专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08653405B2 Method for operating a vacuum plasma process system 有权
标题翻译：操作真空等离子体处理系统的方法
公开(公告)号：US08653405B2
公开(公告)日：2014-02-18
申请号：US11559102
申请日：2006-11-13
申请人： Thomas Kirchmeier , Michael Glück , Christoph Hofstetter , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Glück , Christoph Hofstetter , Gerd Hintz
IPC分类号： H01L21/306
CPC分类号： H05H1/46 , H01S3/036 , H01S3/0384 , H01S3/073 , H01S3/0971 , H01S3/0975
摘要： In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.
摘要翻译：一方面，包括等离子体放电室的真空等离子体处理系统的操作通过在第一操作状态下在放电室中产生主等离子体并且在第二操作状态下在放电室中产生辅助等离子体来实现。生成主等离子体包括用第一数量的RF发电机产生主等离子体功率，并且产生具有第二数量的RF发生器的辅助等离子体功率，使得第二数量小于第一数量。

2. 发明授权

US07745955B2 RF plasma supply device 有权
标题翻译：射频等离子体供应装置
公开(公告)号：US07745955B2
公开(公告)日：2010-06-29
申请号：US11549773
申请日：2006-10-16
申请人： Thomas Kirchmeier , Ekkehard Mann , Michael Glück , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
发明人： Thomas Kirchmeier , Ekkehard Mann , Michael Glück , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
IPC分类号： H02J1/10
CPC分类号： H02M7/5387 , H01J37/32082 , H01J37/32165 , H01J37/32174 , H02M2007/53878 , Y10T307/505
摘要： The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
摘要翻译：通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出，将至少两个RF功率信号耦合到耦合的RF功率中，并将耦合的RF功率分配在要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出，即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率，耦合的 RF功率构成均衡功率，并且对于低于预定义的下限功率限制的等离子体功率，耦合RF功率的重要部分构成均衡功率。

3. 发明申请

US20070145900A1 RF Plasma Supply Device 有权
标题翻译：射频等离子体供应装置
公开(公告)号：US20070145900A1
公开(公告)日：2007-06-28
申请号：US11549773
申请日：2006-10-16
申请人： Thomas Kirchmeier , Ekkehard Mann , Michael Gluck , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
发明人： Thomas Kirchmeier , Ekkehard Mann , Michael Gluck , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
IPC分类号： H01J7/24 , C23F1/00 , C23C16/00
CPC分类号： H02M7/5387 , H01J37/32082 , H01J37/32165 , H01J37/32174 , H02M2007/53878 , Y10T307/505
摘要： The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
摘要翻译：通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出，将至少两个RF功率信号耦合到耦合的RF功率中，并将耦合的RF功率分配在要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出，即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率，耦合的 RF功率构成均衡功率，并且对于低于预定义的下限功率限制的等离子体功率，耦合RF功率的重要部分构成均衡功率。

4. 发明申请

US20080041830A1 Method for Operating a Vacuum Plasma Process System 有权
标题翻译：操作真空等离子体处理系统的方法
公开(公告)号：US20080041830A1
公开(公告)日：2008-02-21
申请号：US11559102
申请日：2006-11-13
申请人： Thomas Kirchmeier , Michael Gluck , Christoph Hofstetter , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Gluck , Christoph Hofstetter , Gerd Hintz
IPC分类号： H01J37/32 , B23K26/00 , H01S3/03
CPC分类号： H05H1/46 , H01S3/036 , H01S3/0384 , H01S3/073 , H01S3/0971 , H01S3/0975
摘要： A method for operating vacuum plasma process system includes generating a main plasma in a first operating state and generating an auxiliary plasma in a second operating state. The main plasma is generated in that a first number of RF power generators generate a main plasma, and a second number of RF power generators generate an auxiliary plasma power. The second number is smaller than the first number. The auxiliary plasma facilitates ignition of the main plasma.
摘要翻译：用于操作真空等离子体处理系统的方法包括在第一操作状态下产生主等离子体并在第二操作状态下产生辅助等离子体。产生主等离子体是因为第一数量的RF发生器产生主等离子体，第二数量的RF发生器产生辅助等离子体功率。第二个数字小于第一个数字。辅助等离子体有助于主等离子体的点燃。

