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1. 发明授权

US5109069A Hydrogenated diene copolymer-containing resin composition and process for producing the same 失效
标题翻译：加氢二烯共聚物树脂组合物及其制造方法
公开(公告)号：US5109069A
公开(公告)日：1992-04-28
申请号：US446692
申请日：1989-12-06
申请人： Tooru Shibata , Toshio Teramoto , Yasuo Takeuchi , Kenya Makino , Masaaki Mawatari , Minoru Maeda , Shinichi Kimura , Minoru Hasegawa , Kunio Goshima , Mikio Takeuchi
发明人： Tooru Shibata , Toshio Teramoto , Yasuo Takeuchi , Kenya Makino , Masaaki Mawatari , Minoru Maeda , Shinichi Kimura , Minoru Hasegawa , Kunio Goshima , Mikio Takeuchi
IPC分类号： C08J3/00 , C08L15/00 , C08L21/00 , C08L23/00 , C08L23/10 , C08L25/00 , C08L25/10 , C08L37/00 , C08L47/00 , C08L67/00 , C08L71/12 , C08L77/00
CPC分类号： C08L15/00 , C08L71/123 , C08L23/10 , C08L25/02 , C08L67/00 , C08L77/00 , Y10S525/905
摘要： A hydrogenated diene copolymer resin composition comprising (A) 5-70% by weight of a hydrogenated diene copolymer which is a hydrogenation product of a random copolymer of at least one conjugated diene and 3-50% by weight of an alkenyl aromatic compound having a number average molecular weight of 5,000-1,000,000 and a molecular weight distribution (Mw/Mn) of 10 or less, the vinyl content in the diene portion of the random copolymer being 10-90%, at least 70% of the olefinic unsaturation of the random copolymer being hydrogenated, and (B) 95-30% by weight of at least one resin selected from the group consisting of a polypropylene resin, a polyphenylene ether resin and an alkenyl aromatic compound polymer resin. The hydrogenated diene copolymer (A) can be used in combination with (B) a polyphenylene ether resin and (C) at least one member selected from the group consisting of a polyamide and a thermoplastic polyester in such a proportion that the amount of (A) is 1-50 parts by weight, the amount of (B) is 10-89 parts by weight and the amount of (C) is 10-89 parts by weight. The above composition has improved impact resistance and improved gloss and appearance of molded article.

2. 发明授权

US5346964A (Modified) hydrogenated diene block copolymer and composition comprising the same 失效
标题翻译：（改性）氢化二烯嵌段共聚物及其组合物
公开(公告)号：US5346964A
公开(公告)日：1994-09-13
申请号：US80115
申请日：1993-06-23
申请人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
发明人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
IPC分类号： C08F8/04 , C08F297/04 , C08L51/00 , C08L53/02 , C08F287/00
CPC分类号： C08L53/025 , C08F297/04 , C08F8/04 , C08L51/006 , Y10S525/94
摘要： A hydrogenated diene block copolymer having a polystyrene-reduced number-average molecular weight of 50,000-600,000 which is a hydrogenation product of an (A)-(B) block copolymer in which (A) means an alkenyl aromatic compound polymer block and (B) means a conjugated diene homopolymer block wherein the vinyl content of the conjugated diene portion is more than 60%, or an alkenyl aromatic compound-conjugated diene random copolymer block wherein the vinyl content of the conjugated diene portion is 15% or more, an (A)-(B)-(C) block copolymer in which (A) and (B) are as defined above and (C) means an alkenyl aromatic compound-conjugated diene copolymer tapered block wherein the proportion of the alkenyl aromatic compound increases gradually, or an (A)-(B)-(A) block copolymer in which (A) and (B) are as defined above. Said hydrogenated diene block copolymer is useful as a modifier for polar resins, non-polar resins or both of them.
摘要翻译：具有聚苯乙烯换算的数均分子量为50,000-600,000的氢化二烯嵌段共聚物，其是（A） - （B）嵌段共聚物的氢化产物，其中（A）表示链烯基芳族化合物聚合物嵌段和（B 是指共轭二烯部分的乙烯基含量大于60％的共轭二烯均聚物嵌段或共轭二烯部分的乙烯基含量为15％以上的链烯基芳香族化合物 - 共轭二烯无规共聚物嵌段，（ A） - （B） - （C）嵌段共聚物，其中（A）和（B）如上所定义，（C）是烯基芳族化合物 - 共轭二烯共聚物渐缩嵌段，其中烯基芳族化合物的比例逐渐增加或（A） - （B） - （A）嵌段共聚物，其中（A）和（B）如上所定义。所述氢化二烯嵌段共聚物可用作极性树脂，非极性树脂或它们两者的改性剂。

