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1. 发明授权

US07518131B2 Electron beam irradiating apparatus 有权
标题翻译：电子束照射装置
公开(公告)号：US07518131B2
公开(公告)日：2009-04-14
申请号：US11385483
申请日：2006-03-21
申请人： Tsutomu Nanataki , Iwao Ohwada , Yuki Bessho , Takayoshi Akao
发明人： Tsutomu Nanataki , Iwao Ohwada , Yuki Bessho , Takayoshi Akao
IPC分类号： A61N5/00
CPC分类号： G21K5/04 , H01J37/317 , H01L21/67005
摘要： An electron beam irradiating apparatus includes a chamber being kept under vacuum, and housing a planar electron emitting element and a positioning unit and an object to be irradiated is directly irradiated with an electron beam emitted from the element. The planar electron emitting element includes: an emitter portion composed of a dielectric material; and a first electrode and a second electrode applied with a driving voltage for emitting electrons, and the first electrode is formed on a first surface of the emitter portion and has a plurality of through-holes where the emitter portion is exposed, a surface of the first electrode facing to the emitter portion around the through-holes is separated from the emitter portion, and the electron beam is emitted from the first surface of the emitter portion through the through-holes.
摘要翻译：电子束照射装置包括保持在真空下的室，并容纳平面电子发射元件和定位单元，并且被照射物体直接用从元件发射的电子束照射。平面电子发射元件包括：由电介质材料构成的发射极部分; 以及施加有用于发射电子的驱动电压的第一电极和第二电极，并且所述第一电极形成在所述发射极部分的第一表面上，并且具有多个通过所述发射极部分露出的通孔，面向通孔周围的发射极部分的第一电极与发射极部分分离，并且电子束通过通孔从发射器部分的第一表面发射。

2. 发明申请

US20070040130A1 Electron beam irradiating apparatus 有权
标题翻译：电子束照射装置
公开(公告)号：US20070040130A1
公开(公告)日：2007-02-22
申请号：US11385483
申请日：2006-03-21
申请人： Tsutomu Nanataki , Iwao Ohwada , Yuki Bessho , Takayoshi Akao
发明人： Tsutomu Nanataki , Iwao Ohwada , Yuki Bessho , Takayoshi Akao
IPC分类号： A61N5/00
CPC分类号： G21K5/04 , H01J37/317 , H01L21/67005
摘要： An electron beam irradiating apparatus includes a chamber being kept under vacuum, and housing a planar electron emitting element and a positioning unit and an object to be irradiated is directly irradiated with an electron beam emitted from the element. The planar electron emitting element includes: an emitter portion composed of a dielectric material; and a first electrode and a second electrode applied with a driving voltage for emitting electrons, and the first electrode is formed on a first surface of the emitter portion and has a plurality of through-holes where the emitter portion is exposed, a surface of the first electrode facing to the emitter portion around the through-holes is separated from the emitter portion, and the electron beam is emitted from the first surface of the emitter portion through the through-holes.
摘要翻译：电子束照射装置包括保持在真空下的室，并容纳平面电子发射元件和定位单元，并且被照射物体直接用从元件发射的电子束照射。平面电子发射元件包括：由电介质材料构成的发射极部分; 以及施加有用于发射电子的驱动电压的第一电极和第二电极，并且所述第一电极形成在所述发射极部分的第一表面上，并且具有多个通过所述发射极部分露出的通孔，面向通孔周围的发射极部分的第一电极与发射极部分分离，并且电子束通过通孔从发射器部分的第一表面发射。

3. 发明申请

US20070202023A1 Reactor 审中-公开
标题翻译：反应堆
公开(公告)号：US20070202023A1
公开(公告)日：2007-08-30
申请号：US11572438
申请日：2005-07-26
申请人： Yuki Bessho , Fumitake Takahashi
发明人： Yuki Bessho , Fumitake Takahashi
IPC分类号： B01J8/02
CPC分类号： B01J23/42 , B01D53/228 , B01D53/885 , B01D63/08 , B01D67/0048 , B01D71/022 , B01D2323/46 , B01D2325/10 , B01J19/249 , B01J19/2495 , B01J23/464 , B01J35/04 , B01J37/0215 , B01J2219/2453 , B01J2219/2458 , B01J2219/2462 , B01J2219/2465 , B01J2219/2467 , B01J2219/247 , B01J2219/2472 , B01J2219/2475 , B01J2219/2487 , B01J2219/2493 , B01J2219/2498 , C01B3/22 , C01B3/34 , C01B3/501 , C01B2203/0205 , C01B2203/0266 , C01B2203/041 , C01B2203/0475
摘要： A reactor RT1 comprises a flow passage forming member (10) having been formed by laminating a plurality of ceramic plates (11 to 13) and firing the resultant laminate and, provided inside the flow passage (R1) of the member, a porous body (20) having a three dimensional net-like structure and carrying a catalytic material. In the reactor, when a fluid before reaction flows through the flow passage (R1), the fluid inevitably passes through the inside of the porous body (20). Accordingly, the flow is contacted frequently with the catalytic material, and thus a reaction by the catalytic material with good efficiency is occurred, which allows the use of the reactor (RT1) having a smaller size.
摘要翻译：反应器RT 1包括通过层叠多个陶瓷板（11至13）并烧制所得层压体而形成的流路形成构件（10），并且在该构件的流路（R 1）内部设置多孔主体（20）具有三维网状结构并且携带催化材料。在反应器中，当反应前的流体流经流路（R 1）时，流体不可避免地通过多孔体（20）的内部。因此，流动与催化剂材料频繁接触，因此发生了高效率的催化材料的反应，这允许使用具有较小尺寸的反应器（RT 1）。

