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1. 发明授权

US08810934B2 Positioning method for an optical arrangement of a projection illumination system 有权
标题翻译：投影照明系统的光学布置的定位方法
公开(公告)号：US08810934B2
公开(公告)日：2014-08-19
申请号：US13050155
申请日：2011-03-17
申请人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
发明人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
IPC分类号： G02B7/02 , G03B27/54 , G03B27/32
CPC分类号： G02B27/62 , G03F7/70258 , G03F7/70525
摘要： The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.
摘要翻译：本公开涉及一种用于生产和/或调整投影照明系统的光学装置的方法，其中至少一个致动器用于通过移动光学元件来设置要操纵的至少一个光学元件的位置递增地以特定的增量大小。移动增量的增量大小被设置为光学元件距离期望位置的距离的函数，距离由距离值表示。如果距离值高于第一阈值，则设定基本上恒定的增量大小，而如果距离值低于第一阈值，则特定增量大小随着与期望位置的距离而减小。或者或另外，与特定增量尺寸和/或预先规定的增量尺寸变化率的预定偏差导致警告信号和/或停止运动。

2. 发明申请

US20110267596A1 GRAVITATION COMPENSATION FOR OPTICAL ELEMENTS IN PROJECTION EXPOSURE APPARATUSES 有权
标题翻译：投影曝光装置中的光学元件的渲染补偿
公开(公告)号：US20110267596A1
公开(公告)日：2011-11-03
申请号：US13111492
申请日：2011-05-19
申请人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
发明人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
IPC分类号： G03B27/54 , F16M13/02
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译：公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。这尤其适用于要补偿的高重量力。此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。

3. 发明授权

US07961294B2 Imaging device in a projection exposure facility 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07961294B2
公开(公告)日：2011-06-14
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52 , G03B7/02
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

4. 发明授权

US07304717B2 Imaging device in a projection exposure facility 失效
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07304717B2
公开(公告)日：2007-12-04
申请号：US10250495
申请日：2002-12-17
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52 , G02B7/02 , G03B27/54
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

5. 发明授权

US07548387B2 Optical imaging device 有权
标题翻译：光学成像装置
公开(公告)号：US07548387B2
公开(公告)日：2009-06-16
申请号：US11278850
申请日：2006-04-06
申请人： Thorsten Rassel , Erich Merz , Martin Mahlmann
发明人： Thorsten Rassel , Erich Merz , Martin Mahlmann
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , F16C32/0603 , F16C32/0692 , F16C33/72 , G02B7/02 , G03F7/70266 , G03F7/70816
摘要： An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).
摘要翻译：光学成像装置（1a）具有至少一个光学元件（2），该光学元件设置有外框架（1），安装有光学元件（2）的内圈（4）至少一个执行器。通过设置在内环（4）和外框架（1）之间的支撑件（5），内环（4）与外框架（1）的非接触连接以至少一个自由度提供。操纵器具有至少一个致动器（8），其设定力和/或承载力在内圈（4）上非接触地作用，用于相对于内环（4）的安装和/或定位和/或操纵内环（4）外框架（1）。

6. 发明申请

US20090040487A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20090040487A1
公开(公告)日：2009-02-12
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

7. 发明申请

US20080174757A1 IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE 失效
标题翻译：投影曝光机成像装置
公开(公告)号：US20080174757A1
公开(公告)日：2008-07-24
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

8. 发明授权

US08514371B2 Imaging device in a projection exposure facility 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US08514371B2
公开(公告)日：2013-08-20
申请号：US13096112
申请日：2011-04-28
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

9. 发明授权

US07486382B2 Imaging device in a projection exposure machine 有权
标题翻译：投影曝光机中的成像装置
公开(公告)号：US07486382B2
公开(公告)日：2009-02-03
申请号：US11316160
申请日：2005-12-21
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54 , G03B27/42 , G03B27/52 , G02B7/02
CPC分类号： G03F7/70825 , G03F7/70258
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译：用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。

10. 发明申请

US20060230413A1 OPTICAL IMAGING DEVICE 有权
标题翻译：光学成像装置
公开(公告)号：US20060230413A1
公开(公告)日：2006-10-12
申请号：US11278850
申请日：2006-04-06
申请人： Thorsten Rassel , Erich Merz , Martin Mahlmann
发明人： Thorsten Rassel , Erich Merz , Martin Mahlmann
IPC分类号： G11B7/24
CPC分类号： G03F7/70825 , F16C32/0603 , F16C32/0692 , F16C33/72 , G02B7/02 , G03F7/70266 , G03F7/70816
摘要： An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).
摘要翻译：光学成像装置（1a）具有至少一个光学元件（2），该光学元件设置有外框架（1），安装有光学元件（2）的内圈（4），以及具有至少一个致动器。通过设置在内环（4）和外框架（1）之间的支撑件（5），内环（4）与外框架（1）的非接触连接以至少一个自由度提供。操纵器具有至少一个致动器（8），其设定力和/或承载力在内圈（4）上非接触地作用，用于相对于内环（4）的安装和/或定位和/或操纵内环（4）外框架（1）。

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