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    • 6. 发明申请
    • NEAR-FIELD EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD USING THE SAME
    • 近场曝光方法及使用其的装置制造方法
    • US20080107998A1
    • 2008-05-08
    • US11740604
    • 2007-04-26
    • Yasuhisa InaoTakako YamaguchiToshiki ItoNatsuhiko Mizutani
    • Yasuhisa InaoTakako YamaguchiToshiki ItoNatsuhiko Mizutani
    • G03F9/00
    • G03F7/2014G03F1/50G03F7/091G03F7/094G03F7/7035
    • A near-field exposure method in which a light blocking film with an opening having an opening width not greater than a wavelength size of exposure light is contacted to an object to be exposed and in which light from an exposure light source is projected on the light blocking film so that a pattern based on the opening of the light blocking film is formed on the object to be exposed, by use of near-field light produced at the opening, wherein the object to be exposed is prepared by a process that includes (i) a step of providing, upon a substrate having surface irregularity, a shape buffering layer so as to fill the surface irregularity thereof to thereby flatten the surface of the substrate, (ii) a step of providing, upon the shape buffering layer, a light reflecting layer for reflecting the exposure light, and (iii) a step of providing a photosensitive resist layer upon the light reflecting layer, and wherein the exposure is carried out to the object so prepared.
    • 一种近场曝光方法,其中具有不大于曝光光的波长尺寸的开口宽度的开口的遮光膜与待曝光的物体接触,并且来自曝光光源的光被投射到光 使得通过使用在开口处产生的近场光,在待曝光的物体上形成基于遮光膜的开口的图案,其中待曝光的物体通过包括( i)在具有表面不规则的基板上设置形状缓冲层以填充其表面不规则性从而使基板的表面变平的步骤,(ii)在形状缓冲层上设置一个 用于反射曝光光的光反射层,以及(iii)在光反射层上提供光敏抗蚀剂层的步骤,并且其中对如此制备的物体进行曝光。