4. 发明授权

US5728635A Aluminum nitride sintered bodies 失效
标题翻译：氮化铝烧结体
公开(公告)号：US5728635A
公开(公告)日：1998-03-17
申请号：US691915
申请日：1996-08-01
申请人： Hiromichi Kobayashi , Yuki Bessho , Yukimasa Mori
发明人： Hiromichi Kobayashi , Yuki Bessho , Yukimasa Mori
IPC分类号： C04B35/581 , H01L23/15
CPC分类号： H01L23/15 , C04B35/581 , H01L2924/0002 , H01L2924/09701 , Y10S156/914
摘要： An aluminum nitride sintered body is characterized by having a g-value of an unpaired electron in a spectrum of an electron spin resonance being not less than 2.0010. The aluminum nitride sintered body is produced by sintering a raw material composed of powdery aluminum nitride at a temperature of not less than 1730.degree. C. to not more than 1920.degree. under a pressure of not less than 80 kg/cm.sup.2.
摘要翻译：氮化铝烧结体的特征在于在电子自旋共振谱中具有不成对电子的g值不小于2.0010。氮化铝烧结体通过在不低于80kg / cm 2的压力下在不低于1730℃至不超过1920℃的温度下烧结由氮化铝粉末组成的原料来制备。

5. 发明授权

US07824781B2 Metal phosphate composite and dense material comprised of the same 有权
标题翻译：金属磷酸盐复合材料和致密材料组成
公开(公告)号：US07824781B2
公开(公告)日：2010-11-02
申请号：US12171496
申请日：2008-07-11
申请人： Hiroki Fujita , Yosuke Sato , Yuki Bessho
发明人： Hiroki Fujita , Yosuke Sato , Yuki Bessho
IPC分类号： B32B9/00 , C01B25/26 , C01B25/36
CPC分类号： C01B25/45 , H01M8/086 , H01M8/1016 , H01M2300/0008 , H01M2300/0065 , H01M2300/0091 , Y10T428/24975 , Y10T428/249953
摘要： A metal phosphate composite having a composition represented by the formula M1xM21-x(HwPyOz) (wherein M1 represents at least one element selected from the group consisting of tin, titanium, zirconium, silicon, and germanium, M2 represents an element having a valence of 3, and x, w, y, and z satisfy the following relationship, 0.5≦x
摘要翻译：具有由式M1xM21-x（HwPyOz）表示的组成的金属磷酸盐复合物（其中M1表示选自锡，钛，锆，硅和锗中的至少一种元素，M2表示价数为 3，x，w，y和z满足以下关系：0.5＆nlE; x <1,0,0≤n1E; w，2

6. 发明授权

US07473391B2 Methods for making molding material, molded body, and sintered body 有权
标题翻译：制造成型材料，成型体和烧结体的方法
公开(公告)号：US07473391B2
公开(公告)日：2009-01-06
申请号：US10095118
申请日：2002-03-12
申请人： Yuki Bessho , Hiroyuki Shindo
发明人： Yuki Bessho , Hiroyuki Shindo
IPC分类号： C04B35/624 , C04B35/63
CPC分类号： B22F3/225 , B22F1/0059 , B22F2998/00 , C04B35/111 , C04B35/624 , C04B35/6261 , C04B35/62625 , C04B35/6263 , C04B35/62635 , C04B35/62655 , C04B35/63 , C04B35/632 , C04B35/63424 , C04B2235/3217 , C04B2235/5409 , C04B2235/5445 , C04B2235/6021 , C04B2235/6022 , C04B2235/77 , B22F3/10 , B22F3/22
摘要： A method of manufacturing a sintered body is provided. A molding powder, a gel-forming material powder and a solvent are mixed at a temperature not higher than a dissolving point of the gel-forming material. A treatment of pulverizing agglomerates containing the molding powder, gel-forming material powder and solvent absorbed in the gel-forming material powder is carried out. The mixture is then heated to a temperature not lower than the dissolving point thereby forming a sol. The sol is then cooled to a temperature not higher than the gel point, thereby forming a molding material. The molding material is used for producing a sintering body.
摘要翻译：提供一种制造烧结体的方法。将成型粉末，凝胶形成材料粉末和溶剂在不高于凝胶形成材料的溶解点的温度下混合。进行粉碎含有成型粉末，凝胶形成材料粉末和凝胶形成材料粉末中吸收的溶剂的附聚物的处理。然后将混合物加热至不低于溶解点的温度，从而形成溶胶。然后将溶胶冷却至不高于凝胶点的温度，从而形成模塑材料。成型材料用于制造烧结体。