5. 发明申请

US20080218264A1 CLASS D AMPLIFIER ARRANGEMENT 有权
标题翻译：类别D放大器布置
公开(公告)号：US20080218264A1
公开(公告)日：2008-09-11
申请号：US12044572
申请日：2008-03-07
申请人： Thomas Kirchmeier , Michael Glueck , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Glueck , Gerd Hintz
IPC分类号： H03F3/217
CPC分类号： H03F3/217 , H01J37/32009 , H01J37/32174 , H01L23/642 , H01L24/48 , H01L24/49 , H01L25/16 , H01L2224/48091 , H01L2224/48137 , H01L2224/48227 , H01L2224/49111 , H01L2224/73265 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01068 , H01L2924/01072 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/13091 , H01L2924/19041 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/30111 , H05H1/36 , H05H1/46 , H01L2924/00 , H01L2224/45099 , H01L2224/05599
摘要： An amplifier arrangement for operation at supply voltages of at least 100V and at output powers of at least 1 kW includes a half-bridge formed from two switching elements connected in series, two supply voltage terminals, and an output connection between the switching elements. A bypass capacitor is in parallel with the switching elements, and a current path is through the switching elements and the bypass capacitor, where the current path has a length of 10 cm or less, the half-bridge and the bypass capacitor are arranged on an area of 30 cm2, and a resonant circuit formed by capacitances and inductances in the current path has a resonance frequency of 100 MHz or greater.
摘要翻译：用于在至少100V的电源电压和至少1kW的输出功率下操作的放大器装置包括由串联连接的两个开关元件，两个电源电压端子和开关元件之间的输出连接形成的半桥。旁路电容与开关元件并联，并且电流路径通过开关元件和旁路电容器，其中电流路径具有10cm或更小的长度，半桥和旁路电容器布置在 30cm 2的面积，由电流路径中的电容和电感形成的谐振电路的共振频率为100MHz以上。

6. 发明授权

US08643279B2 Determining high frequency operating parameters in a plasma system 有权
标题翻译：确定等离子体系统中的高频工作参数
公开(公告)号：US08643279B2
公开(公告)日：2014-02-04
申请号：US12692246
申请日：2010-01-22
申请人： Thomas Kirchmeier , Gerd Hintz
发明人： Thomas Kirchmeier , Gerd Hintz
IPC分类号： H05B37/00
CPC分类号： G01R21/06 , G01R23/02 , H01J37/32045 , H02M7/003 , H02M7/5383 , H03H7/40 , H05B41/2806 , H05H1/46 , Y02B20/22
摘要： Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.
摘要翻译：使用具有四个端口的混合耦合器来确定等离子体系统中包括耦合到等离子体负载的等离子体电源装置的高频工作参数是通过以下方式实现的：产生两个相同频率的高频源信号，相位偏移90°，相互尊重通过组合混合耦合器中的高频源信号来产生高频输出信号; 将高频输出信号传输到等离子体负载; 检测两个或更多个信号，每个信号对应于混合耦合器的相应端口并且与存在于相应端口的高频信号的振幅有关; 并且基于对两个或更多个信号的评估，确定高频操作参数。

7. 发明申请

US20100170640A1 DETERMINING HIGH FREQUENCY OPERATING PARAMETERS IN A PLASMA SYSTEM 有权
标题翻译：确定等离子体系中的高频操作参数
公开(公告)号：US20100170640A1
公开(公告)日：2010-07-08
申请号：US12692246
申请日：2010-01-22
申请人： Thomas Kirchmeier , Gerd Hintz
发明人： Thomas Kirchmeier , Gerd Hintz
IPC分类号： C23F1/08 , G01R21/06 , G01R19/00 , G06F19/00
CPC分类号： G01R21/06 , G01R23/02 , H01J37/32045 , H02M7/003 , H02M7/5383 , H03H7/40 , H05B41/2806 , H05H1/46 , Y02B20/22
摘要： Determining a high frequency operating parameter in a plasma system including a plasma power supply device coupled to a plasma load using a hybrid coupler having four ports is accomplished by: generating two high frequency source signals of identical frequency, the signals phase shifted by 90° with respect to one another; generating a high frequency output signal by combining the high frequency source signals in the hybrid coupler; transmitting the high frequency output signal to the plasma load; detecting two or more signals, each signal corresponding to a respective port of the hybrid coupler and related to an amplitude of a high frequency signal present at the respective port; and based on an evaluation of the two or more signals, determining the high frequency operating parameter.
摘要翻译：使用具有四个端口的混合耦合器来确定等离子体系统中包括耦合到等离子体负载的等离子体电源装置的高频工作参数是通过以下方式实现的：产生两个相同频率的高频源信号，相位偏移90°，相互尊重通过组合混合耦合器中的高频源信号来产生高频输出信号; 将高频输出信号传输到等离子体负载; 检测两个或更多个信号，每个信号对应于混合耦合器的相应端口并且与存在于相应端口的高频信号的振幅有关; 并且基于对两个或更多个信号的评估，确定高频操作参数。

