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    • 2. 发明授权
    • Method and apparatus for regenerating an ammoniacal etching solution
    • 用于再生氨蚀刻溶液的方法和装置
    • US4576677A
    • 1986-03-18
    • US598087
    • 1984-04-09
    • Wolfgang FaulLeander FurstWalter HolzerBertel Kastening
    • Wolfgang FaulLeander FurstWalter HolzerBertel Kastening
    • C23F1/46C23F1/00B44C1/22C03C15/00C03C25/06
    • C23F1/46
    • Ammoniacal etching solution containing metal ions as the result of etching is withdrawn from an etching bath and while part of it goes to an electrolysis cell for removal of metal ion, the remainder goes back to the etching bath through a liquid jet pump in which it serves as the working liquid, while the pump sucks in from the electrolysis cell the anodically evolved oxygen. The thorough mixing of the oxygen into the etching solution performed by the pump results in oxidation so rapid that in many cases it becomes unnecessary to suspend catalyst particles in the electrolyte to accelerate the oxidative regeneration of the etching solution. Where use of such particles is still desired, the solution drawn from the etching bath goes through a cylindrical filter unit from which a filtrate is drawn off laterally for the electrolysis cell, while the remainder of the input goes to the jet pump. Controls are provided for using the electrolysis cell only when the metal ion concentration is above a predetermined value, for adding ammonia to the oxygen line in order to maintain a particular value of pH and for controlling the temperature of the electrolyte in the electrolysis cell in order that a desired quantity of water can be condensed from the oxygen line for use in rinsing the work pieces after they are taken out of the etching bath.
    • 作为蚀刻结果含有金属离子的氨蚀刻溶液从蚀刻浴中取出,并且其一部分进入用于去除金属离子的电解槽,其余部分通过液体喷射泵返回到蚀刻槽 作为工作液体,当泵从电解槽吸入阳极放出的氧气。 将氧气彻底混合到由泵执行的蚀刻溶液中导致氧化如此快速,使得在许多情况下不需要将催化剂颗粒悬浮在电解质中以加速蚀刻溶液的氧化再生。 在仍然需要使用这种颗粒的情况下,从蚀刻浴中抽出的溶液通过圆柱形过滤器单元,其中滤液被横向排出用于电解池,而剩余的输入进入喷射泵。 提供了仅当金属离子浓度高于预定值时才使用电解池的控制,以便为了保持特定的pH值和为了控制电解槽中的电解质的温度按顺序向氧线添加氨 可以从工作片从蚀刻槽中取出所需量的水从氧气线上冷凝,以用于冲洗工件。
    • 3. 发明授权
    • Method of regenerating an ammoniacal etching solution
    • 再生氨蚀刻液的方法
    • US4385969A
    • 1983-05-31
    • US287492
    • 1981-07-27
    • Bertel KasteningWolfgang FaulLeander FurstWalter Holzer
    • Bertel KasteningWolfgang FaulLeander FurstWalter Holzer
    • C23F1/40C23F1/46H05K3/06C25C1/12C25C1/00C25C1/16
    • C23F1/46
    • In addition to catalyzing the reoxidization of spent alkaline etching age the suspension of activated carbon powder in the etching solution also increases the speed of etching when the etching solution is recirculated in the etching of printed circuit boards. The ammonium sulfate etching solution is set to a pH of about 9 by the addition of ammonia gas. In the recirculation of the etching solution, a part of the solution can be freed by filtration from suspended carbon particles and passed through the cathode and anode chambers of an electrolysis cell for the recovery of the etched metal by deposition on the cathode. The activated carbon powder for this purpose is calcined before use, at a temperature of between 900.degree. and 1200.degree. C. in vacuum or in an atmosphere that is inert, reducing, or only slightly oxidizing as in the case of an atmosphere containing carbon dioxide, water vapor or both, in a concentration that does not appreciably oxidize the carbon particles.
    • 除了催化废碱蚀刻剂的再氧化之外,当在印刷电路板的蚀刻中蚀刻溶液再循环时,活性炭粉末在蚀刻溶液中的悬浮液也增加了蚀刻速度。 通过加入氨气使硫酸铵蚀刻溶液的pH设定为约9。 在蚀刻溶液的再循环中,溶液的一部分可以通过从悬浮碳颗粒过滤而被除去,并通过电解槽的阴极和阳极室,以通过沉积在阴极上来回收蚀刻的金属。 用于此目的的活性炭粉末在使用前煅烧,在真空中或在惰性,还原或仅微量氧化的气氛中在900℃至1200℃的温度下,如在含有二氧化碳的气氛中 ,水蒸气或两者,浓度不会明显地氧化碳颗粒。
    • 7. 发明授权
    • Regeneration of an ammoniacal etching solution with recycling of
solution with electrolytically reduced metal content to the
regeneration input
    • 通过将电解还原金属含量的溶液再循环至再生输入,再次生成氨溶液
    • US4557811A
    • 1985-12-10
    • US669312
    • 1984-11-07
    • Leander FurstWalter Holzer
    • Leander FurstWalter Holzer
    • C23F1/00C23F1/34C23F1/46H05K3/06C25C1/00C25C7/00
    • C23F1/46
    • The intermittent electrolysis of a portion of the used ammoniacal etching solution generates oxygen at the anode which is mixed into the remainder of the circulated etching solution for reoxidation and regeneration before it is returned to the etching chamber. The portion of the solution which goes through the electrolysis cell, and has its metal content reduced, is returned to the beginning of the circulation loop rather than to the etching chamber, in order that the metal content of the circulated solution may be quickly reduced. This reduction is quickly picked up by a metal content measuring device in the branch supplying solution to the electrolysis cell. When the metal content is below a certain level, the solution in that branch is returned directly to the beginning of the circulation loop, but when the metal content exceeds the threshold, it is valved into and through the electrolysis cell until the metal content as measured in the line leading to the electrolysis cell drops below its lower threshold value.
