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1. 发明授权

US09383419B2 Magnetic gradiometer and magnetic sensing method 有权
标题翻译：磁梯仪和磁感测方法
公开(公告)号：US09383419B2
公开(公告)日：2016-07-05
申请号：US13814231
申请日：2011-08-01
申请人： Natsuhiko Mizutani , Tetsuo Kobayashi
发明人： Natsuhiko Mizutani , Tetsuo Kobayashi
IPC分类号： G01V3/00 , G01R33/26 , G01R33/022 , G01R33/028
CPC分类号： G01R33/26 , G01R33/022 , G01R33/028
摘要： A gradiometer in which a probe beam for reading sequentially passes through two magnetic field measurement regions to obtain signals according to magnetic flux densities of the respective regions is formed using an optically pumped magnetometer. In particular, in a gradiometer using a high sensitivity optically pumped magnetometer, a geometric arrangement enabling obtainment of a large signal from a dipole moment as a signal source is defined.
摘要翻译：使用光泵浦磁力计形成其中用于读取的探测光束依次通过两个磁场测量区域以获得根据各个区域的磁通密度的信号的梯度计。特别地，在使用高灵敏度光泵浦磁力计的梯度计中，定义了能够从作为信号源的偶极矩获得大信号的几何布置。

2. 发明授权

US08488125B2 Optical tomography apparatus with timing detection element including optical resonator having variable resonator length 有权
标题翻译：具有包括具有可变谐振器长度的光学谐振器的定时检测元件的光学断层摄影装置
公开(公告)号：US08488125B2
公开(公告)日：2013-07-16
申请号：US12865171
申请日：2009-05-12
申请人： Kentaro Furusawa , Natsuhiko Mizutani , Ryo Kuroda
发明人： Kentaro Furusawa , Natsuhiko Mizutani , Ryo Kuroda
IPC分类号： G01B9/02
CPC分类号： G01B9/02014 , G01B9/02004 , G01B9/02069 , G01B9/02091
摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.
摘要翻译：光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像常规的SS-OCT。

3. 发明申请

US20130082700A1 NUCLEAR MAGNETIC RESONANCE IMAGING APPARATUS AND NUCLEAR MAGNETIC RESONANCE IMAGING METHOD 审中-公开
标题翻译：核磁共振成像装置和核磁共振成像方法
公开(公告)号：US20130082700A1
公开(公告)日：2013-04-04
申请号：US13604225
申请日：2012-09-05
申请人： Natsuhiko Mizutani , Tetsuo Kobayashi , Kiyoshi Ishikawa
发明人： Natsuhiko Mizutani , Tetsuo Kobayashi , Kiyoshi Ishikawa
IPC分类号： G01R33/48
CPC分类号： G01R33/26 , G01R33/482
摘要： The present invention has an object to provide a nuclear magnetic resonance imaging apparatus or the like that avoids a region with zero sensitivity of an optical magnetometer and allows imaging by strong magnetic resonance when a common magnetic field is used as a bias field of an optical magnetometer and as a magnetostatic field to be applied to a sample. When a direction of a magnetostatic field application unit applying a magnetostatic field to a sample is a z direction, alkali metal cell of a scalar magnetometer is arranged so as not to overlap a region to be imaged in a z direction, and so as not to intersect the region to be imaged in an in-plane direction perpendicular to the z direction.
摘要翻译：本发明的目的是提供一种避免光学磁力计具有零灵敏度的区域的核磁共振成像设备等，并且当使用公共磁场作为光学磁力计的偏置场时允许通过强磁共振成像并且作为应用于样品的静磁场。当向样品施加静磁场的静磁场施加单元的方向是az方向时，标量磁力计的碱金属单元被布置成不与在az方向上要成像的区域重叠，并且不与在与z方向垂直的面内方向成像的区域。

