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1. 发明授权

US5376498A Negative type radiation-sensitive resin composition 失效
标题翻译：负型辐射敏感树脂组合物
公开(公告)号：US5376498A
公开(公告)日：1994-12-27
申请号：US975713
申请日：1992-11-13
申请人： Toru Kajita , Eiichi Kobayashi , Toshiyuki Ota , Takao Miura
发明人： Toru Kajita , Eiichi Kobayashi , Toshiyuki Ota , Takao Miura
IPC分类号： C07C37/16 , G03F7/004 , G03F7/022 , G03F7/029 , G03F7/038 , G03F7/075 , H01L21/027 , G03C1/52
CPC分类号： G03F7/0755 , C07C37/16 , C07C37/20 , G03F7/0045 , G03F7/0226 , G03F7/038
摘要： A negative type radiation-sensitive resin composition which comprises (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation, and (C) an aromatic compound having, as functional groups, an --OR group and a --CH.sub.2 OX group, both directly bonded to the aromatic ring in which R represents a substituted methyl group, a substituted ethyl group, a silyl group, an alkoxycarbonyl group or an acyl group and in which X represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or an R group which is as defined above, said aromatic compound being capable of cross-linking the alkali-soluble resin (A) in the presence of an acid, and optionally (D) a specific phenolic compound. The negative type radiation-sensitive resin composition is excellent in developability, pattern-formation, resolution and thermal durability.
摘要翻译：一种负型辐射敏感性树脂组合物，其包含（A）碱溶性树脂，（B）照射时产生酸的化合物和（C）具有作为官能团的-OR基团和 -CH 2 X基团，其直接键合到其中R表示取代的甲基，取代的乙基，甲硅烷基，烷氧基羰基或酰基的芳环，其中X表示氢原子，具有1个 -5个碳原子或如上所定义的R基团，所述芳香族化合物能够在酸的存在下交联碱溶性树脂（A），和任选地（D）特定的酚类化合物。负型辐射敏感性树脂组合物的显影性，图案形成，分辨率和热耐久性优异。

2. 发明授权

US5413896A I-ray sensitive positive resist composition 失效
标题翻译： I-ray敏感抗蚀剂组成
公开(公告)号：US5413896A
公开(公告)日：1995-05-09
申请号：US821806
申请日：1992-01-17
申请人： Toru Kajita , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
发明人： Toru Kajita , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
IPC分类号： C08G8/24 , G03F7/022 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0236 , C08G8/24 , G03F7/022
摘要： An i-ray sensitive positive resist composition: which (A) comprises an alkali-soluble novolak resin obtained by subjecting (a) a phenolic mixture of B to 95 mol % of 2,3-xylenol with 95 to 5 mol % of a phenol selected from mono-, di- and tri-methyl phenols other than 2,3-xylenol or (b) a phenolic mixture of 5 to 50 mol % of 8,4-xylenol with 95 to 50 mol % of a phenol selected from mono-, di- and tri-methyl phenols other than 3,4-xylenol to polycondensation together with an aldehyde, and a 1,2-quinonediazide compound, and (B) which has sensitivity to i-ray. There is also provided a method of forming a pattern, which comprises: (1) applying the i-ray sensitive positive resist composition to a wafer to form a photosensitive layer, (2) irradiating the photosensitive layer with i-ray through a predetermined pattern, and (3) developing the pattern with a developer.
摘要翻译：一种i射线敏感正性抗蚀剂组合物，其中（A）包含通过使（a）B至95mol％的2,3-二甲苯酚的酚类混合物与95至5mol％的苯酚（A）的碱溶性酚醛清漆树脂选自2,3-二甲苯酚以外的单 - ，二 - 和三 - 甲基苯酚或（b）5-50mol％的8,4-二甲苯酚的酚类混合物和95-50mol％的选自单 - - 除3,4-二异戊烯酚以外的二 - 和三 - 甲基苯酚与醛缩合，和1,2-醌二叠氮化合物，和（B）对i射线具有敏感性。还提供了形成图案的方法，其包括：（1）将i射线敏感正性抗蚀剂组合物施加到晶片以形成感光层，（2）通过预定图案以i射线照射感光层，（3）用开发者开发图案。

