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1. 发明申请

US20060068096A1 METHOD OF SYNTHESISING CARBON NANO TUBES 失效
标题翻译：合成碳纳米管的方法
公开(公告)号：US20060068096A1
公开(公告)日：2006-03-30
申请号：US10301317
申请日：2002-11-20
申请人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
发明人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Loschner , Elmar Platzgummer , Gerhard Stengl
IPC分类号： C23C16/00
CPC分类号： C30B23/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C30B29/02 , C30B29/605 , C30B33/00 , Y10S427/102
摘要： Method of synthesising carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during and/or after formation of said carbon nano tubes for modifying the physical, chemical and/or conductive properties of said carbon nano tubes.
摘要翻译：在形成在支撑构件上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成所述碳纳米管之前，期间和/或之后使用离子束，改变所述碳纳米管的物理，化学和/或导电性质。

2. 发明授权

US07033647B2 Method of synthesising carbon nano tubes 失效
标题翻译：碳纳米管合成方法
公开(公告)号：US07033647B2
公开(公告)日：2006-04-25
申请号：US10301317
申请日：2002-11-20
申请人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Löschner , Elmar Platzgummer , Gerhard Stengl
发明人： Xinhe Tang , Klaus Mauthner , Ernst Hammel , Hans Löschner , Elmar Platzgummer , Gerhard Stengl
IPC分类号： C23C16/26 , C23C16/48 , D01F9/127
CPC分类号： C30B23/00 , B82Y30/00 , B82Y40/00 , C01B32/162 , C30B29/02 , C30B29/605 , C30B33/00 , Y10S427/102
摘要： Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.
摘要翻译：在形成在支撑体上的催化剂层上合成碳纳米管（CNT）的方法，通过从气相中催化沉积碳，由此在形成碳纳米管之前，期间和/或之后使用离子束用于改变碳纳米管的物理，化学和/或导电性质。

3. 发明授权

US07214951B2 Charged-particle multi-beam exposure apparatus 有权
标题翻译：带电粒子多光束曝光装置
公开(公告)号：US07214951B2
公开(公告)日：2007-05-08
申请号：US10969493
申请日：2004-10-20
申请人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
发明人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
IPC分类号： H01J37/08 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
摘要翻译：用于曝光目标（41）的带电粒子多光束曝光装置（1）使用沿平行光束路径朝向目标（41）传播的多个带电粒子束。对于每个粒子束，提供照明系统（10），图案定义装置（20）和投影光学系统（30）。照明系统（10）和/或投影光学系统（30）包括具有多于一个粒子束共有的透镜元件（L 1，L 2，L 3，L 4，L 5）的粒子 - 光学透镜。图案定义装置（20）在相应的粒子束中限定多个子束，通过使其仅通过限定形状的多个孔而将其形状形成为投射到目标（41）上的期望图案子束穿透所述孔，并且还包括消隐装置，以切断所选子束从子束的相应路径的通过。

4. 发明授权

US07041992B2 Charged-particle multi-beam exposure apparatus 有权
公开(公告)号：US07041992B2
公开(公告)日：2006-05-09
申请号：US10969493
申请日：2004-10-20
申请人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
发明人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
IPC分类号： H01J37/08 , G21G5/00
摘要： A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

5. 发明授权

US06989546B2 Particle multibeam lithography 有权
标题翻译：粒子多光刻光刻
公开(公告)号：US06989546B2
公开(公告)日：2006-01-24
申请号：US09375627
申请日：1999-08-17
申请人： Hans Loschner , Gerhard Stengl , Herbert Vonach , Elmar Platzgummer
发明人： Hans Loschner , Gerhard Stengl , Herbert Vonach , Elmar Platzgummer
IPC分类号： H01J37/08
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177 , H01J2237/153
摘要： In a particle multibeam lithography apparatus an illumination system (242) having a particle source (203) produces an illuminating beam (205) of electrically charged particles, and a multibeam optical system (208) positioned after the illumination system (242) and comprising at least one aperture plate having an array of a plurality of apertures to form a plurality of sub-beams focuses the sub-beams onto the surface of a substrate (220), wherein for each sub-beam (207) a deflection unit (210) is positioned within the multibeam optical system and adapted to correct individual imaging aberrations of the respective sub-beam with respect to the desired target position and/or position the sub-beam during a writing process an the substrate surface. Preferably, for each sub-beam the respective aperture of the first aperture plate defines the size and shape of the sub-beam cross-section and the multibeam optical system produces a demagnified image of the aperture on the substrate surface, with a demagnification of at least 20:1.
摘要翻译：在粒子多光刻光刻设备中，具有粒子源（203）的照明系统（242）产生带电粒子的照明光束（205）和位于照明系统（242）之后的多光束光学系统（208）具有多个孔的阵列以形成多个子光束的至少一个孔板将所述子光束聚焦到衬底（220）的表面上，其中对于每个子光束（207），偏转单元（210）被定位在多光束光学系统内，并且适于相对于期望的目标位置校正各个子光束的各个成像像差和/或在写入过程期间将子光束定位在衬底表面上。优选地，对于每个子光束，第一孔径板的相应孔径限定了子束横截面的尺寸和形状，并且多光束光学系统产生基板表面上的孔的缩小图像，至少20：1。