4. 发明授权

US07704672B2 Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device 失效
标题翻译：光敏性硅烷偶联剂，表面改性方法，成型方法及其制造方法
公开(公告)号：US07704672B2
公开(公告)日：2010-04-27
申请号：US11705787
申请日：2007-02-14
申请人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao
发明人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0755 , C07F7/12 , C07F7/1804 , G03F7/022 , G03F7/0751 , G03F7/165
摘要： Provided are a photosensitive silane coupling agent for forming a low-defect microparticle pattern, dot array pattern, or hole array pattern through fewer steps, and a method of forming a pattern using such photosensitive silane coupling agent. Used is a photosensitive silane coupling agent comprising a 1,2-naphthoquinone-2-diazido-5-sulfonyl group or a 1,2-naphthoquinone-2-diazido-4-sulfonyl group.
摘要翻译：提供了用于通过较少步骤形成低缺陷微粒图案，点阵列图案或孔阵列图案的感光性硅烷偶联剂，以及使用这种感光性硅烷偶联剂形成图案的方法。使用的是含有1,2-萘醌-2-二叠氮基-5-磺酰基或1,2-萘醌-2-二叠氮基-4-磺酰基的感光性硅烷偶联剂。

5. 发明授权

US07659039B2 Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method 失效
标题翻译：近场曝光掩模，制造该掩模的方法，具有该掩模的近场曝光装置和抗蚀剂图案形成方法
公开(公告)号：US07659039B2
公开(公告)日：2010-02-09
申请号：US10585644
申请日：2006-06-07
申请人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
发明人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
IPC分类号： G03F1/00
CPC分类号： G03F1/50 , B82Y10/00 , G03F7/70325 , G03F7/7035
摘要： Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.
摘要翻译：公开了一种具有在基板上形成的遮光层的近场曝光掩模，该遮光层具有开口宽度比曝光光源的波长窄的开口，其中进行曝光对象的曝光通过使曝光掩模和被曝光物体在开口处产生的近场光彼此接触，其特征在于阻光层由含有硅的膜提供，以摩尔分数计为50％至100％的范围。

6. 发明申请

US20090311631A1 NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD 失效
标题翻译：近场曝光装置及近场曝光方法
公开(公告)号：US20090311631A1
公开(公告)日：2009-12-17
申请号：US11914040
申请日：2007-10-10
申请人： Yasuhisa Inao , Toshiki Ito , Natsuhiko Mizutani
发明人： Yasuhisa Inao , Toshiki Ito , Natsuhiko Mizutani
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F9/7038 , B82Y10/00 , G03F7/70325 , G03F7/7035 , G03F7/70866 , G03F9/7096 , Y10S430/167
摘要： A near-field exposure apparatus includes a near-field exposure mask, a mechanism to place a substrate to be exposed, opposed to the near-field exposure mask, a mechanism to perform relative alignment of the near-field exposure mask and the substrate to be exposed, a mechanism to closely contact the near-field exposure mask and the substrate to be exposed, with each other, a mechanism to project exposure light to the near-field exposure mask, and a soft X-ray irradiating device to remove static electricity charged in at least one of the near-field exposure mask and the substrate to be exposed. The soft X-ray irradiating device is disposed at a side of the near-field exposure mask remote from the substrate to be exposed.
摘要翻译：近场曝光装置包括近场曝光掩模，与近场曝光掩模相对地放置待曝光的基板的机构，用于执行近场曝光掩模和基板的相对对准的机构，暴露出将近场曝光掩模和待曝光的基板紧密接触的机构，将曝光光投射到近场曝光掩模的机构，以及用于去除静电的软X射线照射装置在近场曝光掩模和待暴露的基板中的至少一个中充电的电。软X射线照射装置设置在远离待曝光的基板的近场曝光掩模的一侧。

7. 发明授权

US07605908B2 Near-field exposure mask, near-field exposure apparatus, and near-field exposure method 失效
标题翻译：近场曝光掩模，近场曝光装置和近场曝光法
公开(公告)号：US07605908B2
公开(公告)日：2009-10-20
申请号：US11864097
申请日：2007-09-28
申请人： Toshiki Ito , Natsuhiko Mizutani
发明人： Toshiki Ito , Natsuhiko Mizutani
IPC分类号： G03B27/02 , G03B27/20 , G03B27/62 , G03F1/00 , G03C5/04
CPC分类号： G03F7/24 , B82Y10/00 , G03F1/50 , G03F1/60 , G03F7/2014 , G03F7/7035
摘要： A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.
摘要翻译：近场曝光掩模包括具有比曝光光的波长小的开口的遮光膜和用于保持遮光膜的掩模基材。近场曝光掩模被构造和定位成使得要暴露于与要暴露的物体接触期间对应于开口产生的近场光的物体的曝光。掩模基材对曝光光是透明的，并且包含杨氏模量在1GPa以上至10GPa以下的合成树脂材料。

