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1. 发明授权

US4636626A Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication 失效
标题翻译：用于对准半导体电路元件制造中使用的掩模和晶片的装置
公开(公告)号：US4636626A
公开(公告)日：1987-01-13
申请号：US570189
申请日：1984-01-12
申请人： Junji Hazama , Kinya Kato , Akikazu Tanimoto , Hisao Izawa
发明人： Junji Hazama , Kinya Kato , Akikazu Tanimoto , Hisao Izawa
IPC分类号： G03F9/00 , G01J1/20
CPC分类号： G03F9/7023
摘要： An alignment apparatus for aligning a semiconductor wafer with an optical mask containing a circuit pattern to be exposed onto the wafer in the fabrication of semiconductor devices by a proximity exposure apparatus. The alignment apparatus includes light beam radiating means for radiating a first and second light beams which are imaged at positions separated by a given gap in a direction substantially perpendicular to two flat sheets, first and second detecting means for respectively detecting the imaging condition of the first and second light beams at the flat sheets, means for relatively moving the light beam radiating means and the flat sheets, and means for discriminating the order of generation of signals from the first and second detecting means, whereby the value of each gap between the selected areas of the two flat sheets at a plurality of places is detected with a high degree of accuracy without changing the gap between the flat sheets thereby making it possible to correct the parallelism, inclination, etc., of the flat sheets.
摘要翻译：一种对准装置，用于通过接近曝光装置将半导体晶片与包含要在半导体器件制造中暴露于晶片上的电路图案的光学掩模对准。对准装置包括光束照射装置，用于辐射第一和第二光束，该第一和第二光束在基本上垂直于两个平板的方向上以给定间隙分开的位置成像;第一和第二检测装置，用于分别检测第一和第二光束的成像条件并且平板处的第二光束，用于使光束辐射装置和平板相对移动的装置，以及用于鉴别来自第一和第二检测装置的信号的产生顺序的装置，由此所选择的每个间隙之间的值在不改变平板之间的间隙的情况下以高精度检测多个位置处的两个平板的区域，从而可以校正平板的平行度，倾斜度等。

2. 发明授权

US4685805A Small gap measuring apparatus 失效
标题翻译：小间隙测量仪
公开(公告)号：US4685805A
公开(公告)日：1987-08-11
申请号：US706970
申请日：1985-03-01
申请人： Kenichi Kodama , Akikazu Tanimoto , Hisao Izawa , Yoichi Hamashima , Junji Hazama
发明人： Kenichi Kodama , Akikazu Tanimoto , Hisao Izawa , Yoichi Hamashima , Junji Hazama
IPC分类号： G01B11/14 , G03F9/00 , G01B11/00
CPC分类号： G03F9/7065 , G03F9/7026
摘要： An apparatus for optically measuring the very small gap between a reference plane and a substrate parallel to the reference plane. A beam of energy converging on the reference plane is reflected by the substrate and a spot of reflected beam is formed on a detecting plane at a different position. An array of detecting elements for detecting the size of the spot on the detecting plane is adjusted in position in such a manner that the center of the spot coincides with the center of any one of the detecting elements, thereby preventing any error of the in-focus detecting position due to the deviation between the center of the spot and the center of the detecting element.
摘要翻译：一种用于光学测量参考平面与平行于参考平面的基板之间的非常小间隙的装置。会聚在参考平面上的能量束被衬底反射，并且在不同位置的检测平面上形成反射光束点。用于检测检测平面上的斑点尺寸的检测元件的阵列被调整到位置，使得斑点的中心与任何一个检测元件的中心一致，从而防止任何误差，由于点的中心与检测元件的中心之间的偏差导致的焦点检测位置。

3. 发明授权

US08384877B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08384877B2
公开(公告)日：2013-02-26
申请号：US11808230
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

4. 发明授权

US08169592B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08169592B2
公开(公告)日：2012-05-01
申请号：US12153354
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
摘要翻译：曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。该装置还包括具有表面并可移动到构件的表面面向光学元件的位置的构件。该装置还包括清洁构件表面的清洁系统。

5. 发明申请

US20090011368A1 Exposure Method and Apparatus, and Electronic Device Manufacturing Method 审中-公开
标题翻译：曝光方法和装置以及电子装置制造方法
公开(公告)号：US20090011368A1
公开(公告)日：2009-01-08
申请号：US11884891
申请日：2006-02-23
申请人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
发明人： Yutaka Ichihara , Ayako Nakamura , Naomasa Shiraishi , Akikazu Tanimoto , Yuji Kudo
IPC分类号： G03F7/22 , G03B27/42 , G03B27/72
CPC分类号： G03F7/70408 , G02B5/1838 , G02B5/1866 , G02B13/143 , G02B27/4222 , G02B27/4272 , G02B27/4277 , G03B27/42 , G03F7/70283 , G03F7/7035
摘要： An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.
摘要翻译：目的是提供一种适合用于形成用于构成电子设备的精细图案的高分辨率和经济的曝光方法。两个衍射光栅（P1，P2）串联在光路中; 用于构成电子设备的两个衍射光栅（P1，P2）和晶片等（W）以预定间隔布置; 由衍射光栅（P1，P2）产生的干涉条纹的暗暗图案被转印到晶片等（W）上以进行曝光。在根据需要改变晶片等（W）和衍射光栅（P1，P2）之间的位置关系的同时进行曝光。

