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1. 发明授权

US4537501A Apparatus for the attitude control of plate-form body 失效
标题翻译：板形体姿态控制装置
公开(公告)号：US4537501A
公开(公告)日：1985-08-27
申请号：US581049
申请日：1984-02-17
申请人： Yukio Kakizaki , Hisao Izawa , Junji Hazama
发明人： Yukio Kakizaki , Hisao Izawa , Junji Hazama
IPC分类号： G05D3/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/62 , G03B27/64
CPC分类号： G03F7/70691
摘要： An apparatus for the attitude control of a plate-form body such as mask or wafer comprises a supporting table, a first movable stage placed on the table and a second movable stage placed on the first stage. The second movable stage is provided means for holding the plate-form body on a reference plane containing the origin of the coordinates defined by two orthogonal coordinate axes. Between the supporting table and the first movable stage there is disposed first driving means. The first driving means is disposed for displacing the first movable stage at at least two positions opposed to each other relative to one of the coordinate axes. The displacement is produced in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. The displacement of the first stage relative to the table in the direction substantially normal to the above direction is inhibited by first limiting means. Similarly second driving means is disposed between the first and second movable stages for producing the displacement of the second stage at at least two positions opposed to each other relative to the other coordinate axis. The displacement produced by second driving means is in the direction substantially normal to a segment passing through the origin of the coordinates and forming a determined angle with the reference plane. Second limiting means is provided to inhibit the displacement of the second movable stage in the direction substantially normal to the above direction of displacement by the second driving means.
摘要翻译：用于诸如掩模或晶片的板状体的姿态控制的装置包括支撑台，放置在桌子上的第一可移动台和放置在第一台上的第二可移动台。第二可移动台被提供用于将板状体保持在包含由两个正交坐标轴限定的坐标的原点的参考平面上。在支撑台和第一可移动台之间设置有第一驱动装置。第一驱动装置被设置用于相对于一个坐标轴彼此相对的至少两个位置移动第一可移动台。位移沿基本上垂直于穿过坐标原点的段产生，并与参考平面形成确定的角度。通过第一限制装置禁止第一级相对于桌子在基本上垂直于上述方向的方向上的位移。类似地，第二驱动装置设置在第一和第二可移动平台之间，用于在相对于另一个坐标轴彼此相对的至少两个位置产生第二平台的位移。由第二驱动装置产生的位移在与通过坐标原点的段基本上垂直的方向上，并与参考平面形成确定的角度。第二限制装置被设置为通过第二驱动装置来抑制第二可移动台在基本上垂直于上述移位方向的方向上的位移。

2. 发明授权

US06583597B2 Stage apparatus including non-containing gas bearings and microlithography apparatus comprising same 失效
标题翻译：包括非接触式气体轴承和包括其的微光刻设备的舞台装置
公开(公告)号：US06583597B2
公开(公告)日：2003-06-24
申请号：US09899946
申请日：2001-07-06
申请人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
发明人： Keiichi Tanaka , Yukiharu Okubo , Hiroaki Narushima , Yukio Kakizaki , Yasushi Yoda
IPC分类号： G05B1100
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0618 , G03F7/70716 , G03F7/70725 , G03F7/70758 , H01J37/20 , H01J2237/20278
摘要： Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings. The sliders can be driven by a combination of a linear motor and a gas cylinder, the latter assisting the driving force by the linear motor during acceleration and deceleration of the stage.
摘要翻译：公开了用于在微光刻系统中保持物体（例如，基板或掩模版）的平台装置，特别是用于在真空环境中执行微光刻的系统。舞台装置提供在导向平面的X和Y方向上的舞台（用于保持物体）的运动。平台安装到臂构件，臂构件具有至少第一和第二端相对于平台对称设置。端部包括与相应的定子相互作用的线性马达驱动器，并且当载物台在引导平面内移动时，包括在相对于其它表面滑动的表面上的气体轴承。线性马达移动器可以是一维或二维移动器，并且期望地允许载物台的θ方向运动。其他构造包括引导构件和滑块，其经由非接触气体轴承相对于引导构件经历滑动运动。滑块可以通过线性马达和气瓶的组合来驱动，后者在加速和减速阶段通过线性马达来辅助驱动力。