8. 发明申请

US20090208850A1 Near-Field Exposure Mask, Method of Producing that Mask, Near-Field Exposure Apparatus Having that Mask, and Resist Pattern Forming Method 失效
标题翻译：近场曝光掩模，产生该掩模的方法，具有该掩模的近场曝光装置和抗蚀剂图案形成方法
公开(公告)号：US20090208850A1
公开(公告)日：2009-08-20
申请号：US10585644
申请日：2006-06-07
申请人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
发明人： Toshiki Ito , Natsuhiko Mizutani , Takako Yamaguchi
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G03F1/50 , B82Y10/00 , G03F7/70325 , G03F7/7035
摘要： Disclosed is a near-field exposure mask having a light blocking layer formed on a substrate, the light blocking layer having an opening with an opening width narrower than a wavelength of an exposure light source, wherein exposure of an object to be exposed is carried out by use of near-field light to be produced at the opening while the exposure mask and the object to be exposed are placed in contact with each other, an important feature residing in that the light blocking layer is provided by a film that contains silicon in a range from 50% to 100% in terms of mole fraction.
摘要翻译：公开了一种具有在基板上形成的遮光层的近场曝光掩模，该遮光层具有开口宽度比曝光光源的波长窄的开口，其中进行曝光对象的曝光通过使曝光掩模和被曝光物体在开口处产生的近场光彼此接触，其特征在于阻光层由含有硅的膜提供，以摩尔分数计为50％至100％的范围。

9. 发明申请

US20080246970A1 SENSOR DEVICE AND TESTING METHOD UTILIZING LOCALIZED PLASMON RESONANCE 失效
标题翻译：传感器设备和测试方法利用本地化的PLASMON共振
公开(公告)号：US20080246970A1
公开(公告)日：2008-10-09
申请号：US12131433
申请日：2008-06-02
申请人： Ryo Kuroda , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
发明人： Ryo Kuroda , Natsuhiko Mizutani , Takako Yamaguchi , Yasuhisa Inao , Tomohiro Yamada
IPC分类号： G01N21/55
CPC分类号： G01N21/648 , G01N21/554 , Y10T436/11
摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.
摘要翻译：传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器从开口穿过或反射。多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

10. 发明申请

US20080074633A1 NEAR-FIELD EXPOSURE METHOD AND APPARATUS, NEAR-FIELD EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：近场曝光方法和装置，近场曝光掩模和装置制造方法
公开(公告)号：US20080074633A1
公开(公告)日：2008-03-27
申请号：US11849447
申请日：2007-09-04
申请人： Natsuhiko MIZUTANI
发明人： Natsuhiko MIZUTANI
IPC分类号： G03B27/60 , G03F1/00 , G03F7/24
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/703 , G03F7/70325
摘要： A near-field exposure method wherein a pressure difference is applied between a front face and a rear face of an elastically deformable exposure mask to cause deformation of the exposure mask in accordance with a substrate to be exposed, and to cause the exposure mask surface to follow a surface irregularity state of the substrate so that these surfaces closely contact each other, for exposure based on near field light. The method includes setting the pressure difference applied between the front and rear faces of the exposure mask at a predetermined pressure difference corresponding to a surface roughness of the substrate to be exposed.
摘要翻译：一种近场曝光方法，其中在可弹性变形的曝光掩模的前表面和后表面之间施加压差，以使曝光掩模根据待曝光的基板而变形，并使曝光掩模表面遵循基板的表面不规则状态，使得这些表面彼此紧密接触，用于基于近场光的曝光。该方法包括将曝光掩模的前表面和后表面之间施加的压差设定在与待曝光的基板的表面粗糙度相对应的预定压力差。

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