7. 发明授权

US5998320A Aluminum nitride sintered body, metal including member, electrostatic chuck, method of producing aluminum nitride sintered body, and method of producing metal including member 失效
标题翻译：氮化铝烧结体，金属构件，静电吸盘，氮化铝烧结体的制造方法以及金属构成体的制造方法
公开(公告)号：US5998320A
公开(公告)日：1999-12-07
申请号：US744774
申请日：1996-11-01
申请人： Naohito Yamada , Yukimasa Mori , Yuki Bessho , Hiromichi Kobayashi
发明人： Naohito Yamada , Yukimasa Mori , Yuki Bessho , Hiromichi Kobayashi
IPC分类号： B23Q3/15 , C04B35/581 , C04B35/626 , C04B35/74 , C04B37/02 , H01L21/683
CPC分类号： C04B35/581 , C04B37/021 , C04B2237/366 , C04B2237/40 , C04B2237/402 , C04B2237/403 , C04B2237/404 , C04B2237/408 , C04B2237/62 , C04B2237/704 , C04B2237/706 , Y10T279/23 , Y10T428/22 , Y10T428/31678
摘要： An aluminum nitride sintered body has characteristics such that an amount of total metal elements other than aluminum is smaller than 100 ppm, and a volume resistivity at room temperature is greater than 1.0.times.10.sup.9 .OMEGA..multidot.cm and is smaller than 1.0.times.10.sup.13 .OMEGA..multidot.cm. A metal including member has such a construction that a metal member is embedded in the aluminum nitride sintered body mentioned above. An electrostatic chuck is made by the metal including member mentioned above. In the metal including member mentioned above in which the metal member is embedded in the aluminum nitride sintered body mentioned above, a volume resistivity thereof can be controlled without adding a low resistance material in aluminum nitride.
摘要翻译：氮化铝烧结体具有以下特性：铝以外的总金属元素的量小于100ppm，室温下的体积电阻率大于1.0×10 9欧姆×xcm，小于1.0×10 13欧姆×xcm。包含金属的构件具有金属构件嵌入在上述氮化铝烧结体中的结构。由上述金属构成的静电卡盘构成。在上述金属构件中，金属构件嵌入上述的氮化铝烧结体中，其体积电阻率可以在氮化铝不添加低电阻材料的情况下进行控制。

8. 发明授权

US07504070B2 Micro reactor 失效
标题翻译：微反应堆
公开(公告)号：US07504070B2
公开(公告)日：2009-03-17
申请号：US10886258
申请日：2004-07-06
申请人： Yuki Bessho , Yukihisa Takeuchi
发明人： Yuki Bessho , Yukihisa Takeuchi
IPC分类号： B01L3/00
CPC分类号： B01L3/50273 , B01J19/0093 , B01J2219/00162 , B01J2219/00164 , B01J2219/00783 , B01J2219/00824 , B01J2219/00833 , B01J2219/00853 , B01J2219/00867 , B01J2219/00891 , B01J2219/0095 , B01L3/0241 , B01L2300/0816 , B01L2300/0887 , B01L2400/0439 , B01L2400/0442 , F04B43/046
摘要： A micro reactor comprising: a first substrate comprising a predetermined number each of micro channels, reactors connected to micro channels at respective connection points, injection ports for feeding/receiving a sample solution, and discharge ports for recovering a sample solution after reaction from respective reactors; and a second substrate in which at least one micro pump is disposed so as to be faced to the injection ports and the discharge ports, the at least one micro pump being provided with a substrate including a cavity made of a ceramic in the inner surface thereof; a piezoelectric/electrostrictive operation section formed on the outer surface of the substrate, and at least two connection ports for feeding/receiving a sample solution in the cavity; and the micro reactor being formed integrally by laminating the first substrate and the second substrate.
摘要翻译：一种微反应器，包括：包含预定数量的每个微通道的第一基板，在相应连接点处连接到微通道的反应器，用于进料/接收样品溶液的注入口和用于从各个反应器反应后回收样品溶液的排出口 ; 以及第二基板，其中至少一个微泵设置成面对所述喷射口和所述排出口，所述至少一个微型泵设置有在其内表面中包括由陶瓷制成的空腔的基板 ; 形成在所述基板的外表面上的压电/电致伸缩操作部，以及用于在所述空腔内供给/接收样品溶液的至少两个连接端口; 并且所述微反应器通过层叠所述第一基板和所述第二基板而一体地形成。

