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1. 发明授权

US5683856A Positive-working photosensitive composition 失效
标题翻译：正性感光组合物
公开(公告)号：US5683856A
公开(公告)日：1997-11-04
申请号：US634529
申请日：1996-04-18
申请人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03C1/492
CPC分类号： G03F7/0045
摘要： A positive working photosensitive composition is disclosed, which comprises: (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution; (b) a compound which generates an acid upon irradiation with active light or radiation; (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. A further positive working photosensitive composition is disclosed, which comprises: (1) a compound which generates an acid upon irradiation with active light or radiation; (2) a resin having a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. The positive-working photosensitive composition of the present invention can easily and properly inhibit acid diffusion and acid deactivation on the surface thereof with time between the exposure and the heat treatment, keep the dissolution inhibiting effect exerted by the dissolution-inhibitive compound and exhibit a good profile, a high sensitivity and a high resolving power.
摘要翻译：公开了一种正性感光性组合物，其包括：（a）不溶于水但可溶于碱性水溶液的树脂; （b）在用活性光或辐射照射时产生酸的化合物; （c）分子量为3000以下且含有可与酸分解的基团的低分子酸分解性溶解抑制性化合物，其通过酸的作用增加其在碱性显影剂中的溶解度; 和（d）含有碱性氮原子，重均分子量为2,000以上的树脂。公开了另一种正性光敏组合物，其包括：（1）在用活性光或辐射照射时产生酸的化合物; （2）具有通过酸分解的基团的树脂，从而增加其在碱性显影剂中的溶解度; 和（3）含有碱性氮原子，重均分子量为2,000以上的树脂。本发明的正性感光性组合物可以在曝光和热处理之间的时间内容易且适当地抑制其在表面上的酸扩散和酸失活，保持由溶解抑制性化合物发挥的溶解抑制作用，轮廓，高灵敏度和高分辨力。

2. 发明授权

US6013411A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US6013411A
公开(公告)日：2000-01-11
申请号：US794890
申请日：1997-02-05
申请人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; R.sub.2 represents --C(.dbd.O)--O--C(R.sub.6) (R.sub.7) (R.sub.8) or --O--R.sub.5 --C(.dbd.O)--O--(R.sub.6) (R.sub.7) (R.sub.8); R.sub.3 represents --O--C(R.sub.6)(R.sub.7) (R.sub.8), --O--Si(R.sub.6)(R.sub.7)(Rs) or --O--C(R.sub.9)(R.sub.10)--OR.sub.11 ; R.sub.4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R.sub.5 represents an alkylene group; R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R.sub.6, R.sub.7 and R.sub.8 are groups other than a hydrogen atom; R.sub.11 represents an alkyl group or an aryl group; two groups selected from R.sub.6, R.sub.7 and R.sub.8 and two groups selected from R.sub.9, R.sub.10 and R.sub.11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.
摘要翻译：一种正性感光性组合物，其特征在于，具有分别具有下述式（I），（II）和（III）所示的重复单元的树脂和通过活性射线或辐射照射产生酸的化合物，其中R1表示氢原子或甲基; R2表示-C（= O）-O-C（R6）（R7）（R8）或-O-R5-C（= O）-O-（R6）（R7）（R8） R3表示-O-C（R6）（R7）（R8），-O-Si（R6）（R7）（Rs）或-O-C（R9）（R10）-OR11; R4表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或酰氧基; R5表示亚烷基; R6，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烯基，条件是R6，R7和R8中的至少两个是除氢原子以外的基团; R11表示烷基或芳基; 选自R6，R7和R8的两个基团和选自R9，R10和R11的两个基团，可以将两个基团组合形成环; n为1〜3的整数。

3. 发明授权

US5837420A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5837420A
公开(公告)日：1998-11-17
申请号：US812165
申请日：1997-03-06
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： A positive working photosensitive composition is disclosed, which comprises (a) a resin having groups capable of increasing solubility of the resin in an alkali developer through their decomposition due to the action of an acid and (b) a compound represented by formula (I) or (II) generating sulfonic acid by irradiation with active rays or radiant rays: ##STR1##
摘要翻译：公开了一种正性感光性组合物，其包含（a）具有能够通过酸的作用使树脂在碱性显影剂中分解的溶解性的基团的树脂和（b）由式（I）表示的化合物，或（II）通过用活性射线或辐射线照射产生磺酸：<图像（I）<图像>（II）