3. 发明授权

US5580695A Chemically amplified resist 失效
标题翻译：化学放大抗蚀剂
公开(公告)号：US5580695A
公开(公告)日：1996-12-03
申请号：US339289
申请日：1994-11-10
申请人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
发明人： Makoto Murata , Takao Miura , Yoshiji Yumoto , Toshiyuki Ota , Eiichi Kobayashi
IPC分类号： G03F7/004 , G03C1/73 , G03F7/038
CPC分类号： G03F7/0045 , Y10S430/118 , Y10S430/121
摘要： A chemically amplified resist comprising an alkali-soluble resin or a resin having at least one acid-dissociable group which is alkali-insoluble or -sprairingly soluble but becomes alkali-soluble upon dissociation of said acid dissociable group due to an acid; a radiation-sensitive, acid-generating agent; and an optional component in which resist, the radiation-sensitive, acid-generating agent generates an acid upon irradiation with a radiation in the irradiated portion and the solubility of the resin component and optional component in a developing solution is varied in the irradiated portion by a chemical reaction caused by the catalytic action of the acid, whereby a pattern is formed, characterized in that a compound having a nitrogen-containing basic group is contained in the resist. Said resist is superior in developability, pattern form, resolution, focus tolerance and yield of residual film thickness, has good process stability, and can be suitably used even in irradiation with, in particular, a radiation having a wavelength equal to or smaller than far ultraviolet rays, for example, an excimer laser or the like.
摘要翻译：一种化学放大抗蚀剂，其包含碱溶性树脂或具有至少一种酸解离基团的树脂，所述酸解离基团是由于酸而导致的所述酸解离基团的解离时为碱不溶性或易溶性但是变得碱溶性的; 辐射敏感的酸产生剂; 以及任选的组分，其中抗辐射敏感的酸产生剂在照射部分中的辐射照射时产生酸，并且树脂组分和任选组分在显影溶液中的溶解度在照射部分中变化由酸的催化作用引起的化学反应，由此形成图案，其特征在于在抗蚀剂中含有具有含氮碱性基团的化合物。所述抗蚀剂的显影性，图案形式，分辨率，聚焦容限和残留膜厚度的产率优异，具有良好的工艺稳定性，并且可以适用于特别是具有等于或小于远的波长的辐射紫外线，例如准分子激光等。

4. 发明授权

US5238775A Radiation-sensitive resin composition 失效
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US5238775A
公开(公告)日：1993-08-24
申请号：US656857
申请日：1991-02-19
申请人： Toru Kajita , Takao Miura , Yoshiji Yumoto , Chozo Okuda
发明人： Toru Kajita , Takao Miura , Yoshiji Yumoto , Chozo Okuda
IPC分类号： C07C39/15 , G03F7/022
CPC分类号： C07C39/15 , G03F7/0226
摘要： A radiation-sensitive resin composition containing an alkali-soluble resin, comprising a polyhydroxy compound having the following formula: ##STR1## or a quinonediazidesulfonate of the polyhydroxy compound. The radiation-sensitive resin composition is suitable for use as a positive type photoresist which has such excellent developability as to inhibit effectively the generation of scum in the formation of a photoresist pattern, has high sensitivity and is excellent in heat resistance and remained thickness ratio upon development.

5. 发明授权

US5494777A Radiation sensitive resin composition 失效
标题翻译：辐射敏感树脂组合物
公开(公告)号：US5494777A
公开(公告)日：1996-02-27
申请号：US229677
申请日：1994-04-19
申请人： Shinji Shiraki , Hidetoshi Miyamoto , Masaaki Inoue , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
发明人： Shinji Shiraki , Hidetoshi Miyamoto , Masaaki Inoue , Toshiyuki Ota , Yoshiji Yumoto , Takao Miura
IPC分类号： G03F7/004 , G03F7/038 , G03C1/492
CPC分类号： G03F7/038 , G03F7/0045
摘要： A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.
摘要翻译：适合用作具有高灵敏度，高分辨率，高残留膜厚度和高耐热性的负型抗蚀剂的辐射敏感性树脂组合物，其包含（A）碱溶性酚醛清漆树脂（ B）具有标准聚苯乙烯换算的重均分子量为10,000以下的酚类化合物，例如聚乙烯基苯酚，（C）能够在（A）成分和/或（B）成分的存在下交联的化合物酸和（D）辐射敏感性酸产生剂，例如具有卤代甲基的三嗪化合物。

