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1. 发明授权

US4506382A Apparatus for detecting two-dimensional pattern and method for transforming the pattern into binary image 失效
标题翻译：用于检测二维图案的装置和将图案转换成二进制图像的方法
公开(公告)号：US4506382A
公开(公告)日：1985-03-19
申请号：US370781
申请日：1982-04-21
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G06K9/56 , G06T5/00 , G06T5/30 , H04N1/409 , H04N5/21
CPC分类号： G06K9/56
摘要： Two-dimensional pattern detecting apparatus provided with register for serially receiving binary signals obtained from analog signals of a two-dimensional pattern and adapted to divide the pattern into pixels and to represent the density of bright and dark for pixels by the binary signals. The apparatus further includes a processing circuit adapted to compare with predetermined patterns a pattern composed of 8 peripheral pixels of a partial area of 3.times.3 pixels within the two-dimensional pattern, on the basis of the binary signals stored in the register. The processing circuit outputs a binary signal of a logic value stored in said register corresponding to a central pixel of the partial area when the pattern of the 8 pixels coincides with one of said predetermined patterns, and to outputs a binary signal of a logic value prevailing in 8 binary signals stored in the register corresponding to the 8 pixels when the pattern of the 8 pixels does not coincide with any of the predetermined patterns.
摘要翻译：二维图案检测装置设置有用于串行接收从二维图案的模拟信号获得的二进制信号的寄存器，并且适于将图案划分为像素并且通过二进制信号表示像素的亮和暗的密度。该装置还包括处理电路，其适于根据存储在寄存器中的二进制信号，与二维图案中的3×3像素的部分区域的8个周边像素组成的图案与预定图案进行比较。当8个像素的图案与所述预定图案中的一个一致时，处理电路输出存储在所述寄存器中的对应于该部分区域的中心像素的逻辑值的二进制信号，并输出主要的逻辑值的二进制信号当8像素的图案与任何预定图案不一致时，存储在对应于8个像素的寄存器中的8个二进制信号。

2. 发明授权

US4479145A Apparatus for detecting the defect of pattern 失效
标题翻译：用于检测图案缺陷的装置
公开(公告)号：US4479145A
公开(公告)日：1984-10-23
申请号：US400681
申请日：1982-07-22
申请人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
发明人： Toru Azuma , Junji Hazama , Atsushi Kawahara , Kazunari Hada , Norio Fujii
IPC分类号： G01N21/88 , G06T7/00 , H04N7/18
CPC分类号： G01N21/88 , G06T7/001 , G06T2207/30148
摘要： A pattern examining in which a pattern on an examined object such as reticle or mask is scanned to produce image binary signals of picture elements; binary information corresponding to a local area on the examined object is serially extracted from the image binary signals; and shape detection is effected for detecting by means of the binary information whether or not the pattern in the local area possesses a determined geometric shape or characteristics. The result of the shape detection is compared with the information on design relating to the geometric shape or characteristics which the pattern on the examined object should possess.
摘要翻译：模式检查，其中扫描诸如掩模版或掩模的被检查物体上的图案以产生图像元素的图像二进制信号; 对应于所检查对象上的局部区域的二进制信息从图像二进制信号中被串行提取; 并且通过二进制信息进行形状检测来检测局部区域中的图案是否具有确定的几何形状或特征。将形状检测的结果与关于检查对象的图案所具有的几何形状或特征的设计信息进行比较。

3. 发明授权

US4472738A Pattern testing apparatus 失效
标题翻译：图案检测仪
公开(公告)号：US4472738A
公开(公告)日：1984-09-18
申请号：US381469
申请日：1982-05-24
申请人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Atsushi Kawahara , Toru Azuma , Junji Hazama
IPC分类号： G01N21/88 , G01N21/956 , G06T1/00 , G06T7/00 , H04N7/18
CPC分类号： G01N21/956 , G06T7/001 , G06T2207/10016 , G06T2207/30148
摘要： A pattern defect testing apparatus comprises a first detection circuit which defines a first detection area on a two-dimensional pattern and produces a first detection signal when all digital signals representative of densities of picture cells in the first detection area have the same logical value, a second detection circuit which defines a second detection area on the two-dimensional pattern and produces a second detection signal when at least one of digital signals representative of densities of picture cells in the second detection area has a logical value different from that of the digital signals to the first detection circuit, and a discriminating circuit for discriminating the presence of a defect in the second detection area when the first and second detection signals are produced.
摘要翻译：图案缺陷检测装置包括第一检测电路，其定义二维图案上的第一检测区域，并且当表示第一检测区域中的图像单元的密度的所有数字信号具有相同的逻辑值时，产生第一检测信号，第二检测电路，其限定二维图案上的第二检测区域，并且当表示第二检测区域中的图像单元的密度的数字信号中的至少一个具有与数字信号的逻辑值不同的逻辑值时，产生第二检测信号以及鉴别电路，用于在产生第一和第二检测信号时鉴别第二检测区域中的缺陷的存在。

