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1. 发明授权

US08653405B2 Method for operating a vacuum plasma process system 有权
标题翻译：操作真空等离子体处理系统的方法
公开(公告)号：US08653405B2
公开(公告)日：2014-02-18
申请号：US11559102
申请日：2006-11-13
申请人： Thomas Kirchmeier , Michael Glück , Christoph Hofstetter , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Glück , Christoph Hofstetter , Gerd Hintz
IPC分类号： H01L21/306
CPC分类号： H05H1/46 , H01S3/036 , H01S3/0384 , H01S3/073 , H01S3/0971 , H01S3/0975
摘要： In one aspect, operating a vacuum plasma process system including a plasma discharge chamber is accomplished by generating a main plasma in the discharge chamber in a first operating state, and generating an auxiliary plasma in the discharge chamber in a second operating state. Generating the main plasma includes generating a main plasma power with a first number of RF power generators, and generating an auxiliary plasma power with a second number of RF power generators, such that the second number is smaller than the first number.
摘要翻译：一方面，包括等离子体放电室的真空等离子体处理系统的操作通过在第一操作状态下在放电室中产生主等离子体并且在第二操作状态下在放电室中产生辅助等离子体来实现。生成主等离子体包括用第一数量的RF发电机产生主等离子体功率，并且产生具有第二数量的RF发生器的辅助等离子体功率，使得第二数量小于第一数量。

2. 发明授权

US08133347B2 Vacuum plasma generator 有权
标题翻译：真空等离子发生器
公开(公告)号：US08133347B2
公开(公告)日：2012-03-13
申请号：US12257643
申请日：2008-10-24
申请人： Michael Glück , Christoph Hofstetter , Gerd Hintz
发明人： Michael Glück , Christoph Hofstetter , Gerd Hintz
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32174 , H01J37/32082 , H03H7/40
摘要： Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.
摘要翻译：在真空室中的工件通过从电压网络接收电源电压来处理; 产生至少一个中间电路电压; 从所述至少一个中间电路电压产生基本频率和第一相位位置的第一RF信号; 从所述至少一个中间电路电压产生所述基本频率和第二相位位置的第二RF信号; 并耦合第一和第二信号，并使用3dB耦合器产生用于真空室的输出信号。

3. 发明授权

US07452443B2 Vacuum plasma generator 有权
标题翻译：真空等离子发生器
公开(公告)号：US07452443B2
公开(公告)日：2008-11-18
申请号：US11371628
申请日：2006-03-09
申请人： Michael Glück , Christoph Hofstetter , Gerd Hintz
发明人： Michael Glück , Christoph Hofstetter , Gerd Hintz
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01J37/32174 , H01J37/32082 , H03H7/40
摘要： A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.
摘要翻译：真空等离子体发生器用于处理真空室中的工件。真空等离子体发生器包括用于连接到电压网络的电源连接器和至少一个电源整流器。所述至少一个电源整流器连接到至少一个产生至少一个中间电路电压的第一转换器，第一RF信号发生器，第二RF信号发生器和至少一个3dB耦合器。第一RF信号发生器连接到至少一个中间电路电压，用于产生基本频率和第一相位位置的第一信号。第二RF信号发生器连接到至少一个中间电路电压，用于产生基本频率和第二相位位置的第二信号。至少一个3dB耦合器将第一和第二信号耦合到发生器的输出信号中。

4. 发明申请

US20090117288A1 VACUUM PLASMA GENERATOR 有权
标题翻译：真空等离子体发生器
公开(公告)号：US20090117288A1
公开(公告)日：2009-05-07
申请号：US12257643
申请日：2008-10-24
申请人： Michael Gluck , Christoph Hofstetter , Gerd Hintz
发明人： Michael Gluck , Christoph Hofstetter , Gerd Hintz
IPC分类号： H05H1/24
CPC分类号： H01J37/32174 , H01J37/32082 , H03H7/40
摘要： Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.
摘要翻译：在真空室中的工件通过从电压网络接收电源电压来处理; 产生至少一个中间电路电压; 从所述至少一个中间电路电压产生基本频率和第一相位位置的第一RF信号; 从所述至少一个中间电路电压产生所述基本频率和第二相位位置的第二RF信号; 并耦合第一和第二信号，并使用3dB耦合器产生用于真空室的输出信号。

