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    • 4. 发明授权
    • Use of polymers for modifying surfaces in cleaning applications
    • 使用聚合物来改善清洁应用中的表面
    • US07749331B2
    • 2010-07-06
    • US11574988
    • 2005-09-12
    • Heike BeckerKai-Uwe BaldeniusMarkus Hartmann
    • Heike BeckerKai-Uwe BaldeniusMarkus Hartmann
    • B08B3/04C11D3/37C11D1/00
    • C11D3/042C11D3/2075C11D3/34C11D3/3719C11D3/3723
    • The present application relates to the use of formulations comprising a) at least one polymer as component A comprising at least one structural unit of the formula (I) where the structural unit may be part of a polymer main chain or may be bonded to a polymer main chain via an anchor group, and M is hydrogen or a metal cation; and water; for the treatment of hard surfaces as compositions for improving the run-off behavior of water from the treated hard surfaces and for reducing soil and salt deposition on the treated hard surfaces, and to formulations for the treatment of hard surfaces comprising the at least one polymer, at least one surfactant and at least one carboxylic acid and/or sulfonic acid and/or inorganic acid, and to the use of these formulations for the treatment of hard surfaces.
    • 本申请涉及包含a)至少一种聚合物作为组分A的组合物的用途,其包含至少一种式(I)的结构单元,其中结构单元可以是聚合物主链的一部分或可以结合到聚合物 主链通过锚定基团,M是氢或金属阳离子; 和水; 用于处理硬表面作为用于改善来自处理过的硬表面的水的流失行为并用于减少经处理的硬表面上的土壤和盐沉积的组合物的组合物,以及用于处理包含至少一种聚合物的硬表面的制剂 ,至少一种表面活性剂和至少一种羧酸和/或磺酸和/或无机酸,以及这些制剂用于硬表面处理的用途。
    • 5. 发明授权
    • Process for preparing substituted chroman derivatives
    • 取代苯并二氢吡喃衍生物的制备方法
    • US6136986A
    • 2000-10-24
    • US459727
    • 1999-12-13
    • Rainer SturmerKai-Uwe Baldenius
    • Rainer SturmerKai-Uwe Baldenius
    • C07D309/30C07D311/66C07D311/70C07D407/04C07D311/58
    • C07D311/70C07D311/66Y02P20/55
    • The invention relates to a process for preparing substituted chroman derivatives of the general formula VII, ##STR1## where X is the group --CN, --COOR.sup.3, --CHO, --CH.sub.2 OR.sup.7 or --CH(OR.sup.8).sub.2,R.sup.2 is a C.sub.1 -C.sub.23 -alkyl, C.sub.2 -C.sub.23 -alkenyl, C.sub.6 -C.sub.18 -aryl or C.sub.7 -C.sub.18 -aralkyl radical,R.sup.3 is hydrogen or an optionally substituted C.sub.1 -C.sub.4 -alkyl radical,R.sup.4, R.sup.5, R.sup.6 are, independently of one another, hydrogen or a C.sub.1 -C.sub.4 -alkyl radical,R.sup.7 is hydrogen or a C.sub.1 -C.sub.4 -alkyl radical,R.sup.8 is a C.sub.1 -C.sub.4 -alkyl radical, or the two radicals are a C.sub.2 -C.sub.6 -alkylene radical which links the two oxygen atoms to form a cyclic acetal and is optionally branched or may carry one or two carboxyl groups, cyclohexyl or phenyl radicals,and to the novel intermediates of the process.
