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1. 发明申请

US20110199597A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20110199597A1
公开(公告)日：2011-08-18
申请号：US13096112
申请日：2011-04-28
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/52
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

2. 发明授权

US07710542B2 Imaging device in a projection exposure machine 失效
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07710542B2
公开(公告)日：2010-05-04
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

3. 发明授权

US06191898B1 Optical imaging device, particularly an objective, with at least one optical element 有权
标题翻译：具有至少一个光学元件的光学成像装置，特别是物镜
公开(公告)号：US06191898B1
公开(公告)日：2001-02-20
申请号：US09483320
申请日：2000-01-14
申请人： Michael Trunz , Ralf Hilgers , Erich Merz , Michael Mühlbeyer
发明人： Michael Trunz , Ralf Hilgers , Erich Merz , Michael Mühlbeyer
IPC分类号： G02B702
CPC分类号： G02B7/026
摘要： An optical imaging device, particularly an objective, is provided with at least one optical element, which is mounted in an inner ring, the inner ring being connected to an outer mount. A manipulator device serves for the displacement of the optical element in at least one direction that is perpendicular to the optical axis. By a system of peripheral slots between the inner ring and the outer mount with connecting members situated therebetween, a rotary joint between the inner ring and the outer mount, and at least one displacing rotary joint with an adjusting member between the inner ring and the outer mount as the manipulator device, a displacement of the optical element is attained with low deformation or controlled deformation of the optical element. The inner ring and the outer mount are preferably constituted monolithically.
摘要翻译：光学成像装置，特别是物镜，具有安装在内圈中的至少一个光学元件，内环连接到外部安装件。操纵器装置用于在垂直于光轴的至少一个方向上移动光学元件。通过内环和外部安装件之间的外围槽的系统，其中连接构件位于它们之间，内环和外部安装件之间的旋转接头以及至少一个带有调节构件的位移旋转接头，位于内圈和外圈之间作为机械手装置安装，通过光学元件的低变形或受控制的变形来获得光学元件的位移。内环和外部安装件优选地是整体构成的。

4. 发明授权

US07603010B2 Device consisting of at least one optical element 有权
标题翻译：装置由至少一个光学元件组成
公开(公告)号：US07603010B2
公开(公告)日：2009-10-13
申请号：US11509154
申请日：2006-08-24
申请人： Yim-Bun Patrick Kwan , Michael Mühlbeyer , Johannes Lippert
发明人： Yim-Bun Patrick Kwan , Michael Mühlbeyer , Johannes Lippert
IPC分类号： G02B6/26
CPC分类号： G02B7/1827 , G02B7/005 , G02B7/008 , G02B7/023 , G02B7/1822 , G03F7/70258 , G03F7/70825 , G03F7/70891
摘要： An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterized in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.
摘要翻译：光学组件包括至少一个可移动至少两个自由度的光学元件和至少一个用于调节至少一个光学元件的致动器; 至少一个传感器，用于以至少两个自由度感测所述至少一个元件的位置，其特征在于，所述至少一个传感器至少基本上与所述至少一个致动器对角地相对。

5. 发明申请

US20090324174A1 DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT 有权
标题翻译：最少一个光学元件的设备
公开(公告)号：US20090324174A1
公开(公告)日：2009-12-31
申请号：US12555269
申请日：2009-09-08
申请人： Yim-Bun Patrick Kwan , Michael Mühlbeyer , Johannes Lippert
发明人： Yim-Bun Patrick Kwan , Michael Mühlbeyer , Johannes Lippert
IPC分类号： G02B6/26 , G02B7/02 , G01B11/14
CPC分类号： G02B7/1827 , G02B7/005 , G02B7/008 , G02B7/023 , G02B7/1822 , G03F7/70258 , G03F7/70825 , G03F7/70891
摘要： An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator.
摘要翻译：光学组件包括至少一个可移动至少两个自由度的光学元件和至少一个用于调节至少一个光学元件的致动器; 至少一个传感器，用于以至少两个自由度感测所述至少一个元件的位置，其特征在于，所述至少一个传感器至少基本上与所述至少一个致动器对角地相对。

