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1. 发明申请

US20090016860A1 SUBSTRATE CONVEY PROCESSING DEVICE, TROUBLE COUNTERMEASURE METHOD IN SUBSTRATE CONVEY PROCESSING DEVICE, AND TROUBLE COUNTERMEASURES PROGRAM IN SUBSTRATE CONVEY PROCESSING DEVICE 有权
标题翻译：基板输送加工装置，底板输送加工装置中的故障计数方法以及基板输送加工装置中的故障计数方案
公开(公告)号：US20090016860A1
公开(公告)日：2009-01-15
申请号：US11813925
申请日：2006-01-18
申请人： Tomohiro Kaneko , Yoshitaka Hara , Akira Miyata
发明人： Tomohiro Kaneko , Yoshitaka Hara , Akira Miyata
IPC分类号： H01L21/67
CPC分类号： H01L21/67745 , H01L21/67276
摘要： A plurality of process modules for conducting processes on a wafer; conveying modules for conveying the wafer, a turnout module for transferring the wafer to/from the conveying module, and a CPU for detecting a trouble occurring in the process module and centrally controlling each of the modules based on a detection signal. When the controller detects the trouble occurring in any one of the process modules, the wafer to be conveyed to the process module where the trouble occurs is conveyed to the turnout module, and conveyance of the wafer before the process module where the trouble occurs is temporarily stopped, and conveyance and processing of the other wafer are continued, and thereafter, conveyance and processing of the wafer before the process module where the trouble occurs are conducted.
摘要翻译：用于在晶片上进行处理的多个处理模块; 用于传送晶片的输送模块，用于将晶片传送到/从输送模块传送的转向模块;以及CPU，用于检测在处理模块中发生的故障，并且基于检测信号集中控制模块。当控制器检测到任何一个处理模块发生故障时，要传送到发生故障的处理模块的晶片被传送到投票模块，并且在发生故障的处理模块之前的晶片的传送是暂时的停止，继续进行其他晶片的输送和处理，然后进行在发生故障的处理模块之前的晶片的输送和处理。

2. 发明授权

US08393845B2 Substrate convey processing device, trouble countermeasure method in substrate convey processing device, and trouble countermeasures program in substrate convey processing device 有权
标题翻译：基板输送处理装置，基板输送处理装置中的故障对策方法以及基板输送处理装置中的故障对策程序
公开(公告)号：US08393845B2
公开(公告)日：2013-03-12
申请号：US11813925
申请日：2006-01-18
申请人： Tomohiro Kaneko , Yoshitaka Hara , Akira Miyata
发明人： Tomohiro Kaneko , Yoshitaka Hara , Akira Miyata
IPC分类号： B65H1/00
CPC分类号： H01L21/67745 , H01L21/67276
摘要： A plurality of process modules for conducting processes on a wafer; conveying modules for conveying the wafer, a turnout module for transferring the wafer to/from the conveying module, and a CPU for detecting a trouble occurring in the process module and centrally controlling each of the modules based on a detection signal. When the controller detects the trouble occurring in any one of the process modules, the wafer to be conveyed to the process module where the trouble occurs is conveyed to the turnout module, and conveyance of the wafer before the process module where the trouble occurs is temporarily stopped, and conveyance and processing of the other wafer are continued, and thereafter, conveyance and processing of the wafer before the process module where the trouble occurs are conducted.
摘要翻译：用于在晶片上进行处理的多个处理模块; 用于传送晶片的输送模块，用于将晶片传送到/从输送模块传送的转向模块;以及CPU，用于检测在处理模块中发生的故障，并且基于检测信号集中控制模块。当控制器检测到任何一个处理模块发生故障时，要传送到发生故障的处理模块的晶片被传送到投票模块，并且在发生故障的处理模块之前的晶片的传送是暂时的停止，继续进行其他晶片的输送和处理，然后进行在发生故障的处理模块之前的晶片的输送和处理。