9. 发明授权

US07267840B2 Manufacturing method of piezoelectric/electrostrictive film type device 失效
标题翻译：压电/电致伸缩薄膜型器件的制造方法
公开(公告)号：US07267840B2
公开(公告)日：2007-09-11
申请号：US10630887
申请日：2003-07-30
申请人： Takao Ohnishi , Masahiro Murasato , Yuki Bessho , Nobuo Takahashi
发明人： Takao Ohnishi , Masahiro Murasato , Yuki Bessho , Nobuo Takahashi
IPC分类号： B05D5/12
CPC分类号： H01L41/314 , H01L41/0973 , H01L41/273
摘要： A method is provided for manufacturing a piezoelectric/electrostrictive film device including a ceramic substrate and a piezoelectric/electrostrictive operation portion including a lower electrode, a piezoelectric/electrostrictive layer, and upper electrode stacked on the substrate. The piezoelectric/electrostrictive layer is formed to extend beyond at least one of electrodes to form projected portions at its ends. The method includes the steps of forming the piezoelectric/electrostrictive layer so that ends of the piezoelectric/electrostrictive layer are projected to extend beyond ends of at least one electrode, applying a coating liquid in a sufficient amount so that the coating liquid permeates through a gap between at least the projected end portion of the piezoelectric/electrostrictive layer and the substrate, and so as to coat a predetermined portion of the at least one electrode, and drying the applied coating liquid to form a coupling member to couple the projected end portions of the piezoelectric/electrostrictive layer to the substrate.
摘要翻译：提供一种用于制造包括陶瓷基板和压电/电致伸缩操作部分的压电/电致伸缩膜装置的方法，该压电/电致伸缩操作部分包括堆叠在基板上的下电极，压电/电致伸缩层和上电极。压电/电致伸缩层被形成为延伸超过至少一个电极以在其端部处形成突出部分。该方法包括以下步骤：形成压电/电致伸缩层，使得压电/电致伸缩层的端部突出延伸超过至少一个电极的端部，施加足够量的涂覆液体，使得涂布液体渗透通过间隙在压电/电致伸缩层的至少突出的端部与基板之间，并且涂覆至少一个电极的预定部分，并干燥所施加的涂覆液体以形成耦合部件，以将突出的端部压电/电致伸缩层到基板。

10. 发明授权

US07067961B2 Piezoelectric/electrostrictive film device, and manufacturing method of the device 失效
标题翻译：压电/电致伸缩膜装置及其制造方法
公开(公告)号：US07067961B2
公开(公告)日：2006-06-27
申请号：US10615545
申请日：2003-07-08
申请人： Nobuo Takahashi , Yuki Bessho , Nobuyuki Kobayashi , Masahiro Murasato
发明人： Nobuo Takahashi , Yuki Bessho , Nobuyuki Kobayashi , Masahiro Murasato
IPC分类号： H01L41/08
CPC分类号： C04B35/493 , C04B2235/3206 , C04B2235/3227 , C04B2235/3251 , C04B2235/3279 , C04B2235/785 , H01L41/0973 , H01L41/314
摘要： There is disclosed a piezoelectric/electrostrictive film device which has a flexural displacement and durability equal to or more than those of a related-art piezoelectric/electrostrictive film device and which has a remarkably high resonance frequency and which is superior in high-speed response. The piezoelectric/electrostrictive film device comprises: a substrate formed of ceramic; and a piezoelectric/electrostrictive operation portion including a lower electrode, piezoelectric/electrostrictive layer, and upper electrode which are successively stacked on the substrate and including a projecting end of the piezoelectric/electrostrictive layer with which an upper surface of the lower electrode and a lower surface of the upper electrode are coated, and a projecting portion of the piezoelectric/electrostrictive layer is a coupling member constituted of a hybrid material in which inorganic particles are scattered in a matrix of a polymer compound, and is coupled to the substrate.
摘要翻译：公开了一种压电/电致伸缩膜装置，其具有等于或大于现有技术的压电/电致伸缩膜装置的弯曲位移和耐久性，并且具有非常高的谐振频率，并且在高速响应方面优异。压电/电致伸缩膜装置包括：由陶瓷形成的基板; 以及包括下电极，压电/电致伸缩层和上电极的压电/电致伸缩操作部分，它们依次层叠在基板上，并且包括压电/电致伸缩层的突出端，下电极的上表面和下电极上部电极的表面被涂覆，并且压电/电致伸缩层的突出部分是由无机颗粒在高分子化合物的基体中散射并耦合到基底的混合材料构成的耦合构件。

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