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    • 1. 发明授权
    • Layout structure of multi-use coupling capacitors in reducing ground
bounces and replacing faulty logic components
    • 多用耦合电容器的布局结构,可减少地面反弹和更换故障逻辑元件
    • US5998846A
    • 1999-12-07
    • US50621
    • 1998-03-30
    • Tzong-Shi JanYen-Tai Lin
    • Tzong-Shi JanYen-Tai Lin
    • H01L27/02H01L29/72
    • H01L27/0207
    • A first mask includes a well mask formed over a first portion of the wafer to define a first conductive type well in the wafer. A first polysilicon mask is formed over the well mask including a plurality of first structures and a plurality of second structures to cover a first polysilicon layer, thereby defining polysilicon gates. A first implanting mask is formed over the first polysilicon mask for forming second conductive type region. A second implanting mask is formed over the first polysilicon mask for forming first conductive type region. A second polysilicon mask is formed between gates of a second conductive type MOS and gates of a first conductive type MOS. A contact hole mask is formed over the second polysilicon mask for forming contact holes. A metal mask is formed over the contact hole mask for forming connection.
    • 第一掩模包括在晶片的第一部分上形成的阱掩模,以在晶片中限定第一导电类型阱。 第一多晶硅掩模形成在阱掩模之上,包括多个第一结构和多个第二结构以覆盖第一多晶硅层,从而限定多晶硅栅极。 第一注入掩模形成在第一多晶硅掩模上,用于形成第二导电类型区域。 在第一多晶硅掩模上形成第二注入掩模,用于形成第一导电类型区域。 在第二导电型MOS的栅极和第一导电型MOS的栅极之间形成第二多晶硅掩模。 在第二多晶硅掩模上形成接触孔掩模以形成接触孔。 在用于形成连接的接触孔掩模上形成金属掩模。
    • 4. 发明授权
    • Voltage level shifting apparatus
    • 电压电平转换装置
    • US08373485B2
    • 2013-02-12
    • US13090283
    • 2011-04-20
    • Chen-Hao PoYen-Tai LinWay-Chen WuChing-Shan Chien
    • Chen-Hao PoYen-Tai LinWay-Chen WuChing-Shan Chien
    • H03L5/00
    • H03K3/356182
    • A voltage level shifting apparatus is disclosed. The voltage level shifting apparatus has a cross-coupled transistor pair, a plurality of transistor pairs, a first diode string, a second diode string and an input transistor pair. One of the transistor pairs is coupled to the cross-coupled transistor pair, and the transistor pairs are controlled by a plurality of reference voltages. The first and the second diode strings are coupled between two of the transistor pairs. Each of the first and the second diode strings has at least one diode. The input transistor pair receives a first and a second input voltage, and the first and second input voltages are complementary signals. The cross-coupled transistor pair generates and outputs a first output voltage and a second output voltage by shifting the voltage level of the first and the second input voltage.
    • 公开了一种电压电平转换装置。 电压电平移位装置具有交叉耦合晶体管对,多个晶体管对,第一二极管串,第二二极管串和输入晶体管对。 晶体管对中的一个耦合到交叉耦合晶体管对,并且晶体管对由多个参考电压控制。 第一和第二二极管串耦合在两个晶体管对之间。 第一和第二二极管串中的每一个具有至少一个二极管。 输入晶体管对接收第一和第二输入电压,第一和第二输入电压是互补信号。 交叉耦合晶体管对通过移位第一和第二输入电压的电压电平来产生并输出第一输出电压和第二输出电压。
    • 5. 发明申请
    • OPERATING METHOD OF P-CHANNEL NON-VOLATILE MEMORY
    • P-CHANNEL非易失性存储器的操作方法
    • US20080165587A1
    • 2008-07-10
    • US12046477
    • 2008-03-12
    • Yen-Tai Lin
    • Yen-Tai Lin
    • G11C11/34
    • H01L27/115
    • A P-channel non-volatile memory is described. The P-channel non-volatile memory includes a substrate, a first memory cell, and second memory cell. An N-well is disposed over the substrate, and the first cell and the second cell are disposed over the N-well. The first memory cell includes a first gate, a first charge storage structure, a first doped region and a second doped region. The first doped region and the second doped region are disposed in the substrate on the respective sides of the first gate. The second cell includes a second gate, a second charge storage structure, a third doped region, and the second doped region. The third doped region and the second doped region are disposed in the substrate on the respective sides of the second gate. The second cell and the first cell share the second doped region.
    • 描述P沟道非易失性存储器。 P沟道非易失性存储器包括衬底,第一存储单元和第二存储单元。 在衬底上设置N阱,并且将第一电池和第二电池设置在N阱上。 第一存储单元包括第一栅极,第一电荷存储结构,第一掺杂区和第二掺杂区。 第一掺杂区域和第二掺杂区域设置在第一栅极的相应侧面上的衬底中。 第二单元包括第二栅极,第二电荷存储结构,第三掺杂区和第二掺杂区。 第三掺杂区域和第二掺杂区域设置在第二栅极的相应侧上的衬底中。 第二单元和第一单元共享第二掺杂区。
    • 8. 发明授权
    • Triple plate capacitor and method for manufacturing
    • 三板式电容器及其制造方法
    • US6153463A
    • 2000-11-28
    • US350478
    • 1999-07-09
    • Hon-Sco WeiYen-Tai Lin
    • Hon-Sco WeiYen-Tai Lin
    • H01L21/02H01L29/94H01L21/8242
    • H01L28/40H01L29/94
    • A novel capacitor design and construction method that uses a stacked structure which is sometimes otherwise used for a so-called floating gate transistor. A first electrical contact is electrically coupled with a conductive region formed in the substrate and with a control gate layer. A second electrical contact is electrically coupled with a floating gate layer, forming a plate between the substrate and control gate layers. The footprint of this capacitor is reduced by using both sides of the floating gate layer as capacitive plate. Parasitic capacitance is relatively reduced. One or more dielectric layers can be formed for both capacitors and for floating gate transistors on the substrate in the same process step or steps.
    • 一种新颖的电容器设计和施工方法,其使用有时另外用于所谓的浮栅晶体管的堆叠结构。 第一电触头与形成在基板中的导电区域和控制栅极层电耦合。 第二电接触件与浮栅层电耦合,在衬底和控制栅极层之间形成一个板。 通过使用浮动栅极层的两侧作为电容板来减小该电容器的占位面积。 寄生电容相对减小。 可以在相同的工艺步骤中为两个电容器和衬底上的浮栅晶体管形成一个或多个电介质层。