4. 发明授权

US4589139A Apparatus for detecting defects in pattern 失效
标题翻译：用于检测图案中的缺陷的装置
公开(公告)号：US4589139A
公开(公告)日：1986-05-13
申请号：US462515
申请日：1983-01-31
申请人： Kazunari Hada , Norio Fujii , Toru Azuma , Kaoru Kikuchi , Junji Hazama
发明人： Kazunari Hada , Norio Fujii , Toru Azuma , Kaoru Kikuchi , Junji Hazama
IPC分类号： G01R31/308 , G06T7/00 , G06K9/46
CPC分类号： G06T7/0006 , G01R31/308 , G06T2207/20144 , G06T2207/30148
摘要： An apparatus for inspecting a pattern consisting of light and dark areas formed on a planar test specimen according to design information, comprising: an imaging device for viewing the pattern to generate image information; a detector for generating a first signal upon detection that, in response to the image information, a boundary line between the light and dark areas of the pattern is bent in a determined stepping form in the direction of the plane; a memory for generating and storing a second signal, upon detection that the boundary line of the pattern has a bend of stepping form according to the design information, corresponding to the position in the imaging area of the bend in the design information; and an inspecting device for discriminating, upon generation of the first signal, the presence or absence of the second signal in the memory corresponding to the position of the first signal in the image area.
摘要翻译：一种用于根据设计信息检查由平面测试样本上形成的由浅色和暗色区域组成的图案的设备，包括：用于观看图案以生成图像信息的成像装置; 检测器，用于在检测到时产生第一信号，响应于图像信息，图案的亮区和暗区之间的边界线以确定的步进形式沿平面的方向弯曲; 用于产生和存储第二信号的存储器，当检测到所述图案的边界线根据所述设计信息具有与所述设计信息中的所述弯曲部的所述成像区域中的位置相对应的步进形式的弯曲时; 以及检测装置，用于在产生第一信号时，在对应于图像区域中的第一信号的位置的存储器中存在或不存在第二信号。

5. 发明授权

US5500736A Method of detecting positions 失效
标题翻译：检测位置的方法
公开(公告)号：US5500736A
公开(公告)日：1996-03-19
申请号：US339284
申请日：1994-11-07
申请人： Hideki Koitabashi , Masamitsu Yanagihara , Junji Hazama
发明人： Hideki Koitabashi , Masamitsu Yanagihara , Junji Hazama
IPC分类号： G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68 , G01B11/00
CPC分类号： G03F9/70
摘要： A position detecting method detects each position of a photosensitive substrate when executing shots of circuit patterns so that the circuit patterns are further superposed on the photosensitive substrate already formed with the circuit patterns. The method comprises the steps of performing a shot of a circuit pattern of a reticle in superposition on liquid crystal pixel segments already formed on a glass plate, registering, in a memory, a circuit pattern as a reference image in the liquid crystal pixel segment and performing pattern matching with other fields of the liquid crystal pixel segments by use of this reference image. An alignment is conducted based on a position of circuit pattern extracted thereby.
摘要翻译：当执行电路图案的拍摄时，位置检测方法检测感光基板的每个位置，使得电路图案进一步叠加在已经形成有电路图案的感光基板上。该方法包括以下步骤：在已经形成在玻璃板上的液晶像素段上叠加掩模版的电路图案，在存储器中将作为参考图像的电路图案配置在液晶像素段中，以及通过使用该参考图像来执行与液晶像素段的其它场的模式匹配。基于由此提取的电路图案的位置进行对准。