6. 发明授权

US06867913B2 6-mirror microlithography projection objective 失效
标题翻译： 6镜微光投影物镜
公开(公告)号：US06867913B2
公开(公告)日：2005-03-15
申请号：US09920285
申请日：2001-08-01
申请人： Hans-Jürgen Mann , Udo Dinger , Michael Mühlbeyer
发明人： Hans-Jürgen Mann , Udo Dinger , Michael Mühlbeyer
IPC分类号： G02B17/06 , G03F7/20 , G02B17/00
CPC分类号： G03F7/70233 , G02B17/0657
摘要： There is provided a microlithography projection objective for short wavelengths, with an entrance pupil and an exit pupil for imaging an object field in an image field, which represents a segment of a ring field, in which the segment has an axis of symmetry and an extension perpendicular to the axis of symmetry and the extension is at least 20 mm. The objective comprises a first (S1), a second (S2), a third (S3), a fourth (S4), a fifth (S5) and a sixth mirror (S6) in centered arrangement relative to an optical axis. Each of these mirrors have an off-axis segment, in which the light beams traveling through the projection objective impinge. The diameter of the off-axis segment of the first, second, third, fourth, fifth and sixth mirrors as a function of the numerical aperture NA of the objective at the exit pupil is ≦1200 mm * NA.
摘要翻译：提供了用于短波长的微光刻投影物镜，具有用于对图像场中的物场进行成像的入射光瞳和出射光瞳，其表示环形场的区段，其中该区段具有对称轴和延伸部垂直于对称轴和延伸部至少为20mm。目标包括相对于光轴居中排列的第一（S1），第二（S2），第三（S3），第四（S4），第五（S5）和第六反射镜（S6）。这些反射镜中的每一个具有离轴部分，其中穿过投影物镜的光束撞击其中。作为出射光瞳处的物镜的数值孔径NA的函数的第一，第二，第三，第四，第五和第六反射镜的离轴部分的直径为<= 1200MM * NA。

7. 发明授权

US06750949B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US06750949B2
公开(公告)日：2004-06-15
申请号：US10193688
申请日：2002-07-12
申请人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
发明人： Erik Roelof Loopstra , Dominicus Jacobus Petrus Adrianus Franken , Josephus Jacobus Smits , Antonius Johannes Josephus Van Dijsseldonk , Johannes Hubertus Josephina Moors , Albrecht Hof , Günter Maul , Michael Mühlbeyer , Klaus Mehlkopp
IPC分类号： G03B2742
CPC分类号： G03F7/70258 , G02B7/008 , G02B7/02 , G03F7/70833
摘要： A lithographic projection apparatus according to one embodiment of the invention includes a projection system having a plurality of optical elements or sensors mounted on a frame. The frame includes support portions made of a material (e.g. a glass ceramic) having a coefficient of thermal expansion of less than or approximately equal to 0.1×10−6 K−1.
摘要翻译：根据本发明的一个实施例的光刻投影设备包括具有安装在框架上的多个光学元件或传感器的投影系统。框架包括由热膨胀系数小于或大约等于0.1×10 -6 K -1的材料（例如玻璃陶瓷）制成的支撑部分。

8. 发明授权

US06844994B2 Optical element deformation system 有权
标题翻译：光学元件变形系统
公开(公告)号：US06844994B2
公开(公告)日：2005-01-18
申请号：US09956715
申请日：2001-09-19
申请人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
发明人： Frank Melzer , Michael Mühlbeyer , Bernhard Gellrich , Franz Sorg , Stefan Xalter , Thomas Ittner
IPC分类号： G02B26/00 , G02B5/10 , G02B13/24 , G02B26/06 , G02B26/08 , G02B27/00 , G02B27/18 , G03F7/20 , H01L21/027 , G02B7/02
CPC分类号： G03F7/70258 , G02B26/06 , G02B27/0068
摘要： In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.
摘要翻译：在用于成像装置中的光学元件的特定变形的系统中，特别是在具有用于微光刻的投影透镜的投影曝光机中，为了消除图像误差或主动调节，压电元件作为致动器形式的薄板，薄膜或层到要变形的表面或整合到它们中。结合具有传感器的自适应伺服回路，通过作为致动器的压电元件的受控激活，力和/或力矩被施加在光学元件上用于其特定变形。

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