5. 发明申请

US20070145900A1 RF Plasma Supply Device 有权
标题翻译：射频等离子体供应装置
公开(公告)号：US20070145900A1
公开(公告)日：2007-06-28
申请号：US11549773
申请日：2006-10-16
申请人： Thomas Kirchmeier , Ekkehard Mann , Michael Gluck , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
发明人： Thomas Kirchmeier , Ekkehard Mann , Michael Gluck , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
IPC分类号： H01J7/24 , C23F1/00 , C23C16/00
CPC分类号： H02M7/5387 , H01J37/32082 , H01J37/32165 , H01J37/32174 , H02M2007/53878 , Y10T307/505
摘要： The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
摘要翻译：通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出，将至少两个RF功率信号耦合到耦合的RF功率中，并将耦合的RF功率分配在要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出，即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率，耦合的 RF功率构成均衡功率，并且对于低于预定义的下限功率限制的等离子体功率，耦合RF功率的重要部分构成均衡功率。

6. 发明授权

US06288553B1 Method for determining the loop resistance of a power supply network 有权
标题翻译：用于确定电源网络的回路电阻的方法
公开(公告)号：US06288553B1
公开(公告)日：2001-09-11
申请号：US09172025
申请日：1998-10-14
申请人： Christoph Hofstetter , Frank Henninger
发明人： Christoph Hofstetter , Frank Henninger
IPC分类号： G01R3108
CPC分类号： G01R27/16
摘要： The invention relates to a method for determining the loop resistance of a power supply network with a neutral conductor (called N), a phase or external conductor (called L1), a ground or protective earth conductor (called PE), and a fault current breaker (called FI) based on the differential quotient Ri=dU/dI≈(U1−U2)/(I1−I2); whereby U1 is the measured, unloaded network voltage, I1 is the zero current without load, U2 is the measured, loaded network voltage, and I2 is the calculated load current. According to one aspect of the invention, the following steps are provided: Loading of a L1-N loop and determining the resistance RL1 according to equation (1), loading of a N-PE loop with a measuring current IM under a measuring voltage UM which is small enough to avoid triggering of the fault current circuit breaker, and determining the resistance RPE according to the following equation (2): RPE=UM/IM (2) and determining the loop resistance as RL1+RPE.
摘要翻译：本发明涉及一种用于确定具有中性导体（称为N），相或外部导体（称为L1），接地或保护接地导体（称为PE）的电源网络的回路电阻的方法，以及故障电流基于差分商的断路器（称为FI），其中U1是测量的无负载网络电压，I1是无负载的零电流，U2是测量的负载网络电压，I2是计算的负载电流。根据本发明的一个方面，提供以下步骤：根据等式（1）加载L1-N环路并确定电阻RL1，在测量电压UM下加载具有测量电流IM的N-PE环路其足够小以避免触发故障电流断路器，并根据以下等式（2）确定电阻RPE：并将回路电阻确定为RL1 + RPE。

7. 发明授权

US6144925A Device and method for determining the sign of the phase angle of two electrical signals 失效
标题翻译：用于确定两个电信号的相位角符号的装置和方法
公开(公告)号：US6144925A
公开(公告)日：2000-11-07
申请号：US993522
申请日：1997-12-18
申请人： Christoph Hofstetter
发明人： Christoph Hofstetter
IPC分类号： G01R29/18 , G01R25/00
CPC分类号： G01R29/18
摘要： The present invention pertains to a device and method for determining the sign of a phase angle of a first and second, essentially identical, periodic electric signals on corresponding first and second electrical conductors L1, L2, in particular, to determine the phase sequence in a three-phase power system. The device according to the present invention has a sensing device for sensing of the first signal from the first conductor L1 and of the second signal from the second conductor L2; a trigger device 25 for receiving the sensed first signal and specifying a time reference point and/or a time reference window within the signal period of the first signal and outputting a corresponding trigger signal; and a determination device 31, 32, 33 for receiving the trigger signal and the sensed second signal and determining the sign of the phase angle under consideration of at least the value of the second signal at the time reference point and/or the waveform of the second signal within the time reference window.
摘要翻译：本发明涉及一种用于确定对应的第一和第二电导体L1，L2上的第一和第二，基本相同的周期性电信号的相位角的符号的装置和方法，特别地，以确定一个三相电力系统。根据本发明的装置具有用于感测来自第一导体L1的第一信号和来自第二导体L2的第二信号的感测装置; 触发装置25，用于接收感测到的第一信号，并在第一信号的信号周期内指定时间参考点和/或时间参考窗口，并输出相应的触发信号; 以及确定装置31,32,33，用于接收触发信号和所感测的第二信号，并且在时间参考点处至少考虑第二信号的值和/或波形，确定相位角的符号时间参考窗口内的第二个信号。