6. 发明申请

US20050104013A1 Charged-particle multi-beam exposure apparatus 有权
标题翻译：带电粒子多光束曝光装置
公开(公告)号：US20050104013A1
公开(公告)日：2005-05-19
申请号：US10969493
申请日：2004-10-20
申请人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
发明人： Gerhard Stengl , Elmar Platzgummer , Hans Loschner
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
摘要翻译：用于曝光目标（41）的带电粒子多光束曝光装置（1）使用沿平行光束路径朝向目标（41）传播的多个带电粒子束。对于每个粒子束，提供照明系统（10），图案定义装置（20）和投影光学系统（30）。照明系统（10）和/或投影光学系统（30）包括具有多于一个粒子束共有的透镜元件（L 1，L 2，L 3，L 4，L 5）的粒子 - 光学透镜。图案定义装置（20）在相应的粒子束中限定多个子束，通过使其仅通过限定形状的多个孔而将其形状形成为投射到目标（41）上的期望图案子束穿透所述孔，并且还包括消隐装置，以切断所选子束从子束的相应路径的通过。

7. 发明申请

US20080203317A1 MULTI-BEAM DEFLECTOR ARRAY DEVICE FOR MASKLESS PARTICLE-BEAM PROCESSING 有权
标题翻译：用于无障碍颗粒光束处理的多光束偏转器阵列装置
公开(公告)号：US20080203317A1
公开(公告)日：2008-08-28
申请号：US12038326
申请日：2008-02-27
申请人： Elmar Platzgummer , Hans Loschner , Samuel Kvasnica , Reinhard Springer , Mathias Irmscher , Florian Letzkus , Jorg Butschke
发明人： Elmar Platzgummer , Hans Loschner , Samuel Kvasnica , Reinhard Springer , Mathias Irmscher , Florian Letzkus , Jorg Butschke
IPC分类号： H01J3/14 , H01L21/20
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3174 , H01J37/3177 , H01J2237/0437
摘要： The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.
摘要翻译：本发明涉及一种用于使用带电粒子束的粒子束曝光装置中的多光束偏转器阵列装置，该多光束偏转器阵列装置具有带有膜区域的板状形状，该膜区域包括一个第一面朝向输入的粒子束，一组孔，每个孔允许通过由粒子束形成的对应子束，多个凹陷，每个凹陷与至少一个孔相关联，以及阵列的电极，每个孔与至少一个电极相关联，并且每个电极位于凹陷中，电极被配置为实现非偏转状态，其中允许通过孔的颗粒沿着期望的路径行进，并且偏转状态，其中颗粒偏离所需的路径。

8. 发明授权

US08368015B2 Particle-optical system 有权
标题翻译：粒子光学系统
公开(公告)号：US08368015B2
公开(公告)日：2013-02-05
申请号：US11990067
申请日：2006-08-08
申请人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
发明人： Elmar Platzgummer , Gerhard Stengl , Helmut Falkner
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/12 , B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.
摘要翻译：多子束多列粒子光学系统技术领域本发明涉及一种多子束多列粒子光学系统，该多子束多列粒子光学系统包括多个列，其被布置成阵列以同时暴露衬底，每个列具有光轴，并且包括：子束产生装置，其包括至少一个用于产生多个带电粒子束的图案的多孔板，以及包括至少一个电极元件的静电透镜装置; 所述至少一个电极元件具有由面向光轴的内周边缘限定的孔，所述孔在与所述光轴正交的平面中具有中心和预定形状; 其中在所述多个列中的至少一个列中，所述孔的预定形状是非圆形形状，其具有围绕所述孔的中心的来自理想圆的突起和凹陷中的至少一个。

9. 发明申请

US20050201246A1 Particle-optical projection system 审中-公开
标题翻译：粒子投影系统
公开(公告)号：US20050201246A1
公开(公告)日：2005-09-15
申请号：US11080578
申请日：2005-03-15
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01L21/027 , G03F7/20 , G11B7/09 , H01J37/02 , H01J37/147 , H01J37/15 , H01J37/20 , H01J37/21 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system (32) a pattern (B) is imaged onto a target (tp) by means of energetic electrically charged particles. The pattern is represented in a patterned beam (pb) of said charged particles emerging from the object plane through at least one cross-over (c); it is imaged into an image (S) with a given size and distortion. To compensate for the Z-deviation of the image (S) position from the actual positioning of the target (tp) (Z denotes an axial coordinate substantially parallel to the optical axis cx), without changing the size of the image (S), the system comprises a position detection means (ZD) for measuring the Z-position of several locations of the target (tp), a control means (33) for calculating modifications (cr) of selected lens parameters of the final particle-optical lens (L2) and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统（32）中，通过能量带电粒子将图案（B）成像到目标（tp）上。所述图案通过至少一个交叉（c）从所述物体平面出射的所述带电粒子的图案化束（pb）中表示; 它被成像为具有给定大小和失真的图像（S）。为了补偿图像（S）位置与目标的实际定位（tp）（Z表示基本上平行于光轴cx的轴向坐标）的Z偏差，而不改变图像（S）的尺寸，该系统包括用于测量目标（tp）的若干位置的Z位置的位置检测装置（ZD），用于计算最终粒子光学透镜的选定透镜参数的修改（cr）的控制装置（33） L 2），并根据所述修改来控制所述透镜参数。

10. 发明申请

US20090140160A1 Charged particle beam exposure system and beam manipulating arrangement 有权
标题翻译：带电粒子束曝光系统和光束操纵装置
公开(公告)号：US20090140160A1
公开(公告)日：2009-06-04
申请号：US11988922
申请日：2006-07-20
申请人： Elmar Platzgummer , Gerhard Stengl
发明人： Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J3/14
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/0435
摘要： A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.
摘要翻译：用于使用带电粒子的多光束施加的光束操纵装置包括具有由带电粒子束穿过的多个孔的多孔板。加热多孔板的框架部分以降低多孔板内的温度梯度。此外，考虑到降低温度梯度，与其他区域相比，多孔板的表面的发热率在一些区域可能更高。

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