6. 发明申请

US20070247600A1 EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070247600A1
公开(公告)日：2007-10-25
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

7. 发明申请

US20070064210A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20070064210A1
公开(公告)日：2007-03-22
申请号：US11603078
申请日：2006-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

8. 发明授权

US06894763B2 Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same 失效
标题翻译：利用能够沿相反方向移动的多个掩模和物体台的曝光装置和方法，以及使用其的装置的制造方法
公开(公告)号：US06894763B2
公开(公告)日：2005-05-17
申请号：US10424815
申请日：2003-04-29
申请人： Seiro Murakami , Takaharu Miura , Akikazu Tanimoto , Yutaka Ichihara , Hideo Mizutani
发明人： Seiro Murakami , Takaharu Miura , Akikazu Tanimoto , Yutaka Ichihara , Hideo Mizutani
IPC分类号： G03F7/20 , G03B27/42 , G03B27/54 , G03B27/62 , G01N21/86
CPC分类号： G03F7/7005 , G03F7/70225 , G03F7/70275 , G03F7/70358 , G03F7/70716 , G03F7/70733 , G03F7/70808
摘要： A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.
摘要翻译：在掩模台RS 1上的掩模和掩模上的掩模的状态下，同步移动掩模载台RS 1和基板载台WS 1，并且掩模载台RS 2和基板载台RS 2同步移动分别用来自照明光学系统IOP1，IOP2的照明光束照射舞台RS 2。通过使掩模载台RS 1和掩模载台RS 2相互相反的方向移动，可以抵消由于级的移动导致的基板上的反作用力，以抑制曝光装置的振动。通过在曝光操作中同时进行基板台WS 3，WS 4的对准操作，能够提高通过量。

9. 发明授权

US06713747B2 Light exposure apparatus 失效
标题翻译：在照明区域中曝光光的强度分布变化的扫描曝光装置和方法。
公开(公告)号：US06713747B2
公开(公告)日：2004-03-30
申请号：US10207832
申请日：2002-07-31
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G01J132
CPC分类号： G03F7/70058 , G03F7/70358 , G03F7/70558
摘要： A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.
摘要翻译：扫描曝光装置和方法使用光学部件来改变照明区域中的曝光光的强度分布。

10. 发明授权

US5906901A Alignment method and exposure apparatus for use in such alignment method 失效
标题翻译：对准方法和用于这种对准方法的曝光装置
公开(公告)号：US5906901A
公开(公告)日：1999-05-25
申请号：US580886
申请日：1995-12-29
申请人： Akikazu Tanimoto
发明人： Akikazu Tanimoto
IPC分类号： G01B11/00 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F7/70425 , G03F7/70358 , G03F9/70
摘要： In a lithographic process for fabrication of integrated circuit chips, a projection exposure machine is used to print a mask pattern onto each of a plurality of shot areas defined on a substrate, where an alignment method for establishing alignment between each shot area on the substrate and the mask pattern is performed. The alignment method comprises the step of forming on the substrate a regular pattern which comprises a plurality of pattern elements regularly distributed over the plurality of shot areas, and the step of performing an alignment operation based on the position of the regular pattern so as to establish alignment between each of the plurality of shot areas and the mask pattern. An exposure apparatus may be used to form the regular pattern on the substrate. The exposure apparatus comprises a light source for emitting a primary light beam, a beam-splitting optical system for splitting the primary light beam into a plurality of secondary light beams which are coherent with each other, and an objective optical system for modifying each secondary light beam into a substantially plane wave light beam, and for illuminating a region of a photoresist-coated substrate with the secondary light beams at different incident angles, the region of the substrate extending over a plurality of shot areas defined on the substrate, wherein the region is exposed to a regular pattern of light of interference fringes produced on the substrate from the plurality of secondary light beams.
摘要翻译：在用于制造集成电路芯片的光刻工艺中，使用投影曝光机将掩模图案印刷到限定在基板上的多个照射区域中的每一个上，其中用于在基板上的每个照射区域之间建立对准的对准方法和执行掩模图案。对准方法包括在基板上形成规则图案的步骤，该规则图案包括规则分布在多个拍摄区域上的多个图案元素，以及基于规则图案的位置执行对准操作的步骤，以便建立多个拍摄区域中的每一个与掩模图案之间的对准。可以使用曝光装置在基板上形成规则图案。曝光装置包括用于发射主光束的光源，用于将主光束分离成彼此相干的多个次级光束的分束光学系统，以及用于修改每个二次光的物镜光学系统射入基本上平面的波长光束中，并且用不同入射角的二次光束照射光致抗蚀剂涂覆的基底的区域，衬底的区域延伸在限定在衬底上的多个注射区域上，其中区域暴露于从多个次级光束在基板上产生的干涉条纹的规则图案。

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