6. 发明授权

US09199291B2 Operation management device, operation management method, and operation management program for high-frequency resistance welding and induction welding 有权
标题翻译：高频电阻焊接和感应焊接的操作管理装置，操作管理方法和操作管理程序
公开(公告)号：US09199291B2
公开(公告)日：2015-12-01
申请号：US13581488
申请日：2011-03-22
申请人： Noboru Hasegawa , Hideki Hamatani , Takao Miura , Kunihiko Hatabara , Nobuo Mizuhashi , Kazuto Yamamoto
发明人： Noboru Hasegawa , Hideki Hamatani , Takao Miura , Kunihiko Hatabara , Nobuo Mizuhashi , Kazuto Yamamoto
IPC分类号： B23K13/01 , B23K9/073 , B23K11/00 , B23K9/02 , B21C51/00 , B21C37/08 , B23K13/04 , B23K11/087 , G01N21/952 , G01N21/84
CPC分类号： B21C51/00 , B21C37/08 , B21C37/0822 , B23K11/0873 , B23K13/046 , G01N21/952 , G01N2021/8411
摘要： An operation management device performs an operation management for electric resistance welding in which a strip-shaped metal plate is formed to have a cylindrical shape in such a manner that both end portions of the metal plate gradually face each other while the metal plate is conveyed, and a Vee convergence section, which is a portion at which both of the end portions butt against each other while facing each other, is welded. Furthermore, the operation management device includes: a measuring unit that measures a distance L [mm] between a first Vee convergence point at which both of the end portions of the metal plate geometrically come into contact with each other and a second Vee convergence point that is a contact point of both of the end portions of the metal plate, and a Vee convergence angle θ[°] at the first Vee convergence point on the basis of an image of an area including the Vee convergence section; and a determining unit that determines whether or not the distance L [mm] and the Vee convergence angle θ[°] satisfy the following equation (1). Lmin(θ/θst)−0.15≦L≦35 (1)
摘要翻译：操作管理装置执行电阻焊接的操作管理，其中条形金属板形成为具有圆筒形状，使得金属板的两个端部在金属板被传送的同时逐渐面对，以及Vee会聚部，其是两端部彼此相对的端部彼此面对的部分。此外，操作管理装置包括：测量单元，其测量金属板的两个端部彼此接触的第一Vee会聚点与第二Vee会聚点之间的距离L [mm] 是基于包括Vee会聚部分的区域的图像的第一Vee会聚点处的金属板的两个端部的接触点和Vee会聚角度; [°] 以及确定距离L [mm]和Vee会聚角θ的距离是否满足下式（1）的确定单元。 Lmin（＆thetas; /＆thetas; st）-0.15＆nlE; L＆nlE; 35（1）

