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1. 发明授权

US06525326B1 System and method for removing particles entrained in an ion beam 失效
标题翻译：用于去除夹带在离子束中的颗粒的系统和方法
公开(公告)号：US06525326B1
公开(公告)日：2003-02-25
申请号：US09654381
申请日：2000-09-01
申请人： Eric R. Harrington , Victor M. Benveniste , Jeffrey A. Burgess , John Z. Ye
发明人： Eric R. Harrington , Victor M. Benveniste , Jeffrey A. Burgess , John Z. Ye
IPC分类号： H01J3730
CPC分类号： H01J3/40 , H01J37/026 , H01J37/3002 , H01J37/3171 , H01J2237/004 , H01J2237/022 , H01J2237/31705
摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes an electric field generator for generating an electric field relative to a path of travel for the ion beam. A particle located in the ion beam and in a region of the electric field is charged to a polarity according to the ion beam, so that the electric field may urge the charged particle out of the ion beam.
摘要翻译：用于抑制用离子束输送污染物颗粒的系统包括用于相对于离子束的行进路径产生电场的电场发生器。位于离子束中并且在电场的区域中的粒子根据离子束被充电到极性，使得电场可以将带电粒子推出离子束。

2. 发明授权

US06759665B2 Method and system for ion beam containment in an ion beam guide 有权
标题翻译：离子束导管中离子束收容的方法和系统
公开(公告)号：US06759665B2
公开(公告)日：2004-07-06
申请号：US09865155
申请日：2001-05-24
申请人： Victor M. Benveniste , William F. DiVergilio , John Z. Ye
发明人： Victor M. Benveniste , William F. DiVergilio , John Z. Ye
IPC分类号： H01J37317
CPC分类号： H01J37/32623 , H01J37/05 , H01J37/3171 , H01J37/32678
摘要： An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet mounted in a passageway along the path of an ion beam, and a magnetic device adapted to provide a multi-cusped magnetic field in the passageway, which may include a plurality of magnets mounted along at least a portion of the passageway. The magnets may cooperatively interact to provide a multi-cusped magnetic field along at least a portion of the passageway. The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway for a given low energy ion beam. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.
摘要翻译：公开了一种用于提供用于离子注入应用的低能量高电流离子束的装置和方法。该设备包括安装在沿着离子束路径的通道中的质量分析磁体和适于在通道中提供多通道磁场的磁性装置，该磁性装置可以包括沿着至少一部分通道。磁体可以协同地相互作用以沿着通道的至少一部分提供多脉冲磁场。对于给定的低能量离子束，多质量磁场可以在质量分析器通道的区域中以指定的场强叠加在偶极子场上。因此，本发明在低能量离子束的质量分析器偶极磁场内提供束等离子体的增强，而不引入外部产生的等离子体。本发明还包括一种在低能离子注入系统中提供离子束容纳的方法以及离子注入系统。

3. 发明授权

US06534775B1 Electrostatic trap for particles entrained in an ion beam 失效
标题翻译：用于夹带在离子束中的颗粒的静电捕集器
公开(公告)号：US06534775B1
公开(公告)日：2003-03-18
申请号：US09654380
申请日：2000-09-01
申请人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
发明人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
IPC分类号： H01J3730
CPC分类号： H01J37/3171 , H01J3/40 , H01J37/026 , H01J37/3002 , H01J2237/004 , H01J2237/022 , H01J2237/31705
摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a pair of electrodes that provide opposite electric fields through which the ion beam travels. A particle entrained in the ion beam is charged to a polarity matching the polarity of ion beam when traveling through a first of the electric fields. The downstream electrode provides another electric field for repelling the positively charged particle away from the direction of beam travel.
摘要翻译：用于抑制用离子束输送污染物颗粒的系统包括一对电极，其提供相反的电场，离子束通过该电场传播。夹带在离子束中的颗粒在穿过第一电场时被充电到与离子束的极性相匹配的极性。下游电极提供另一个电场，用于驱除带正电的粒子远离光束移动的方向。

4. 发明授权

US06476399B1 System and method for removing contaminant particles relative to an ion beam 有权
标题翻译：相对于离子束去除污染物颗粒的系统和方法
公开(公告)号：US06476399B1
公开(公告)日：2002-11-05
申请号：US09654379
申请日：2000-09-01
申请人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
发明人： Eric R. Harrington , Victor M. Benveniste , Michael A. Graf , Robert D. Rathmell
IPC分类号： H01J3730
CPC分类号： H01J37/026 , H01J37/3002 , H01J37/3171 , H01J2237/004 , H01J2237/022 , H01J2237/31705
摘要： A system for inhibiting the transport of contaminant particles with an ion beam includes a particle charging system for charging particles within a region through which the ion beam travels. An electric field is generated downstream relative to the charged region so as to urge charged particles away from a direction of travel for the ion beam.
摘要翻译：用于抑制用离子束输送污染物颗粒的系统包括用于在离子束行进的区域内填充颗粒的颗粒装料系统。在相对于带电区域的下游产生电场，以便使带电粒子远离离子束的行进方向。