8. 发明授权

US08129653B2 Plasma supply device 有权
标题翻译：等离子体供应装置
公开(公告)号：US08129653B2
公开(公告)日：2012-03-06
申请号：US12166963
申请日：2008-07-02
申请人： Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
发明人： Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
IPC分类号： B23K10/00
CPC分类号： G01R21/06 , G01R23/02 , H01J37/32045 , H02M7/003 , H02M7/5383 , H03H7/40 , H05B41/2806 , H05H1/46 , Y02B20/22
摘要： A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.
摘要翻译：等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。等离子体供给装置包括连接到直流电源的至少一个逆变器，该逆变器具有至少一个开关元件和输出网络。输出网络布置在印刷电路板上。因此，输出网络的设计价格低廉且准确。

9. 发明授权

US07705676B2 Class D amplifier arrangement 有权
标题翻译： D类放大器布置
公开(公告)号：US07705676B2
公开(公告)日：2010-04-27
申请号：US12044572
申请日：2008-03-07
申请人： Thomas Kirchmeier , Michael Glueck , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Glueck , Gerd Hintz
IPC分类号： H03F3/217
CPC分类号： H03F3/217 , H01J37/32009 , H01J37/32174 , H01L23/642 , H01L24/48 , H01L24/49 , H01L25/16 , H01L2224/48091 , H01L2224/48137 , H01L2224/48227 , H01L2224/49111 , H01L2224/73265 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01023 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01068 , H01L2924/01072 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/13091 , H01L2924/19041 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/30111 , H05H1/36 , H05H1/46 , H01L2924/00 , H01L2224/45099 , H01L2224/05599
摘要： An amplifier arrangement for operation at supply voltages of at least 100V and at output powers of at least 1 kW includes a half-bridge formed from two switching elements connected in series, two supply voltage terminals, and an output connection between the switching elements. A bypass capacitor is in parallel with the switching elements, and a current path is through the switching elements and the bypass capacitor, where the current path has a length of 10 cm or less, the half-bridge and the bypass capacitor are arranged on an area of 30 cm2, and a resonant circuit formed by capacitances and inductances in the current path has a resonance frequency of 100 MHz or greater.
摘要翻译：用于在至少100V的电源电压和至少1kW的输出功率下操作的放大器装置包括由串联连接的两个开关元件，两个电源电压端子和开关元件之间的输出连接形成的半桥。旁路电容与开关元件并联，并且电流路径通过开关元件和旁路电容器，其中电流路径具有10cm或更小的长度，半桥和旁路电容器布置在 30cm 2的面积，由电流路径中的电容和电感形成的谐振电路的共振频率为100MHz以上。

10. 发明申请

US20090026968A1 PLASMA SUPPLY DEVICE 有权
标题翻译：等离子体供应装置
公开(公告)号：US20090026968A1
公开(公告)日：2009-01-29
申请号：US12166963
申请日：2008-07-02
申请人： Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
发明人： Thomas Kirchmeier , Hans-Juergen Windisch , Hanns-Joachim Knaus , Michael Glueck , Gerd Hintz
IPC分类号： H05B37/00 , H05B41/24
CPC分类号： G01R21/06 , G01R23/02 , H01J37/32045 , H02M7/003 , H02M7/5383 , H03H7/40 , H05B41/2806 , H05H1/46 , Y02B20/22
摘要： A plasma supply device generates an output power greater than 500 W at an essentially constant basic frequency greater than 3 MHz and powers a plasma process to which is supplied the generated output power, and from which reflected power is returned to the plasma supply device. The plasma supply device includes at least one inverter connected to a DC power supply, which inverter has at least one switching element, and an output network. The output network is arranged on a printed circuit board. The output network can therefore be designed low priced and accurately.
摘要翻译：等离子体供给装置以大于3MHz的基本上恒定的基本频率产生大于500W的输出功率，并对供给所产生的输出功率的等离子体处理进行供电，并从反射功率返回到等离子体供应装置。等离子体供给装置包括连接到直流电源的至少一个逆变器，该逆变器具有至少一个开关元件和输出网络。输出网络布置在印刷电路板上。因此，输出网络的设计价格低廉且准确。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式