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    • 7. 发明授权
    • Calculation method for generating layout pattern in photomask
    • 在光掩模中生成布局图案的计算方法
    • US08954919B1
    • 2015-02-10
    • US14069391
    • 2013-11-01
    • United Microelectronics Corp.
    • En-Chiuan LiouSho-Shen LeeWen-Liang HuangChang-Mao WangKai-Lin ChuangYu-Chin Huang
    • G06F17/50
    • G03F1/70
    • A calculation method for generating a layout pattern in a photomask includes at least the following steps. A two-dimensional design layout including several geometric patterns distributed in a plane is provided to a computer system. The computer system is used to mark portions of the geometric patterns and generate at least one marked geometric pattern and at least one non-marked geometric pattern. The marked geometric pattern is then simulated and corrected by the computer system so as to generate a 3-D design layout. Through the simulation and correction, the marked geometric pattern and the non-marked geometric pattern are arranged alternately along an axis orthogonal to the plane. The 3-D design layout is outputted to a mask-making system afterwards.
    • 用于生成光掩模中的布局图案的计算方法至少包括以下步骤。 将包括分布在平面中的几个几何图案的二维设计布局提供给计算机系统。 计算机系统用于标记几何图案的部分并且生成至少一个标记的几何图案和至少一个未标记的几何图案。 然后通过计算机系统模拟和校正标记的几何图案,以生成3维设计布局。 通过模拟和校正,标记的几何图案和未标记的几何图案沿着与平面正交的轴线交替布置。 3-D设计布局随后输出到制版系统。