a dishwasher. Preferably, the shell comprises a plurality of parts that can be easily and repeatedly assembled and disassembled by hand without use of tools. For example, the parts of a telephone handset shell are made to be easily snapped together around, and unsnapped from, the handset's electronics, thereby enabling the shells of the handsets of telephones to be washed to have this function performed by unskilled personnel.
摘要翻译：电子手持装置的壳体适于容易且反复均匀地组装和拆卸电子装置，并且壳体可洗涤，优选在洗碗机中。优选地，壳体包括可以容易且重复地组装和拆卸的多个部件，而不使用工具。例如，电话听筒外壳的部件被轻易地卡在手机的电子设备周围并且从手机的电子设备中解锁，从而使电话机手机的外壳能够被非技术人员执行。

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