3. 发明授权

US08749753B2 Movable body apparatus, exposure apparatus and optical system unit, and device manufacturing method 有权
标题翻译：移动体装置，曝光装置和光学系统装置以及装置的制造方法
公开(公告)号：US08749753B2
公开(公告)日：2014-06-10
申请号：US12109069
申请日：2008-04-24
申请人： Keiichi Tanaka , Yukio Kakizaki
发明人： Keiichi Tanaka , Yukio Kakizaki
IPC分类号： G03B27/52 , G03B27/58 , G03B27/60 , G03B27/62 , G03F7/20 , G03B27/42 , G03B27/54
CPC分类号： G03F7/7085 , F16C29/025 , F16C32/0603 , G03F7/70808 , G03F7/70816 , G03F7/70841 , G03F7/70866
摘要： The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.
摘要翻译：晶片侧密封单元的静态气体轴承构件的上端通过波纹管连接到处于气密状态的室的曝光光束的出射侧的边缘部分，并且下端表面处于形成状态与晶片和晶片保持器的预定间隙。通过这种布置，室的内部与外部隔离。因此，可以保持曝光光束的光路周围的真空环境，而不设置真空室来容纳晶片，晶片保持器和晶片台，这允许整个曝光装置的尺寸减少，并且也使得容易进入晶片台附近。

4. 发明授权

US06570641B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06570641B2
公开(公告)日：2003-05-27
申请号：US09955116
申请日：2001-09-19
申请人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
发明人： Tomohide Hamada , Hiroshi Shirasu , Yukio Kakizaki , Kinya Kato
IPC分类号： G03B2118
CPC分类号： G03F7/70775 , G03F7/70358 , G03F7/70716 , G03F9/70
摘要： The projection exposure apparatus can include an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.
摘要翻译：投影曝光装置可以包括照射光学系统，用于以掩模形式的一部分掩模图案照射预定形状的曝光辐射通量，固定支撑件，固定在固定支架上的投影光学系统，用于投影图像的图像掩模图案的照明部分到基板上，以及滑架，用于一体地保持掩模和基板，滑架可相对于投影光学系统沿预定方向移动，连续地将基板与由曝光辐射通量。投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

5. 发明授权

US06040096A Mask substrate, projection exposure apparatus equipped with the mask substrate, and a pattern formation method utilizing the projection exposure apparatus 失效
标题翻译：掩模基板，配备有掩模基板的投影曝光装置以及利用投影曝光装置的图案形成方法
公开(公告)号：US06040096A
公开(公告)日：2000-03-21
申请号：US224061
申请日：1998-12-31
申请人： Yukio Kakizaki , Toru Kiuchi , Kesayoshi Amano , Toshikazu Umatate
发明人： Yukio Kakizaki , Toru Kiuchi , Kesayoshi Amano , Toshikazu Umatate
IPC分类号： G03F1/44 , G03F1/50 , G03F7/20 , G03F9/00 , H01L21/027 , G06F9/00 , G03B27/42 , G01B11/00
CPC分类号： G03F7/707 , G03F7/70358 , G03F7/70716 , G03F7/70875 , G03F7/70883 , G03F7/70891 , G03F9/70 , G03F9/7011
摘要： In order to reduce mask pattern transfer error caused by expansion of the mask substrate during transferring the circuit pattern onto the photosensitive substrate, a mask substrate is loosely supported on a plurality of mounts on the mask stage so that the mask substrate can freely expand in response to changes in its temperature. A measuring instrument (such as a temperature sensor or an interferometer) is used to measure a value representing the expansion amount of the mask substrate. Alignment and positioning of the mask substrate and the photosensitive substrate is adjusted in response to the expansion amount of the reticle, based on the measured value.
摘要翻译：为了在将电路图案转印到感光基板上时减少由于掩模基板的膨胀引起的掩模图案转移误差，掩模基板被松散地支撑在掩模台上的多个安装座上，使得掩模基板可以自由地响应地膨胀其温度变化。使用测量仪器（例如温度传感器或干涉仪）来测量表示掩模基板的膨胀量的值。基于测量值，调整掩模基板和感光基板的对准和定位以响应于掩模版的扩展量。