4. 发明授权

US06200729B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06200729B1
公开(公告)日：2001-03-13
申请号：US09422344
申请日：1999-10-21
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: wherein R1 to R5 and R7 to R10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by —S—R6, where R6 represents an alkyl group or an aryl group; X− represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as deifined in the specification; and m, n, p and q each represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中所述的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

5. 发明授权

US6010820A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US6010820A
公开(公告)日：2000-01-04
申请号：US814826
申请日：1997-03-11
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.5 and R.sub.7 to R.sub.10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.6, where R.sub.6 represents an alkyl group or an aryl group; X.sup.- represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as defined in the specification; and m, n, p and q each represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中定义的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

6. 发明授权

US06962766B2 Positive photoresist composition 有权
标题翻译：正光致抗蚀剂组合物
公开(公告)号：US06962766B2
公开(公告)日：2005-11-08
申请号：US10109872
申请日：2002-04-01
申请人： Kazuya Uenishi , Toshiaki Aoai , Kenichiro Sato
发明人： Kazuya Uenishi , Toshiaki Aoai , Kenichiro Sato
IPC分类号： C08K5/00 , C08L101/00 , G03F7/004 , G03F7/039 , G03F7/20 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/0397
摘要： A positive photoresist composition comprises: an acid-decomposable resin containing a specified repeating unit; an acid-generator; and a specified dissolution-inhibiting compound.
摘要翻译：正性光致抗蚀剂组合物包含：含有特定重复单元的酸分解树脂; 酸发生器; 和特定的溶解抑制化合物。

7. 发明授权

US5981140A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5981140A
公开(公告)日：1999-11-09
申请号：US932168
申请日：1997-09-17
申请人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
发明人： Kenichiro Sato , Kunihiko Kodama , Kazuya Uenishi , Toshiaki Aoai
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/121 , Y10S430/122
摘要： A positive photosensitive composition comprising:a compound represented by formula (I) or (I') and a compound represented by formula (II) as compounds which generate a sulfonic acid upon irradiation with actinic rays or radiation: ##STR1## The substituents in these formulae are as defined in the specification. The positive photosensitive composition has high sensitivity and high resolving power, undergoes neither a decrease in resist pattern line width nor the formation of a T-top resist pattern surface with the lapse of time from exposure to heat treatment, and exhibits less profile deterioration such as residual standing wave and collapse.
摘要翻译：一种正型光敏组合物，其包含：由式（I）或（I'）表示的化合物和由式（II）表示的化合物作为在光化射线或辐射照射时产生磺酸的化合物：这些式中的取代基为在规范中定义。正型感光性组合物具有高灵敏度和高分辨能力，经历曝光与热处理后的时间不会影响抗蚀剂图案线宽度的降低和T型抗蚀剂图形表面的形成，并且表现出较小的轮廓劣化，例如残余驻波和崩溃。

8. 发明授权

US5955238A Waterless planographic printing plate and method of plate making using the same 失效
标题翻译：无水平版印刷版及其制版方法
公开(公告)号：US5955238A
公开(公告)日：1999-09-21
申请号：US812035
申请日：1997-03-06
申请人： Hiroaki Yokoya , Toshiaki Aoai , Kazuya Uenishi
发明人： Hiroaki Yokoya , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： B41C1/05 , B41C1/055 , B41C1/10 , B41N1/14 , G03F7/00 , G03F7/004 , G03F7/022 , G03F7/075 , G03F7/11 , G03F7/26
CPC分类号： G03F7/0752 , B41C1/1033 , G03F7/0045 , G03F7/022 , B41C2210/16 , Y10S430/145
摘要： A waterless planographic printing plate, wherein the waterless planographic printing plate comprises a laser-light-sensitive layer which constitute a first layer provided on a support, containing a compound (A) generating an acid by irradiating an actinic light thereto, a compound (B) converting a laser light to heat and a polymer compound (C) which is decomposed by heat under an acidic condition; and a layer which constitutes a second layer having an ink repellent surface thereon. The entire surface of the waterless planographic printing plate is exposed with ultraviolet light. The printing plate is irradiated imagewisely with an infrared laser light to heat the portion irradiated with the laser light, and at least a layer having an ink repellent surface at the portion irradiated with the laser light is removed. The present invention can provide a waterless planographic printing plate capable of laser recording with a high sensitivity and separation developing, and having a high resolving power and an excellent storability, and a method of plate making for the printing plate which is simple and accurate.
摘要翻译：一种无水平版印刷版，其中所述无水平版印刷版包括构成设置在载体上的第一层的激光感光层，所述第一层含有通过向其中照射光化光而产生酸的化合物（A），化合物（B ）将激光转化为热，以及在酸性条件下通过加热分解的高分子化合物（C）; 以及构成其上具有拒墨表面的第二层的层。无水平版印刷版的整个表面用紫外线照射。用红外激光成像照射印版，加热照射激光的部分，至少在激光照射部分具有防墨表面的层被去除。本发明可以提供一种能够以高灵敏度和分离显影的激光记录，并且具有高分辨能力和优异的储存性的无水平版印刷版，并且该印版的制版方法简单准确。

