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1. 发明授权

US07934979B2 Retaining ring with tapered inner surface 有权
标题翻译：带锥形内表面的保持环
公开(公告)号：US07934979B2
公开(公告)日：2011-05-03
申请号：US12687804
申请日：2010-01-14
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B47/26
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
摘要翻译：保持环具有大致环形体，其具有顶表面，底表面，内径表面和外径表面。外径表面包括具有下表面的向外突出的凸缘，并且底表面包括多个通道。

2. 发明授权

US07094139B2 Retaining ring with flange for chemical mechanical polishing 有权
公开(公告)号：US07094139B2
公开(公告)日：2006-08-22
申请号：US10659047
申请日：2003-09-08
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B21/18
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.

3. 发明申请

US20100112914A1 RETAINING RING WITH TAPERED INNER SURFACE 有权
标题翻译：带有内表面的保持环
公开(公告)号：US20100112914A1
公开(公告)日：2010-05-06
申请号：US12687804
申请日：2010-01-14
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B41/06
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
摘要翻译：保持环具有大致环形体，其具有顶表面，底表面，内径表面和外径表面。外径表面包括具有下表面的向外突出的凸缘，并且底表面包括多个通道。

4. 发明授权

US07677958B2 Retaining ring with flange for chemical mechanical polishing 有权
标题翻译：带法兰的挡圈用于化学机械抛光
公开(公告)号：US07677958B2
公开(公告)日：2010-03-16
申请号：US11506477
申请日：2006-08-17
申请人： Dan A. Marohl , Ming-Kuei Tseng
发明人： Dan A. Marohl , Ming-Kuei Tseng
IPC分类号： B24B47/26
CPC分类号： B24B37/32 , H01L21/30625
摘要： A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
摘要翻译：保持环具有大致环形体，其具有顶表面，底表面，内径表面和外径表面。外径表面包括具有下表面的向外突出的凸缘，并且底表面包括多个通道。

5. 发明申请

US20080210258A1 SCRUBBER BOX AND METHODS FOR USING THE SAME 有权
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：US20080210258A1
公开(公告)日：2008-09-04
申请号：US12102846
申请日：2008-04-14
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B7/00 , A47L25/00
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

6. 发明授权

US06267423B1 End effector for semiconductor wafer transfer device and method of moving a wafer with an end effector 失效
标题翻译：用于半导体晶片转移装置的末端执行器和用末端执行器移动晶片的方法
公开(公告)号：US06267423B1
公开(公告)日：2001-07-31
申请号：US09578007
申请日：2000-05-24
申请人： Dan A. Marohl , Kenny King-Tai Ngan
发明人： Dan A. Marohl , Kenny King-Tai Ngan
IPC分类号： B65G4907
CPC分类号： H01L21/68707 , Y10S414/141
摘要： An end effector for a transfer robot used in connection with the manufacture of semiconductor wafers is provided. The end effector is designed to handle very thin (0.005″-010″) semiconductor wafers which tend to bow during processing. The robot blade or end effector includes a deep pocket for receiving a bowed wafer. The depth of the pocket may be varied depending upon the degree of bowing in the wafers to be handled. Unlike ordinary wafer transfer devices, the present invention requires the wafer to be transferred with the surface bearing the devices facing down. The deep pocket allows the end effector to contact only the edges of the wafer, thus minimizing any defects across the wafer due to handling. The pocket opening is provided with arcuately shaped sloped wafer contact surfaces to prevent wafer sliding during robot movement.
摘要翻译：提供了一种用于与制造半导体晶片相关的传送机器人的端部执行器。端部执行器被设计为处理在加工期间倾向于弯曲的非常薄（0.005“-101”）的半导体晶片。机器人刀片或末端执行器包括用于接收弓形晶片的深口袋。口袋的深度可以根据要处理的晶片的弯曲程度而变化。不同于普通的晶片转移装置，本发明要求晶片被转移，其中表面将使装置面朝下。深口袋允许端部执行器仅接触晶片的边缘，从而最小化由于处理而在晶片上的任何缺陷。口袋开口设置有弧形倾斜的晶片接触表面，以防止机器人运动期间的晶片滑动。