6. 发明授权

US5929973A Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate 失效
标题翻译：将掩模图案同时转印到基板的两侧的装置和方法
公开(公告)号：US5929973A
公开(公告)日：1999-07-27
申请号：US735082
申请日：1996-10-22
申请人： Yukio Kakizaki , Hidetoshi Mori
发明人： Yukio Kakizaki , Hidetoshi Mori
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/32
CPC分类号： G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F7/70425 , G03F9/70
摘要： Disclosed is a double-side exposure apparatus having a substrate holder for holding a photosensitizable substrate; a first exposure system containing a first light source, a first illumination unit for striking a ray of light emitted from the first light source in a first mask, and a first projection optical unit for projecting an image of the first mask onto a front surface of the photosensitizable substrate; and a second exposure system, mounted at the side opposite to the first exposure system, containing a second light source, a second illumination unit for striking a ray of light emitted from the first light source in a second mask, and a second projection optical unit for projecting an image of the second mask onto a back surface of the photosensitizable substrate; wherein the pattern of the first mask is exposed to the front surface of the photosensitizable substrate and the pattern of the second mask is exposed to the back surface thereof substantially simultaneously with exposure of the pattern of the first mask to the front surface thereof. Also, further disclosed is an exposing method for exposure of both surfaces of a substrate with the double-side exposure apparatus having the structure as described above, which involves aligning a first mask for a first exposing surface of a substrate with a second mask for a second exposing surface of the substrate in a state that no the substrate is interposed between a first projection optical unit for projecting a pattern of the first mask to the first exposing surface of the substrate and a second projection optical unit for projecting a pattern of the second mask to the second exposing surface of the substrate.
摘要翻译：公开了一种具有用于保持光敏性基板的基板保持件的双面曝光装置; 包含第一光源的第一曝光系统，用于在第一掩模中击打从第一光源发出的光线的第一照明单元和用于将第一掩模的图像投影到第一掩模的前表面的第一投影光学单元光敏基材; 以及第二曝光系统，其安装在与所述第一曝光系统相对的一侧，所述第二曝光系统包含第二光源，用于在第二掩模中击打从所述第一光源发出的光线的第二照明单元，以及第二投影光学单元用于将第二掩模的图像投影到可光敏化基板的背面上; 其中所述第一掩模的图案暴露于所述可光敏化基板的前表面，并且所述第二掩模的图案基本上与所述第一掩模的图案暴露于其前表面同时暴露于其背面。此外，进一步公开了一种曝光方法，用于利用具有上述结构的双面曝光装置对基板的两个表面进行曝光，其包括将用于基板的第一曝光表面的第一掩模与用于基板的第二掩模对准在基板被插入到用于将第一掩模的图案投影到基板的第一曝光表面的第一投影光学单元之间的状态下的基板的第二曝光表面和用于将第二掩模的图案投影到第二投影光学单元的第二投影光学单元掩模到基板的第二曝光表面。

7. 发明授权

US5617211A Exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US5617211A
公开(公告)日：1997-04-01
申请号：US515783
申请日：1995-08-16
申请人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
发明人： Kei Nara , Toshio Matsuura , Muneyasu Yokota , Yukio Kakizaki , Yoshio Fukami , Seiji Miyazaki , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , G01B11/00 , G01U21/86 , G06K7/015 , G03B27/52
CPC分类号： G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F9/70
摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.
摘要翻译：本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置并且测量掩模侧参考标记。根据位移量校正多个投影光学系统的成像特性。