3. 发明申请

US20080020315A1 Substrate Collection Method and Substrate Treatment Apparatus 有权
标题翻译：基板收集方法和基板处理装置
公开(公告)号：US20080020315A1
公开(公告)日：2008-01-24
申请号：US11571613
申请日：2005-06-23
申请人： Makio Higashi , Akira Miyata , Yoshitaka Hara
发明人： Makio Higashi , Akira Miyata , Yoshitaka Hara
IPC分类号： G03G13/06
CPC分类号： H01L21/67201 , H01L21/67225 , H01L21/67253 , Y10S414/135
摘要： When a trouble occurs in a substrate treatment apparatus, the substrate existing in the substrate treatment apparatus is quickly collected without exerting adverse effects on the subsequent substrate treatment to resume the substrate treatment early. At the time of occurrence of trouble in a coating and developing treatment apparatus, all of the substrates in the coating and developing treatment apparatus are collected to a transfer-in/out section using a transfer unit in the apparatus. In this event, each transfer unit transfers the substrate from each position at the time of occurrence of trouble in a direction toward the transfer-in/out section for collection. Further, the substrate under treatment in the treatment unit at the time of occurrence of trouble is collected after the treatment is finished.
摘要翻译：当在基板处理装置中发生故障时，快速收集存在于基板处理装置中的基板，而不会对随后的基板处理产生不利影响，以便提前恢复基板处理。在涂布和显影处理装置出现故障时，涂布和显影处理装置中的所有基材都使用装置中的转印单元收集到输入/输出部分。在这种情况下，每个传送单元在发生故障时的每个位置沿着朝向用于收集的输入/输出部分的方向传送基板。此外，在处理完成后收集处理单元中发生故障时处理的基板。

4. 发明授权

US08940365B2 Coating method, coating device, and storage medium 有权
标题翻译：涂布方法，涂布装置和存储介质
公开(公告)号：US08940365B2
公开(公告)日：2015-01-27
申请号：US13336373
申请日：2011-12-23
申请人： Akira Miyata , Yoshitaka Hara , Kouji Fujimura
发明人： Akira Miyata , Yoshitaka Hara , Kouji Fujimura
IPC分类号： B05D3/12 , G06F19/00 , H01L21/67
CPC分类号： H01L21/6715
摘要： A device to form a coating film which can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device is configured such that nozzles for a preceding lot and a following lot are integrated into a common movement mechanism and moved between an upper side of a liquid processing unit and a standby area. A coating method includes sucking air into the nozzle for the preceding lot to form an upper gas layer, sucking a solvent for the preceding lot in the standby area to form a thinner layer, and sucking air into the nozzle for the preceding lot to form a lower gas layer within the nozzle, and thus forming a state that a solvent layer is interposed between the upper gas layer and the lower gas layer.
摘要翻译：一种形成涂膜的装置，其可以在涂覆前面的批次之后快速地涂覆后续批次的基材。该装置被构造成使得用于先前批次和后续批次的喷嘴被集成到公共运动机构中并且在液体处理单元的上侧和待机区域之间移动。涂布方法包括将空气吸入前述批次的喷嘴中以形成上部气体层，在备用区域吸取前一批料的溶剂以形成更薄的层，并将空气吸入前一批料的喷嘴中以形成从而形成在上部气体层和下部气体层之间插入溶剂层的状态。

5. 发明授权

US07840299B2 Substrate collection method and substrate treatment apparatus 有权
标题翻译：基板收集方法和基板处理装置
公开(公告)号：US07840299B2
公开(公告)日：2010-11-23
申请号：US11571613
申请日：2005-06-23
申请人： Makio Higashi , Akira Miyata , Yoshitaka Hara
发明人： Makio Higashi , Akira Miyata , Yoshitaka Hara
IPC分类号： G06F19/00 , H01L21/677
CPC分类号： H01L21/67201 , H01L21/67225 , H01L21/67253 , Y10S414/135
摘要： When a trouble occurs in a substrate treatment apparatus, the substrate existing in the substrate treatment apparatus is quickly collected without exerting adverse effects on the subsequent substrate treatment to resume the substrate treatment early. At the time of occurrence of trouble in a coating and developing treatment apparatus, all of the substrates in the coating and developing treatment apparatus are collected to a transfer-in/out section using a transfer unit in the apparatus. In this event, each transfer unit transfers the substrate from each position at the time of occurrence of trouble in a direction toward the transfer-in/out section for collection. Further, the substrate under treatment in the treatment unit at the time of occurrence of trouble is collected after the treatment is finished.
摘要翻译：当在基板处理装置中发生故障时，快速收集存在于基板处理装置中的基板，而不会对随后的基板处理产生不利影响，以便提前恢复基板处理。在涂布和显影处理装置出现故障时，涂布和显影处理装置中的所有基材都使用装置中的转印单元收集到输入/输出部分。在这种情况下，每个传送单元在发生故障时的每个位置沿着朝向用于收集的输入/输出部分的方向传送基板。此外，在处理完成后收集处理单元中发生故障时处理的基板。