6. 发明授权

US4537501A Apparatus for the attitude control of plate-form body 失效
标题翻译：板形体姿态控制装置
公开(公告)号：US4537501A
公开(公告)日：1985-08-27
申请号：US581049
申请日：1984-02-17
申请人： Yukio Kakizaki , Hisao Izawa , Junji Hazama
发明人： Yukio Kakizaki , Hisao Izawa , Junji Hazama
IPC分类号： G05D3/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/62 , G03B27/64
CPC分类号： G03F7/70691
摘要： An apparatus for the attitude control of a plate-form body such as mask or wafer comprises a supporting table, a first movable stage placed on the table and a second movable stage placed on the first stage. The second movable stage is provided means for holding the plate-form body on a reference plane containing the origin of the coordinates defined by two orthogonal coordinate axes. Between the supporting table and the first movable stage there is disposed first driving means. The first driving means is disposed for displacing the first movable stage at at least two positions opposed to each other relative to one of the coordinate axes. The displacement is produced in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. The displacement of the first stage relative to the table in the direction substantially normal to the above direction is inhibited by first limiting means. Similarly second driving means is disposed between the first and second movable stages for producing the displacement of the second stage at at least two positions opposed to each other relative to the other coordinate axis. The displacement produced by second driving means is in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. Second limiting means is provided to inhibit the displacement of the second movable stage in the direction substantially normal to the above direction of displacement by the second driving means.
摘要翻译：用于诸如掩模或晶片的板状体的姿态控制的装置包括支撑台，放置在桌子上的第一可移动台和放置在第一台上的第二可移动台。第二可移动台被提供用于将板状体保持在包含由两个正交坐标轴限定的坐标的原点的参考平面上。在支撑台和第一可移动台之间设置有第一驱动装置。第一驱动装置被设置用于相对于一个坐标轴彼此相对的至少两个位置移动第一可移动台。位移沿基本上垂直于穿过坐标原点的段产生，并与参考平面形成确定的角度。通过第一限制装置禁止第一级相对于桌子在基本上垂直于上述方向的方向上的位移。类似地，第二驱动装置设置在第一和第二可移动平台之间，用于在相对于另一个坐标轴彼此相对的至少两个位置产生第二平台的位移。由第二驱动装置产生的位移在与通过坐标原点的段基本上垂直的方向上，并与参考平面形成确定的角度。第二限制装置被设置为通过第二驱动装置来抑制第二可移动台在基本上垂直于上述移位方向的方向上的位移。

7. 发明授权

US4685805A Small gap measuring apparatus 失效
标题翻译：小间隙测量仪
公开(公告)号：US4685805A
公开(公告)日：1987-08-11
申请号：US706970
申请日：1985-03-01
申请人： Kenichi Kodama , Akikazu Tanimoto , Hisao Izawa , Yoichi Hamashima , Junji Hazama
发明人： Kenichi Kodama , Akikazu Tanimoto , Hisao Izawa , Yoichi Hamashima , Junji Hazama
IPC分类号： G01B11/14 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7065 , G03F9/7026
摘要： An apparatus for optically measuring the very small gap between a reference plane and a substrate parallel to the reference plane. A beam of energy converging on the reference plane is reflected by the substrate and a spot of reflected beam is formed on a detecting plane at a different position. An array of detecting elements for detecting the size of the spot on the detecting plane is adjusted in position in such a manner that the center of the spot coincides with the center of any one of the detecting elements, thereby preventing any error of the in-focus detecting position due to the deviation between the center of the spot and the center of the detecting element.
摘要翻译：一种用于光学测量参考平面与平行于参考平面的基板之间的非常小间隙的装置。会聚在参考平面上的能量束被衬底反射，并且在不同位置的检测平面上形成反射光束点。用于检测检测平面上的斑点尺寸的检测元件的阵列被调整到位置，使得斑点的中心与任何一个检测元件的中心一致，从而防止任何误差，由于点的中心与检测元件的中心之间的偏差导致的焦点检测位置。