9. 发明授权

US06265135B1 Positive-working electron beam or X-ray resist composition 有权
标题翻译：正电子束或X射线抗蚀剂组成
公开(公告)号：US06265135B1
公开(公告)日：2001-07-24
申请号：US09419905
申请日：1999-10-18
申请人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
发明人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： G03C1492
CPC分类号： G03F7/0392 , C08F12/22 , G03F7/0045 , Y10S430/143 , Y10S430/167
摘要： A positive-working electron beam or X-ray resist composition comprising: (a) a compound capable of generating an acid by irradiation of an electron beam or X-ray; (b) a resin containing a group which is decomposable by action of an acid to increase solubility in an alkali developing solution or (e) a resin insoluble in water and soluble in the alkali developing solution; and (c) a fluorine and/or silicon surfactant, the compound capable of generating an acid by irradiation of an electron beam or X-ray being a compound which generates benzenesulfonic acid, naphthalenesulfonic acid or anthracenesulfonic acid which is substituted by at least one fluorine atom and/or at least one group containing a fluorine atom.
摘要翻译：一种正电子束或X射线抗蚀剂组合物，其包含：（a）能够通过电子束或X射线的照射产生酸的化合物;（b）含有可通过酸以增加在碱性显影溶液中的溶解度，或（e）不溶于水并可溶于碱性显影液的树脂; 和（c）氟和/或硅表面活性剂，能够通过电子束的照射产生酸的化合物或者X射线是产生被至少一个氟取代的苯磺酸，萘磺酸或蒽磺酸的化合物原子和/或至少一个含有氟原子的基团。

10. 发明授权

US5891603A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5891603A
公开(公告)日：1999-04-06
申请号：US840629
申请日：1997-04-25
申请人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
发明人： Kunihiko Kodama , Toshiaki Aoai , Kazuya Uenishi
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/121 , Y10S430/125
摘要： Provided is a positive working photosensitive composition comprising (a) a compound represented by the following formula (I) which generates a sulfonic acid by irradiation with active rays or radiation, and (b) a resin comprising constitutional repeating units of the following formulae (II) and (III) and having groups which enable an increase of the solubility in an alkali developer through their decomposition due to the action of an acid: ##STR1## wherein Y represents an alkyl group, an aralkyl group, or a specific phenyl, naphthyl or anthracenyl group and Y may be bonded to the other imidesulfonate compound residue; and X represents an alkylene group, an alkenylene group, an arylene group, or an aralkylene group, and X may be bonded to the other imidesulfonate compound residue: ##STR2## wherein R.sub.22 represents a hydrogen atom, an alkyl group, or an aralkyl group; and A represents an alkyl group or an aralkyl group, and A may combine with R.sub.22 to complete a 5- or 6-membered ring.
摘要翻译：本发明提供一种正型工作感光性组合物，其包含（a）通过用活性射线或辐射照射产生磺酸的下式（I）表示的化合物，和（b）包含下式（II）的构成重复单元的树脂）和（III），并且具有能够通过其由酸的作用而使其在碱性显影剂中的溶解度增加的基团：其中Y表示烷基，芳烷基或特定的苯基，萘基或蒽基，Y可以与另一个酰亚胺磺酸酯化合物残基键合; X表示亚烷基，亚烯基，亚芳基或亚芳烷基，X可以与另一个亚氨基磺酸酯化合物残基键合：氢原子，烷基或芳烷基; A表示烷基或芳烷基，A可与R 22结合形成5元或6元环。

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