5. 发明授权

US08471476B2 Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement 有权
标题翻译：电感耦合等离子体喷枪采用浸入式低电感FR线圈和多脉冲磁排列
公开(公告)号：US08471476B2
公开(公告)日：2013-06-25
申请号：US12901198
申请日：2010-10-08
申请人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
发明人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
IPC分类号： H05B31/26 , H01J37/317
CPC分类号： H01J37/3211 , H01J37/026 , H01J37/3171 , H01J37/32688 , H01J2237/03
摘要： A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.
摘要翻译：公开了一种用于提供电感耦合的射频等离子体喷枪的装置。在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。等离子体室可以包括用于控制等离子体的多个磁体。可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

6. 发明申请

US20120085917A1 INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTANCE FR COIL AND MULTICUSP MAGNETIC ARRANGEMENT 有权
标题翻译：电感耦合等离子体喷枪使用低电感FR线圈和MULTICUSP磁性布置
公开(公告)号：US20120085917A1
公开(公告)日：2012-04-12
申请号：US12901198
申请日：2010-10-08
申请人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
发明人： Peter F. Kurunczi , Victor M. Benveniste , Oliver V. Naumovski
IPC分类号： H01J1/50 , H01J3/14
CPC分类号： H01J37/3211 , H01J37/026 , H01J37/3171 , H01J37/32688 , H01J2237/03
摘要： A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.
摘要翻译：公开了一种用于提供电感耦合的射频等离子体喷枪的装置。在一个特定的示例性实施例中，该装置是离子注入系统中的等离子体喷枪。等离子体喷枪可以包括具有一个或多个孔的等离子体室; 能够向所述等离子体室供给至少一种气态物质的气体源; 设置在等离子体室内的单匝线圈和耦合到线圈的电源，用于感应耦合射频电力以激发等离子体室中的至少一种气态物质以产生等离子体。等离子体室的内表面可以不含含金属的材料，并且等离子体可能不暴露于等离子体室内的任何含金属的组分。等离子体室可以包括用于控制等离子体的多个磁体。可以在等离子体室中设置出口孔，以使所得到的等离子体的带负电粒子能够接合作为相关离子注入系统的一部分的离子束。在一个实施例中，磁体设置在孔的相对侧上，并用于操纵等离子体的电子。

7. 发明授权

US07888653B2 Techniques for independently controlling deflection, deceleration and focus of an ion beam 有权
标题翻译：用于独立控制离子束的偏转，减速和聚焦的技术
公开(公告)号：US07888653B2
公开(公告)日：2011-02-15
申请号：US12348091
申请日：2009-01-02
申请人： Peter L. Kellerman , Svetlana Radovanov , Frank Sinclair , Victor M. Benveniste
发明人： Peter L. Kellerman , Svetlana Radovanov , Frank Sinclair , Victor M. Benveniste
IPC分类号： H01J3/14 , H01J49/22 , H01J23/083
CPC分类号： H01J37/1471 , H01J37/12 , H01J37/3171
摘要： Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.
摘要翻译：公开了用于独立地控制离子束的偏转，减速和聚焦的技术。在一个特定的示例性实施例中，这些技术可以被实现为用于独立地控制离子束的偏转，减速和聚焦的装置。该装置可以包括电极配置，其包括设置在离子束上方的一组上电极和设置在离子束下方的一组下电极。所述上电极组和下电极组可以围绕离子束的中心射线轨迹对称地定位。上部电极组和下部电极组之间的电位差也可以沿着中心射线轨迹变化，以反映沿着中心射线轨迹的每个点处的离子束的能量，以独立地控制偏转，减速和聚焦的离子束。