7. 发明授权

US5332650A Radiation-sensitive composition 失效
标题翻译：辐射敏感组合物
公开(公告)号：US5332650A
公开(公告)日：1994-07-26
申请号：US941264
申请日：1992-09-04
申请人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
发明人： Makoto Murata , Mikio Yamachika , Yoshiji Yumoto , Takao Miura
IPC分类号： G03F7/039 , G03F7/004 , G03C1/52 , G03F7/023
CPC分类号： G03F7/039 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/126
摘要： A radiation-sensitive composition comprising (A) a polymer having a recurring unit represented by formula (1): ##STR1## wherein R.sup.1 represents a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.2 represents --OR.sup.3 or --NR.sup.4 R.sup.5 in which R.sup.3 is a hydrogen atom, a straight-chain alkyl group, a cyclic alkyl group, an aryl group, an aralkyl group, a substituted methyl group, a substituted ethyl group, a silyl group, a germyl group or an alkoxycarbonyl group, and R.sup.4 and R.sup.5 which may be the same or different, are hydrogen atoms, straight-chain alkyl groups, cyclic alkyl groups, aralkyl groups or aryl groups, and (B) a radiation-sensitive acid forming agent. Said radiation-sensitive composition can be suitably used as a resist composition which enables reliable fine processing, which has high sensitivity and high resolution degree, and which is superior in dry etching resistance, developability, adhesiveness, heat resistance and yield of residual film thickness.
摘要翻译：一种辐射敏感性组合物，其包含（A）具有由式（1）表示的重复单元的聚合物：其中R1表示取代的甲基，取代的乙基，甲硅烷基，甲锗烷基或烷氧基羰基，R 2表示-OR 3或-NR 4 R 5，其中R 3为氢原子，直链烷基，环烷基，芳基，芳烷基，取代甲基，取代乙基，甲硅烷基，甲锗烷基或烷氧基羰基，R 4和R 5可以相同或不同，为氢原子，直链烷基，环烷基，芳烷基或芳基，（B）敏感的酸成型剂。所述辐射敏感性组合物可以适当地用作能够进行可靠的精细加工的抗蚀剂组合物，其具有高灵敏度和高分辨度，并且其耐干蚀刻性，显影性，粘合性，耐热性和残留膜厚度的产率优异。

8. 发明授权

US4755479A Manufacturing method of insulated gate field effect transistor using reflowable sidewall spacers 失效
标题翻译：使用可回流侧壁间隔件的绝缘栅场效应晶体管的制造方法
公开(公告)号：US4755479A
公开(公告)日：1988-07-05
申请号：US10667
申请日：1987-02-04
申请人： Takao Miura
发明人： Takao Miura
IPC分类号： H01L21/266 , H01L21/3105 , H01L21/336 , H01L29/08 , H01L29/78 , H01L21/223 , H01L21/265
CPC分类号： H01L29/66598 , H01L21/266 , H01L21/3105 , H01L29/0847 , H01L29/6659 , H01L29/78 , Y10S148/044 , Y10S148/106 , Y10S148/157 , Y10S148/161 , Y10S257/90 , Y10S257/919 , Y10S438/965
摘要： With an increase of integration density in an integrated circuit, the channel length of MIS FET becomes shorter and shorter, which causes a hot carrier effect. To solve the problem, the doping profile of source/drain regions and doping amount must be precisely controlled such that a strong electric field is not generated in a transition region from channel to drain. To obtain this objective, the present invention discloses a method, in which reflowed sidewalls of doped silicate glass having a gentle slope are formed on both sides of a gate electrode, and the gate electrode and the sidewalls thus formed are used as a mask for ion implantation. The depth of ion implantation and the doping amount change gradually from the channel region to the drain region avoiding a generation of the strong electric field and thus alleviates the short channel trouble. The present invention has also an effect of obtaining a passivation layer having gentle slope on the surface and avoiding a broken wire trouble of aluminum wiring.
摘要翻译：随着集成电路集成密度的增加，MIS FET的沟道长度越来越短，从而导致热载流子效应。为了解决这个问题，必须精确地控制源极/漏极区域的掺杂分布和掺杂量，使得在从通道到漏极的过渡区域中不产生强电场。为了达到这个目的，本发明公开了一种方法，其中在栅电极的两侧形成具有平缓斜率的掺杂硅酸盐玻璃的回流侧壁，并且将这样形成的栅电极和侧壁用作离子掩模植入。离子注入的深度和掺杂量从沟道区逐渐变化到漏极区，避免了强电场的产生，从而缓解了短沟道故障。本发明还具有获得在表面上具有缓和斜率的钝化层并避免铝布线断线的问题。