3. 发明授权

US5191024A Hydrogenated diene block copolymer and composition comprising the same 失效
标题翻译：加氢二烯嵌段共聚物及其组合物
公开(公告)号：US5191024A
公开(公告)日：1993-03-02
申请号：US524809
申请日：1990-05-18
申请人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
发明人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
IPC分类号： C08F8/04 , C08F297/04 , C08L51/00 , C08L53/02
CPC分类号： C08L53/025 , C08F297/04 , C08F8/04 , C08L51/006 , Y10S525/94
摘要： A hydrogenated diene block copolymer having a polystyrene-reduced number-average molecular weight of 50,000-600,000 which is a hydrogenation product of an (A)--(B) block copolymer in which (A) means an alkenyl aromatic compound polymer block and (B) means a conjugated diene homopolymer block wherein the vinyl content of the conjugated diene portion is more than 60%, or an alkenyl aromatic compound-conjugated diene random copolymer block wherein the vinyl content of the conjugated diene portion is 15% or more, an (A)--(B)--(C) block copolymer in which (A) and (B) are as defined above and (C) means an alkenyl aromatic compound-conjugated diene copolymer tapered block wherein the proportion of the alkenyl aromatic compound increases gradually, or an (A)--(B)--(A) block copolymer in which (A) and (B) are as defined above, in which block copolymer(1) the weight proportion of theh alkenyl aromatic compound/the conjugated diene is 5/95 to 60/40, and(2) the content of the bound alkenyl aromatic compound in at least one block (A) is at last 3% by weight and the total of the bound alkenyl aromatic compound contents in the block (A) and the block (C) or the two block (A)'s is 3-50% by weight based on the total monomers,and in which hydrogenation product at least 80% of the double bonds of the conjugated diene portion is saturated by the hydrogenation. Said hydrogenated diene block copolymer is useful as a modifier for polar resins, non-polar resins or both of them.

4. 发明授权

US5306779A Hydrogenated diene block copolymer and composition comprising the same 失效
标题翻译：氢化二烯嵌段共聚物及其组合物
公开(公告)号：US5306779A
公开(公告)日：1994-04-26
申请号：US937723
申请日：1992-09-01
申请人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
发明人： Tooru Shibata , Toshio Teramoto , Yoshiharu Hashiguchi , Kunio Goshima
IPC分类号： C08F8/04 , C08F297/04 , C08L51/00 , C08L53/02
CPC分类号： C08L53/025 , C08F297/04 , C08F8/04 , C08L51/006 , Y10S525/94
摘要： A hydrogenated diene block copolymer having a polystyrene-reduced number-average molecular weight of 50,000-600,000 which is a hydrogenation product of an (A)-(B) block copolymer in which (A) means an alkenyl aromatic compound polymer block and (B) means a conjugated diene homopolymer block wherein the vinyl content of the conjugated diene portion is more than 60%, or an alkenyl aromatic compound-conjugated diene random copolymer block wherein the vinyl content of the conjugated diene portion is 15% or more, an (A)-(B)-(C) block copolymer in which (A) and (B) are as defined above and (C) means an alkenyl aromatic compound-conjugated diene copolymer tapered block wherein the proportion of the alkenyl aromatic compound increases gradually, or an (A)-(B)-(A) block copolymer in which (A) and (B) are as defined above and in which hydrogenation product at least 80% of the double bonds of the conjugated diene portion is saturated by the hydrogenation. Said hydrogenated diene block copolymer is useful as a modifier for polar resins, non-polar resins or both of them.
摘要翻译：具有聚苯乙烯换算的数均分子量为50,000-600,000的氢化二烯嵌段共聚物，其是（A） - （B）嵌段共聚物的氢化产物，其中（A）表示链烯基芳族化合物聚合物嵌段和（B 是指共轭二烯部分的乙烯基含量大于60％的共轭二烯均聚物嵌段或共轭二烯部分的乙烯基含量为15％以上的链烯基芳香族化合物 - 共轭二烯无规共聚物嵌段，（ A） - （B） - （C）嵌段共聚物，其中（A）和（B）如上所定义，（C）是烯基芳族化合物 - 共轭二烯共聚物渐缩嵌段，其中烯基芳族化合物的比例逐渐增加或（A） - （B） - （A）嵌段共聚物，其中（A）和（B）如上所定义，并且其中至少80％的共轭二烯部分的双键被氢化产物饱和氢化。所述氢化二烯嵌段共聚物可用作极性树脂，非极性树脂或它们两者的改性剂。