6. 发明授权

US07844359B2 Coating and developing apparatus, operating method for same, and storage medium for the method 有权
标题翻译：涂料和显影装置，其操作方法和方法的存储介质
公开(公告)号：US07844359B2
公开(公告)日：2010-11-30
申请号：US12128437
申请日：2008-05-28
申请人： Tomonori Shin , Kouji Okamura , Tomohiro Kaneko , Akira Miyata , Syuzo Fujimaru
发明人： Tomonori Shin , Kouji Okamura , Tomohiro Kaneko , Akira Miyata , Syuzo Fujimaru
IPC分类号： G06F19/00 , H01L21/00
CPC分类号： H01L21/67225 , H01L21/67276
摘要： In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.
摘要翻译：在适用于液浸式曝光的涂布显影装置中，可以回收没有适当形成的保护膜的基板，而不会不利地影响正常的基板处理效率，另外可以简化保护膜的去除。在本发明的涂布和显影装置中，在液浸式曝光期间不被适当表面涂覆有保护膜的异常基板排队在排队模块中，而不是装载到曝光单元中，并且在紧接在前面的基板已经从曝光单元卸载并加载到指定的模块中，例如预先显影的第二加热模块中，每个异常基板被装载到指定模块中，以防止所谓的“计划传送”受到影响，并且还控制保护膜去除单元以处理异常衬底。

7. 发明申请

US20090041926A1 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD AND COMPUTER-READABLE RECORDING MEDIUM 有权
标题翻译：涂层和开发设备，基板处理方法和计算机可读记录介质
公开(公告)号：US20090041926A1
公开(公告)日：2009-02-12
申请号：US12179014
申请日：2008-07-24
申请人： Akira Miyata , Tomohiro Kaneko
发明人： Akira Miyata , Tomohiro Kaneko
IPC分类号： C23C16/52 , B05C11/00
CPC分类号： H01L21/67276
摘要： With regard to a group of substrates preceding a substrate of which residence time is under calculation, a time t1 and a time t2 are calculated, t1 being a time interval from a time point in which a substrate B1 under the consideration has become ready from being transferred out from a wait module to a time point in which a heating module used for the substrate B1 has been ready for processing the substrate B1, t2 being a time interface from a time on in which the substrate B1 under calculation has been transferred out from the wait module to a time point of reaching the heating module used for the substrate B1, and a waiting time t of the substrate B1 in the wait module is calculated according to t=t1−t2.
摘要翻译：对于在其计算停留时间的基板之前的一组基板，计算时间t1和时间t2，t1是从考虑中的基板B1准备好的时间点开始的时间间隔从等待模块传出到用于基板B1的加热模块已经准备好处理基板B1的时间点，t2是从计算中的基板B1已被转出的时间的时间界面等待模块到达用于基板B1的加热模块的时间点，以及根据t = t1-t2计算等待模块中的基板B1的等待时间t。

8. 发明申请

US20070250202A1 COATING AND DEVELOPING SYSTEM, METHOD OF CONTROLLING COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 审中-公开
标题翻译：涂料与开发系统，涂料和发展体系与储存介质的控制方法
公开(公告)号：US20070250202A1
公开(公告)日：2007-10-25
申请号：US11734088
申请日：2007-04-11
申请人： Tomohiro Kaneko , Akira Miyata
发明人： Tomohiro Kaneko , Akira Miyata
IPC分类号： G06F19/00 , B05C11/00
CPC分类号： H01L21/67745 , H01L21/67276
摘要： A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.
摘要翻译：涂装和显影系统包括一个盒式磁带站，一个处理站和一个插入在磁带站和处理站之间的检查站。基板在检查模块中无用的时间减少了。设置在检查模块中的基板承载装置优先地将基板传送到盒站和处理站之间，并且在循环时间的一部分中将基板传送到检查模块，其中设置在处理站中的基板承载装置执行一个携带循环。允许以跳过方式从检查模块执行基板，其中由较小的数字指定的基板在由较小的数字指定的基板的前面进行。在跳过运行模式下，禁止将基板运送到检查模块。