7. 发明授权

US5833426A Magnetically coupled wafer extraction platform 失效
标题翻译：磁耦合晶圆提取平台
公开(公告)号：US5833426A
公开(公告)日：1998-11-10
申请号：US763604
申请日：1996-12-11
申请人： Dan A. Marohl
发明人： Dan A. Marohl
IPC分类号： B65G49/07 , H01L21/677 , H01L21/687 , B65G65/02
CPC分类号： H01L21/67748 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A wafer extraction platform that is compatible with a high vacuum transfer system includes magnetically coupled upper and lower assemblies. A vacuum to atmosphere seal on the platform is maintained with two O-rings. Two opposing arrays of spaced, parallel blades in the upper assembly define slots for receiving wafers from a cassette. The upper assembly moves in response to a magnetically coupled linear slide mounted on the lower assembly. The upper assembly moves outside the load lock, and the blades pick up and simultaneously extract the wafers from the cassette. The upper assembly retracts into the load lock, and the wafers are transferred to the process chamber. A linear motor mounted at atmospheric pressure inside the lower assembly permits the horizontal movement of the upper assembly while holding the blades parallel to the wafers. Level adjustment screws and a bellows are used to level the platform.
摘要翻译：与高真空传输系统兼容的晶片提取平台包括磁耦合的上部和下部组件。使用两个O形环保持平台上的大气密封真空。在上部组件中的两个相对的间隔开的平行叶片阵列限定用于从盒子接收晶片的狭槽。上部组件响应于安装在下部组件上的磁耦合线性滑块而移动。上部组件移动到装载锁定之外，并且叶片拾起并同时从盒中提取晶片。上部组件缩回到负载锁定中，并且晶片被转移到处理室。安装在下部组件内的大气压下的线性电动机允许上部组件的水平移动，同时保持叶片平行于晶片。水平调节螺丝和波纹管用于平台平台。

8. 发明申请

US20090078292A1 SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE 审中-公开
标题翻译：使用惰性气体空气干燥半导体基板的单波长方法和装置
公开(公告)号：US20090078292A1
公开(公告)日：2009-03-26
申请号：US12249960
申请日：2008-10-12
申请人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
发明人： Nathan D. Stein , Younes Achkire , Timothy J. Franklin , Julia Svirchevski , Dan A. Marohl
IPC分类号： B08B13/00
CPC分类号： H01L21/67034
摘要： In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted to scrub a first and a second side of the wafer respectively; a first spray bar adapted to spray a liquid on the wafer to form a meniscus on the wafer as the wafer is lifted out of the chamber; and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to perform Marangoni drying of the wafer as the wafer is lifted out of the chamber. Numerous other aspects are provided.
摘要翻译：一方面，提供了一种装置。该装置包括一个室; 适于在腔室内以垂直取向支撑晶片的多个辊; 一对刷子，分别用于擦拭所述晶片的第一和第二侧; 第一喷杆，当晶片被提升出室时，适于在晶片上喷射液体以在晶片上形成弯月面; 以及适于将蒸汽引导到弯液面的第二喷杆，所述蒸汽适于降低所述弯液面处的液体的表面张力，以在所述晶片被提升到所述腔室之后执行所述晶片的马兰戈尼干燥。提供了许多其他方面。

9. 发明授权

US07377002B2 Scrubber box 有权
标题翻译：洗衣盒
公开(公告)号：US07377002B2
公开(公告)日：2008-05-27
申请号：US10976012
申请日：2004-10-28
申请人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
发明人： Joseph Yudovsky , Avi Tepman , Kenneth R. Reynolds , Younes Achkire , Dan A. Marohl , Steve G. Ghanayem , Alexander S. Polyak , Gary Ettinger , Haochuan Zhang , Hui Chen
IPC分类号： B08B1/04
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度刷子

10. 发明申请

US20160148822A1 SUBSTRATE CARRIER USING A PROPORTIONAL THERMAL FLUID DELIVERY SYSTEM 审中-公开
标题翻译：使用比例热流体输送系统的基座载体
公开(公告)号：US20160148822A1
公开(公告)日：2016-05-26
申请号：US14555467
申请日：2014-11-26
申请人： Phillip Criminale , Justin Phi , Dan A. Marohl , Sergio Fukuda Shoji , Brad L. Mays
发明人： Phillip Criminale , Justin Phi , Dan A. Marohl , Sergio Fukuda Shoji , Brad L. Mays
IPC分类号： H01L21/67 , H01L21/66 , H01L21/683 , H01J37/32 , H01L21/3065
CPC分类号： H01L21/67248 , H01J37/32724 , H01L21/67017 , H01L21/67109 , H01L21/6831
摘要： A substrate carrier is described that uses a proportional thermal fluid delivery system In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel, A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.
摘要翻译：描述了使用比例热流体输送系统的衬底载体。在一个示例中，该装置包括热交换器，以将热流体提供给衬底载体的流体通道并从流体通道接收热流体，流体通道，用于在衬底处理期间控制载体的温度。比例阀控制从热交换器到流体通道的热流体的流速。温度控制器从载体的热传感器接收测量的温度，并根据测量的温度控制比例阀，以调节速度流。

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