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    • 1. 发明授权
    • Apparatus and a method for cleaning a dielectric film
    • 用于清洁电介质膜的装置和方法
    • US07658802B2
    • 2010-02-09
    • US11284775
    • 2005-11-22
    • Xinyu FuJohn ForsterWei W. Wang
    • Xinyu FuJohn ForsterWei W. Wang
    • B08B6/00
    • H01L21/02063H01J37/32357H01J37/32422H01J37/3266
    • An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted to provide a plurality of reactive radicals to the chamber body, a passage coupling the remote plasma source to the chamber body, and at least one magnet disposed adjacent the passage. In another embodiment, a method of cleaning a dielectric film that includes providing a substrate having an at least partially exposed dielectric layer disposed in a process chamber, generating a plurality of reactive radicals in a remote plasma source, flowing the reactive radicals from the remote plasma source into the process chamber through a passage having at least one magnet disposed adjacent the passage, and magnetically filtering the reactive radicals passing through the passage.
    • 在本发明中提供了一种清洁电介质膜的装置和方法。 在一个实施例中,一种清洁电介质膜的装置包括适于在其中支撑衬底的室主体,适于向室主体提供多个反应性基团的远程等离子体源,将远程等离子体源耦合到 室主体,以及邻近通道设置的至少一个磁体。 在另一个实施例中,一种清洁电介质膜的方法,该方法包括提供具有设置在处理室中的至少部分暴露的电介质层的衬底,在远程等离子体源中产生多个反应性基团,使来自远端等离子体的反应性基团 通过具有邻近通道设置的至少一个磁体的通道进入处理室,并对穿过通道的反应性基团进行磁过滤。
    • 5. 发明申请
    • Apparatus and a method for cleaning a dielectric film
    • 用于清洁电介质膜的装置和方法
    • US20070113868A1
    • 2007-05-24
    • US11284775
    • 2005-11-22
    • Xinyu FuJohn ForsterWei Wang
    • Xinyu FuJohn ForsterWei Wang
    • B08B6/00
    • H01L21/02063H01J37/32357H01J37/32422H01J37/3266
    • An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted to provide a plurality of reactive radicals to the chamber body, a passage coupling the remote plasma source to the chamber body, and at least one magnet disposed adjacent the passage. In another embodiment, a method of cleaning a dielectric film that includes providing a substrate having an at least partially exposed dielectric layer disposed in a process chamber, generating a plurality of reactive radicals in a remote plasma source, flowing the reactive radicals from the remote plasma source into the process chamber through a passage having at least one magnet disposed adjacent the passage, and magnetically filtering the reactive radicals passing through the passage.
    • 在本发明中提供了一种清洁电介质膜的装置和方法。 在一个实施例中,一种清洁电介质膜的装置包括适于在其中支撑衬底的室主体,适于向室主体提供多个反应性基团的远程等离子体源,将远程等离子体源耦合到 室主体,以及邻近通道设置的至少一个磁体。 在另一个实施例中,一种清洁电介质膜的方法,该方法包括提供具有设置在处理室中的至少部分暴露的电介质层的衬底,在远程等离子体源中产生多个反应性基团,使来自远端等离子体的反应性基团 通过具有邻近通道设置的至少一个磁体的通道进入处理室,并对穿过通道的反应性基团进行磁过滤。