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1. 发明申请

US20090078292A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 审中-公开
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090078292A1
公开(公告)日：2009-03-26
申请号：US12249960
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B13/00
CPC分类号： H01L21/67034
摘要： In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted to scrub a first and a second side of the wafer respectively; a first spray bar adapted to spray a liquid on the wafer to form a meniscus on the wafer as the wafer is lifted out of the chamber; and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to perform Marangoni drying of the wafer as the wafer is lifted out of the chamber. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种装置。该装置包括一个室; 适于在腔室内以垂直取向支撑晶片的多个辊; 一对刷子，分别用于擦拭所述晶片的第一和第二侧; 第一喷杆，当晶片被提升出室时，适于在晶片上喷射液体以在晶片上形成弯月面; 以及适于将蒸汽引导到弯液面的第二喷杆，所述蒸汽适于降低所述弯液面处的液体的表面张力，以在所述晶片被提升到所述腔室之后执行所述晶片的马兰戈尼干燥。提供了许多其他方面。

2. 发明授权

US08322045B2 Single wafer apparatus for drying semiconductor substrates using an inert gas air-knife 有权
标题翻译：使用惰性气体气刀干燥半导体衬底的单晶片装置
公开(公告)号：US08322045B2
公开(公告)日：2012-12-04
申请号：US12249956
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： F26B21/06
CPC分类号： H01L21/67034
摘要： In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种基板处理装置。该装置包括用于通过移动衬底通过流体在衬底的表面上形成弯液面的机构; 定位成施加气刀以缩短形成在基板表面上的弯液面的气刀装置; 以及干燥蒸汽喷嘴，定位成将干燥蒸汽引导到由气刀缩短的弯液面。提供了许多其他方面。

3. 发明授权

US06568896B2 Transfer chamber with side wall port 失效
公开(公告)号：US06568896B2
公开(公告)日：2003-05-27
申请号：US09814807
申请日：2001-03-21
申请人： Timothy J. Franklin , Dan A. Marohl
发明人： Timothy J. Franklin , Dan A. Marohl
IPC分类号： H01L2100
CPC分类号： H01L21/67017 , Y10S414/135
摘要： A chamber for transferring a substrate is provided. In one embodiment, a chamber for transferring a substrate includes at least one side wall supporting a lid and coupled to a chamber bottom. The side wall, lid and chamber bottom defining an evacuable volume therebetween. A passage is disposed at least partially through the side wall and chamber bottom. The passage has a first end that is disposed in the side wall and is exposed to the evacuable volume. The passage has a second end that is disposed on an exterior side of the chamber bottom. The passage may be utilized as a pumping port when coupled to a pumping system at the second end of the passage. Additionally, the port may be utilized as a sensor housing to shield the sensor from objects within the transfer chamber.

4. 发明授权

US06503131B1 Integrated platen assembly for a chemical mechanical planarization system 有权
标题翻译：用于化学机械平面化系统的集成压板组件
公开(公告)号：US06503131B1
公开(公告)日：2003-01-07
申请号：US09931156
申请日：2001-08-16
申请人： Timothy J. Franklin , Dan A. Marohl
发明人： Timothy J. Franklin , Dan A. Marohl
IPC分类号： B24B700
CPC分类号： B24B37/16 , B24B9/10 , B24B21/04 , B24B21/20
摘要： Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen and a blocker valve. The platen includes a support surface adapted to support the polishing material and a port fluidly coupled to the support surface. A housing that includes a supply port and an exit port has a venturi body disposed therein. The blocker valve has a first state whereby a flow through the housing and blocker valve causes vacuum to be drawn through the port disposed in the platen by the venturi body. In another embodiment, the flow through the venturi may be reversed by changing the state of the blocker valve to blow air through the port disposed in the platen, thereby placing the polishing material and the support surface of the platen in a spaced-apart relation.
摘要翻译：通常，用于支撑抛光材料的网的方法和装置。在一个实施例中，该装置包括压板和阻塞阀。压板包括适于支撑抛光材料的支撑表面和流体地联接到支撑表面的端口。包括供给口和出口的壳体具有设置在其中的文丘里体。阻塞阀具有第一状态，由此通过壳体和阻塞阀的流动导致真空通过文丘里管体设置在压板中的端口被抽吸。在另一个实施例中，可以通过改变阻塞阀的状态来改变通过文丘里管的流动，从而通过设置在压板中的端口吹送空气，从而将抛光材料和压板的支撑表面间隔开来。

