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1. 发明申请

US20100195070A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY, PROJECTION EXPOSURE APPARATUS, PROJECTION EXPOSURE METHOD AND OPTICAL CORRECTION PLATE 有权
标题翻译：投影曝光法，投影曝光法和光学校正板投影目标
公开(公告)号：US20100195070A1
公开(公告)日：2010-08-05
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68 , G02B9/00 , B32B3/00
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译：公开了一种投影物镜。投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带波长λ。多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线，以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

2. 发明授权

US08228483B2 Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate 有权
标题翻译：微光刻投影目标，投影曝光装置，投影曝光法和光学校正板
公开(公告)号：US08228483B2
公开(公告)日：2012-07-24
申请号：US12698242
申请日：2010-02-02
申请人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
发明人： Ulrich Loering , Gerd Reisinger , Franz-Josef Stickel , Sonja Schneider , Johann Trenkler , Stefan Kraus , Gordon Doering , Aksel Goehnermeier
IPC分类号： G03B27/68
CPC分类号： G03F7/70983 , G03F1/62 , G03F7/70308 , Y10T428/24612
摘要： A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ. The second optical surface can have a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ. A thickness of the optical correction plate can vary by less than 0.1*(PV1+PV2)/2 across the optical correction plate.
摘要翻译：公开了一种投影物镜。投影物镜可以包括多个光学元件，其布置成将图案从投影物镜的物体表面中的物场映射到投影物镜的图像表面中的图像场，其中电磁操作辐射来自围绕操作的波长带波长λ。多个光学元件可以包括光学校正板，其包括主体，该主体包括对操作辐射透明的材料，该主体具有第一光学表面，第二光学表面，基本上垂直于第一和第二光学表面的板法线，以及限定为平行于板法线测量的第一和第二光学表面之间的距离的厚度分布。第一光学表面可以具有第一峰谷值PV1>λ的非旋转对称非球面第一表面轮廓。第二光学表面可以具有非旋转对称的非球面第二表面轮廓，具有第二峰谷值PV2>λ。光学校正板的厚度可以在光学校正板上变化小于0.1 *（PV1 + PV2）/ 2。

3. 发明授权

US07551361B2 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type 有权
标题翻译：具有这种类型的至少一个光刻透镜系统的光刻透镜系统和投影曝光系统
公开(公告)号：US07551361B2
公开(公告)日：2009-06-23
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B3/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

4. 发明授权

US09568845B2 Mirror for use in a microlithography projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的镜子
公开(公告)号：US09568845B2
公开(公告)日：2017-02-14
申请号：US13417510
申请日：2012-03-12
申请人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
发明人： Martin Rocktaeschel , Hartmut Enkisch , Franz-Josef Stickel , Oliver Natt , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/68 , G03B27/52 , G03B27/54 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70958 , G02B5/0833 , G03F7/70191 , G03F7/70308 , G03F7/70316
摘要： A mirror including a substrate and a reflective coating that includes a first group of layers and a second group of layers arranged between the substrate and the first group of layers. Both the first and second groups of layers include a plurality of alternating first material layers and second material layers, arranged one above another. The refractive index of the first material for radiation in the range of 5-30 nm is greater than the refractive index of the second material in that wavelength range. The first group of layers is configured to have a number of layers that is greater than 20, such that, upon irradiation with radiation having a wavelength in the range of 5-30 nm, less than 20% of the radiation reaches the second group of layers, which has a layer thickness variation for correcting the surface form of the mirror.
摘要翻译：一种包括基板和反射涂层的反射镜，其包括布置在基板和第一组层之间的第一组层和第二组层。第一组和第二组都包括多个交替的第一材料层和第二材料层，其彼此排列。用于5-30nm范围内的辐射的第一材料的折射率大于在该波长范围内的第二材料的折射率。第一组层被配置为具有大于20的多个层，使得当辐射具有在5-30nm范围内的波长的辐射时，少于20％的辐射达到第二组层，其具有用于校正反射镜的表面形式的层厚度变化。