    • 所使用的氨水蚀刻溶液的一部分的间歇电解在阳极处产生氧,在返回到蚀刻室之前,其被混合到剩余的循环蚀刻溶液中用于再氧化和再生。 通过电解池的溶液的部分,其金属含量降低,返回到循环回路的开始而不是蚀刻室,以便循环溶液的金属含量可以快速降低。 这种还原通过分支供应溶液中的金属含量测量装置快速地拾取到电解槽中。 当金属含量低于一定水平时,该分支中的溶液直接返回到循环回路的开始处,但是当金属含量超过阈值时,其被电压进入并通过电解槽,直到所测量的金属含量 在导致电解池的线路下降到其低阈值以下。
    • 8. 发明授权
    • Device for removing hydrogen from a gas mixture and its use
    • 用于从气体混合物中除去氢的装置及其用途
    • US6074618A
    • 2000-06-13
    • US91587
    • 1998-06-22
    • Leander FurstHerbert NeumesiterReinhold Flucht
    • Leander FurstHerbert NeumesiterReinhold Flucht
    • G21F9/02B01D53/86B01J19/24C01B3/58C01B5/00G21C19/37B01D53/34
    • B01D53/8671C01B3/58C01B5/00C01B2203/0435C01B2203/0465
    • The invention relates to a device for removing hydrogen from a gas mixture containing free hydrogen and oxygen by means of catalytic oxidation of the hydrogen in a reaction chamber (6) having a support (1) secured in the reaction chamber and coated on its surface (2) with catalytically active materials, serving to dissipate reaction heat, and also with an inlet (7) into the reaction chamber for the gas mixture and with an outlet (10) for residual gas that remains after the oxidation of the hydrogen. A part (5) of the catalytically active surface (2) of the support (1) is immersed into a liquid bath (3), the temperature of which is below the condensation temperature of the water vapor formed in the reaction chamber (6). The liquid inlet (7) for the liquid bath (3) concurrently serves as the inlet for the gas mixture to be fed into the reaction chamber and a liquid outlet (10) concurrently serves as an outlet for the residual gas, and both the liquid inlet (7) and the liquid outlet (10) are situated below the liquid level (8) in the reaction chamber (6) and whereby the pressure in the reaction chamber can be controlled.
    • PCT No.PCT / DE96 / 02418 Sec。 371日期1998年7月13日第 102(e)日期1998年7月13日PCT 1996年12月16日PCT公布。 公开号WO97 / 23412 PCT 日期1997年7月3日本发明涉及一种用于通过在具有固定在反应室中的载体(1)的反应室(6)中的氢的催化氧化从含有游离氢和氧的气体混合物中除去氢气的装置,以及 在其表面(2)上涂覆有催化活性材料,用于消散反应热,并且还具有入口(7)进入用于气体混合物的反应室中,并具有用于在氧化后保留的残余气体的出口(10) 氢气。 将支撑体(1)的催化活性表面(2)的部分(5)浸入液体浴(3)中,液体温度低于在反应室(6)中形成的水​​蒸汽的冷凝温度, 。 用于液浴(3)的液体入口(7)同时用作用于进入反应室的气体混合物的入口,液体出口(10)同时用作残余气体的出口,并且液体 入口(7)和液体出口(10)位于反应室(6)中的液面(8)的下方,从而可以控制反应室中的压力。
    • 9. 发明授权
    • Gas flow regulator for gases with condensable components
    • 具有可冷凝组分的气体气体调节器
    • US4630637A
    • 1986-12-23
    • US775736
    • 1985-09-13
    • Leander FurstJohan T. G. BallastKurt Jahnel
    • Leander FurstJohan T. G. BallastKurt Jahnel
    • G05D7/01G05D16/06F16K49/00
    • G05D7/0106G05D16/0663Y10T137/6579Y10T137/7036Y10T137/87917
    • A gas flow regulator for gases with condensable components, which deliversases at constant pressure with constant average composition comprising a gas flow control mechanism, preferably including a spring-loaded membrane bounding a receiving chamber, which is subjected to the pressure of the gases flowing in and which an inlet valve control; and a cooling section connected and vertically oriented to the gas flow control mechanism by which the proportions of the condensable components are held at a partial pressure given by the cooling temperature, and a means for maintaining the gas flow control mechanism at a temperature above the condensation point. A restrictor, preferably an adjustable outlet valve, is connected after the cooling section to help maintain the membrane under pressure by the flowing gas, from which all condensate formed arrives in the region below the regulator directly by action of the force of gravity.
    • 一种用于具有可冷凝组分的气体的气体流量调节器,其以恒定的平均成分输送恒定压力的气体,包括气体流量控制机构,优选地包括界定接收室的弹簧加载的膜,其受到在 并且进气阀控制; 以及连接并垂直取向到气流控制机构的冷却部分,通过该冷却部分将冷凝组分的比例保持在由冷却温度给出的分压下,以及用于将气体流量控制机构保持在高于冷凝的温度的装置 点。 在冷却部分之后连接限流器,优选地是可调节的出口阀,以有助于通过流动的气体来保持膜的压力,所有的冷凝物从该气流直接通过重力的作用到达调节器下方的区域。