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    • 3. 发明授权
    • Semiconductor integrated circuit device
    • 半导体集成电路器件
    • US08379425B2
    • 2013-02-19
    • US12714309
    • 2010-02-26
    • Kazuki FukuokaYasuto IgarashiRyo MoriYoshihiko YasuToshio Sasaki
    • Kazuki FukuokaYasuto IgarashiRyo MoriYoshihiko YasuToshio Sasaki
    • H02M1/00G06F1/26
    • H03K5/00H01L27/0203H01L27/0207H01L27/0928H01L27/11807H03K3/00H03K19/0016
    • Efficient reduction in power consumption is achieved by combinational implementation of a power cutoff circuit technique using power supply switch control and a DVFS technique for low power consumption. A power supply switch section fed with power supply voltage, a circuit block in which a power cutoff is performed by the power supply switch section, and a level shifter are formed in a DEEP-NWELL region formed over a semiconductor substrate. Another power supply switch section fed with another power supply voltage, a circuit block in which a power cutoff is performed by the power supply switch section, and a level shifter are formed in another DEEP-NWELL region formed over the semiconductor substrate. In this arrangement, there arises no possibility of short-circuiting between different power supplies via each DEEP-NWELL region formed over the semiconductor substrate.
    • 通过使用电源开关控制和DVFS技术组合实现断电电路技术实现功耗的有效降低,实现低功耗。 在半导体基板上形成的DEEP-NWELL区域中,形成供给电源电压的电源开关部,由电源开关部进行电源切断的电路块和电平移位器。 供给另一电源电压的另一个电源开关部分,由电源开关部分执行电源切断的电路块和电平移位器形成在形成在半导体衬底上的另一个DEEP-NWELL区域中。 在这种布置中,不存在通过半导体衬底上形成的每个DEEP-NWELL区域在不同电源之间短路的可能性。
    • 10. 发明申请
    • SEMICONDUCTOR INTEGRATED CIRCUIT
    • 半导体集成电路
    • US20070215952A1
    • 2007-09-20
    • US11614619
    • 2006-12-21
    • Osamu OZAWAToshio SasakiRyo MoriTakashi KuraishiYoshihiko YasuKoichiro Ishibashi
    • Osamu OZAWAToshio SasakiRyo MoriTakashi KuraishiYoshihiko YasuKoichiro Ishibashi
    • H01L29/76
    • H01L27/1203H01L21/823857
    • The semiconductor integrated circuit has so-called SOI type first MOS transistors (MNtk, MPtk) and second MOS transistors (MNtn, MPtn). The first MOS transistors have a gate isolation film thicker than that the second MOS transistors have. The first and second MOS transistors constitute a power-supply-interruptible circuit (6) and a power-supply-uninterrupted circuit (7). The power-supply-interruptible circuit has the first MOS transistors each constituting a power switch (10) between a source line (VDD) and a ground line (VSS), and the second MOS transistors connected in series with the power switch. A gate control signal for the first MOS transistors each constituting a power switch is made larger in amplitude than that for the second MOS transistors. This enables power-source cutoff control with a high degree of flexibility commensurate with the device isolation structure, which an SOI type semiconductor integrated circuit has originally.
    • 半导体集成电路具有所谓的SOI型第一MOS晶体管(MNtk,MPtk)和第二MOS晶体管(MNtn,MPtn)。 第一MOS晶体管具有比第二MOS晶体管更厚的栅极隔离膜。 第一和第二MOS晶体管构成电源可中断电路(6)和电源不间断电路(7)。 电源中断电路具有构成源极线(VDD)和接地线(VSS)之间的电源开关(10)的第一MOS晶体管,以及与电源开关串联连接的第二MOS晶体管。 构成功率开关的第一MOS晶体管的栅极控制信号的幅度比第二MOS晶体管的幅度大。 这使得能够实现与SOI原理的SOI型半导体集成电路的器件隔离结构相当的高度灵活性的电源切断控制。