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1. 发明授权

US06759665B2 Method and system for ion beam containment in an ion beam guide 有权
标题翻译：离子束导管中离子束收容的方法和系统
公开(公告)号：US06759665B2
公开(公告)日：2004-07-06
申请号：US09865155
申请日：2001-05-24
申请人： Victor M. Benveniste , William F. DiVergilio , John Z. Ye
发明人： Victor M. Benveniste , William F. DiVergilio , John Z. Ye
IPC分类号： H01J37317
CPC分类号： H01J37/32623 , H01J37/05 , H01J37/3171 , H01J37/32678
摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The magnets may cooperatively interact to provide a multi-cusped magnetic field along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway for a given low energy ion beam. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.
摘要翻译：公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。该设备包括安装在沿着离子束路径的通道中的质量分析磁体和适于在通道中提供多通道磁场的磁性装置，该磁性装置可以包括沿着至少一部分通道。磁体可以协同地相互作用以沿着通道的至少一部分提供多脉冲磁场。对于给定的低能量离子束，多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上。因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

2. 发明授权

US06879109B2 Thin magnetron structures for plasma generation in ion implantation systems 失效
标题翻译：用于离子注入系统中等离子体生成的薄磁控管结构
公开(公告)号：US06879109B2
公开(公告)日：2005-04-12
申请号：US10600775
申请日：2003-06-20
申请人： Victor M. Benveniste , William F. DiVergilio , Bo H. Vanderberg
发明人： Victor M. Benveniste , William F. DiVergilio , Bo H. Vanderberg
IPC分类号： H01J37/317 , H05H1/24
CPC分类号： H01J37/32082 , H01J37/3171 , H01J37/3266 , H01J2237/0041
摘要： A plasma generator for space charge neutralization of an ion beam is disclosed and resides within an ion implantation system operable to generate an ion beam and direct the ion beam along a beamline path. The plasma generator comprises an electric field generation system operable to generate an electric field in a portion of the beamline path, and a magnetic field generation system operable to generate a magnetic field in the portion of the beamline path, wherein the magnetic field is perpendicular to the electric field. The plasma generator further comprises a gas source operable to introduce a gas in a region occupied by the electric field and the magnetic field. Electrons in the region move in the region due to the electric field and the magnetic field, respectively, and at least some of the electrons collide with the gas in the region to ionize a portion of the gas, thereby generating a plasma in the region.
摘要翻译：公开了一种用于离子束的空间电荷中和的等离子体发生器，并且位于离子注入系统内，可操作以产生离子束并沿着束线路径引导离子束。等离子体发生器包括可操作以在束线路径的一部分中产生电场的电场产生系统，以及可操作以在束线路径的该部分中产生磁场的磁场产生系统，其中磁场垂直于电场。等离子体发生器还包括可操作以在由电场和磁场占据的区域中引入气体的气体源。该区域中的电子分别由于电场和磁场而在该区域内移动，并且至少一些电子与该区域中的气体碰撞以使一部分气体离子化，从而在该区域中产生等离子体。

3. 发明授权

US06664548B2 Ion source and coaxial inductive coupler for ion implantation system 失效
公开(公告)号：US06664548B2
公开(公告)日：2003-12-16
申请号：US10209397
申请日：2002-07-31
申请人： Victor M. Benveniste , William F. DiVergilio
发明人： Victor M. Benveniste , William F. DiVergilio
IPC分类号： H01J2706
CPC分类号： H01J37/08 , H01J2237/0815 , H01J2237/083 , H01J2237/0835 , H01J2237/31701
摘要： An ion source is disclosed having an elongated slit for providing a ribbon ion beam for use in an ion implantation system. The source comprises a coaxial inductive coupling antenna for RF excitation of plasma within a cylindrical source housing, as well as circumferential magnets disposed within the housing for generating azimuthal multi-cusped magnetic fields for plasma confinement. Also disclosed is a liner for the housing interior providing thermal barrier between the plasma and the outer housing wall so as to mitigate or reduce condensation within the plasma confinement chamber.