5. 发明授权

US5206301A Hydrogenated block copolymer and composition comprising the same 失效
标题翻译：加氢嵌段共聚物及其组合物
公开(公告)号：US5206301A
公开(公告)日：1993-04-27
申请号：US536564
申请日：1990-07-12
申请人： Iwakazu Hattori , Noboru Oshima , Tooru Shibata , Yasuo Takeuchi
发明人： Iwakazu Hattori , Noboru Oshima , Tooru Shibata , Yasuo Takeuchi
IPC分类号： C08L23/02 , C08F8/04 , C08F8/46 , C08F297/04 , C08L53/00 , C08L53/02 , C08L101/00
CPC分类号： C08L53/025 , C08F297/04 , C08F8/04 , C08L101/00 , Y10S525/904 , Y10S525/914
摘要： A hydrogenated block copolymer having a number-average molecular weight of 40,000-700,000, obtained by hydrogenating at least 80% of the olefinic bonds of a block copolymer having in the molecule at least one each ofa polymer block A composed of 90% by weight or more of a vinyl aromatic compound,a polybutadiene polymer block B having a 1,2-vinyl structure of 30-70%, anda polybutadiene polymer block C having a 1,2-vinyl structure of less than 30%,in which block copolymer the blocks A, B and C are contained at a specific ratio, or a unit of the block copolymer is bonded, via a coupling agent residue, to at least one polymer block unit of the blocks A, B and C and thereby the polymer molecular chain is extended or branched; and a thermoplastic resin composition comprising the hydrogenated block copolymer.
摘要翻译： PCT No.PCT / JP89 / 01157 Sec。 371日期1990年7月12日 102（e）日1990年7月12日PCT 1989年11月14日PCT PCT。 WO90 / 05753 PCT出版物日本1990年5月31日。一种数均分子量为40,000-700,000的氢化嵌段共聚物，其通过氢化至少80％的分子中具有至少一种聚合物嵌段A的嵌段共聚物的烯键由乙烯基芳族化合物的90重量％以上，1,2-乙烯基结构为30〜70摩尔的聚丁二烯聚合物嵌段B和1,2-乙烯基结构的聚丁二烯聚合物嵌段C小于 30％，其中嵌段A，B和C以特定比例包含或嵌段共聚物的单元通过偶联剂残基键合至块A，B的至少一个聚合物嵌段单元和C，从而使聚合物分子链延伸或分支; 和包含氢化嵌段共聚物的热塑性树脂组合物。

6. 发明授权

US4461883A Process for producing conjugated diene polymer using a solubilized lanthanum carboxylate catalyst 失效
标题翻译：使用溶解的镧羧酸盐催化剂制备共轭二烯聚合物的方法
公开(公告)号：US4461883A
公开(公告)日：1984-07-24
申请号：US387780
申请日：1982-06-14
申请人： Yasumasa Takeuchi , Mitsuhiko Sakakibara , Tooru Shibata
发明人： Yasumasa Takeuchi , Mitsuhiko Sakakibara , Tooru Shibata
IPC分类号： C08F2/06 , C08F4/12 , C08F4/14 , C08F4/44 , C08F36/04 , C08F4/52
CPC分类号： C08F36/04
摘要： A process for producing a conjugated diene polymer, characterized by polymerizing at least one conjugated diene with a catalyst consisting of (A) a reaction product of a Lewis base and a carboxylate of a rare earth element of the lanthanum series represented by Ln(R.sup.1 CO.sub.2).sub.3 wherein Ln is a rare earth element of the lanthanum series having an atomic number of 57 to 71 and R.sup.1 is a hydrocarbon substituent having 1 to 20 carbon atoms, (B) an organic aluminum compound represented by AlR.sup.2 R.sup.3 R.sup.4 wherein R.sup.2, R.sup.3 and R.sup.4, which may be identical or different, represent hydrogen atoms or hydrocarbon substituents having 1 to 8 carbon atoms, excluding the case where all of R.sup.2, R.sup.3 and R.sup.4 are hydrogen atoms at the same time, and (C) an (alkyl)aluminum halide represented by AlX.sub.n R.sup.5.sub.3-n wherein X is Cl, Br, F or I; R.sup.5 is a hydrocarbon substituent having 1 to 8 carbon atoms; and n has a value of 1, 1.5, 2 or 3, or consisting of these (A), (B) and (C) components and (D) a conjugated diene. A polymer obtained by said process has a high cis-1,4-configuration content and is excellent in physical properties of vulcanizate.
摘要翻译：一种共轭二烯聚合物的制备方法，其特征在于，将由（L）（R 1 CO 2）表示的镧系稀土元素的路易斯碱与羧酸酯的反应产物与（A） 3其中Ln是原子序数为57〜71的镧系稀土元素，R1为碳原子数1〜20的烃取代基，（B）由AlR2R3R4表示的有机铝化合物，其中R2，R3和R4，可以相同或不同，表示氢原子或具有1至8个碳原子的烃取代基，不包括所有R 2，R 3和R 4同时为氢原子的情况，（C）（烷基）卤化铝代表通过AlXnR53-n，其中X是Cl，Br，F或I; R5是具有1-8个碳原子的烃取代基; 并且n具有1,1.5,2或3的值，或由这些（A），（B）和（C）组分组成，和（D）共轭二烯。通过所述方法获得的聚合物具有高顺式-1,4-构型含量，并且硫化橡胶的物理性能优异。