8. 发明授权

US07421973B2 System and method for performing SIMOX implants using an ion shower 失效
标题翻译：使用离子淋浴执行SIMOX植入物的系统和方法
公开(公告)号：US07421973B2
公开(公告)日：2008-09-09
申请号：US10762114
申请日：2004-01-21
申请人： Peter L. Kellerman , Victor M. Benveniste , William F. DiVergili , Michael P. Bradley
发明人： Peter L. Kellerman , Victor M. Benveniste , William F. DiVergili , Michael P. Bradley
IPC分类号： C23C16/00 , C23C14/00 , C23C14/32 , H01J3/26 , H01J49/42 , H01J49/26 , B01D59/44
CPC分类号： H01J37/321 , H01J37/08 , H01J37/3171 , H01J2237/0815 , H01J2237/083 , H01J2237/31708
摘要： An ion shower comprises a plasma source operable to generate source gas ions within a chamber, and an extraction assembly associated with a top portion of the chamber. The extraction assembly is operable to extract ions from the top portion of the chamber. The ion shower further comprises a workpiece support structure associated with the top portion of the chamber that is operable to secure the workpiece having an implantation surface orientated facing downward toward the extraction assembly for implantation thereof. The ion shower of the present invention advantageously facilitates SIMOX processing with a high oxygen fraction, and uniform beam current for next generation processing.
摘要翻译：离子淋浴器包括可操作以在室内产生源气体离子的等离子体源，以及与腔室的顶部相关联的提取组件。提取组件可操作以从腔室的顶部提取离子。离子淋浴器还包括与室的顶部相关联的工件支撑结构，该工件支撑结构可操作以将具有朝向朝向提取组件定向的注入表面的工件固定以用于其植入。本发明的离子淋浴器有利地促进了具有高氧分数的SIMOX处理和用于下一代处理的均匀束流。

9. 发明申请

US20080067444A1 Ion beam scanning control methods and systems for ion implantation uniformity 有权
标题翻译：离子束扫描控制方法和离子注入系统的均匀性
公开(公告)号：US20080067444A1
公开(公告)日：2008-03-20
申请号：US11784709
申请日：2007-04-09
申请人： Victor M. Benveniste , Edward C. Eisner , Bo H. Vanderberg
发明人： Victor M. Benveniste , Edward C. Eisner , Bo H. Vanderberg
IPC分类号： H01J37/08
CPC分类号： H01J37/3171 , G21K5/04 , H01J37/304 , H01J2237/24507 , H01J2237/3045 , H01J2237/30455 , H01J2237/31703
摘要： One embodiment of the invention relates to a method for adjusting the ribbon beam flux of a scanned ion beam. In this method, an ion beam is scanned at a scan rate, and a plurality of dynamic beam profiles are measured as the ion beam is scanned. A corrected scan rate is calculated based on the plurality of measured dynamic beam profiles of the scanned beam. The ion beam is scanned at the corrected scan rate to produce a corrected ribbon ion beam. Other methods and systems are also disclosed.
摘要翻译：本发明的一个实施例涉及一种用于调整扫描离子束的带状光束通量的方法。在该方法中，以扫描速率扫描离子束，并且当扫描离子束时测量多个动态光束分布。基于扫描光束的多个测量的动态光束分布来计算校正的扫描速率。以校正的扫描速率扫描离子束以产生校正的带状离子束。还公开了其它方法和系统。

10. 发明授权

US06881966B2 Hybrid magnetic/electrostatic deflector for ion implantation systems 有权
标题翻译：用于离子注入系统的混合磁/静电偏转器
公开(公告)号：US06881966B2
公开(公告)日：2005-04-19
申请号：US10461702
申请日：2003-06-13
申请人： Victor M. Benveniste , Robert D. Rathmell , Yongzhang Huang
发明人： Victor M. Benveniste , Robert D. Rathmell , Yongzhang Huang
IPC分类号： H01J27/18 , H01J37/00 , H01J37/05 , H01J37/147 , H01J37/30 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/147 , H01J2237/057
摘要： A magnetic deflector for an ion beam is disclosed and comprises first and second coils. The coils are positioned above and below the beam, respectively, and extend along a width of the beam. Current passes through the coils to generate a magnetic field therebetween that is generally perpendicular to a direction of travel of the beam along substantially the entire width thereof. In another aspect of the invention, a method of deflecting a beam prior to implantation into a workpiece is disclosed. The method includes determining one or more properties associated with the beam and selectively activating one of a magnetic deflection module and an electrostatic deflection module based on the determination.
摘要翻译：公开了用于离子束的磁偏转器，并且包括第一和第二线圈。线圈分别位于梁的上方和下方，并沿着梁的宽度延伸。电流通过线圈以产生它们之间的磁场，其大致垂直于梁的大致整个宽度的行进方向。在本发明的另一方面，公开了一种在植入植入工件之前偏转光束的方法。该方法包括确定与光束相关联的一个或多个属性，并且基于该确定选择性地激活磁偏转模块和静电偏转模块中的一个。

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