9. 发明授权

US4496102A Cleaning apparatus 失效
标题翻译：清洁装置
公开(公告)号：US4496102A
公开(公告)日：1985-01-29
申请号：US391661
申请日：1982-06-24
申请人： Takao Miura , Isao Miura
发明人： Takao Miura , Isao Miura
IPC分类号： F16J15/18 , B05B3/02 , B05B3/04 , B08B9/093
CPC分类号： B05B3/027 , B05B3/0445 , B08B9/0936
摘要： A cleaning apparatus including an ejector assembly (52, 54, 62, 64) with cleaning jets which rolls in a circular path around a housing (40) at a speed which is adjustable independent of the pressure of the liquid issuing from the cleaning jets of the ejector assembly. The liquid is fed under a predetermined high pressure to an ejection port (12c) in a stationary support member (12) through a first distribution path (12b) to form a driving jet, as well as to the ejector assembly through a second distribution path (10c, 42a, 42b, 50a, 50b, 54a, 54b, 52b) for forming the cleaning jets. The driving jet drives an impeller (20) whose rotation is transmitted to the housing by a gearing (28, 32, 16, 14), thereby moving the ejector assembly around the housing. The rotating or movement of the ejector assembly is provided by engagement of bevelled teeth (12a, 52a) on the support member and ejector assembly. The rotating speed of the ejector assembly is determined by a replaceable nozzle (38) having a selected diameter of nozzle hole or a nozzle housing (36') having an adjustable nozzle needle (68) therein. Either one of each shaft (10, 50) of the apparatus and a sleeve (42, 54) slidably engaged therewith is formed with an annular recess (50c) for receiving an improved sealing which ensures sealing between the shaft and the sleeve against a substantial magnitude of liquid pressure.
摘要翻译：一种清洁设备，包括具有清洁喷嘴的喷射器组件（52,54,62,64），所述喷射器组件以可以独立于从清洁喷嘴的清洗喷嘴发出的液体的压力可调节的速度围绕壳体（40）以圆形路径滚动喷射器组件。液体通过第一分配路径（12b）在预定高压下被供给到固定支撑构件（12）中的喷射口（12c），以形成驱动射流，以及通过第二分配路径（10c，42a，42b，50a，50b，54a，54b，52b）。驱动喷射器驱动叶轮（20），其旋转通过齿轮（28,32,16,14）传递到壳体，从而使喷射器组件围绕壳体移动。喷射器组件的旋转或移动通过在支撑构件上的倾斜齿（12a，52a）和喷射器组件的接合来提供。喷射器组件的旋转速度由具有选定直径的喷嘴孔的可更换喷嘴（38）或其中具有可调节喷嘴针（68）的喷嘴壳体（36'）确定。设备的每个轴（10,50）中的任一个和与其可滑动地接合的套筒（42,44）形成有用于接收改进的密封的环形凹部（50c），该密封确保轴和套筒之间的密封抵抗大体液压大小。

10. 发明授权

US3948667A Photosensitive compositions 失效
标题翻译：感光组合物
公开(公告)号：US3948667A
公开(公告)日：1976-04-06
申请号：US484982
申请日：1974-07-01
申请人： Mitsuo Ichikawa , Yasumasa Takeuchi , Takao Miura , Yoshiyuki Harita , Mitsuru Tashiro , Takahiro Tsunoda
发明人： Mitsuo Ichikawa , Yasumasa Takeuchi , Takao Miura , Yoshiyuki Harita , Mitsuru Tashiro , Takahiro Tsunoda
IPC分类号： C08C19/10 , G03F7/038 , G03C1/68
CPC分类号： G03F7/038 , C08C19/10 , Y10S430/12 , Y10S430/122 , Y10S430/126
摘要： Solvent-developed type photosensitive compositions containing as an essential ingredient at least one selected from the group of the cyclization product of butadiene polymer or copolymer and organic solvent, with or without at least one member selected from the group consisting of photosensitizer and photosensitive crosslinking agent, both soluble in an organic solvent.
摘要翻译：含有选自丁二烯聚合物或共聚物和有机溶剂的环化产物的组中的至少一种的溶剂显影型感光性组合物，含有或不含有选自光敏剂和光敏交联剂中的至少一种，均溶于有机溶剂。

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