4. 发明授权

US06414329B1 Method and system for microwave excitation of plasma in an ion beam guide 有权
标题翻译：离子束引导中等离子体微波激发的方法和系统
公开(公告)号：US06414329B1
公开(公告)日：2002-07-02
申请号：US09625153
申请日：2000-07-25
申请人： Victor M. Benveniste , William F. DiVergilio , Frank Sinclair
发明人： Victor M. Benveniste , William F. DiVergilio , Frank Sinclair
IPC分类号： H01J37317
CPC分类号： H01J37/32623 , H01J37/05 , H01J37/3171 , H01J37/32678
摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.
摘要翻译：公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。该装置包括安装在沿着离子束的路径的通道中的质量分析磁体，适于在通道中提供电场的电源以及适于在通道中提供多通道磁场的磁性装置，其中可以包括沿通道的至少一部分安装的多个磁体。电源和磁体可以协同地相互作用以沿着通道的至少一部分提供电子回旋共振（ECR）状态。多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上，以与给定的低能离子束的已知RF或微波频率的电场相互作用。本发明还包括质量分析器波导，其适于沿着质量分析器通道的长度一致地将电场耦合到束等离子体，从而改善ECR条件的产生。因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

5. 发明授权

US06291828B1 Glass-like insulator for electrically isolating electrodes from ion implanter housing 有权
标题翻译：用于将电极与离子注入机外壳电隔离的玻璃状绝缘体
公开(公告)号：US06291828B1
公开(公告)日：2001-09-18
申请号：US09469068
申请日：1999-12-21
申请人： Kourosh Saadatmand , David R. Swenson , William F. DiVergilio , Stephen M. Quinn , Zhimin Wan , Victor M. Benveniste
发明人： Kourosh Saadatmand , David R. Swenson , William F. DiVergilio , Stephen M. Quinn , Zhimin Wan , Victor M. Benveniste
IPC分类号： G21K510
CPC分类号： H01J37/3171 , H01J37/12 , H01J2237/038 , H01J2237/04737 , H01J2237/04924
摘要： An electrostatic quadrupole lens assembly (60) is provided for an ion implanter (10) having an axis (86) along which an ion beam passes, comprising: (i) four electrodes (84a-84d) oriented radially outward from the axis (86), approximately 90° apart from each other, such that a first pair of electrodes (84a and 84c) oppose each other approximately 180° apart, and a second pair of electrodes (84b and 84d) also oppose each other approximately 180° apart; (ii) a housing (62) having a mounting surface (64) for mounting the assembly (60) to the implanter, the housing at least partially enclosing the four electrodes (84a-84d); (iii) a first electrical lead (104) for providing electrical power to the first pair of electrodes (84a and 84c); (iv) a second electrical lead (108) for providing electrical power to the second pair of electrodes (84b and 84d); and (v) a plurality of electrically insulating members (92) formed of a glass-like material, comprising at least a first electrically insulating member for attaching the first pair of electrodes (84a and 84c) to the housing, and at least a second electrically insulating member for attaching the second pair of electrodes (84b and 84d) to the housing. The plurality of electrically insulating members (92) are preferably comprised of quartz (SiO2), or a heat resistant and chemical resistant glass material such as Pyrex®. The members (92) resist accumulation of material such as graphite sputtered off of the electrodes (84a-84d) by the ion beam, thus reducing the occurrence of high voltage breakdown and electrical current breakdown.
摘要翻译：为具有离子束通过的轴线（86）的离子注入机（10）提供静电四极透镜组件（60），包括：（i）从轴线（86）径向向外取向的四个电极（84a-84d））彼此大约90°，使得第一对电极（84a和84c）彼此相对大约180°，并且第二对电极（84b和84d）也彼此相对大约180°; （ii）具有用于将所述组件（60）安装到所述注入器的安装表面（64）的壳体（62），所述壳体至少部分地包围所述四个电极（84a-84d）; （iii）用于向所述第一对电极（84a和84c）提供电力的第一电引线（104）; （iv）用于向所述第二对电极（84b和84d）提供电力的第二电引线（108）; 和（v）由玻璃状材料形成的多个电绝缘构件（92），至少包括用于将第一对电极（84a和84c）附接到壳体的第一电绝缘构件，以及至少第二用于将第二对电极（84b和84d）附接到壳体的电绝缘构件。多个电绝缘构件（92）优选地由石英（SiO 2）或耐热和耐化学腐蚀的玻璃材料（例如Pyrex）组成。构件（92）通过离子束阻止溅射在电极（84a-84d）之外的诸如石墨的材料的堆积，从而减少高压击穿和电流击穿的发生。