    • 本发明涉及制备通式VII取代的苯并二氢吡喃衍生物的方法,其中X为基团-CN,-COOR 3,-CHO,-CH 2 OR 7或-CH(OR 8)2,R 2为C 1 -C 23 - 烷基, C 2 -C 23 - 烯基,C 6 -C 18 - 芳基或C 7 -C 18 - 芳烷基,R 3是氢或任选取代的C 1 -C 4烷基,R 4,R 5,R 6彼此独立地是氢或C1- C 4 - 烷基,R 7是氢或C 1 -C 4 - 烷基,R 8是C 1 -C 4烷基,或两个基团是连接两个氧原子以形成环状缩醛的C 2 -C 6亚烷基 并且任选地支链或可以携带一个或两个羧基,环己基或苯基,以及该方法的新中间体。
    • 6. 发明申请
    • Use of Polymers for Modifying Surfaces in Cleaning Applications
    • 在清洁应用中使用聚合物修饰表面
    • US20080032911A1
    • 2008-02-07
    • US11574988
    • 2005-09-12
    • Heike BeckerKai-Uwe BaldeniusMarkus Hartmann
    • Heike BeckerKai-Uwe BaldeniusMarkus Hartmann
    • B08B7/00C11D3/37
    • C11D3/042C11D3/2075C11D3/34C11D3/3719C11D3/3723
    • The present application relates to the use of formulations comprising a) at least one polymer as component A comprising at least one structural unit of the formula (I) where the structural unit may be part of a polymer main chain or may be bonded to a polymer main chain via an anchor group, and M is hydrogen or a metal cation; and water; for the treatment of hard surfaces as compositions for improving the run-off behavior of water from the treated hard surfaces and for reducing soil and salt deposition on the treated hard surfaces, and to formulations for the treatment of hard surfaces comprising the at least one polymer, at least one surfactant and at least one carboxylic acid and/or sulfonic acid and/or inorganic acid, and to the use of these formulations for the treatment of hard surfaces.
    • 本申请涉及包含a)至少一种聚合物作为组分A的组合物的用途,其包含至少一种式(I)的结构单元,其中结构单元可以是聚合物主链的一部分或可以结合到聚合物 主链通过锚定基团,M是氢或金属阳离子; 和水; 用于处理硬表面作为用于改善来自处理过的硬表面的水的流失行为并用于减少经处理的硬表面上的土壤和盐沉积的组合物的组合物,以及用于处理包含至少一种聚合物的硬表面的制剂 ,至少一种表面活性剂和至少一种羧酸和/或磺酸和/或无机酸,以及这些制剂用于硬表面处理的用途。
    • 10. 发明授权
    • Method for producing methylglycine-N,N-diethanoic acid-trialkali metal salts with a low by-product content
    • 具有低副产物含量的甲基甘氨酸-N,N-二乙酸 - 三烷基金属盐的制备方法
    • US07671234B2
    • 2010-03-02
    • US11913597
    • 2006-05-02
    • Alfred OftringGerold BraunFriedrich WirsingArmin StammKai-Uwe Baldenius
    • Alfred OftringGerold BraunFriedrich WirsingArmin StammKai-Uwe Baldenius
    • C07C227/26C07C229/16
    • C07C227/26C07C229/16
    • The invention relates to a process for preparing low-by-product, light-color methylglycine-N,N-diacetic acid tri(alkali metal) salt by alkaline hydrolysis of methylglycinediacetonitrile (MGDN), comprising the steps in the sequence (a) to (f): (a) mixing of MGDN with aqueous alkali at a temperature of ≦30° C.; (b) allowing the aqueous alkaline MGDN suspension to react at a temperature in the range from 10 to 30° C. over a period of from 0.1 to 10 h to form a solution; (c) allowing the solution from step (b) to react at a temperature in the range from 30 to 40° C. over a period of from 0.1 to 10 h; (d) optionally allowing the solution from step (c) to react at a temperature in the range from 50 to 80° C. over a period of from 0.5 to 2 h; (e) optionally allowing the solution from step (c) or (d) to react at a temperature in the range from 110 to 200° C. over a period of from 5 to 60 min; (f) hydrolysis and removal of ammonia of the solution obtained in step (c), (d) or (e) by stripping at a temperature of from 90 to 105° C.
    • 本发明涉及通过甲基甘氨二乙腈(MGDN)的碱水解制备低副产物,浅色甲基甘氨酸-N,N-二乙酸三(碱金属)盐的方法,包括步骤(a)至 (f):(a)在温度为30℃的温度下,将MGDN与碱水溶液混合; (b)使含水碱性MGDN悬浮液在10至30℃的温度下反应0.1至10小时以形成溶液; (c)允许来自步骤(b)的溶液在0.1至10小时的时间内在30至40℃的温度下反应; (d)任选地允许步骤(c)的溶液在0.5至2小时的时间内在50至80℃的温度下反应; (e)任选地允许来自步骤(c)或(d)的溶液在110至200℃的温度下在5至60分钟的时间内反应; (f)通过在90至105℃的温度下汽提来水解和除去在步骤(c),(d)或(e)中获得的溶液中的氨。