7. 发明申请

US20060220754A1 Voltage controlled oscillator 审中-公开
标题翻译：压控振荡器
公开(公告)号：US20060220754A1
公开(公告)日：2006-10-05
申请号：US11362767
申请日：2006-02-28
申请人： Tooru Shibata
发明人： Tooru Shibata
IPC分类号： H03B5/12
CPC分类号： H03B5/04 , H03B5/1212 , H03B5/1228 , H03B5/124 , H03B2200/0038
摘要： A voltage controlled oscillator includes an LC resonance circuit having an inductance and a voltage dependent variable capacitance connected in parallel between first and second output terminals; a transistor pair circuit connected in parallel with the LC resonance circuit between the first and second output terminals and having negative conductance to keep oscillation of the LC resonance circuit; a resistance having one end connected with the oscillation transistor pair circuit; and a current source connected with the other end of the resistance.
摘要翻译：压控振荡器包括具有在第一和第二输出端子之间并联连接的电感和电压相关可变电容的LC谐振电路; 晶体管对电路与第一和第二输出端子之间的LC谐振电路并联连接，并具有负电导以保持LC谐振电路的振荡; 一端与振荡晶体管对电路连接的电阻; 以及与电阻的另一端连接的电流源。

8. 发明授权

US4340685A Process for preparing polybutadiene having a 1,2-configuration content of 5-40% and a cis-1,4-configuration content of 60% or more 失效
标题翻译：制备1,2-构型含量为5-40％，顺式-1,4-构型含量为60％以上的聚丁二烯的方法
公开(公告)号：US4340685A
公开(公告)日：1982-07-20
申请号：US228625
申请日：1981-01-26
申请人： Yasumasa Takeuchi , Yutaka Obata , Noboru Ohshima , Tooru Shibata , Kaoru Nakako
发明人： Yasumasa Takeuchi , Yutaka Obata , Noboru Ohshima , Tooru Shibata , Kaoru Nakako
IPC分类号： C08F2/00 , C08F2/04 , C08F2/06 , C08F2/44 , C08F4/00 , C08F4/26 , C08F4/60 , C08F4/70 , C08F36/00 , C08F36/06 , C08F136/06
CPC分类号： C08F136/06
摘要： A process for preparing polybutadiene having a 1,2-configuration content of 5-40% and a cis-1,4-configuration content of 60% or more, which comprises polymerizing 1,3-butadiene in the presence of a catalyst consisting of:(A) a cobalt compound,(B) at least one member selected from the group consisting of:(i) a trialkylaluminum,(ii) a reaction product of a trialkylaluminum and an alcohol or water,(iii) a mixture of a trialkylaluminum and a dialkylaluminum halide,(iv) a dialkylaluminum hydride, and(v) an organolithium compound, and(C) at least one compound selected from the group consisting of phenyl isothiocyanate and carbon disulfide, in a hydrocarbon or halogenated hydrocarbon solution of a high cis-1,4-polybutadiene obtained by polymerizing 1,3-butadiene with a catalyst consisting of:(D) at least one compound selected from the group consisting of the organocarboxylates of nickel and organic complex compounds of nickel,(E) at least one compound selected from the group consisting of boron trifluoride, boron trifluoride complex compounds and hydrogen fluoride, and(F) at least one compound selected from the group consisting of the organometallic compounds of the alkali metals of the Group II or III metals of the Periodic Table. The polybutadiene produced by this process has an improved tear strength and improved flexural fatigue properties.
摘要翻译：一种制备1,2-构型含量为5-40％，顺式-1,4-构型含量为60％以上的聚丁二烯的方法，其包括在催化剂存在下将1,3-丁二烯聚合，所述催化剂由：（A）钴化合物，（B）选自由以下组成的组中的至少一种：（i）三烷基铝，（ii）三烷基铝与醇或水的反应产物，（iii）三烷基铝和二烷基卤化铝，（iv）氢化二烷基铝，和（v）有机锂化合物，和（C）至少一种选自异硫氰酸苯酯和二硫化碳的化合物在烃或卤代烃溶液中通过由以下组成的催化剂聚合1,3-丁二烯获得的高顺式-1,4-聚丁二烯：（D）至少一种选自镍的有机羧酸盐和镍的有机络合物的化合物，（E）在选自组中的至少一种化合物三氟化硼配位化合物和氟化氢，和（F）选自元素周期表第二或第三族金属的碱金属的有机金属化合物中的至少一种化合物。通过该方法制备的聚丁二烯具有改进的撕裂强度和改善的弯曲疲劳性能。