6. 发明授权

US07748344B2 Segmented resonant antenna for radio frequency inductively coupled plasmas 有权
标题翻译：用于射频感应耦合等离子体的分段谐振天线
公开(公告)号：US07748344B2
公开(公告)日：2010-07-06
申请号：US10702368
申请日：2003-11-06
申请人： William F. DiVergilio , Victor M. Benveniste , Peter L. Kellerman
发明人： William F. DiVergilio , Victor M. Benveniste , Peter L. Kellerman
IPC分类号： C23C16/452 , C23C16/507 , C23C16/509 , C23C16/517 , C23C16/505 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号： H01J37/321
摘要： An ion shower system is disclosed and comprises a plasma source operable to generate source gas ions within a chamber. The plasma source further comprises a plurality of conductor segments and a plurality of capacitors, wherein the conductor segments are serially connected through the plurality of capacitors. The plasma source further comprises an antenna drive circuit coupled to the plurality of conductor segments that provides power to the conductor segments and capacitors at a predetermined frequency. The ion shower system also comprises a source gas inlet that provides a source gas to the chamber. The conductor segments, capacitors and antenna drive circuit cooperatively provide energy to charged particles in the chamber, thereby energizing the charged particles and generating a plasma comprising source gas ions and electrons within the chamber due to ionizing collisions between the energized charged particles and the source gas.
摘要翻译：公开了一种离子淋浴系统，其包括可操作以在室内产生源气体离子的等离子体源。等离子体源还包括多个导体段和多个电容器，其中导体段通过多个电容器串联连接。等离子体源还包括耦合到多个导体段的天线驱动电路，其以预定频率向导体段和电容器提供功率。离子淋浴系统还包括向腔室提供源气体的源气体入口。导体段，电容器和天线驱动电路协同地向腔室中的带电粒子提供能量，从而由于通电的带电粒子和源气体之间的电离碰撞，激发带电粒子并产生包含源室气体离子和电子的等离子体。

7. 发明授权

US07078707B1 Ion beam scanning control methods and systems for ion implantation uniformity 有权
标题翻译：离子束扫描控制方法和离子注入系统的均匀性
公开(公告)号：US07078707B1
公开(公告)日：2006-07-18
申请号：US11029052
申请日：2005-01-04
申请人： Victor M. Benveniste , Peter L. Kellerman , William F. DiVergilio
发明人： Victor M. Benveniste , Peter L. Kellerman , William F. DiVergilio
IPC分类号： G21K5/10 , H01J37/08
CPC分类号： H01J37/3171 , H01J2237/31703
摘要： Methods are provided for calibrating an ion beam scanner in an ion implantation system, comprising measuring a plurality of initial current density values at a plurality of locations along a scan direction, where the values individually correspond to one of a plurality of initial voltage scan intervals and one of a corresponding plurality of initial scan time values, creating a system of linear equations based on the measured initial current density values and the initial voltage scan intervals, and determining a set of scan time values that correspond to a solution to the system of linear equations that reduces current density profile deviations. A calibration system is provided for calibrating an ion beam scanner in an ion implantation system, comprising a dosimetry system and a control system.
摘要翻译：提供了用于在离子注入系统中校准离子束扫描器的方法，包括在沿着扫描方向的多个位置处测量多个初始电流密度值，其中所述值分别对应于多个初始电压扫描间隔中的一个，以及相应的多个初始扫描时间值中的一个，基于测量的初始电流密度值和初始电压扫描间隔创建线性方程组，并且确定与线性系统的解的对应的一组扫描时间值减小电流密度分布偏差的方程式。提供校准系统用于在离子注入系统中校准离子束扫描器，包括剂量测定系统和控制系统。