9. 发明申请

US20060287200A1 Substrate processing system and substrate processing method 审中-公开
标题翻译：基板加工系统和基板加工方法
公开(公告)号：US20060287200A1
公开(公告)日：2006-12-21
申请号：US11436700
申请日：2006-05-19
申请人： Tomohiro Kaneko , Akira Miyata
发明人： Tomohiro Kaneko , Akira Miyata
IPC分类号： C04B35/45
CPC分类号： G03F7/7075 , G03F7/70533 , H01L21/67155 , H01L21/67173 , H01L21/67184 , H01L21/67196 , H01L21/67253 , H01L21/67276
摘要： A substrate processing system 100 and a substrate processing method process a plurality of substrates in a single-substrate processing mode by the cooperative operation of a first processing system and a second processing system. The substrate processing system 100 suppresses increase in cost and footprint and the reduction of yield and throughput. The substrate processing system 100 includes a first processing system 50 for processing substrates in a single-substrate processing mode and a second processing system 60 for processing substrates in a single-substrate processing mode. The second processing system 60 processes a substrate processed by a first process by the first processing system 50 by a second process, and the first processing system processes the substrate processed by the second process by the second processing system 60 by a third process. The first processing system 50 includes a first control means 30 for controlling a substrate carrying operation. The second processing system 60 includes a second control means 40. The first control means 30 (or the second control means 40) obtains information about processing time needed by the second processing system 60 (the first processing system 50) and controls a substrate carrying operation for carrying substrates between the first processing system 50 and the second processing system 60 on the basis of the obtained information.
摘要翻译：基板处理系统100和基板处理方法通过第一处理系统和第二处理系统的协作操作以单基板处理模式处理多个基板。基板处理系统100抑制成本和占地面积的增加以及产量和产量的降低。基板处理系统100包括用于以单基板处理模式处理基板的第一处理系统50和用于以单基板处理模式处理基板的第二处理系统60。第二处理系统60通过第二处理处理由第一处理系统50进行的第一处理的基板，第一处理系统通过第三处理由第二处理系统60处理由第二处理处理的基板。第一处理系统50包括用于控制基板承载操作的第一控制装置30。第二处理系统60包括第二控制装置40.第一控制装置30（或第二控制装置40）获得关于第二处理系统60（第一处理系统50）所需的处理时间的信息，并控制基板承载操作用于基于获得的信息在第一处理系统50和第二处理系统60之间承载基板。

10. 发明授权

US08747949B2 Coating and developing system, method of controlling coating and developing system and storage medium 有权
标题翻译：涂料和显影系统，涂料和显影系统和储存介质的控制方法
公开(公告)号：US08747949B2
公开(公告)日：2014-06-10
申请号：US12902529
申请日：2010-10-12
申请人： Tomohiro Kaneko , Akira Miyata
发明人： Tomohiro Kaneko , Akira Miyata
IPC分类号： H01L21/02 , H01L21/027 , H01L21/67 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67745 , H01L21/67276
摘要： A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.
摘要翻译：涂装和显影系统包括一个盒式磁带站，一个处理站和一个插入在磁带站和处理站之间的检查站。基板在检查模块中无用的时间减少了。设置在检查模块中的基板承载装置优先地将基板传送到盒站和处理站之间，并且在循环时间的一部分中将基板传送到检查模块，其中布置在处理站中的基板承载装置执行一个携带循环。允许以跳过方式从检查模块执行基板，其中由较小的数字指定的基板在由较小的数字指定的基板的前面进行。在跳过运行模式下，禁止将基板运送到检查模块。

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