9. 发明授权

US07608368B2 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product 有权
标题翻译：图案形成方法，光掩模制造方法，半导体器件制造方法和计算机程序产品
公开(公告)号：US07608368B2
公开(公告)日：2009-10-27
申请号：US11342677
申请日：2006-01-31
申请人： Hideaki Sakurai , Tooru Shibata , Masato Saito , Masamitsu Itoh
发明人： Hideaki Sakurai , Tooru Shibata , Masato Saito , Masamitsu Itoh
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70625 , G03F7/70558 , Y10S430/143
摘要： A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including partitioning the surface into M (≧2) regions and determining correction exposure dose for each of the M region, the determining the correction exposure dose including determining a correction exposure dose for an i-th (1≦i≦M) region so that an actual pattern dimension of a pattern on the i-th region matches a design pattern dimension based on a pattern opening ratio of a pattern to be formed on the substrate, the pattern being located on a region which is further upstream region than the i-th region with respect to an upstream direction of a flow of the solution, and forming the pattern by etching the substrate using the resist pattern as a mask.
摘要翻译：图案形成方法包括通过使显影溶液流到膜上以形成抗蚀剂图案，在基板的主表面上显影抗蚀剂膜，显影该膜包括将表面划分成M（> = 2）区域并确定校正曝光确定校正曝光剂量，包括确定第i（1≤i≤M）区域的校正曝光剂量，使得第i个区域上的图案的实际图案尺寸基于要在衬底上形成的图案的图案开口率来匹配设计图案尺寸，该图案位于比第i个区域的上游方向更靠上游区域的区域上溶液，并且通过使用抗蚀剂图案作为掩模来蚀刻基板来形成图案。

10. 发明申请

US20060172205A1 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product 有权
公开(公告)号：US20060172205A1
公开(公告)日：2006-08-03
申请号：US11342677
申请日：2006-01-31
申请人： Hideaki Sakurai , Tooru Shibata , Masato Saito , Masamitsu Itoh
发明人： Hideaki Sakurai , Tooru Shibata , Masato Saito , Masamitsu Itoh
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F7/70625 , G03F7/70558 , Y10S430/143
摘要： A pattern forming method includes developing a resist film on a main surface of a substrate by flowing a developing solution on the film to form a resist pattern, the developing the film including partitioning the surface into M (≧2) regions and determining correction exposure dose for each of the M region, the determining the correction exposure dose including determining a correction exposure dose for an i-th (1≦i≦M) region so that an actual pattern dimension of a pattern on the i-th region matches a design pattern dimension based on a pattern opening ratio of a pattern to be formed on the substrate, the pattern being located on a region which is further upstream region than the i-th region with respect to an upstream direction of a flow of the solution, and forming the pattern by etching the substrate using the resist pattern as a mask.

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