8. 发明授权

US06541781B1 Waveguide for microwave excitation of plasma in an ion beam guide 有权
标题翻译：波导用于离子束引导中的等离子体的微波激发
公开(公告)号：US06541781B1
公开(公告)日：2003-04-01
申请号：US09625718
申请日：2000-07-25
申请人： Victor M. Benveniste , John Ye , William F. DiVergilio
发明人： Victor M. Benveniste , John Ye , William F. DiVergilio
IPC分类号： G21K510
CPC分类号： H01J37/32678 , H01J37/05 , H01J37/3171
摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, a power source adapted to provide an electric field in the passageway, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The power source and the magnets may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.
摘要翻译：公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。该装置包括安装在沿着离子束的路径的通道中的质量分析磁体，适于在通道中提供电场的电源以及适于在通道中提供多通道磁场的磁性装置，其中可以包括沿通道的至少一部分安装的多个磁体。电源和磁体可以协同地相互作用以沿着通道的至少一部分提供电子回旋共振（ECR）状态。多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上，以与给定的低能离子束的已知RF或微波频率的电场相互作用。本发明还包括质量分析器波导，其适于沿着质量分析器通道的长度一致地将电场耦合到束等离子体，从而改善ECR条件的产生。因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

9. 发明授权

US06525326B1 System and method for removing particles entrained in an ion beam 失效
标题翻译：用于去除夹带在离子束中的颗粒的系统和方法
公开(公告)号：US06525326B1
公开(公告)日：2003-02-25
申请号：US09654381
申请日：2000-09-01
申请人： Eric R. Harrington , Victor M. Benveniste , Jeffrey A. Burgess , John Z. Ye
发明人： Eric R. Harrington , Victor M. Benveniste , Jeffrey A. Burgess , John Z. Ye
IPC分类号： H01J3730
CPC分类号： H01J3/40 , H01J37/026 , H01J37/3002 , H01J37/3171 , H01J2237/004 , H01J2237/022 , H01J2237/31705
摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes an electric field generator for generating an electric field relative to a path of travel for the ion beam. A particle located in the ion beam and in a region of the electric field is charged to a polarity according to the ion beam, so that the electric field may urge the charged particle out of the ion beam.
摘要翻译：用于抑制用离子束输送污染物颗粒的系统包括用于相对于离子束的行进路径产生电场的电场发生器。位于离子束中并且在电场的区域中的粒子根据离子束被充电到极性，使得电场可以将带电粒子推出离子束。

10. 发明授权

US08471476B2 Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement 有权
标题翻译：电感耦合等离子体喷枪采用浸入式低电感FR线圈和多脉冲磁排列
公开(公告)号：US08471476B2
公开(公告)日：2013-06-25
申请号：US12901198
申请日：2010-10-08
申请人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
发明人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
IPC分类号： H05B31/26 , H01J37/317
CPC分类号： H01J37/3211 , H01J37/026 , H01J37/3171 , H01J37/32688 , H01J2237/03
摘要： A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.
摘要翻译：公开了一种用于提供电感耦合的射频等离子体喷枪的装置。在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。等离子体室可以包括用于控制等离子体的多个磁体。可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

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