会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Depletion mode chip decoupling capacitor
    • 耗尽模式芯片去耦电容
    • US5032892A
    • 1991-07-16
    • US453861
    • 1989-12-20
    • Wen-Foo ChernWard M. ParkinsonThomas M. TrentKevin G. DuesmanJames E. O'Toole
    • Wen-Foo ChernWard M. ParkinsonThomas M. TrentKevin G. DuesmanJames E. O'Toole
    • H01L27/02H01L27/08H05K1/02
    • H01L27/0805H01L27/0214H05K1/0231
    • An integrated cirucuit is provided with a depletion mode filter capacitor, which reduces voltage spiking, while at the same time avoiding latchup problems caused by the capacitor. The depletion mode capacitor has a barrier layer which is doped to an opposite conductivity type as the integrated circuit's substrate, achieved by doping to provide an opposite difference from four valence electrons as the substrate. The barrier is formed as a part of a CMOS process, in a manner which avoids additional process steps. The capacitor is formed with one node connected to ground or substrate, and the other node directly to a power bus. The capacitor is located on open space available on the whole siliocn chip (memory as well as logic chip), particularly directly underneath the metal power bus to achieve an on-chip power bus decoupling capacitor wth capacitance in excess of 0.001 .mu.F.
    • 一个集成的cirucuit配备有耗尽型滤波电容,可以减少电压尖峰,同时避免电容引起的闭锁问题。 耗尽型电容器具有阻挡层,其被掺杂成与集成电路的衬底相反的导电类型,通过掺杂实现,以提供与四价电子相反的差异作为衬底。 阻挡层以避免额外工艺步骤的方式形成为CMOS工艺的一部分。 电容器形成有一个节点连接到接地或基板,另一个节点直接连接到电源总线。 电容器位于整个硅芯片(存储器和逻辑芯片)上的开放空间上,特别是直接在金属电源总线下方,以实现片上电源总线去耦电容器超过0.001μF的电容。
    • 10. 发明授权
    • Reduced latchup in precharging I/O lines to sense amp signal levels
    • 在预充电I / O线路中减少闭锁以感测放大器信号电平
    • US4962326A
    • 1990-10-09
    • US222842
    • 1988-07-22
    • Ward D. ParkinsonWen-Foo Chern
    • Ward D. ParkinsonWen-Foo Chern
    • G11C7/10H03K19/003
    • G11C7/1048H03K19/00315
    • I/O lines on a CMOS circuit are precharged to preferred voltage levels in order to avoid latch up. The precharging is achieved by using N channel transistors to provide a precharge which is at a threshold voltage (V.sub.T) below bias voltage V.sub.CC, or (V.sub.CC -V.sub.T). This results in a lower forward bias when V.sub.CC bumps down after the I/O lines are floated. By lowering the precharge voltage by a level corresponding to a threshold voltage (V.sub.T), the allowed range of power supply voltage bumping is increased by this amount. This eliminmates the destructive effect of a negative bump of V.sub.BE, which would have presented a diode forward bias condition. Instead, the power supply may bump to (V.sub.BE +V.sub.T).
    • CMOS电路上的I / O线被预先充电至优选的电压电平,以避免闩锁。 通过使用N沟道晶体管来提供预充电,该预充电的阈值电压(VT)低于偏置电压VCC或(VCC-VT)。 这导致当I / O线浮起后VCC下降时,较低的正向偏置。 通过将预充电电压降低到与阈值电压(VT)相对应的电平,电源电压触发的允许范围增加该量。 这消除了VBE的负凸起的破坏性影响,其将呈现二极管正向偏置条件。 相反,电源可能会碰到(VBE + VT)。