8. 发明授权

US4636626A Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication 失效
标题翻译：用于对准半导体电路元件制造中使用的掩模和晶片的装置
公开(公告)号：US4636626A
公开(公告)日：1987-01-13
申请号：US570189
申请日：1984-01-12
申请人： Junji Hazama , Kinya Kato , Akikazu Tanimoto , Hisao Izawa
发明人： Junji Hazama , Kinya Kato , Akikazu Tanimoto , Hisao Izawa
IPC分类号： G03F9/00 , G01J1/20
CPC分类号： G03F9/7023
摘要： An alignment apparatus for aligning a semiconductor wafer with an optical mask containing a circuit pattern to be exposed onto the wafer in the fabrication of semiconductor devices by a proximity exposure apparatus. The alignment apparatus includes light beam radiating means for radiating a first and second light beams which are imaged at positions separated by a given gap in a direction substantially perpendicular to two flat sheets, first and second detecting means for respectively detecting the imaging condition of the first and second light beams at the flat sheets, means for relatively moving the light beam radiating means and the flat sheets, and means for discriminating the order of generation of signals from the first and second detecting means, whereby the value of each gap between the selected areas of the two flat sheets at a plurality of places is detected with a high degree of accuracy without changing the gap between the flat sheets thereby making it possible to correct the parallelism, inclination, etc., of the flat sheets.
摘要翻译：一种对准装置，用于通过接近曝光装置将半导体晶片与包含要在半导体器件制造中暴露于晶片上的电路图案的光学掩模对准。对准装置包括光束照射装置，用于辐射第一和第二光束，该第一和第二光束在基本上垂直于两个平板的方向上以给定间隙分开的位置成像;第一和第二检测装置，用于分别检测第一和第二光束的成像条件并且平板处的第二光束，用于使光束辐射装置和平板相对移动的装置，以及用于鉴别来自第一和第二检测装置的信号的产生顺序的装置，由此所选择的每个间隙之间的值在不改变平板之间的间隙的情况下以高精度检测多个位置处的两个平板的区域，从而可以校正平板的平行度，倾斜度等。

9. 发明授权

US06583854B1 Method and apparatus for the manufacture of circuits for a large display device using stitch exposure 有权
标题翻译：用于制造使用针迹曝光的大型显示装置的电路的方法和装置
公开(公告)号：US06583854B1
公开(公告)日：2003-06-24
申请号：US09722608
申请日：2000-11-28
申请人： Junji Hazama , Tohru Kiuchi
发明人： Junji Hazama , Tohru Kiuchi
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03F7/70475
摘要： A method and apparatus for the manufacture of circuits for a large display device using stitch exposure. In the peripheral region of a circuit pattern on a mask, the method of stitch exposing provides for a joining of pairs of stitch regions in order to join in an interfitting state such that a smaller mask can be combined to form a larger display device. By causing the corresponding positional relationship of mask and plate to change in a direction in which a pair of stitch regions face each other, the arrangement of respectively formed pattern counterparts, after being placed in a mutually complementary interfitting relationship, are transferred so as to be joined to the respective stitch region of a circuit pattern region periphery already transferred onto the plate.
摘要翻译：用于制造使用针迹曝光的大型显示装置的电路的方法和装置。在掩模上的电路图案的外围区域中，针迹曝光的方法提供了一对针脚区域的接合，以便在相互配合状态下结合，使得可以组合更小的掩模以形成更大的显示装置。通过使掩模和板的相应的位置关系在一对针脚区域彼此面对的方向上改变，分别形成的图案对应物的布置在相互互补的相互关系之后被转印为连接到已经转印到板上的电路图案区域周边的各个针脚区域。

10. 发明授权

US06211965B1 Photolithographic position measuring laser interferometer with relitively moving measuring intereometer 有权
标题翻译：激光干涉仪位置测量装置和测量方法曝光装置及其制造方法
公开(公告)号：US06211965B1
公开(公告)日：2001-04-03
申请号：US09377181
申请日：1999-08-19
申请人： Makoto Tsuchiya , Junji Hazama
发明人： Makoto Tsuchiya , Junji Hazama
IPC分类号： G01B902
CPC分类号： G03F7/70775
摘要： A laser interferometer for detecting the position of a moving object in a Y-direction when the object moves in an X-direction has a separating optical system that moves in the X-direction at a speed different from that of the moving object. A laser beam is separated by the separating optical system into a reference beam and a measurement beam, which are individually directed toward a reference mirror and a moving mirror on the moving object. The light of the measurement beam reflected from the moving mirror, and the light of the reference beam reflected from the reference mirror are received by a photodetector via the separating optical system, and the photoelectric conversion signal of the interference light is output as information concerning the position of the moving object in the Y-direction. A fixed mirror that is shorter than the moving object can be used because the separating optical system also moves in the X-direction.
摘要翻译：当物体沿X方向移动时，用于检测运动物体在Y方向上的位置的激光干涉仪具有以与运动物体不同的速度在X方向上移动的分离光学系统。激光束被分离光学系统分离成参考光束和测量光束，它们分别指向移动物体上的参考反射镜和移动反射镜。从移动镜反射的测量光的光和从参考反射镜反射的参考光的光经由分离光学系统被光电检测器接收，并且干涉光的光电转换信号作为关于移动物体在Y方向上的位置。由于分离光学系统也沿X方向移动，所以可以使用比移动物体短的固定镜。

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