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    • 1. 发明授权
    • Method of multi-port virtual local area network (VLAN) supported by multi-protocol label switch (MPLS)
    • 多协议标签交换(MPLS)支持的多端口虚拟局域网(VLAN)方法
    • US07848333B2
    • 2010-12-07
    • US10565352
    • 2004-07-27
    • Wei ZhuBo ChenJianbing Wang
    • Wei ZhuBo ChenJianbing Wang
    • H04L12/28
    • H04L45/507
    • The present invention provides a method of supporting a multi-port virtual local area network (VLAN) with a multi-protocol Label switch (MPLS), comprising steps of: establishing a label switching path (LSP) by the label distribution protocol (LDP), and obtaining information binding a forwarding equivalence class (FEC) and a label or information binding an ingress label and an egress label, and an address of a LDP peer entity at an opposite end, which is a next-hop IP address; the MPLS table item managing module creating a forwarding-relation table, and adding a forwarding-relation table item based upon the obtained information; obtaining an egress port corresponding to the forwarding-relation table item based upon the next-hop IP address; and accomplishing the MPLS via the egress port. With the present invention, it is possible to support the multi-port VLAN in a three-layer switch with the function of the MPLS and implement the MPLS in the VLAN.
    • 本发明提供了一种支持多协议标签交换机(MPLS)的多端口虚拟局域网(VLAN)的方法,包括以下步骤:通过标签分发协议(LDP)建立标签交换路径(LSP) 并且获取绑定转发等价类(FEC)的信息和绑定入口标签和出口标签的标签或信息以及作为下一跳IP地址的相对端的LDP对等实体的地址; 所述MPLS表项目管理模块创建转发关系表,并且基于获得的信息添加转发关系表项; 基于下一跳IP地址获取对应于转发关系表项的出口端口; 并通过出口端口完成MPLS。 通过本发明,可以在具有MPLS功能的三层交换机中支持多端口VLAN,并在VLAN内实现MPLS。
    • 5. 发明授权
    • System, device, and method for adjusting wind turbine component workload
    • 用于调整风力发电机组件工作负载的系统,设备和方法
    • US09377007B2
    • 2016-06-28
    • US13976674
    • 2010-12-30
    • Wei Zhu
    • Wei Zhu
    • F03D7/00F03D7/02H02P9/04F03D7/04
    • F03D7/00F03D7/0204F03D7/0292F03D7/043F05B2270/321F05B2270/329F05B2270/332H02P9/04Y02E10/723
    • A system, a device and a method for controlling an operation of a wind turbine (100) based on a wind turbine component workload. The system includes a control device (120) that is configured to actuate a wind turbine component (130). The system also includes a wind turbine controller (205) that is coupled in communication with the control device (120) and configured to determine a workload associated with the wind turbine component (130) based at least in part on one or more actuations of the wind turbine component (130) by the control device (120) within a time period. The wind turbine controller (205) is also configured to calculate an operating threshold value based at least in part on the calculated workload and to operate the wind turbine component (130) by the control device (120) based on the calculated operating threshold value.
    • 一种用于基于风力涡轮机部件工作负载来控制风力涡轮机(100)的操作的系统,装置和方法。 该系统包括配置成致动风力涡轮机部件(130)的控制装置(120)。 该系统还包括风力涡轮机控制器(205),该风力涡轮机控制器(205)与控制装置(120)相连接并被配置为至少部分地基于风力涡轮机组件(130)的一个或多个动作来确定与风力涡轮机部件(130)相关联的工作负载 风力涡轮机部件(130)由控制装置(120)在一段时间内。 风力涡轮机控制器(205)还被配置为至少部分地基于所计算的工作量来计算操作阈值,并且基于所计算的操作阈值由控制装置(120)操作风力涡轮机部件(130)。
    • 7. 发明申请
    • APPARATUS AND METHOD FOR CALIBRATING LITHOGRAPHY PROCESS
    • 用于校准光刻过程的装置和方法
    • US20110279797A1
    • 2011-11-17
    • US12891738
    • 2010-09-27
    • CHUN CHI CHENSai Hung LamWei ZhuChin Yu Chen
    • CHUN CHI CHENSai Hung LamWei ZhuChin Yu Chen
    • G03B27/42
    • H01L21/67253G03F7/70516H01L23/544H01L2223/54433H01L2924/0002H01L2924/00
    • A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second mark type may be located on an outer peripheral portion of the wafer to indicate the desired boundary of a wafer edge expose region (WEE). A third mark type may indicate the border of a portion of the wafer expected to bear a wafer identification mark. A fourth mark type may be located at the center of the wafer to allow for precise and uniform application of liquid photoresist material to the calibration wafer. The calibration wafer may be employed in methods of rapidly and easily assessing the accuracy of various phases of photolithography processes.
    • 校准晶片可以承载一种或多种不同的标记类型,以便于光刻工艺的检查。 第一标记类型可以位于晶片的外周部分上,以指示边缘珠去除(EBR)区域的期望边界。 第二标记类型可以位于晶片的外周部分上,以指示晶片边缘曝光区域(WEE)的期望边界。 第三标记类型可以指示期望承载晶片识别标记的晶片的一部分的边界。 第四标记类型可以位于晶片的中心,以允许液体光致抗蚀剂材料精确和均匀地施加到校准晶片。 校准晶片可以用于快速且容易地评估光刻工艺的各个阶段的精度的方法。
    • 8. 发明申请
    • MAGNETIC CIRCUIT UNIT AND SPEAKER USING SAME
    • 磁性电路单元和使用相同的扬声器
    • US20110261992A1
    • 2011-10-27
    • US12978582
    • 2010-12-26
    • Xing-Zhi HUANGLi-Shu XiWei Zhu
    • Xing-Zhi HUANGLi-Shu XiWei Zhu
    • H04R1/00H01F7/02
    • H04R9/025H04R2499/11
    • A magnetic circuit unit includes a yoke, a magnet positioned on the yoke, a plate on the magnet. The yoke includes a bottom defining a central hole therein, and a wall extending from the bottom. The magnet is positioned on the bottom of the yoke. The plate defines a base coupled to a top surface of the magnet, and a central pole extending from the base and getting through the annular magnet with an end thereof suspended in the central hole of the yoke. Thus, a first magnetic gap is formed between the wall of the yoke and an outer side of the annular magnet, and a second magnetic gap is formed between the central pole of the plate and an inner side of the annular magnet. A speaker using the magnetic circuit unit described above is disclosed.
    • 磁路单元包括磁轭,位于磁轭上的磁体,磁体上的板。 轭包括限定其中的中心孔的底部和从底部延伸的壁。 磁铁位于磁轭的底部。 板限定了联接到磁体的顶表面的基座和从基座延伸并穿过环形磁体的中心极,其中端部悬挂在磁轭的中心孔中。 因此,在轭的壁和环形磁体的外侧之间形成第一磁隙,并且在板的中心极和环形磁体的内侧之间形成第二磁隙。 公开了使用上述磁路单元的扬声器。