8. 发明授权

US4776693A Foreign substance inspecting system including a calibration standard 失效
标题翻译：国外检验体系包括校准标准
公开(公告)号：US4776693A
公开(公告)日：1988-10-11
申请号：US120231
申请日：1987-11-12
申请人： Kazunori Imamura , Akikazu Tanimoto , Yukio Kakizaki
发明人： Kazunori Imamura , Akikazu Tanimoto , Yukio Kakizaki
IPC分类号： G01N21/94 , G01N21/88
CPC分类号： G01N21/94
摘要： A system for placing thereron an object to be inspected, scanning the surface of the object to be inspected by a light spot and inspecting a foreign substance on the basis of light information produced by the foreign substance on the surface of the object to be inspected includes light information producing means including a member for producing light information substantially similar to the light information produced by the foreign substance, and means for disposing the member on a surface substantially identical to the surface of the object to be inspected placed on the system.
摘要翻译：一种用于将该物体放置在被检查物体上的系统，用光点扫描待检查物体的表面，并根据被检测物体表面上的异物产生的光信息检查异物，包括：光信息产生装置，包括用于产生与由异物产生的光信息基本相似的光信息的部件，以及用于将该部件设置在与要被检查物体的表面基本相同的表面放置在系统上的装置。

9. 发明授权

US4716299A Apparatus for conveying and inspecting a substrate 失效
标题翻译：用于输送和检查基底的装置
公开(公告)号：US4716299A
公开(公告)日：1987-12-29
申请号：US821743
申请日：1986-01-23
申请人： Hiroshi Tanaka , Hiromitsu Iwata , Yukio Kakizaki
发明人： Hiroshi Tanaka , Hiromitsu Iwata , Yukio Kakizaki
IPC分类号： B65G1/00 , B65G1/04 , B65G1/08 , G01N21/94 , G03F1/62 , G03F1/84 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/66 , H01L21/67 , H01L21/677 , G01N21/86
CPC分类号： H01L21/67778 , G01N21/94 , H01L21/67271 , H01L21/67748 , H01L21/681
摘要： An arrangement in an apparatus for handling a substrate such as a photomask or a reticle used in a process of manufacturing a semiconductor device comprises a container unit for containing therein the substrate in a substantially horizontal posture, an inspection unit having means for inspecting a surface of the substrate, the inspecting means including a radiation source for supplying a directional beam, and a device for detecting the scattering of the directional beam, a holding member for supporting the substrate substantially horizontally, a device for moving the holding member between the container unit and the inspection unit and conveying the substrate from the container unit to the inspection unit by the use of the holding member, and a scanning device for moving the holding member in a horizontal direction relative to the inspecting means and moving the substrate relative to the directional beam while subjecting the surface of the substrate to the directional beam.
摘要翻译：在用于处理半导体器件制造工艺中使用的诸如光掩模或掩模版的基板的设备中的布置包括用于以基本上水平的姿势容纳基板的容器单元，检查单元具有用于检查所述检查装置包括用于提供定向光束的辐射源和用于检测所述方向光束的散射的装置，用于基本上水平地支撑所述基板的保持部件，用于使所述保持部件移动在所述容器单元和检查单元，并且通过使用保持构件将基板从容器单元传送到检查单元;以及扫描装置，用于相对于检查装置沿水平方向移动保持构件，并使基板相对于定向梁同时使基板的表面经受定向梁。

10. 发明授权

US4422547A Container for holding substrate 失效
标题翻译：用于保持底物的容器
公开(公告)号：US4422547A
公开(公告)日：1983-12-27
申请号：US445030
申请日：1982-11-29
申请人： Nobutoshi Abe , Yukio Kakizaki , Jiro Kobayashi
发明人： Nobutoshi Abe , Yukio Kakizaki , Jiro Kobayashi
IPC分类号： G03F7/20 , H01L21/02 , H01L21/673 , B65D85/30 , B65D81/02
CPC分类号： H01L21/67353 , G03F1/66 , G03F7/70741 , H01L21/02 , H01L21/67359 , H01L21/67369 , H01L21/67386
摘要： A container for a piece of substrate such as reticle, mask or wafer is disclosed. The container comprises a housing body having an opening for receiving a substrate, a door for closing and opening said opening of the housing body and means for fixing the received substrate to the container. Said fixing means includes a contact member movable to fix the substrate in the position and a member for moving the contact member in link with the motion of the door.
摘要翻译：公开了一种用于诸如掩模版，掩模或晶片的基片的容器。容器包括具有用于容纳基底的开口的壳体，用于关闭和打开壳体主体的开口的门，以及用于将接收的基底固定到容器的装置。所述固定装置包括可移动以将基板固定在该位置的接触构件和用于使接触构件与门的运动相联动的构件。

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