8. 发明授权

US07745955B2 RF plasma supply device 有权
标题翻译：射频等离子体供应装置
公开(公告)号：US07745955B2
公开(公告)日：2010-06-29
申请号：US11549773
申请日：2006-10-16
申请人： Thomas Kirchmeier , Ekkehard Mann , Michael Glück , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
发明人： Thomas Kirchmeier , Ekkehard Mann , Michael Glück , Christoph Hofstetter , Christoph Gerhardt , Gerd Hintz
IPC分类号： H02J1/10
CPC分类号： H02M7/5387 , H01J37/32082 , H01J37/32165 , H01J37/32174 , H02M2007/53878 , Y10T307/505
摘要： The power output of an RF plasma supply device is controlled by producing at least a first and second RF power signal by means of a respective RF generator, coupling at least two RF power signals into a coupled RF power, and distributing the coupled RF power between a plasma power that is to be supplied to a plasma load and an equalizing power that is to be supplied to an equalizing load. The power output is controlled by adjusting the levels and/or the phase position of the RF power signals in such a manner that, for plasma power in the range between a predefined lower power limit and a predefined nominal power, an insignificant portion of the coupled RF power constitutes the equalizing power and, for plasma power below the predefined lower power limit, a significant portion of the coupled RF power constitutes the equalizing power.
摘要翻译：通过利用相应的RF发生器产生至少第一和第二RF功率信号来控制RF等离子体供给装置的功率输出，将至少两个RF功率信号耦合到耦合的RF功率中，并将耦合的RF功率分配在要提供给等离子体负载的等离子体功率和将被提供给均衡负载的均衡功率。通过以这样的方式调节RF功率信号的电平和/或相位位置来控制功率输出，即对于在预定义的较低功率极限和预定标称功率之间的范围内的等离子体功率，耦合的 RF功率构成均衡功率，并且对于低于预定义的下限功率限制的等离子体功率，耦合RF功率的重要部分构成均衡功率。

9. 发明申请

US20080041830A1 Method for Operating a Vacuum Plasma Process System 有权
标题翻译：操作真空等离子体处理系统的方法
公开(公告)号：US20080041830A1
公开(公告)日：2008-02-21
申请号：US11559102
申请日：2006-11-13
申请人： Thomas Kirchmeier , Michael Gluck , Christoph Hofstetter , Gerd Hintz
发明人： Thomas Kirchmeier , Michael Gluck , Christoph Hofstetter , Gerd Hintz
IPC分类号： H01J37/32 , B23K26/00 , H01S3/03
CPC分类号： H05H1/46 , H01S3/036 , H01S3/0384 , H01S3/073 , H01S3/0971 , H01S3/0975
摘要： A method for operating vacuum plasma process system includes generating a main plasma in a first operating state and generating an auxiliary plasma in a second operating state. The main plasma is generated in that a first number of RF power generators generate a main plasma, and a second number of RF power generators generate an auxiliary plasma power. The second number is smaller than the first number. The auxiliary plasma facilitates ignition of the main plasma.
摘要翻译：用于操作真空等离子体处理系统的方法包括在第一操作状态下产生主等离子体并在第二操作状态下产生辅助等离子体。产生主等离子体是因为第一数量的RF发生器产生主等离子体，第二数量的RF发生器产生辅助等离子体功率。第二个数字小于第一个数字。辅助等离子体有助于主等离子体的点燃。

10. 发明申请

US20060196426A1 Vacuum plasma generator 有权
标题翻译：真空等离子发生器
公开(公告)号：US20060196426A1
公开(公告)日：2006-09-07
申请号：US11371628
申请日：2006-03-09
申请人： Michael Gluck , Christoph Hofstetter , Gerd Hintz
发明人： Michael Gluck , Christoph Hofstetter , Gerd Hintz
IPC分类号： C23C16/00
CPC分类号： H01J37/32174 , H01J37/32082 , H03H7/40
摘要： A vacuum plasma generator is used for treating workpieces in a vacuum chamber. The vacuum plasma generator includes a mains connection for connection to a voltage supply network, and at least one mains rectifier. The at least one mains rectifier is connected to at least one first converter that generates at least one intermediate circuit voltage, a first RF signal generator, a second RF signal generator, and at least one 3 dB coupler. The first RF signal generator is connected to at least one intermediate circuit voltage, for generating a first signal of a basic frequency and of a first phase position. The second RF signal generator is connected to at least one intermediate circuit voltage, for generating a second signal of the basic frequency and of a second phase position. The least one 3 dB coupler couples the first and the second signal into an output signal of the generator.
摘要翻译：真空等离子体发生器用于处理真空室中的工件。真空等离子体发生器包括用于连接到电压网络的电源连接器和至少一个电源整流器。所述至少一个电源整流器连接到至少一个产生至少一个中间电路电压的第一转换器，第一RF信号发生器，第二RF信号发生器和至少一个3dB耦合器。第一RF信号发生器连接到至少一个中间电路电压，用于产生基本频率和第一相位位置的第一信号。第二RF信号发生器连接到至少一个中间电路电压，用于产生基本频率和第二相位位置的第二信号。至少一个3dB耦合器将第一和第二信号耦合到发生器的输出信号中。

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