5. 发明申请

US20090044839A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 有权
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090044839A1
公开(公告)日：2009-02-19
申请号：US12249956
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B13/00
CPC分类号： H01L21/67034
摘要： In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种基板处理装置。该装置包括用于通过移动衬底通过流体在衬底的表面上形成弯液面的机构; 定位成施加气刀以缩短形成在基板表面上的弯液面的气刀装置; 以及干燥蒸汽喷嘴，定位成将干燥蒸汽引导到由气刀缩短的弯液面。提供了许多其他方面。

6. 发明申请

US20090032068A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 审中-公开
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090032068A1
公开(公告)日：2009-02-05
申请号：US12249961
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B5/00 , B08B3/04
CPC分类号： H01L21/67034
摘要： In one aspect, a method is provided. The method comprises forming a meniscus at an interface between a substrate and a fluid surface by moving the substrate through the fluid; shortening the meniscus by applying an air knife to the meniscus at the interface between the substrate and the fluid surface; and Marangoni drying the substrate by applying a drying vapor to the shortened meniscus. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种方法。该方法包括通过移动衬底通过流体在衬底和流体表面之间的界面处形成弯液面; 通过在基板和流体表面之间的界面处向弯液面施加气刀来缩短弯月面; 并且Marangoni通过对缩短的弯液面施加干燥蒸气来干燥基底。提供了许多其他方面。

7. 发明授权

US06837964B2 Integrated platen assembly for a chemical mechanical planarization system 有权
标题翻译：用于化学机械平面化系统的集成压板组件
公开(公告)号：US06837964B2
公开(公告)日：2005-01-04
申请号：US10293542
申请日：2002-11-12
申请人： Timothy J. Franklin , Dan A. Marohl
发明人： Timothy J. Franklin , Dan A. Marohl
IPC分类号： B24B9/10 , B24B21/04 , B24B21/20 , B24B37/16
CPC分类号： B24B37/16 , B24B9/10 , B24B21/04 , B24B21/20
摘要： A method and apparatus for supporting a web of polishing material are generally provided. In one embodiment, an apparatus for supporting a web of polishing material includes a web of polishing media having a first portion disposed across a support surface of a platen assembly and a second portion wound on a first roll coupled to the platen assembly. A tensioning mechanism is coupled to the platen assembly and adapted to tension the web of polishing media in response to a diameter of the second portion of the web of polishing material wound on the first roll.
摘要翻译：通常提供用于支撑抛光材料的网的方法和装置。在一个实施例中，用于支撑抛光材料的卷材的装置包括抛光介质的卷材，其具有横跨压板组件的支撑表面设置的第一部分和缠绕在联接到压板组件上的第一辊上的第二部分。张紧机构联接到压板组件并且适于响应于缠绕在第一辊上的抛光材料幅材的第二部分的直径来拉紧抛光介质的幅材。

8. 发明授权

US07934979B2 Retaining ring with tapered inner surface 有权
标题翻译：带锥形内表面的保持环
公开(公告)号：US07934979B2
公开(公告)日：2011-05-03
申请号：US12687804
申请日：2010-01-14
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B47/26
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
摘要翻译：保持环具有大致环形体，其具有顶表面，底表面，内径表面和外径表面。外径表面包括具有下表面的向外突出的凸缘，并且底表面包括多个通道。

9. 发明申请

US20080210258A1 SCRUBBER BOX AND METHODS FOR USING THE SAME 有权
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：US20080210258A1
公开(公告)日：2008-09-04
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

10. 发明授权

US07094139B2 Retaining ring with flange for chemical mechanical polishing 有权
公开(公告)号：US07094139B2
公开(公告)日：2006-08-22
申请号：US10659047
申请日：2003-09-08
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B21/18
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.

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