5. 发明授权

US06831794B2 Objective with at least one aspheric lens 失效
标题翻译：目标至少有一个非球面透镜
公开(公告)号：US06831794B2
公开(公告)日：2004-12-14
申请号：US10600288
申请日：2003-06-21
申请人： Karl-Heinz Schuster , Frank Schillke , Franz-Josef Stickel , Alexander Epple
发明人： Karl-Heinz Schuster , Frank Schillke , Franz-Josef Stickel , Alexander Epple
IPC分类号： G02B302
CPC分类号： G03F7/70241 , G02B13/143 , G02B13/22
摘要： A lens has at least one aspheric lens surface, an objective with at least one aspheric lens surface, and a projection exposure device for microlithography and a method for the production of microstructured components with an objective having at least one aspheric lens surface. The object of the invention is to provide a method by which new designs with aspheric lens surfaces can be generated without consultation with manufacturing, with this object attained by the measure of describing the aspheric lens surfaces by Zernike polynomials, which makes it is possible to undertake a classification of aspheric lens surfaces such that the respective aspheric lens surface can be polished and tested at a justifiable cost when at least two of three, or all three, of certain conditions are present.
摘要翻译：透镜具有至少一个非球面透镜表面，具有至少一个非球面透镜表面的物镜和用于微光刻的投影曝光装置以及用于产生具有至少一个非球面透镜表面的物镜的微结构元件的方法。本发明的目的是提供一种可以在不咨询制造的情况下产生具有非球面透镜表面的新设计的方法，该目的通过采用Zernike多项式描述非球面透镜表面的措施获得，这使得可以进行非球面透镜表面的分类，使得当存在三种或全部三种某些条件中的至少两种时，可以以合理的成本对相应的非球面透镜表面进行抛光和测试。

6. 发明授权

US09249501B2 Surface correction on coated mirrors 有权
标题翻译：涂层镜面的表面校正
公开(公告)号：US09249501B2
公开(公告)日：2016-02-02
申请号：US13475173
申请日：2012-05-18
申请人： Dirk Heinrich Ehm , Franz-Josef Stickel , Juergen Mueller
发明人： Dirk Heinrich Ehm , Franz-Josef Stickel , Juergen Mueller
IPC分类号： G03B27/52 , C23C14/48 , G03B7/20 , G02B26/08 , G03F7/20 , G21K1/06 , G02B17/06
CPC分类号： C23C14/48 , G02B17/0657 , G02B26/0825 , G03B7/20 , G03F7/70266 , G03F7/70316 , G03F7/7095 , G21K1/062 , G21K2201/067
摘要： A mirror (1) for a microlithography projection exposure apparatus including a substrate (3) and a reflective coating (5). A functional coating (11) between the substrate (3) and the reflective coating (5) has a local form variation (19) for correcting the surface form of the mirror (1), wherein the local form variation (19) is brought about by a local variation in the chemical composition of the functional coating (11) and wherein a thickness of the reflective coating (5) is not changed by the local variation in the chemical composition of the functional coating (11). The local variation in the chemical composition of the functional coating (11) can be brought about by bombardment with particles (15), for example with hydrogen ions.
摘要翻译：一种用于包括基板（3）和反射涂层（5）的微光刻投影曝光装置的反射镜（1）。在基板（3）和反射涂层（5）之间的功能性涂层（11）具有用于校正反射镜（1）的表面形状的局部形状变化（19），其中局部形状变化（19）带来通过功能性涂层（11）的化学组成的局部变化，并且其中反射涂层（5）的厚度不会由于功能涂层（11）的化学组成的局部变化而改变。功能性涂层（11）的化学组成的局部变化可以通过用颗粒（15）例如用氢离子轰击来实现。

7. 发明申请

US20070258134A1 Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type 有权
标题翻译：光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统
公开(公告)号：US20070258134A1
公开(公告)日：2007-11-08
申请号：US10571267
申请日：2004-07-14
申请人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
发明人： Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
IPC分类号： G02B17/00
CPC分类号： G03F7/70066 , G03F7/70241
摘要： An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
摘要翻译：用于微光刻投影曝光系统的光学成像系统用于将布置在成像系统的物体平面中的物体场成像为布置在成像系统的图像平面中的图像场。特别是可以涉及在照明系统中使用的投影物镜或中继物镜。成像系统具有布置在物平面和图像平面之间的多个透镜，并且在每种情况下具有第一透镜表面和第二透镜表面。至少一个透镜是双非球面透镜，其中第一透镜表面和第二透镜表面是非球面。对于具有可接受的关于透镜表面的表面处理和测试的费用的双非球面透镜的情况，可以产生具有非常强的变形非球面作用的良好质量的透镜。

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