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    • 4. 发明授权
    • Semiconductor device with a photodetector switching device grown on a
recrystallized monocrystal silicon film
    • 具有在再结晶单晶硅膜上生长的光电检测器开关器件的半导体器件
    • US5223446A
    • 1993-06-29
    • US777668
    • 1991-10-16
    • Toshiaki MiyajimaShinji ToyoyamaMasayoshi Koba
    • Toshiaki MiyajimaShinji ToyoyamaMasayoshi Koba
    • H01L27/144H03K17/785
    • H01L27/1443H03K17/785
    • A semiconductor device is disclosed which comprises a normally-off first MOSFET, a normally-off second MOSFET connected between the gate and source of the first MOSFET, a diode connected between the gate and source of the second MOSFET, a resistor and an optoelectric transducer array, both of which are connected in parallel with each other between the gate and drain of the second MOSFET, wherein all of the components are formed on a single semiconductor chip. Also disclosed is a semiconductor device comprising a normally-off first MOSFET, a normally-on second MOSFET connected between the gate and source of the first MOSFET, a first resistor and a diode, both of which are connected in series between the source and drain of the second MOSFET, a second resistor connected between the gate and source of the second MOSFET, an optoelectric transducer array connected between the gate of the second MOSFET and the terminal which is positioned between the first resistor and the diode, wherein all of the components are formed on a single semiconductor chip.Further disclosed is a method for manufacturing a semiconductor device comprising a normally-off first MOSFET, a normally-off second MOSFET connected between the gate and source of the first MOSFET, a diode connected between the gate and source of the second MOSFET, a resistor and an optoelectric transducer array, both of which are connected in parallel with each other between the gate and drain of the second MOSFET.
    • 公开了一种半导体器件,其包括常闭第一MOSFET,连接在第一MOSFET的栅极和源极之间的常关的第二MOSFET,连接在第二MOSFET的栅极和源极之间的二极管,电阻器和光电换能器 阵列,它们都在第二MOSFET的栅极和漏极之间彼此并联连接,其中所有的部件形成在单个半导体芯片上。 还公开了一种半导体器件,包括常闭第一MOSFET,连接在第一MOSFET的栅极和源极之间的常数第二MOSFET,第一电阻器和二极管,两者均串联连接在源极和漏极 连接在第二MOSFET的栅极和源极之间的第二电阻器,连接在第二MOSFET的栅极和位于第一电阻器和二极管之间的端子之间的光电变换器阵列,其中所有部件 形成在单个半导体芯片上。 进一步公开的是一种制造半导体器件的方法,该半导体器件包括常闭第一MOSFET,连接在第一MOSFET的栅极和源极之间的常关的第二MOSFET,连接在第二MOSFET的栅极和源极之间的二极管, 以及光电转换器阵列,它们都在第二MOSFET的栅极和漏极之间彼此并联连接。
    • 6. 发明授权
    • Method of manufacturing a device having a superconducting film
    • 制造具有超导膜的器件的方法
    • US5262026A
    • 1993-11-16
    • US908922
    • 1992-07-02
    • Hideo NojimaMasayoshi KobaMasaya NagataHidetaka Shintaku
    • Hideo NojimaMasayoshi KobaMasaya NagataHidetaka Shintaku
    • H01L39/14H01L39/24C25D13/02B05D5/12
    • H01L39/2429H01L39/143Y10S505/741
    • In a method for manufacturing a device having a film of high temperature superconductor, a copper substrate is used in the electrophoretic deposition as a cathode on which fine powders of superconductor should be deposited, and the fine powders deposited on the substrate are fired in the conditions that they are sintered partially.In other methods for manufacturing such a device, a desired minute pattern of electrically conductive material as a cathode in the electrophoretic deposition is formed on a substrate, and a minute pattern of fine powders is deposited according to the pattern of the cathode. Then, the fine powders are fired to form a superconductor film. Such a desired pattern of the cathode is formed by the patterning of a film of an electrically insulating substrate. Such a desired pattern of the cathode is also formed by the patterning of an electrically insulating material, applied to an electrically conductive substrate.In a further method for manufacturing such a device, a desired minute pattern of electrically conductive material as a cathode in the electrophoretic deposition is formed on a substrate, while another pattern of electrically conductive material as an anode is formed on the same substrate near the former pattern so as to keep a constant distance. The fine powders deposited on the former pattern are fired to form a superconductor film.
    • 在制造具有高温超导体膜的器件的方法中,在电泳沉积中使用铜衬底作为阴极,在其上沉积超导体的细粉末,并且沉积在衬底上的细粉末在条件下烧制 它们被部分烧结。 在制造这种器件的其它方法中,在基片上形成电泳沉积中作为阴极的导电材料的期望微小图案,并根据阴极的图案沉积细微粉末的微小图案。 然后,烧制细粉以形成超导膜。 通过图案化电绝缘基板的膜来形成阴极的这种期望的图案。 阴极的这种期望图案也通过施加到导电基底上的电绝缘材料的图案形成。 在制造这种器件的另一种方法中,在基片上形成作为电泳沉积中阴极的导电材料的期望的微小图案,而作为阳极的导电材料的另一图案形成在靠近前者的同一衬底上 模式,以保持恒定的距离。 将沉积在前一图案上的细粉末烧制以形成超导薄膜。